KR930026515U - 반도체 식각장치 - Google Patents

반도체 식각장치

Info

Publication number
KR930026515U
KR930026515U KR2019920008094U KR920008094U KR930026515U KR 930026515 U KR930026515 U KR 930026515U KR 2019920008094 U KR2019920008094 U KR 2019920008094U KR 920008094 U KR920008094 U KR 920008094U KR 930026515 U KR930026515 U KR 930026515U
Authority
KR
South Korea
Prior art keywords
etching device
semiconductor etching
semiconductor
etching
Prior art date
Application number
KR2019920008094U
Other languages
English (en)
Other versions
KR0129924Y1 (ko
Inventor
염용주
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019920008094U priority Critical patent/KR0129924Y1/ko
Publication of KR930026515U publication Critical patent/KR930026515U/ko
Application granted granted Critical
Publication of KR0129924Y1 publication Critical patent/KR0129924Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)
KR2019920008094U 1992-05-13 1992-05-13 반도체 식각장치 KR0129924Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019920008094U KR0129924Y1 (ko) 1992-05-13 1992-05-13 반도체 식각장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019920008094U KR0129924Y1 (ko) 1992-05-13 1992-05-13 반도체 식각장치

Publications (2)

Publication Number Publication Date
KR930026515U true KR930026515U (ko) 1993-12-28
KR0129924Y1 KR0129924Y1 (ko) 1999-02-01

Family

ID=19333043

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019920008094U KR0129924Y1 (ko) 1992-05-13 1992-05-13 반도체 식각장치

Country Status (1)

Country Link
KR (1) KR0129924Y1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG92720A1 (en) * 1999-07-14 2002-11-19 Nisso Engineering Co Ltd Method and apparatus for etching silicon

Also Published As

Publication number Publication date
KR0129924Y1 (ko) 1999-02-01

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20060720

Year of fee payment: 9

EXPY Expiration of term