KR930017997A - 양이온성 유화제를 함유하는 금속 표면용 광택제 및 광택제내에 함유된 양이온성 유화제 - Google Patents
양이온성 유화제를 함유하는 금속 표면용 광택제 및 광택제내에 함유된 양이온성 유화제 Download PDFInfo
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- KR930017997A KR930017997A KR1019930002388A KR930002388A KR930017997A KR 930017997 A KR930017997 A KR 930017997A KR 1019930002388 A KR1019930002388 A KR 1019930002388A KR 930002388 A KR930002388 A KR 930002388A KR 930017997 A KR930017997 A KR 930017997A
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- South Korea
- Prior art keywords
- weight
- formula
- polishing agent
- carbon atoms
- atoms
- Prior art date
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- 239000003795 chemical substances by application Substances 0.000 title claims abstract 8
- 239000003995 emulsifying agent Substances 0.000 title claims abstract 6
- 125000002091 cationic group Chemical group 0.000 title claims abstract 5
- 239000002184 metal Substances 0.000 title claims abstract 3
- 238000005498 polishing Methods 0.000 title claims 7
- 125000000962 organic group Chemical group 0.000 claims abstract 5
- 239000006185 dispersion Substances 0.000 claims abstract 3
- 229910052736 halogen Inorganic materials 0.000 claims abstract 3
- 150000001875 compounds Chemical class 0.000 claims abstract 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 6
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 6
- 125000004437 phosphorous atom Chemical group 0.000 claims 6
- 125000004432 carbon atom Chemical group C* 0.000 claims 5
- 125000000217 alkyl group Chemical group 0.000 claims 4
- 125000003118 aryl group Chemical group 0.000 claims 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims 2
- 125000001931 aliphatic group Chemical group 0.000 claims 2
- 150000001450 anions Chemical class 0.000 claims 2
- 239000002800 charge carrier Substances 0.000 claims 2
- 150000002367 halogens Chemical class 0.000 claims 2
- 125000005842 heteroatom Chemical group 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- 239000003960 organic solvent Substances 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 229920000642 polymer Polymers 0.000 claims 2
- 229920006395 saturated elastomer Polymers 0.000 claims 2
- 229910052717 sulfur Inorganic materials 0.000 claims 2
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 claims 1
- 229920001577 copolymer Polymers 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 229920001296 polysiloxane Polymers 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 238000005282 brightening Methods 0.000 abstract 1
- 229920002313 fluoropolymer Polymers 0.000 abstract 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/06—Other polishing compositions
- C09G1/08—Other polishing compositions based on wax
- C09G1/10—Other polishing compositions based on wax based on mixtures of wax and natural or synthetic resin
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
- C08G65/005—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
- C08G65/007—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Detergent Compositions (AREA)
- Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polyethers (AREA)
- Paints Or Removers (AREA)
- Silicon Polymers (AREA)
- Developing Agents For Electrophotography (AREA)
- Treatments For Attaching Organic Compounds To Fibrous Goods (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
하기 일반식의 양이온성 유화제를 적어도 0.1~5중량% 함유하는 개선된 방수성 및 내오염성과 함께 고광택 특성을 갖는 불소화 중합체 및 피플루오로옥시알킬렌 오일 및 왁스의 분산액 기재 금속 표면용 광택제.
R[L-Q+X-]t (I)
[식중, R은 피플루오로폴리옥시알킬렌 단위이며, L은 2가 유기 기이고, Q는 극성 기이며, X는 할로겐 또는 CH3-페닐렌 -SO3 -,R″SO3 -(R″는F-(CF2)m-이다.)이고, t는 1 또는 2이며, m은 1~4이다.) 상기 식을 함유하는 화합물 뿐만 아니라 식(I)의 유화제를 함유하는 광택제를 신규 생성물로 특히 청구한다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (10)
- 하기 일반식(I)의 양이온성 유화제를 함유하는 것을 특징으로 하는,유기용매 중에 있는, 플루오로올레핀 공중합체 및 피플루오로폴리옥시알킬렌오일로 부터 선택된 플루오르화 물질 및 왁스의 분산액 기재 금속 표면용 광택제.R[L-Q+X-]t (I)[상기식에서, R은 400 내지 2,000의 평균 분자량을 갖는 탄소수 1~3의 퍼플루오로옥시알킬렌 단위의 사슬이고, L은 2가 유기 기이며, t는 1 또는 2이고, Q는 양전자 캐리어로서 N 또는 P 원자를 함유하는 극성 유기기이며,(A+는 N 또는 P 원자이며, R1,R2및 R3은 서로 동일하거나 상이하며 탄소수 1~12의 알킬기이고, 또는 A+가 P일때, R1,R2,R3는 또한 아릴기일 수 있다)을 갖거나, 또는 Q는 L기에 직접 결합한 양전하 캐리어로서 N 또는 P 원자를 함유하는 포화 되었거나 불포화된 방향족 또는 지방족 환이며, 이 환은 경우에 따라서 알킬 치환체로 O 및 S등과 같은 헤테로 원자를 함유할 수 있으며, X-는 음이온이다.]
- 제1항에 있어서, 식(I)중의 L이 하기식에서 선택되는 광택제:-CH2O-CO-CH2-, -CH2O(CH2CH2O)nCH÷CH2-, -CH2O(CH2CH2O)nCOCH2-, -CO-NR′(CH2)n-CH2-[식중 : n은 1 내지 3의 수이고, R′은 수소원자, 탄소수 1~4의 알킬기이다.]
- 제1항 또는 제2항에 있어서, 식(I)중의 X-가 할로겐, 아세테이프, CH3- 페닐렌-SO3-, R″SO3 -(식중, R″는 구조식 F-(CF)m- 이고 m은 1~4이다.)에서 선택되는 광택제.
- 제1항 내지 제3항 중의 어느 한 항에 있어서, 중량%로 하기를 함유하는 광택제. 유기 용매 50~90, 퍼플루오로폴리옥시알킬렌 오일 0.1~5, 플루오로올레핀 중합체 0.5~20, 왁스 1~10, 양이 온성 유화제 0.1~5.
- 제4항에 있어서, 0~10중량%를 지방족 알콜, 0~10 중량%의 실리콘 및 0~20중량%의 연마제를 더함유하는 광택제.
- 제1항 내지 제5항중의 어느 한 항에 있어서, 피플루오로폴리옥시알킬렌 오일을 0.5~3중량%의 양으로 함유하는 광택제.
- 제1항 내지 제6중의 어느 한 항에 있어서, 플루오로올레핀중합체를 1.5~20중량%의 양으로 함유하는 광택제.
- 하기 일반식의 화합물.R[-L-Q+-X--]t[식중, R은 평균 분자량이 400~2,000이며, 바람직하게는 500~1000을 갖는 퍼플루오로옥시알킬렌 단위의 사슬이고, L은 2가 유기기이며, t는 1 또는 2이고 Q는 양전자 캐리어로서 N 또는 P 원자를 함유하는 극성 유기기이며,(A+는 N 또는 P 원자이며, R1,R2및 R3은 서로 동일하거나 상이하며 탄소수 1~12의 알킬기이고, 또는 A+가 P일때, R1,R2,R3는 또한 아릴기일 수 있다)을 갖거나, 또는 Q는 L기에 직접 결합한 양전하 캐리어로서 N 또는 P 원자를 함유하는 포화 되었거나 불포화된 방향족 또는 지방족 환이며, 이 환은 경우에 따라서 알킬 치환체로 O 및 S등과 같은 헤테로 원자를 함유할 수 있으며, X-는 음이온이다.]
- 제8항에 있어서, 식(I)중의 L이 하기식에서 선택되는 광택제 :-CH2O-CO-CH2-, -CH2O(CH2CH2O)nCH÷CH2-, -CH2O(CH2CH2O)nCOCH2-, -CO-NR′(CH2)n-CH2-[식중 : n은 1 내지 3의 수이고, R′은 수소원자, 탄소수 1~4의 알킬이다.]
- 제8항 또는 제9항에 있어서, X-가 할로겐, 아세테이프, CH3- 페닐렌-SO3-, R″SO3 -(식중, R″는 구조식 F-(CF)m- 이고 m은 1~4이다.)에서 선택되는 화합물.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITMI920360A IT1254630B (it) | 1992-02-20 | 1992-02-20 | Composizioni detergenti, lucidanti e proteggenti (polishes) per superfici metalliche contenenti emulsionanti cationici, ed emulsionanti cationici in esse contenuti. |
ITMI92A000360 | 1992-02-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR930017997A true KR930017997A (ko) | 1993-09-21 |
KR100272476B1 KR100272476B1 (ko) | 2000-12-01 |
Family
ID=11362040
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019930002388A KR100272476B1 (ko) | 1992-02-20 | 1993-02-20 | 양이온성 유화제를 함유하는 금속 표면용 광택제 및 광택제내에 함유된 양이온성 유화제 |
Country Status (11)
Country | Link |
---|---|
US (2) | US5294248A (ko) |
EP (1) | EP0556770B1 (ko) |
JP (1) | JP3419491B2 (ko) |
KR (1) | KR100272476B1 (ko) |
AT (1) | ATE201224T1 (ko) |
CA (1) | CA2090056A1 (ko) |
CZ (1) | CZ24293A3 (ko) |
DE (1) | DE69330215T2 (ko) |
ES (1) | ES2157908T3 (ko) |
IT (1) | IT1254630B (ko) |
TW (1) | TW223655B (ko) |
Families Citing this family (29)
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IT1269886B (it) * | 1994-06-14 | 1997-04-15 | Ausimont Spa | Processo per il trattamento superficiale di materiali cellulosici, metallici,vetrosi,oppure cementi,marmi,graniti e simili |
IT1275972B1 (it) * | 1995-03-24 | 1997-10-24 | Ausimont Spa | Dispersioni di politetrafluoroetilene in un solvente organico ed agenti disperdenti ivi impiegati |
IT1276680B1 (it) * | 1995-06-08 | 1997-11-03 | Oris Spa | Processo di sintesi dell'1-piridiniopropan-3-solfonato |
US5734085A (en) * | 1995-12-21 | 1998-03-31 | Minnesota Mining And Manufacturing Company | Fluorinated phosphonium salts |
US5753607A (en) * | 1996-04-01 | 1998-05-19 | Sara Lee Corporation | Cleaning and polishing composition |
JP3253851B2 (ja) * | 1996-04-18 | 2002-02-04 | 株式会社日立製作所 | 超撥水塗料及びそれを用いた超撥水塗膜 |
IT1283136B1 (it) * | 1996-07-09 | 1998-04-07 | Ausimont Spa | Lattici acquosi a base di fluoropolimeri |
IT1293515B1 (it) * | 1997-07-31 | 1999-03-01 | Ausimont Spa | Dispersioni di fluoropolimeri |
IT1293516B1 (it) * | 1997-07-31 | 1999-03-01 | Ausimont Spa | Dispersione di perfluoropolimeri |
US5945474A (en) * | 1997-10-06 | 1999-08-31 | Gaultier; Serge | Composition and method for removing a substance from a finished surface |
US5977051A (en) * | 1998-01-05 | 1999-11-02 | Joe A. Dominguez, Jr. | Alcohol based natural wax cleaning and dusting composition |
US6235824B1 (en) | 1999-05-11 | 2001-05-22 | 3M Innovative Properties Company | Polish composition and method of use |
US6193791B1 (en) * | 1999-09-24 | 2001-02-27 | 3M Innovative Properties Company | Polish composition and method of use |
IT1318388B1 (it) | 2000-03-14 | 2003-08-25 | Ausimont Spa | Composizioni lubrificanti a base di ptfe. |
US6506715B1 (en) * | 2002-01-10 | 2003-01-14 | Turtle Wax, Inc. | Automotive wash and wax composition and method of use thereof |
BR0311207A (pt) * | 2002-05-24 | 2005-03-15 | 3M Innovative Properies Compan | Composição fluoroquìmica, composição de revestimento, método de tratamento de um substrato fibroso, e , artigo |
AU2003239607A1 (en) * | 2002-05-24 | 2003-12-12 | 3M Innovative Properties Company | Fluorochemical composition comprising perfluoropolyether and an extender for the treatment of fibrous substrates |
JP2005527677A (ja) * | 2002-05-24 | 2005-09-15 | スリーエム イノベイティブ プロパティズ カンパニー | 弗素化ポリエーテルを含むフルオロケミカル組成物および該組成物による繊維基材の処理 |
US7425279B2 (en) * | 2002-05-24 | 2008-09-16 | 3M Innovative Properties Company | Fluorochemical composition for treatment of a fibrous substrate |
US6923921B2 (en) * | 2002-12-30 | 2005-08-02 | 3M Innovative Properties Company | Fluorinated polyether compositions |
US7652115B2 (en) * | 2003-09-08 | 2010-01-26 | 3M Innovative Properties Company | Fluorinated polyether isocyanate derived silane compositions |
ITMI20031847A1 (it) * | 2003-09-26 | 2005-03-27 | Solvay Solexis Spa | Composizione di fluoropolimeri espandibili senza l'impiego di agenti espandenti. |
US7141537B2 (en) * | 2003-10-30 | 2006-11-28 | 3M Innovative Properties Company | Mixture of fluorinated polyethers and use thereof as surfactant |
US7803894B2 (en) * | 2003-12-05 | 2010-09-28 | 3M Innovatie Properties Company | Coating compositions with perfluoropolyetherisocyanate derived silane and alkoxysilanes |
US7503963B2 (en) * | 2003-12-05 | 2009-03-17 | Ashland Licensing And Intellectual Property Llc | Cleaning and polishing wax composition |
CN102282191A (zh) * | 2008-11-25 | 2011-12-14 | 3M创新有限公司 | 氟化醚尿烷及其使用方法 |
EP2376410B1 (en) * | 2008-12-17 | 2018-08-29 | Honeywell International Inc. | Method for drying |
US20110092394A1 (en) * | 2009-10-15 | 2011-04-21 | E. I. Dupont De Nemours And Company | Fluorinated cationic surfactant |
WO2016079053A1 (en) * | 2014-11-19 | 2016-05-26 | Solvay Specialty Polymers Italy S.P.A. | Amino derivatives of perfluoropolyethers |
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-
1992
- 1992-02-20 IT ITMI920360A patent/IT1254630B/it active
-
1993
- 1993-02-16 EP EP93102384A patent/EP0556770B1/en not_active Expired - Lifetime
- 1993-02-16 AT AT93102384T patent/ATE201224T1/de not_active IP Right Cessation
- 1993-02-16 ES ES93102384T patent/ES2157908T3/es not_active Expired - Lifetime
- 1993-02-16 DE DE69330215T patent/DE69330215T2/de not_active Expired - Fee Related
- 1993-02-19 US US08/020,144 patent/US5294248A/en not_active Expired - Lifetime
- 1993-02-19 CZ CZ93242A patent/CZ24293A3/cs unknown
- 1993-02-20 KR KR1019930002388A patent/KR100272476B1/ko not_active IP Right Cessation
- 1993-02-22 CA CA002090056A patent/CA2090056A1/en not_active Abandoned
- 1993-02-22 JP JP05652993A patent/JP3419491B2/ja not_active Expired - Fee Related
- 1993-03-05 TW TW082101625A patent/TW223655B/zh active
-
1994
- 1994-01-06 US US08/178,040 patent/US5424438A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP3419491B2 (ja) | 2003-06-23 |
EP0556770B1 (en) | 2001-05-16 |
TW223655B (ko) | 1994-05-11 |
EP0556770A1 (en) | 1993-08-25 |
IT1254630B (it) | 1995-09-28 |
ITMI920360A1 (it) | 1993-08-20 |
DE69330215T2 (de) | 2002-04-18 |
KR100272476B1 (ko) | 2000-12-01 |
CZ24293A3 (en) | 1994-02-16 |
ITMI920360A0 (it) | 1992-02-20 |
DE69330215D1 (de) | 2001-06-21 |
ATE201224T1 (de) | 2001-06-15 |
JPH06136325A (ja) | 1994-05-17 |
US5424438A (en) | 1995-06-13 |
CA2090056A1 (en) | 1993-08-21 |
US5294248A (en) | 1994-03-15 |
ES2157908T3 (es) | 2001-09-01 |
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