KR930010421B1 - 적층형 입계 절연형 반도체 세라믹콘덴서 및 그 제조방법 - Google Patents
적층형 입계 절연형 반도체 세라믹콘덴서 및 그 제조방법 Download PDFInfo
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- KR930010421B1 KR930010421B1 KR1019900702498A KR907002494A KR930010421B1 KR 930010421 B1 KR930010421 B1 KR 930010421B1 KR 1019900702498 A KR1019900702498 A KR 1019900702498A KR 907002494 A KR907002494 A KR 907002494A KR 930010421 B1 KR930010421 B1 KR 930010421B1
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- 239000003985 ceramic capacitor Substances 0.000 title claims description 99
- 239000004065 semiconductor Substances 0.000 title claims description 69
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 44
- 238000010304 firing Methods 0.000 claims description 40
- 238000000034 method Methods 0.000 claims description 32
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 30
- 229910052748 manganese Inorganic materials 0.000 claims description 30
- 238000001354 calcination Methods 0.000 claims description 29
- 239000002003 electrode paste Substances 0.000 claims description 28
- 239000000919 ceramic Substances 0.000 claims description 26
- 239000000203 mixture Substances 0.000 claims description 24
- 239000003990 capacitor Substances 0.000 claims description 22
- 230000008569 process Effects 0.000 claims description 21
- 229910017493 Nd 2 O 3 Inorganic materials 0.000 claims description 20
- 239000000843 powder Substances 0.000 claims description 20
- 238000010405 reoxidation reaction Methods 0.000 claims description 18
- 239000012298 atmosphere Substances 0.000 claims description 17
- 239000011812 mixed powder Substances 0.000 claims description 16
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 16
- 229910010093 LiAlO Inorganic materials 0.000 claims description 15
- 239000007858 starting material Substances 0.000 claims description 11
- 239000011230 binding agent Substances 0.000 claims description 10
- 238000009413 insulation Methods 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 229910052759 nickel Inorganic materials 0.000 claims description 8
- 239000002904 solvent Substances 0.000 claims description 8
- 229910052763 palladium Inorganic materials 0.000 claims description 7
- 238000007639 printing Methods 0.000 claims description 7
- 230000009467 reduction Effects 0.000 claims description 7
- 239000000956 alloy Substances 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 229910021193 La 2 O 3 Inorganic materials 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 238000003475 lamination Methods 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- 229910052703 rhodium Inorganic materials 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 6
- 238000010030 laminating Methods 0.000 claims 6
- 229910052757 nitrogen Inorganic materials 0.000 claims 3
- 238000007670 refining Methods 0.000 claims 2
- 230000006835 compression Effects 0.000 claims 1
- 238000007906 compression Methods 0.000 claims 1
- 238000001035 drying Methods 0.000 claims 1
- 229910052738 indium Inorganic materials 0.000 claims 1
- 238000003825 pressing Methods 0.000 claims 1
- 238000010298 pulverizing process Methods 0.000 claims 1
- 230000000052 comparative effect Effects 0.000 description 34
- 230000007423 decrease Effects 0.000 description 27
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- 239000013078 crystal Substances 0.000 description 22
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- 230000008859 change Effects 0.000 description 17
- 230000005611 electricity Effects 0.000 description 17
- 230000003068 static effect Effects 0.000 description 17
- 239000000654 additive Substances 0.000 description 15
- 230000000996 additive effect Effects 0.000 description 15
- 238000005245 sintering Methods 0.000 description 13
- 239000007772 electrode material Substances 0.000 description 12
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- 230000002159 abnormal effect Effects 0.000 description 7
- 238000005238 degreasing Methods 0.000 description 7
- 230000001965 increasing effect Effects 0.000 description 7
- 229910018068 Li 2 O Inorganic materials 0.000 description 6
- 229910002367 SrTiO Inorganic materials 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 239000002244 precipitate Substances 0.000 description 6
- 125000004429 atom Chemical group 0.000 description 5
- 238000005336 cracking Methods 0.000 description 5
- 229910044991 metal oxide Inorganic materials 0.000 description 5
- 150000004706 metal oxides Chemical class 0.000 description 5
- 229910010413 TiO 2 Inorganic materials 0.000 description 4
- 238000004090 dissolution Methods 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
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- 230000001747 exhibiting effect Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 238000012856 packing Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 125000004436 sodium atom Chemical group 0.000 description 3
- 239000000969 carrier Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000007257 malfunction Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
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- 238000012546 transfer Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/46—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates
- C04B35/462—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates
- C04B35/465—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on alkaline earth metal titanates
- C04B35/47—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on alkaline earth metal titanates based on strontium titanates
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Abstract
Description
Claims (20)
- Sr(1-x) Cax와 Ti의 몰비가 0.95Sr(1-x) Cax/Ti < 1.00이 되도록 과잉의 Ti를 함유하고 0.001x0.2인 Sr(1-x) Cax TiO3에, Nb2O5, Ta2O5, V2O5, W2O5, Dy2O3, Nd2O3, Y2O3, La2O3, CeO2중의 적어도 1종류의 적어도 1종류 이상을 0.05~ 2.0mol%와, Mn과 Si를 각각 MnO2와 SiO2의 형태로 환산해서 합계량으로 0.2~5.0mol% 함유해서 이루어진 입계절연형 반도체 세라믹내에, 복수층의 내부전극을 이들이 교호로 상이한 끝가장자리에 이루도록 형성하고, 또 이 내부전극과 전기적으로 접속되도록 상기 입계절연형 반도체 세라믹의 양끝가장자리에 외부전극을 형성한 것을 특징으로 하는 적층형 입계절연형 반도체 세라믹콘덴서.
- 제1항에 있어서, 내부전극이 Au, Pt, Rh, Pd, Ni중 적어도 1종류 이상의 금속 또는 그들의 합금 혹은 혼합물에 형성되는 것을 특징으로 하는 적층형 입계절연형 반도체 세라믹콘덴서.
- 제1항 또는 제2항에 있어서, 외부전극이 Pd, Ag, Ni, Cu, Zn중 적어도 1종류 이상의 금속 또는 그들의 합금 혹은 혼합물에 형성되는 것을 특징으로 하는 적층형 입계절연형 반도체 세라믹콘덴서.
- Sr(1-x) Cax와 Ti의 몰비가 0.95Sr(1-x) Cax/Ti < 1.00이 되도록 과잉의 Ti를 함유하고, 0.001x0.2인 Sr(1-x) Cax TiO3에, Nb2O5, Ta2O5, V2O5, W2O5, Dy2O3, Nd2O3, Y2O3, La2O3, CeO2중 적어도 1종류 이상을 0.05~2.0mol%와, Mn과 Si를 각각 MnO2와 SiO2의 형태로 환산해서 합계량으로 0.2~5.0mol% 함유해서 이루어진 조성물의 혼합분말을 출발원료로 하여, 그 혼합분말을 분쇄, 혼합, 건조한 후, 공기속 또는 질소분위기속에서 가소하는 공정과, 가소후, 재차 분쇄한 분말을 유기바인더와 함께 용매속에 분산시켜 생시이트로 하고, 그후 이 생시이트 위에, 내부전극페이스트를 교호로 상이한 끝가장자리에 이르도록 인쇄(단, 최상층 및 최하층의 생시이트는 인쇄 않음)하는 공정과, 이 내부전극페이스트가 인쇄된 생시이트를 적층, 가압, 압착해서 성형체를 얻고, 그후 이 성형체를 공기속에서 가소하는 공정과, 가소후, 환원 또는 질소분위기속에서 소성하는 공정과, 소성후, 공기속에서 재산화하는 공정과, 재산화후, 내부전극을 노출시킨 양끝에 외부전극페이스트를 도포하고 베이킹하는 공정을 가진 것을 특징으로 하는 적층형 입계절연형 반도체 세라믹콘덴서의 제조방법.
- 제4항에 있어서, 내부전극이 Au, Pt, Rh, Pd, Ni중 적어도 1종류 이상의 금속 또는 그들의 합금 혹은 혼합물에 의해서 형성되는 것을 특징으로 하는 적층형 입계절연형 반도체 세라믹콘덴서의 제조방법.
- 제4항 또는 제5항에 있어서, 외부전극이 Pd, Ag, Ni, Cu, Zn중 적어도 1종류 이상의 금속 또는 그들의 합금 혹은 혼합물에 형성되는 것을 특징으로 하는 적층형 입계절연형 반도체 세라믹콘덴서의 제조방법
- Sr(1-x) Cax와 Ti의 몰비가 0.95Sr(1-x) Cax/Ti < 1.00이 되도록 과잉의 Ti를 함유하고 0.01x0.2인 Sr(1-x) Cax TiO3에, Nb2O5, Ta2O5, V2O5, W2O5, Dy2O3, Nd2O3, Y2O3, La2O3, CeO2중의 적어도 1종류 이상을 0.05~2.0mol%와, Mn과 Si를 각각 MnO2와 SiO2의 형태로 환산해서 합계량으로 0.2~5.0mol%와, NaSiO2을 0.05∼2.0mol% 함유해서 이루어진 입계절연형 반도체 세라믹내에, 복수층의 내부전극을 이들이 교호로 상이한 끝가장자리에 이르도록 형성하고, 또한 이 내부전극과 전기적으로 접속되도록 상기 입계절연형 반도체 세라믹의 양끝가장자리에 외부전극을 형성한 것을 특징으로 하는 적층형 입계절연형 반도체 세라믹콘덴서.
- Sr(1-x) Cax와 Ti의 몰비가 0.95Sr(1-x) Cax/Ti < 1.00이 되도록 과잉의 Ti를 함유하고, 0.001x0.2인 Sr(1-x) Cax TiO3에, Nb2O5, Ta2O5, V2O5, W2O5, Dy2O3, Nd2O3, Y2O3, La2O3, CeO2중 적어도 1종류 이상을 0.05~2.0mol%와, Mn과 Si를 각각 MnO2와 SiO2의 형태로 환산해서 합계량으로 0.2~5.0mol%와, NaSiO2를 0.05∼2.0mol% 함유해서 이루어진 조성물의 혼합분말을 출발재료로 하고, 그 혼합분말을 분쇄, 혼합, 건조한 후, 공기속 또는 질소분위기에서가소하는 공정과, 가소후, 재차 분쇄한 분말을 유기바인더와 함께 용매속에 분산시켜 생시이트로 하고, 그후 이 생시이트 우에, 내부전극페이스트를 교호로 상이한 끝가장자리에 이르ㄷ록 인쇄(단, 최상층 및 최하층의 생시이트에는 인쇄 않음)하는 공정과 이 내부전극페이스트가 인쇄된 생시이트를 적층, 가압, 압착해서 성형체를 얻고, 그후 이 성형체를 공기속에서 가소하는 공정과, 가소후, 환원 또는 질소분위기속에서 소성하는 공정과, 소성후, 공기속에서 재산화하는 공정과, 재산화후, 내부전극을 노출시킨 양끝에 외부전극페이스를 도포하고 베이킹하는 공정을 가진 것을 특징으로 하는 적층형 입계 절전형 반도체 세라믹콘덴서의 제조방법.
- Sr(1-x)Cax와 Ti의 몰비가 0.95Sr(1-x) Cax/Ti<1.00이 되도록 과잉의 Ti를 함유하고, 0.001x0.2인 Sr(1-x) Cax TiO3에, Nb2O5, Ta2O5, V2O5, W2O5, Dy2O3, Nd2O3, Y2O3, La2O3, CeO2중 적어도 1종류 이상을 0.05∼2.0mol%와, Mn과 Si를 각각 MnO2와 SiO2의 형태로 환산해서 합계량으로 0.2∼0.5mol%와, Al2O3를 0.01∼2.0 mol% 함유해서 이루어진 입계절연형 반도체 세라믹내에, 복수층의 내부 전극을 이들이 교호로 상이한 끝가장자리에 이르도록 형성하고, 또한 이 내부전극과 전기적으로 접속되도록 상기 입계절연형 반도체 세라믹의 양끝가장자리에 외부전극을 형성한 것을 특징으로 하는 적층형 입계절연형 반도체 세라믹콘덴서.
- Sr(1-x) Cax와 Ti의 몰비가 0.95Sr(1-x) Cax/Ti < 1.00이 되도록 과잉의 Ti를 함유하고, 0.001x0.2인 Sr(1-x) Cax TiO3에, Nb2O5, Ta2O5, V2O5, W2O5, Dy2O3, Nd2O3, Y2O3, La2O3, CeO2중 적어도 1종류 이상을 0.05~2.0mol%와, Mn과 Si를 각각 MnO2와 SiO2의 형태로 환산해서 합계량으로 0.2~5.0mol%와, Al2O3를 0.01~2.0mol% 함유해서 이루어진 조성물인 혼합분말을 출발원료로 하고 그 혼합분말을 분쇄, 혼합, 건조한 후, 공기속 또는 질소분위기속에서 가소하는 공정과, 가소후, 재차 분쇄한 분말을 유기바인더와 함께 용매속에 분산시켜 생시이트로 하고, 그후 이 생시이트 위에, 내부전극페이스트를 교호로 상이한 끝가장자리에 이르도록 인쇄(단, 최상층 및 최하층의 생시이트는 인쇄 않음)하는 공정과, 이 내부전극페이스트가 인쇄된 생시이트를 적층, 가압, 압착해서 성형체를 얻고, 그후 이 성형체를 공기속에서 가소하는 공정과, 가소후, 환원 또는 질소분위기속에서 소성하는 공정과, 소성후, 공기속에서 재산화하는 공정과, 재산화후, 내부전극을 노출시킨 양끝에 외부전극페이스트를 도포해서 베이킹하는 공정을 가진 것을 특징으로 하는 적층형 입계절연형 반도체 세라믹콘덴서의 제조방법.
- Sr(1-x) Cax와 Ti의 몰비가 0.95Sr(1-x) Cax/Ti < 1.00이 되도록 과잉의 Ti를 함유하고, 0.001x0.2인 Sr(1-x) Cax TiO3에, Nb2O5, Ta2O5, V2O5, W2O5, Dy2O3, Nd2O3, Y2O3, La2O3, CeO2중 적어도 1종류 이상을 0.05~2.0mol%와 Mn과 Si를 각각 MnO2와 SiO2의 형태로 환산해서 합계량으로 0.2~5.0mol%와, NaAlO2를 0.05~4.0mol% 함유해서 이루어진 입계절연형 반도체 세라믹내에, 복수층의 내부전극을 이들이 교호로 상이한 끝가장자리에 이르도록 형성하고, 또한 이 내부전극과 전기적으로 접속되도록 상기 입계절연형 반도체 세라믹의 양끝가장자리에 외부전극을 형성한 것을 특징으로 하는 적층형 입계절연형 반도체 세라믹콘덴서.
- Sr(1-x) Cax와 Ti의 몰비가 0.95Sr(1-x) Cax/Ti < 1.00이 되도록 과잉의 Ti를 함유하고, 0.001x0.2인 Sr(1-x) Cax TiO3에, Nb2O5, Ta2O5, V2O5, W2O5, Dy2O3, Nd2O3, Y2O3, La2O3, CeO2중 적어도 1종류 이상을 0.05~2.0mol%와 Mn과 Si를 각각 MnO2와 SiO2의 형태로 환산해서 합계량으로 0.2~5.0mol%와, NaAlO2를 0.05~4.0mol% 함유해서 이루어진 조성물의 혼합분말을 출발원료로 하고, 그 혼합분말을 분쇄, 혼합, 건조한 후, 공기속 또는 질소분위기속에서 가소하는 공정과, 가소후, 재차 분쇄한 분말을 유기바인더와 함께 용매속에 분산시켜 생시이트로 하고, 그후 이 생시이트 위에, 내부전극페이스트를 교호로 상이한 끝가장자리에 이르도록 인쇄(단, 최상층 및 최하층의 생시이트는 인쇄 않음)하는 공정과, 이 내부전극페이스트가 인쇄된 생시이트를 적층, 가압, 압착해서 성형체를 얻고, 그후 이 성형체를 공기속에서 가소하는 공정과, 가소후, 환원 또는 질소분위기속에서 소성하는 공정과, 소성후, 공기속에서 재산화하는 공정과, 재산화후, 내부전극을 노출시킨 양끝에 외부전극페이스트를 도포해서 베이킹하는 공정을 가진 것을 특징으로 하는 적층형 입계절연형 반도체 세라믹콘덴서의 제조방법.
- Sr(1-x) Cax와 Ti의 몰비가 0.95Sr(1-x) Cax/Ti < 1.00이 되도록 과잉의 Ti를 함유하고, 0.001x0.2인 Sr(1-x) Cax TiO3에, Nb2O5, Ta2O5, V2O5, W2O5, Dy2O3, Nd2O3, Y2O3, La2O3, CeO2중 적어도 1종류 이상을 0.05~2.0mol%와, Mn과 Si를 각각 MnO2의 형태로 환산해서 합계량으로 0.2~5.0mol%와, Li2SiO3를 0.05~2.0mol% 함유해서 이루어진 입계절연형 반도체 세라믹내에, 복수층의 내부전극을 이들이 교호로 상이한 끝가장자리에 이르도록 형성하고, 또한 이 내부전극과 전기적으로 접속되도록 상기 입계절연형 반도체 세라믹의 양끝가장자리에 외부전극을 형성한 것을 특징으로 하는 적층형 입계절연형 반도체 세라믹콘덴서.
- Sr(1-x) Cax와 Ti의 몰비가 0.95Sr(1-x) Cax/Ti < 1.00이 되도록 과잉의 Ti를 함유하고, 0.001x0.2인 Sr(1-x) Cax TiO3에, Nb2O5, Ta2O5, V2O5, W2O5, Dy2O3, Nd2O3, Y2O3, La2O3, CeO2중 적어도 1종류 이상을 0.05~2.0mol%와 Mn과 Si를 각각 MnO2와 SiO2의 형태로 환산해서 합계량으로 0.2~5.0mol%와, Li2SiO3를 0.05~2.0mol% 함유해서 이루어진 조성물의 혼합분말을 출발원료로 하고, 그 혼합분말을 분쇄, 혼합, 건조한 후, 공기속 또는 질소분위기속에서 가소하는 공정과, 가소후, 재차 분쇄한 분말을 유기바인더와 함께 용매속에 분산시켜 생시이트로 하고, 그후 이 생시이트 위에, 내부전극페이스트를 교호로 상이한 끝가장자리에 이르도록 인쇄(단, 최상층 및 최하층의 생시이트는 인쇄 않음)하는 공정과, 이 내부전극페이스트가 인쇄된 생시이트를 적층, 가압, 압착해서 성형체를 얻고, 그후 이 성형체를 공기속에서 가소하는 공정과, 가소후, 환원 또는 질소분위기속에서 소성하는 공정과, 소성후, 공기속에서 재산화하는 공정과, 재산화후, 내부전극을 노출시킨 양끝에 외부전극페이스트를 도포해서 베이킹하는 공정을 가진 것을 특징으로 하는 적층형 입계절연형 반도체 세라믹콘덴서의 제조방법.
- Sr(1-x) Cax와 Ti의 몰비가 0.95Sr(1-x) Cax/Ti < 1.00이 되도록 과잉의 Ti를 함유하고, 0.001x0.2인 Sr(1-x) Cax TiO3에, Nb2O5, Ta2O5, V2O5, W2O5, Dy2O3, Nd2O3, Y2O3, La2O3, CeO2중 적어도 1종류 이상을 0.05~2.0mol%와, Mn과 Si를 각각 MnO2와 SiO2의 형태로 환산해서 합계량으로 0.2~5.0mol%와, LiAlO2를 0.05~4.0mol% 함유해서 이루어진 입계절연형 반도체 세라믹내에, 복수층의 내부전극을 이들이 교호로 상이한 끝가장자리에 이르도록 형성하고, 또한 이 내부전극과 전기적으로 접속되도록 상기 입계절연형 반도체 세라믹의 양끝가장자리위에 외부전극을 형성한 것을 특징으로 하는 적층형 입계절연형 반도체 세라믹콘덴서.
- Sr(1-x) Cax와 Ti의 몰비가 0.95Sr(1-x) Cax/Ti < 1.00이 되도록 과잉의 Ti를 함유하고, 0.001x0.2인 Sr(1-x) Cax TiO3에, Nb2O5, Ta2O5, V2O5, W2O5, Dy2O3, Nd2O3, Y2O3, La2O3, CeO2중 적어도 1종류 이상을 0.05~2.0mol%와 Mn과 Si를 각각 MnO2와 SiO2의 형태로 환산해서 합계량으로 0.2~5.0mol%와, LiAlO2를 0.05~4.0mol% 함유해서 이루어진 조성물의 혼합분말을 출발원료로 하고, 그 혼합분말을 분쇄, 혼합, 건조한 후, 공기속 또는 질소분위기속에서 가소하는 공정과, 가소후, 재차 분쇄한 분말을 유기바인더와 함께 용매속에 분산시켜 생시이트로 하고, 그후 이 생시이트 위에, 내부전극페이스트를 교호로 상이한 끝가장자리에 이르도록 인쇄(단, 최상층 및 최하층의 생시이트는 인쇄 않음)하는 공정과, 이 내부전극페이스트가 인쇄된 생시이트를 적층, 가압, 압착해서 성형체를 얻고, 그후 이 성형체를 공기속에서 가소하는 공정과, 가소후, 환원 또는 질소분위기속에서 소성하는 공정과, 소성후, 공기속에서 재산화하는 공정과, 재산화후, 내부전극을 노출시킨 양끝에 외부전극페이스트를 도포해서 베이킹하는 공정을 가진 것을 특징으로 하는 적층형 입계절연형 반도체 세라믹콘덴서의 제조방법.
- Sr(1-x) Cax와 Ti의 몰비가 0.95Sr(1-x) Cax/Ti < 1.00이 되도록 과잉의 Ti를 함유하고, 0.001x0.2인 Sr(1-x) Cax TiO3에, Nb2O5, Ta2O5, V2O5, W2O5, Dy2O3, Nd2O3, Y2O3, La2O3, CeO2중 적어도 1종류 이상을 0.05~2.0mol%와, Mn과 Si를 각각 MnO2와 SiO2의 형태로 환산해서 합계량으로 0.2~5.0mol%와, NaSiO3를 0.05~2.0mol%와, Al2O3를 0.05∼2.0mol% 함유해서 이루어진 입계절연형 반도체 세라믹내에, 복수층의 내부전극을 이들이 교호로 상이한 끝가장자리에 이르도록 형성하고, 또한 이 내부전극과 전기적으로 접속되도록 상기 입계절연형 반도체 세라믹의 양끝가장자리위에 외부전극을 형성한 것을 특징으로 하는 적층형 입계절연형 반도체 세라믹콘덴서.
- Sr(1-x) Cax와 Ti의 몰비가 0.95Sr(1-x) Cax/Ti < 1.00이 되도록 과잉의 Ti를 함유하고, 0.001x0.2인 Sr(1-x) Cax TiO3에, Nb2O5, Ta2O5, V2O5, W2O5, Dy2O3, Nd2O3, Y2O3, La2O3, CeO2중 적어도 1종류 이상을 0.05~2.0mol%와, Mn과 Si를 각각 MnO2와 SiO2의 형태로 환산해서 합계량으로 0.2~5.0mol%와, Na2SiO3를 0.05~2.0mol% 함유해서 이루어진 조성물의 혼합분말을 출발원료로 하고, 그 혼합분말을 분쇄, 혼합, 건조한 후, 공기속 또는 질소분위기속에서 가소하는 공정과, 가소후, 재차 분쇄한 분말을 유기바인더와 함께 용매속에 분산시켜 생시이트로 하고, 그후 이 생시이트 위에, 내부전극페이스트를 교호로 상이한 끝가장자리에 이르도록 인쇄(단, 최상층 및 최하층의 생시이트는 인쇄 않음)하는 공정과, 이 내부전극페이스트가 인쇄된 생시이트를 적층, 가압, 압착해서 성형체를 얻고, 그후 이 성형체를 공기속에서 가소하는 공정과, 가소후, 환원 또는 질소분위기속에서 소성하는 공정과, 소성후, 공기속에서 재산화하는 공정과, 재산화후, 내부전극을 노출시킨 양끝에 외부전극페이스트를 도포해서 베이킹하는 공정을 가진 것을 특징으로 하는 적층형 입계절연형 반도체 세라믹콘덴서의 제조방법.
- Sr(1-x) Cax와 Ti의 몰비가 0.95Sr(1-x) Cax/Ti < 1.00이 되도록 과잉의 Ti를 함유하고, 0.001x0.2인 Sr(1-x) Cax TiO3에, Nb2O5, Ta2O5, V2O5, W2O5, Dy2O3, Nd2O3, Y2O3, La2O3, CeO2중 적어도 1종류 이상을 0.05~2.0mol%와, Mn과 Si를 각각 MnO2와 SiO2의 형태로 환산해서 합계량으로 0.2~5.0mol%와, Li2SiO3를 0.05~2.0mol%와, Al2O3를 0.05~2.0mol% 함유해서 이루어진 입계절연형 반도체 세라믹내에, 복수층의 내부전극을 이들이 교호로 상이한 끝가장자리에 이르도록 형성하고, 또한 이 내부전극과 전기적으로 접속되도록 상기 입계절연형 반도체 세라믹의 양끝가장자리에 외부전극을 형성한 것을 특징으로 하는 적층형 입계절연형 반도체 세라믹콘덴서.
- Sr(1-x) Cax와 Ti의 몰비가 0.95Sr(1-x) Cax/Ti < 1.00이 되도록 과잉의 Ti를 함유하고, 0.001x0.2인 Sr(1-x) Cax TiO3에, Nb2O5, Ta2O5, V2O5, W2O5, Dy2O3, Nd2O3, Y2O3, La2O3, CeO2중 적어도 1종류 이상을 0.05~2.0mol%와, Mn과 Si를 각각 MnO2와 SiO2의 형태로 환산해서 합계량으로 0.2~5.0mol%와, Li2SiO3를 0.05~2.0mol%와, Al2O3를 0.05~2.0mol% 함유해서 이루어진 조성물의 혼합분말을 출발원료로 하고, 그 혼합분말을 분쇄, 혼합, 건조한 후, 공기속 또는 질소분위기속에서 가소하는 공정과, 가소후, 재차 분쇄한 분말을 유기바인더와 함께 용매속에 분산시켜 생시이트로 하고, 그후 이 생시이트 위에, 내부전극페이스트를 교호로 끝가장자리에 이르도록 인쇄(단, 최상층 및 최하층의 생시이트는 인쇄 않음)하는 공정과, 이 내부전극페이스트가 인쇄된 생시이트를 적층, 가압, 압착해서 성형체를 얻고, 그후 이 성형체를 공기속에서 가소하는 공정과, 가소후, 환원 또는 질소분위기속에서 소성하는 공정과, 소성후, 공기속에서 재산화하는 공정과, 재산화후, 내부전극을 노출시킨 양끝에 외부전극페이스트를 도포해서 베이킹하는 공정을 가진 것을 특징으로 하는 적층형 입계절연형 반도체 세라믹콘덴서의 제조방법.
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP69667 | 1989-03-22 | ||
JP1069660A JP2715529B2 (ja) | 1989-03-22 | 1989-03-22 | セラミックコンデンサ及びその製造方法 |
JP69651 | 1989-03-22 | ||
JP69660 | 1989-03-22 | ||
JP1069651A JP2725357B2 (ja) | 1989-03-22 | 1989-03-22 | セラミックコンデンサ及びその製造方法 |
JP1069667A JP2850355B2 (ja) | 1989-03-22 | 1989-03-22 | セラミックコンデンサ及びその製造方法 |
Publications (1)
Publication Number | Publication Date |
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KR930010421B1 true KR930010421B1 (ko) | 1993-10-23 |
Family
ID=27300105
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019900702498A KR930010421B1 (ko) | 1989-03-22 | 1990-03-20 | 적층형 입계 절연형 반도체 세라믹콘덴서 및 그 제조방법 |
KR1019900702498A KR920700462A (ko) | 1989-03-22 | 1990-03-20 | 적층형입계 절연형 반도체 세라믹콘덴서 및 그 제조방법 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019900702498A KR920700462A (ko) | 1989-03-22 | 1990-03-20 | 적층형입계 절연형 반도체 세라믹콘덴서 및 그 제조방법 |
Country Status (5)
Country | Link |
---|---|
US (1) | US5208727A (ko) |
EP (1) | EP0429653B1 (ko) |
KR (2) | KR930010421B1 (ko) |
DE (1) | DE69023316T2 (ko) |
WO (1) | WO1990011606A1 (ko) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2757587B2 (ja) * | 1990-06-26 | 1998-05-25 | 松下電器産業株式会社 | 粒界絶縁型半導体セラミックコンデンサ及びその製造方法 |
US5319517A (en) * | 1992-03-27 | 1994-06-07 | Tdk Corporation | Multilayer ceramic chip capacitor |
EP0734031B1 (en) * | 1995-03-24 | 2004-06-09 | TDK Corporation | Multilayer varistor |
EP0844989B1 (en) * | 1996-06-14 | 2001-10-10 | dmc2 Electronic Materials B.V. | Ceramic multilayer capacitor |
JPH11199320A (ja) * | 1997-11-06 | 1999-07-27 | Ngk Spark Plug Co Ltd | マイクロ波誘電体磁器組成物 |
KR100371056B1 (ko) * | 2000-10-09 | 2003-02-06 | 한국과학기술연구원 | SrTiO3계 SMD형 바리스터-캐패시터 복합기능소자제조기술 |
KR20020028281A (ko) * | 2000-10-09 | 2002-04-17 | 박호군 | 저온소결 SrTiO3계 바리스터-캐패시터 복합기능소자유전체 조성물 |
TW556237B (en) * | 2001-09-14 | 2003-10-01 | Matsushita Electric Ind Co Ltd | Ceramic capacitor |
TW569254B (en) * | 2001-11-14 | 2004-01-01 | Taiyo Yuden Kk | Ceramic capacitor and its manufacturing method |
JP2005203479A (ja) * | 2004-01-14 | 2005-07-28 | Matsushita Electric Ind Co Ltd | 静電気対策部品 |
JP5212059B2 (ja) * | 2008-03-14 | 2013-06-19 | パナソニック株式会社 | 電圧非直線性抵抗体組成物および積層バリスタ |
US7973638B2 (en) * | 2008-03-14 | 2011-07-05 | Panasonic Corporation | Voltage non-linear resistor ceramic composition and multilayer varistor using the same |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4101454A (en) * | 1975-01-10 | 1978-07-18 | Texas Instruments Incorporated | Ceramic semiconductors |
JPS53101659A (en) * | 1977-02-17 | 1978-09-05 | Murata Manufacturing Co | Strontium titanate base capacitor employing semiconductor ceramic with insulative grain boundary |
JPS5453248A (en) * | 1977-10-03 | 1979-04-26 | Tdk Electronics Co Ltd | Laminated type semiconductor ceramic condenser and method of making same |
JPS5453250A (en) * | 1977-10-05 | 1979-04-26 | Tdk Electronics Co Ltd | Laminated type semiconductor ceramic condenser and method of making same |
JPS5571017A (en) * | 1978-11-22 | 1980-05-28 | Murata Manufacturing Co | Method of manufacturing grain boundary insulated laminated porcelain capacitor |
JPS5674913A (en) * | 1979-11-26 | 1981-06-20 | Tdk Electronics Co Ltd | Semiconductor porcelain composition |
JPS5727001A (en) * | 1980-07-25 | 1982-02-13 | Tdk Electronics Co Ltd | Voltage nonlinear resistance element |
JPS5729450A (en) * | 1980-07-29 | 1982-02-17 | Nippon Electric Co | Manufacture of laminated ceramic part |
JPS5735303A (en) * | 1980-07-30 | 1982-02-25 | Taiyo Yuden Kk | Voltage vs current characteristic nonlinear semiconductor porcelain composition and method of producing same |
IT8183444A0 (it) * | 1981-07-30 | 1981-07-30 | Savio Spa | Dispositivo paraffinatore per ritorcitoi a doppia torsione. |
DE3235886A1 (de) * | 1982-09-28 | 1984-03-29 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung einer sperrschicht-keramik |
GB8306659D0 (en) * | 1983-03-10 | 1983-04-13 | Standard Telephones Cables Ltd | Ceramic capacitors |
JPS59215701A (ja) * | 1983-05-24 | 1984-12-05 | 太陽誘電株式会社 | 複合機能素子の製造方法 |
EP0157276B1 (en) * | 1984-03-30 | 1988-07-06 | Matsushita Electric Industrial Co., Ltd. | Voltage-dependent non-linear resistance ceramic composition |
DE3435806A1 (de) * | 1984-09-28 | 1986-04-10 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung von korngrenzsperrschicht-vielschicht-kondensatoren aus strontiumtitanat |
JPH0316251Y2 (ko) * | 1985-03-04 | 1991-04-08 | ||
DE3785506T2 (de) * | 1986-07-29 | 1993-08-12 | Tdk Corp | Halbleitende keramische zusammensetzung, sowie kondensator aus halbleitender keramik. |
US4889837A (en) * | 1986-09-02 | 1989-12-26 | Tdk Corporation | Semiconductive ceramic composition |
JPH07114174B2 (ja) * | 1987-03-06 | 1995-12-06 | 株式会社村田製作所 | 積層型半導体磁器電子部品の製造方法 |
JPS63178409A (ja) * | 1987-06-26 | 1988-07-22 | ティーディーケイ株式会社 | 半導体磁器組成物 |
JP2666388B2 (ja) * | 1988-07-11 | 1997-10-22 | 株式会社村田製作所 | 積層セラミックコンデンサ |
-
1990
- 1990-03-20 WO PCT/JP1990/000378 patent/WO1990011606A1/ja active IP Right Grant
- 1990-03-20 DE DE69023316T patent/DE69023316T2/de not_active Expired - Fee Related
- 1990-03-20 EP EP90904659A patent/EP0429653B1/en not_active Expired - Lifetime
- 1990-03-20 KR KR1019900702498A patent/KR930010421B1/ko active
- 1990-03-20 US US07/582,221 patent/US5208727A/en not_active Expired - Fee Related
- 1990-03-20 KR KR1019900702498A patent/KR920700462A/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
WO1990011606A1 (fr) | 1990-10-04 |
US5208727A (en) | 1993-05-04 |
KR920700462A (ko) | 1992-02-19 |
EP0429653A1 (en) | 1991-06-05 |
EP0429653B1 (en) | 1995-11-02 |
DE69023316D1 (de) | 1995-12-07 |
EP0429653A4 (en) | 1991-11-27 |
DE69023316T2 (de) | 1996-07-04 |
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