KR930005940A - 지지된 미세 다공성 세라믹 멤브레인 - Google Patents
지지된 미세 다공성 세라믹 멤브레인 Download PDFInfo
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- KR930005940A KR930005940A KR1019920016354A KR920016354A KR930005940A KR 930005940 A KR930005940 A KR 930005940A KR 1019920016354 A KR1019920016354 A KR 1019920016354A KR 920016354 A KR920016354 A KR 920016354A KR 930005940 A KR930005940 A KR 930005940A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D67/0039—Inorganic membrane manufacture
- B01D67/0046—Inorganic membrane manufacture by slurry techniques, e.g. die or slip-casting
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/14—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silica
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- B01D67/0081—After-treatment of organic or inorganic membranes
- B01D67/0088—Physical treatment with compounds, e.g. swelling, coating or impregnation
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
- B01D69/1216—Three or more layers
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D69/12—Composite membranes; Ultra-thin membranes
- B01D69/1218—Layers having the same chemical composition, but different properties, e.g. pore size, molecular weight or porosity
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/02—Inorganic material
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/02—Inorganic material
- B01D71/05—Cermet materials
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- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/24—Stationary reactors without moving elements inside
- B01J19/2475—Membrane reactors
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- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0201—Impregnation
- B01J37/0211—Impregnation using a colloidal suspension
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/008—Details of the reactor or of the particulate material; Processes to increase or to retard the rate of reaction
- B01J8/009—Membranes, e.g. feeding or removing reactants or products to or from the catalyst bed through a membrane
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/4505—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application
- C04B41/4535—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application applied as a solution, emulsion, dispersion or suspension
- C04B41/4537—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application applied as a solution, emulsion, dispersion or suspension by the sol-gel process
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2325/00—Details relating to properties of membranes
- B01D2325/04—Characteristic thickness
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
- B01J2208/00008—Controlling the process
- B01J2208/00017—Controlling the temperature
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
- B01J2208/00008—Controlling the process
- B01J2208/00548—Flow
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
- B01J2208/00008—Controlling the process
- B01J2208/00548—Flow
- B01J2208/00557—Flow controlling the residence time inside the reactor vessel
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
- B01J2208/00008—Controlling the process
- B01J2208/00575—Controlling the viscosity
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
- B01J2208/00008—Controlling the process
- B01J2208/0061—Controlling the level
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- C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
- C04B2111/00474—Uses not provided for elsewhere in C04B2111/00
- C04B2111/00793—Uses not provided for elsewhere in C04B2111/00 as filters or diaphragms
- C04B2111/00801—Membranes; Diaphragms
Abstract
미세 다공성 세라믹 멤브레인을 다공성 지지체 상에 침투형성시키는 방법, 금속 또는 금속 산화물 입자의 콜로이드성 현탁액을 다공성 지지체의 한쪽 면상에 놓고, 입자가 겔로서 지지체의 건조면에 침착되도록 한기 위해 다공성 지지체의 다른 면을 가스의 건조 스트림 또는 반응성 가스 스트림에 노출시키는 단계를 포함한다. 이렇게 침착된 겔을 소결시켜 한외 여과, 역삼투, 또는 분자 시이브에 유용하고, 평균 공극 크기가 100Å 미만인 지지된 세라믹 멤브레인을 형싱시킬 수 있다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 방법을 도시하는 개략도.
제2도는 본 발명의 방법을 도시하는 또다른 개략도.
제3도는 본 발명의 방법을 수행하는데 사용될 수 있는 장치의 한 태양을 도시하는 도면.
Claims (29)
- (a) 용매 중에 금속 또는 금속 산화물 콜로이드성 입자의 콜로이드성 현탁액을 제조하는 단계, (b) 현탁액이 모세관 작용으로 다공성 지지체에 끌어 올려지도록 하는 조건하에서 콜로이드성 현탁액을 다공성 지지체의 한쪽면에 노출시키는 단계, (c) 콜로이드성 현탁액 중의 용매를 증발시키는 조건하에서 지지체의 다른 한쪽 면을 가스스트림에 노출시켜 금속 산화물의 겔 층을 다공성 지지체의 상기 다른면 상에 침착시키는 단계, (d) 겔 층으로부터 잔류 용매를 건조시키는 단계, 및 (e) 공극을 겔내에 유지하면서 겔이 세라믹 멤브레인으로 소결되기에 충분한 온도에서 지지체를 지지체 상의 겔 층과 함께 소성시키는 단계로 이루어지는 2개의 면을 갖는 다공성 지지체 상에 미세 다공성 금속 산화물 세라믹 멤브레인을 형성하는 방법.
- 제1항에 있어서, 금속산화물 입자의 현탁액을 제조하는 단계가 금속 산화물의 가수분해를 포함하는 방법.
- 제1항에 있어서, 금속산화물 중의 금속이 규소인 방법.
- 제1항에 있어서, 다공성 지지체가 공동 실린더인 방법.
- 제1항에 있어서, 다공성 지지체가 편평한 플레이트인 방법.
- 제1항에 있어서, 콜로이드성 현탁액이 수성인 방법.
- 제1항에 있어서, 콜로이드성 현탁액이 알콜성인 방법.
- 제1항에 있어서, 가스 스트림이 콜로이드성 입자를 침착시키기 위해 선택된 반응성 가스의 스트림인 방법.
- 제1항에 있어서, 가스 스트림이 질소의 건조 가스 스트림인 방법.
- 제1항에 있어서, 건조 단계(d)가 겔을 갖는 지지체의 면은 용매에 노출시키고, 지지체의 다른 면은 멤브레인에서 떨어진 지지체를 통해 용매를 끌어 올리는 건조 조건에 노출시키는 것을 포함하는 방법.
- 제1항에 있어서, 멤브레인이 100Å 미만인 공극 크기를 갖는 방법.
- 제1항에 방법의 의한, 지지체 상에 침착된 미세 다공성 세라믹 멤브레인.
- 제12항에 있어서, 평균 공극 크기가 100Å 미만이고, 한외 여과에 사용되는 미세 다공성 세라믹 멤브레인.
- 제12항에 있어서, 평균 공극 크기가 30Å 미만이고, 역삼투에 사용되는 미세 다공성 세라믹 멤브레인.
- (a) 용매 중에 금속 또는 금속 산화물 입자의 콜로이드성 현탁액을 제조하는 단계, (b) 건조면 및 졸면을 갖고, 그 안에 다공성 지지체를 포함하는 가스 스트림 통로를 형성시키는 단계, (c) 콜로이드성 현탁액을 가스 스트림 통로의 졸면 상에 놓는 단계, (d) 다공성 지지체를 통해 용매의 증발을 유발시키는 조건하에 건조 가스 통로의 건조면 상에 가스 스트림을 유동시켜 금속 산화물 입자를 겔로서 지지체의 건조면 상에 침착시키는 단계, (e) 생성된 겔을 건조시키는 단계, 및 (f) 겔을 미세 다공성 세라믹 멤브레인으로 소결시키는 단계로 이루어지는 다공성 지지체 상에 미세 다공성 금속 산화물 세라믹 멤브레인을 침투형성시키는 방법.
- 제15항에 있어서, 금속 산화물 입자의 현탁액을 제조하는 단계가 금속 알콕시드의 가수분해를 포함하는 방법.
- 제15항에 있어서, 금속 산화물 중의 금속이 규소인 방법.
- 제15항에 있어서, 다공성 지지체가 공동 실린더인 방법.
- 제18항에 있어서, 건조면이 실린더의 내부에 있는 방법.
- 제15항에 있어서, 다공성 지지체가 편평한 실린더인 방법.
- 제15항에 있어서, 콜로이드성 현탁액이 수성인 방법.
- 제15항에 있어서, 콜로이드성 현탁액이 알콜성인 방법.
- 제15항에 있어서, 가스 스트림이 질소 가스인 방법.
- 제15항에 있어서, 가스 스트림이 입자를 침착시키는 반응성 가스인 방법.
- 제15항에 있어서, 건조 단계(e)가 지지체의 건조면은 용매에 노출시키고, 지지체의 졸면은 겔로부터 떨어진 지지체를 통해 용매를 끌어 올리는 건조 조건에 노출시키는 것을 포함하는 방법.
- 제16항에 있어서, 멤브레인이 100Å 미만인 공극 크기를 갖는 방법.
- 제16항의 방법에 의해 지지체 상에 침착된 미세 다공성 세라믹 멤브레인.
- 제27항에 있어서, 한외 여과에 사용되는 미세 다공성 세라믹 멤브레인.
- 제27항에 있어서, 역삼투에 사용되는 미세 다공성 세라믹 멤브레인.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/756,395 US5269926A (en) | 1991-09-09 | 1991-09-09 | Supported microporous ceramic membranes |
US756,395 | 1991-09-09 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR930005940A true KR930005940A (ko) | 1993-04-20 |
Family
ID=25043279
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019920016354A KR930005940A (ko) | 1991-09-09 | 1992-09-08 | 지지된 미세 다공성 세라믹 멤브레인 |
Country Status (6)
Country | Link |
---|---|
US (1) | US5269926A (ko) |
EP (1) | EP0532282A1 (ko) |
JP (1) | JPH05192545A (ko) |
KR (1) | KR930005940A (ko) |
AU (1) | AU651296B2 (ko) |
CA (1) | CA2077579A1 (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030046160A (ko) * | 2001-12-05 | 2003-06-12 | 이현구 | 스팽글 부착 원단의 제조장치 |
KR100533623B1 (ko) * | 1998-07-31 | 2006-01-27 | 삼성전기주식회사 | 세라믹 후막의 제조방법 |
Families Citing this family (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5308494A (en) * | 1993-03-24 | 1994-05-03 | E. I. Du Pont De Nemours And Company | Method for improving filter efficiency |
US5628901A (en) * | 1993-04-30 | 1997-05-13 | Castrol Industrial North America Inc. | Vessel for treating liquids |
US5405529A (en) * | 1993-07-19 | 1995-04-11 | Toshiba Ceramics Co., Ltd. | Ceramic filter and manufacturing method therefor |
US5487774A (en) * | 1993-11-08 | 1996-01-30 | Wisconsin Alumni Research Foundation | Gas phase fractionation method using porous ceramic membrane |
DE9405378U1 (de) * | 1994-03-30 | 1994-06-23 | Hewlett Packard Gmbh | Trennsäule für die Chromatographie |
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-
1991
- 1991-09-09 US US07/756,395 patent/US5269926A/en not_active Expired - Lifetime
-
1992
- 1992-09-03 AU AU22139/92A patent/AU651296B2/en not_active Expired - Fee Related
- 1992-09-04 CA CA002077579A patent/CA2077579A1/en not_active Abandoned
- 1992-09-08 KR KR1019920016354A patent/KR930005940A/ko not_active Application Discontinuation
- 1992-09-09 JP JP4240864A patent/JPH05192545A/ja active Pending
- 1992-09-09 EP EP92308160A patent/EP0532282A1/en not_active Withdrawn
Cited By (2)
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KR100533623B1 (ko) * | 1998-07-31 | 2006-01-27 | 삼성전기주식회사 | 세라믹 후막의 제조방법 |
KR20030046160A (ko) * | 2001-12-05 | 2003-06-12 | 이현구 | 스팽글 부착 원단의 제조장치 |
Also Published As
Publication number | Publication date |
---|---|
EP0532282A1 (en) | 1993-03-17 |
JPH05192545A (ja) | 1993-08-03 |
US5269926A (en) | 1993-12-14 |
AU2213992A (en) | 1993-03-11 |
CA2077579A1 (en) | 1993-03-10 |
AU651296B2 (en) | 1994-07-14 |
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