KR930001569B1 - 피세정물의 세정 방법 및 장치 - Google Patents

피세정물의 세정 방법 및 장치 Download PDF

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Publication number
KR930001569B1
KR930001569B1 KR1019900004774A KR900004774A KR930001569B1 KR 930001569 B1 KR930001569 B1 KR 930001569B1 KR 1019900004774 A KR1019900004774 A KR 1019900004774A KR 900004774 A KR900004774 A KR 900004774A KR 930001569 B1 KR930001569 B1 KR 930001569B1
Authority
KR
South Korea
Prior art keywords
cleaning
liquid
solvent
cleaned
cleaning means
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019900004774A
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English (en)
Korean (ko)
Other versions
KR910014158A (ko
Inventor
마시히데 우찌노
Original Assignee
쟈판 휘루도 가부시기가이샤
우찌노 마사히데
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 쟈판 휘루도 가부시기가이샤, 우찌노 마사히데 filed Critical 쟈판 휘루도 가부시기가이샤
Publication of KR910014158A publication Critical patent/KR910014158A/ko
Application granted granted Critical
Publication of KR930001569B1 publication Critical patent/KR930001569B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/04—Apparatus
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/26—Cleaning or polishing of the conductive pattern

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Detergent Compositions (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1019900004774A 1989-05-29 1990-04-07 피세정물의 세정 방법 및 장치 Expired - Fee Related KR930001569B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP13546189 1989-05-29
JP1-135461 1989-05-29
JP2-18476 1990-01-29

Publications (2)

Publication Number Publication Date
KR910014158A KR910014158A (ko) 1991-08-31
KR930001569B1 true KR930001569B1 (ko) 1993-03-05

Family

ID=15152256

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900004774A Expired - Fee Related KR930001569B1 (ko) 1989-05-29 1990-04-07 피세정물의 세정 방법 및 장치

Country Status (7)

Country Link
US (1) US5067983A (enExample)
EP (1) EP0400873B1 (enExample)
JP (1) JPH0389985A (enExample)
KR (1) KR930001569B1 (enExample)
CN (1) CN1027352C (enExample)
DE (1) DE69013759T2 (enExample)
HK (1) HK89295A (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2535466B2 (ja) * 1991-10-17 1996-09-18 ジャパン・フィールド株式会社 可燃性溶剤を用いた被洗浄物の洗浄装置
US5339843A (en) * 1993-04-16 1994-08-23 Martin Marietta Corporation Controlled agitation cleaning system
TW318190B (enExample) * 1993-10-06 1997-10-21 Hitachi Shipbuilding Eng Co
US5402806A (en) * 1993-10-19 1995-04-04 Northrop Grumman Corporation Cleaning apparatus having a partitioned boil sump
JP2996334B2 (ja) * 1994-03-30 1999-12-27 東北日本電気株式会社 超音波脱脂装置
US5928948A (en) * 1997-03-10 1999-07-27 Steris Corporation Method for the assessment and validation of cleaning processes
US6145518A (en) * 1997-12-31 2000-11-14 Crs Holdings, Inc. Bulk ultrasonic degreasing cleaning and drying apparatus and method of using same
US6279584B1 (en) 1998-12-22 2001-08-28 Crs Holdings, Inc. Bulk ultrasonic degreasing, cleaning, and drying method
JP5076033B1 (ja) * 2012-06-08 2012-11-21 ジャパン・フィールド株式会社 被洗浄物の蒸気洗浄方法及びその装置
JP6539251B2 (ja) * 2016-11-10 2019-07-03 上村工業株式会社 超音波処理装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2828231A (en) * 1954-03-31 1958-03-25 Gen Electric Method and apparatus for ultrasonic cleansing
SE426850B (sv) * 1981-06-24 1983-02-14 Bycosin Ab Apparat for rengoring av foremal medelst losningsmedel
DE3374526D1 (en) * 1983-07-06 1987-12-23 Snef Electro Mecanique Method and apparatus for cleaning big work pieces
EP0235744A1 (en) * 1986-02-28 1987-09-09 Japan Field Company, Ltd. Apparatus for vapour cleaning
US4886082A (en) * 1986-07-02 1989-12-12 Brother Kogyo Kabushiki Kaisha Cleaning apparatus
US4763677A (en) * 1986-11-26 1988-08-16 Techalloy Illinois, Inc. Sonic treatment apparatus
US4865060A (en) * 1989-01-25 1989-09-12 S & C Co., Ltd. Ultrasonic cleaning system
US4909266A (en) * 1989-03-10 1990-03-20 Frank Massa Ultrasonic cleaning system

Also Published As

Publication number Publication date
US5067983A (en) 1991-11-26
CN1048992A (zh) 1991-02-06
DE69013759D1 (de) 1994-12-08
JPH0543436B2 (enExample) 1993-07-01
JPH0389985A (ja) 1991-04-15
EP0400873B1 (en) 1994-11-02
KR910014158A (ko) 1991-08-31
HK89295A (en) 1995-06-16
CN1027352C (zh) 1995-01-11
EP0400873A1 (en) 1990-12-05
DE69013759T2 (de) 1995-04-13

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