KR920017946A - 비 결정성 실리카형 충진제 - Google Patents

비 결정성 실리카형 충진제 Download PDF

Info

Publication number
KR920017946A
KR920017946A KR1019920004247A KR920004247A KR920017946A KR 920017946 A KR920017946 A KR 920017946A KR 1019920004247 A KR1019920004247 A KR 1019920004247A KR 920004247 A KR920004247 A KR 920004247A KR 920017946 A KR920017946 A KR 920017946A
Authority
KR
South Korea
Prior art keywords
amorphous silica
filler
recording paper
particle diameter
silica
Prior art date
Application number
KR1019920004247A
Other languages
English (en)
Other versions
KR100237509B1 (ko
Inventor
마시히데 오가와
키요시 아베
마사오 타카하시
유우지 와시오
카쥬미츄 에노모토
토시오 키쥬
Original Assignee
나카자와 타다히사
미즈자와 가가쿠 코교 가부시기가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26415565&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR920017946(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from JP3074421A external-priority patent/JP3050937B2/ja
Application filed by 나카자와 타다히사, 미즈자와 가가쿠 코교 가부시기가이샤 filed Critical 나카자와 타다히사
Publication of KR920017946A publication Critical patent/KR920017946A/ko
Priority to KR1019990029060A priority Critical patent/KR100250376B1/ko
Application granted granted Critical
Publication of KR100237509B1 publication Critical patent/KR100237509B1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/30—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
    • B41M5/337—Additives; Binders
    • B41M5/3377—Inorganic compounds, e.g. metal salts of organic acids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/152—Preparation of hydrogels
    • C01B33/154—Preparation of hydrogels by acidic treatment of aqueous silicate solutions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/02—Amorphous compounds
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/03—Particle morphology depicted by an image obtained by SEM
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/30—Particle morphology extending in three dimensions
    • C01P2004/32—Spheres
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/50—Agglomerated particles
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/10—Solid density
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/19—Oil-absorption capacity, e.g. DBP values
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/22—Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/90—Other properties not specified above
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/913—Material designed to be responsive to temperature, light, moisture
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24893—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including particulate material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y10T428/251—Mica
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y10T428/259—Silicic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Dispersion Chemistry (AREA)
  • Nanotechnology (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Composite Materials (AREA)
  • Optics & Photonics (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Silicon Compounds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Paints Or Removers (AREA)

Abstract

내용 없음

Description

비 결정성 실리카형 충진제
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 비결정성 실리카형 충진제의 입자구조를 보여주는 주사형 전자현미경 사진(20,000배 확대)이다.

Claims (9)

  1. 주사(scanning)형 전자 현미경에 의해 관찰된 제1입자의 평균 직경(D1)이 100 내지 270㎜이고, 겉보기 비중(JIS K 6220법)이 0.24 내지 0.55g/㎠이고, BET법에 의한 비표면적이 200 내지 500㎡/g이며, BET 법의 비표면적으로부터 계산된 실리카 원소입자 직경(DO)가 5 내지 15㎜이고, (평균 주 입자 직경(D1))÷(실리카 원소 입자 직경(DO))이 비율로 정의되는 응집도(DA)가 10 내지 50인 것을 특징으로 하는 비 결정성 실리카-형 충진제.
  2. 제1항에 있어서, 제2 입자의 평균 직경이 카우터(Couter) 계수법에 의하여 1 내지 50㎛인 것을 특징으로 하는 비결정성 실리카-형 충진제.
  3. 제1항에 있어서, 상기 오일-흡인양(JIS K 5101법)이 50 내지 120㎖/100g인 것을 특징으로 하는 비결정성 실리카-형 충진제.
  4. 제1항의 비결정성 실리카를 포함하는 수지필름용 점착 방지제.
  5. 제4항의 점착 방지제를 열가소성 수지 100 중량부당 0.01 내지 5중량부로 첨가한 열가소성 수지 필름.
  6. 제1항의 비결정성 실리카를 포함하는 열감성 기록지용 충진제.
  7. 제6항에 있어서, 카우터 계수법에 의한 제2입자의 평균 직경이 1 내지 5㎛이고, 오일 흡인량(JIS K 5101법)이 50 내지 120㎖/100g인 것을 특징으로 하는 열감성 기록지용 충진제.
  8. 제1항에 있어서, 상기 비결정성 실리카를 50 중량%를 포함하는 수용성 분산 슬러리의 점도가 100cps 이하인 것을 특징으로 하는 열감성 기록지용 충진제.
  9. 제6항의 비결정성 실리카형-충진제를 고형 성분을 기준으로 5 내지 60중량%의 양으로 본질적으로 공지된 열-민감성 기록층 조성물에 첨가한 열감성 기록지.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019920004247A 1991-03-15 1992-03-14 비결정성 실리카형 충진제 KR100237509B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019990029060A KR100250376B1 (ko) 1991-03-15 1999-07-19 비 결정성 실리카형 충진제 함유 열 감성 기록지

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP7442291 1991-03-15
JP91-074421 1991-03-15
JP91-074422 1991-03-15
JP3074421A JP3050937B2 (ja) 1991-03-15 1991-03-15 非晶質シリカ系充填剤

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1019990029060A Division KR100250376B1 (ko) 1991-03-15 1999-07-19 비 결정성 실리카형 충진제 함유 열 감성 기록지

Publications (2)

Publication Number Publication Date
KR920017946A true KR920017946A (ko) 1992-10-21
KR100237509B1 KR100237509B1 (ko) 2000-02-01

Family

ID=26415565

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920004247A KR100237509B1 (ko) 1991-03-15 1992-03-14 비결정성 실리카형 충진제

Country Status (4)

Country Link
US (3) US5266397A (ko)
EP (1) EP0513975B1 (ko)
KR (1) KR100237509B1 (ko)
DE (1) DE69207640T2 (ko)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69207640T2 (de) * 1991-03-15 1996-09-19 Mizusawa Industrial Chem Amorpher silicaartiger Füllstoff
GB9324989D0 (en) * 1992-12-23 1994-01-26 Ici Plc Polymeric film
US5567513A (en) * 1993-07-13 1996-10-22 Canon Kabushiki Kaisha Ink-jet recording paper, and ink-jet recording method
US5554352A (en) * 1995-05-09 1996-09-10 Construction Material Resources Processed silica as a natural pozzolan for use as a cementitious component in concrete and concrete products
US6713550B2 (en) 1996-06-28 2004-03-30 Stora Enso North America Corporation Method for making a high solids interactive coating composition and ink jet recording medium
US6129785A (en) * 1997-06-13 2000-10-10 Consolidated Papers, Inc. Low pH coating composition for ink jet recording medium and method
US6140406A (en) * 1996-06-28 2000-10-31 Consolidated Papers, Inc. High solids interactive coating composition, ink jet recording medium, and method
GB2316414B (en) * 1996-07-31 2000-10-11 Tosoh Corp Abrasive shaped article, abrasive disc and polishing method
TW339313B (en) * 1996-08-07 1998-09-01 Teijin Ltd Photoresist layer supporting polyester flm and photoresist film laminate
MY117802A (en) * 1997-06-13 2004-08-30 Mizusawa Industrial Chem Amorphous silica particles having a double structure, process for producing the same and use
US6656545B1 (en) 1997-06-13 2003-12-02 Stora Enso North America Corporation Low pH coating composition for ink jet recording medium and method
GB9818782D0 (en) * 1998-08-28 1998-10-21 Crosfield Joseph & Sons Granular compositions
US6323271B1 (en) 1998-11-03 2001-11-27 Arteva North America S.A.R.L. Polyester resins containing silica and having reduced stickiness
JP4059368B2 (ja) * 1999-07-23 2008-03-12 Ａｇｃエスアイテック株式会社 微小粒子状シリカゲル及び金属化合物微粒子内包粒子状シリカゲル
US6482536B1 (en) * 1999-12-20 2002-11-19 Kansai Paint Co., Ltd. Coating composition and coated metal plate having coating film formed therefrom
US6441078B1 (en) * 2000-03-08 2002-08-27 E. I. Du Pont De Nemours And Company Aqueous powder coat dispersions, process for their preparation and their use
WO2002022263A2 (en) * 2000-09-14 2002-03-21 Conoco Inc. Catalyst and method of making micrometer sized spherical particles
US6808767B2 (en) 2001-04-19 2004-10-26 Stora Enso North America Corporation High gloss ink jet recording media
JP2002331522A (ja) * 2001-05-09 2002-11-19 Dai Ichi Kogyo Seiyaku Co Ltd 親水性樹脂粒状体の製造方法
AU755845B1 (en) * 2001-11-27 2002-12-19 Gem Of The North Pty Ltd An pesticide composition containing finely ground amorphous silica
US7135429B2 (en) * 2002-05-24 2006-11-14 Ppg Industries Ohio, Inc. Attrition resistant carrier product
WO2004026783A1 (en) * 2002-09-17 2004-04-01 3M Innovative Properties Company Porous surfactant mediated metal oxide films
US7931954B2 (en) * 2003-09-30 2011-04-26 Dai Nippon Printing Co., Ltd. Decorating material
DE102004036573A1 (de) 2004-07-28 2006-03-23 Ge Bayer Silicones Gmbh & Co. Kg Verwendung lichtaktivierbarer, härtbarer Silikonzusammensetzungen zur Herstellung von dickwandigen Formartikeln oder dickwandigen Beschichtungen
EP1800859B1 (en) * 2004-09-30 2014-03-05 Dai Nippon Printing Co., Ltd. Dressed lumber
EP1803580A4 (en) * 2004-09-30 2009-01-07 Jujo Paper Co Ltd HEAT-SENSITIVE RECORDING MATERIAL
JP4636869B2 (ja) * 2004-12-21 2011-02-23 日揮触媒化成株式会社 多孔質シリカ系粒子の製造方法および該方法から得られる多孔質シリカ系粒子
WO2006070594A1 (ja) * 2004-12-27 2006-07-06 Oji Paper Co., Ltd. 感熱記録体
FR2880352B1 (fr) * 2004-12-30 2007-11-16 Rhodia Chimie Sa Utilisation d'une silice de precipitation pour augmenter la resistance au choc d'un materiau polymere thermoplastique
DE602006002040D1 (de) 2005-01-18 2008-09-18 Shinetsu Chemical Co Flüssige Siliconkautschuk-Beschichtungszusammensetzung und damit beschichteter Airbag
JP4831065B2 (ja) * 2005-01-25 2011-12-07 大日本印刷株式会社 賦型シート
US7105284B1 (en) * 2005-03-17 2006-09-12 Eastman Kodak Company Thermally developable materials with narrow disperse amorphous silica
GB0515088D0 (en) * 2005-07-22 2005-08-31 Imerys Minerals Ltd Particulate glass compositions and methods of production
US8097328B2 (en) * 2006-03-28 2012-01-17 Dai Nippon Printing Co., Ltd. High-pressure melamine resin decorative plates
DE102006016156A1 (de) * 2006-04-06 2007-10-11 Mitsubishi Polyester Film Gmbh Hydrolysebeständige, mehrschichtige Polyesterfolie mit Hydrolyseschutzmittel
EP2411329B1 (en) * 2009-03-11 2021-05-19 Imerys Filtration Minerals, Inc. Natural amorphous silica filler products
ES2690413T3 (es) 2015-06-10 2018-11-20 Omya International Ag Uso de carbonato cálcico tratado mediante reacción superficial como agente antibloqueo
CN110920170A (zh) * 2018-09-19 2020-03-27 宝山钢铁股份有限公司 一种单层聚酯薄膜及覆膜金属板
CN113185804A (zh) * 2020-01-14 2021-07-30 广东生益科技股份有限公司 一种树脂组合物、包含其的粘结片及其应用

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4159280A (en) * 1976-09-15 1979-06-26 J. M. Huber Corporation Therapeutic dentifrices in unlined container and methods
US4382115A (en) * 1980-10-20 1983-05-03 Daicel Chemical Industries, Ltd. Film coated with solution containing a vinylidene chloride copolymer and surface active agent
JPS5842432A (ja) * 1981-09-04 1983-03-11 Sumitomo Chem Co Ltd ポリプロピレン延伸フイルム
JPS5922794A (ja) * 1982-07-30 1984-02-06 Mizusawa Ind Chem Ltd 感熱記録紙用填剤
US4741779A (en) * 1985-07-19 1988-05-03 Nippon Chemical Industrial Co. Ltd. Additives for resins and their composition
US5236683A (en) * 1987-01-20 1993-08-17 Mizusawa Industrial Chemicals, Ltd. Amorphous silica spherical particles
US4885225A (en) * 1988-04-29 1989-12-05 Minnesota Mining And Manufacturing Company Color proof with non-blocking thermal adhesive layer with particulate polymer beads
US4956241A (en) * 1988-12-30 1990-09-11 Mobil Oil Corporation Slip coated thermoplastic films
JP2515884B2 (ja) * 1989-06-06 1996-07-10 東レ株式会社 プロピレン系重合体フィルム
DE69207640T2 (de) * 1991-03-15 1996-09-19 Mizusawa Industrial Chem Amorpher silicaartiger Füllstoff

Also Published As

Publication number Publication date
EP0513975B1 (en) 1996-01-17
US5266397A (en) 1993-11-30
EP0513975A1 (en) 1992-11-19
DE69207640T2 (de) 1996-09-19
DE69207640D1 (de) 1996-02-29
KR100237509B1 (ko) 2000-02-01
US5418043A (en) 1995-05-23
US5384191A (en) 1995-01-24

Similar Documents

Publication Publication Date Title
KR920017946A (ko) 비 결정성 실리카형 충진제
US4769264A (en) On page fragrance sampling device
EP0634287A1 (en) Recording sheet and process for its production
JPH02276670A (ja) 記録用シート
KR920018106A (ko) 폴리에스테르 필름
KR910018508A (ko) 페이퍼시이트의 일시접착결합용 접착제 조성물
JPH0448119B2 (ko)
KR880012365A (ko) 리시버 시트
KR910014451A (ko) 열처리-밀봉 가능한 열가소성 성형 재료
JPS61164892A (ja) 転写型感熱記録用受像体
KR890017577A (ko) 정전복사기에서 인쇄할수 있는 무탄소지
JPS6335381A (ja) インパクトプリンタ−用受容シ−ト
US5354601A (en) Recording sheet
KR920019841A (ko) 이축 연신 폴리에스테르 필름
US5736229A (en) Single-layered paper product
JPS631583A (ja) 被記録材
JP2713568B2 (ja) 透明記録用フイルム
KR930019737A (ko) 폴리에스테르 적층필름
KR950001631A (ko) 자기 기록 매체
KR960700907A (ko) 무탄소지 패드 코팅물에서 마찰계수를 증가시키는 콜로이드(colloids to increase coefficient of friction in carbonless paper pad coatings)
JPS57167298A (en) Master paper for lighographic printing
JPS61255338A (ja) 写真用支持体
KR950011510A (ko) 이축연신 폴리에스테르 필름
KR920007840A (ko) 언더코트층용 도공액 조성물 및 이를 도공한 감열기록체
KR920012290A (ko) 필름 성형용 폴리아미드 조성물

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
A107 Divisional application of patent
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20070911

Year of fee payment: 9

LAPS Lapse due to unpaid annual fee