KR910009608A - 성층방법 및 이 방법에 의하여 성층된 공작물 - Google Patents

성층방법 및 이 방법에 의하여 성층된 공작물

Info

Publication number
KR910009608A
KR910009608A KR1019890018805A KR900018805A KR910009608A KR 910009608 A KR910009608 A KR 910009608A KR 1019890018805 A KR1019890018805 A KR 1019890018805A KR 900018805 A KR900018805 A KR 900018805A KR 910009608 A KR910009608 A KR 910009608A
Authority
KR
South Korea
Prior art keywords
layer
oxide
nitride
workpiece
forming
Prior art date
Application number
KR1019890018805A
Other languages
English (en)
Korean (ko)
Inventor
람 지르겐
닥신게르 헬뮤트
부히 라이너
베르그만 에릭
Original Assignee
원본미기재
발저스 아크티엔게젤샤프트
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=4271503&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR910009608(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 원본미기재, 발저스 아크티엔게젤샤프트 filed Critical 원본미기재
Publication of KR910009608A publication Critical patent/KR910009608A/ko

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81Coating or impregnation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3471Introduction of auxiliary energy into the plasma
    • C23C14/3478Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Ceramic Engineering (AREA)
  • Structural Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Materials For Medical Uses (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Dry Shavers And Clippers (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
KR1019890018805A 1989-11-22 1990-11-20 성층방법 및 이 방법에 의하여 성층된 공작물 KR910009608A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH4192/89-2 1989-11-22
CH4192/89A CH680369A5 (US07714131-20100511-C00024.png) 1989-11-22 1989-11-22

Publications (1)

Publication Number Publication Date
KR910009608A true KR910009608A (ko) 1991-06-28

Family

ID=4271503

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890018805A KR910009608A (ko) 1989-11-22 1990-11-20 성층방법 및 이 방법에 의하여 성층된 공작물

Country Status (7)

Country Link
US (1) US5192578A (US07714131-20100511-C00024.png)
EP (1) EP0432090B1 (US07714131-20100511-C00024.png)
JP (1) JP3294263B2 (US07714131-20100511-C00024.png)
KR (1) KR910009608A (US07714131-20100511-C00024.png)
AT (1) ATE117380T1 (US07714131-20100511-C00024.png)
CH (1) CH680369A5 (US07714131-20100511-C00024.png)
DE (1) DE59008302D1 (US07714131-20100511-C00024.png)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5503725A (en) * 1991-04-29 1996-04-02 Novatech Method and device for treatment of products in gas-discharge plasma
DE4127317C2 (de) * 1991-08-17 1999-09-02 Leybold Ag Einrichtung zum Behandeln von Substraten
CA2078245A1 (en) * 1991-09-23 1993-03-24 Roland Dubach Machining tools
CH689767A5 (de) 1992-03-24 1999-10-15 Balzers Hochvakuum Verfahren zur Werkstueckbehandlung in einer Vakuumatmosphaere und Vakuumbehandlungsanlage.
CH687111A5 (de) * 1992-05-26 1996-09-13 Balzers Hochvakuum Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens.
FR2693789B1 (fr) * 1992-07-17 1994-10-07 Trouvay & Cauvin Ets Générateur de vapeur à cloisons poreuses.
US5690796A (en) * 1992-12-23 1997-11-25 Balzers Aktiengesellschaft Method and apparatus for layer depositions
WO1994014996A1 (de) * 1992-12-23 1994-07-07 Balzers Aktiengesellschaft Verfahren und anlage zur schichtabscheidung
WO1996031899A1 (en) * 1995-04-07 1996-10-10 Advanced Energy Industries, Inc. Adjustable energy quantum thin film plasma processing system
EP1186681B1 (de) * 2000-09-05 2010-03-31 Oerlikon Trading AG, Trübbach Vakuumanlage mit koppelbarem Werkstückträger
US6858333B2 (en) * 2002-10-09 2005-02-22 Kennametal Inc. Tool with wear resistant low friction coating and method of making the same
EP2275585A1 (de) * 2003-04-28 2011-01-19 Oerlikon Trading AG, Trübbach Wekstück mit ALCR-haltiger Hartstoffschicht und Verfahren zur Herstellung
US7226670B2 (en) 2003-04-28 2007-06-05 Oc Oerlikon Balzers Ag Work piece with a hard film of AlCr-containing material, and process for its production
US20050205415A1 (en) * 2004-03-19 2005-09-22 Belousov Igor V Multi-component deposition
US8080323B2 (en) 2007-06-28 2011-12-20 Kennametal Inc. Cutting insert with a wear-resistant coating scheme exhibiting wear indication and method of making the same
US20090004449A1 (en) * 2007-06-28 2009-01-01 Zhigang Ban Cutting insert with a wear-resistant coating scheme exhibiting wear indication and method of making the same
US8652589B2 (en) 2008-01-25 2014-02-18 Oerlikon Trading Ag, Truebbach Permeation barrier layer
CN108203810B (zh) * 2017-12-20 2020-05-26 中国科学院兰州化学物理研究所 类富勒烯碳/类石墨烯氮化硼多层超滑薄膜的制备方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH631743A5 (de) * 1977-06-01 1982-08-31 Balzers Hochvakuum Verfahren zum aufdampfen von material in einer vakuumaufdampfanlage.
FR2483848A1 (fr) * 1980-06-06 1981-12-11 Stephanois Rech Mec Procede pour la fabrication d'une couche composite resistant a la fois au grippage, a l'abrasion, a la corrosion et a la fatigue par contraintes alternees, et couche composite ainsi obtenue
US4596719A (en) * 1981-02-24 1986-06-24 Wedtech Corp. Multilayer coating method and apparatus
US4428808A (en) * 1981-04-01 1984-01-31 Westinghouse Electric Corp. Method for obtaining oriented gold and piezoelectric films
US4540596A (en) * 1983-05-06 1985-09-10 Smith International, Inc. Method of producing thin, hard coating
US4673477A (en) * 1984-03-02 1987-06-16 Regents Of The University Of Minnesota Controlled vacuum arc material deposition, method and apparatus
SE453474B (sv) * 1984-06-27 1988-02-08 Santrade Ltd Kompoundkropp belagd med skikt av polykristallin diamant
DE3428951A1 (de) * 1984-08-06 1986-02-13 Leybold-Heraeus GmbH, 5000 Köln Mit einer deckschicht aus gold oder einem goldhaltigen material ueberzogener dekorativer gebrauchsgegenstand und verfahren zu seiner herstellung
CH664163A5 (de) * 1985-03-01 1988-02-15 Balzers Hochvakuum Verfahren zum reaktiven aufdampfen von schichten aus oxiden, nitriden, oxynitriden und karbiden.
JPS6221778A (ja) * 1985-07-17 1987-01-30 東芝タンガロイ株式会社 立方晶窒化ホウ素被覆体及びその製造方法
AT388394B (de) * 1987-01-09 1989-06-12 Vni Instrument Inst Verfahren zur herstellung von schneidwerkzeug
DE3700633C2 (de) * 1987-01-12 1997-02-20 Reinar Dr Gruen Verfahren und Vorrichtung zum schonenden Beschichten elektrisch leitender Gegenstände mittels Plasma
US4842710A (en) * 1987-03-23 1989-06-27 Siemens Aktiengesellschaft Method of making mixed nitride films with at least two metals
CA1332324C (en) * 1987-03-30 1994-10-11 Jun Shioya Method for producing thin film of oxide superconductor
ATE98303T1 (de) * 1989-03-03 1993-12-15 Balzers Hochvakuum Verfahren zur beschichtung von hartmetallgrundkoerpern und hartmetallwerkzeug hergestellt nach dem verfahren.
ATE133718T1 (de) * 1989-08-21 1996-02-15 Balzers Hochvakuum Beschichtetes werkstück mit einer mischkristallbeschichtung, verfahren zu dessen herstellung, sowie vorrichtung zur durchführung des verfahrens

Also Published As

Publication number Publication date
EP0432090B1 (de) 1995-01-18
JP3294263B2 (ja) 2002-06-24
ATE117380T1 (de) 1995-02-15
DE59008302D1 (de) 1995-03-02
EP0432090A3 (en) 1992-01-02
EP0432090A2 (de) 1991-06-12
US5192578A (en) 1993-03-09
JPH03207854A (ja) 1991-09-11
CH680369A5 (US07714131-20100511-C00024.png) 1992-08-14

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WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid