KR960014037A - 플라즈마 불소 저항 다결정 알루미나 세라믹 재료 및 그 제조방법 - Google Patents

플라즈마 불소 저항 다결정 알루미나 세라믹 재료 및 그 제조방법 Download PDF

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KR960014037A
KR960014037A KR1019950035950A KR19950035950A KR960014037A KR 960014037 A KR960014037 A KR 960014037A KR 1019950035950 A KR1019950035950 A KR 1019950035950A KR 19950035950 A KR19950035950 A KR 19950035950A KR 960014037 A KR960014037 A KR 960014037A
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South Korea
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ceramic material
polycrystalline alumina
plasma fluorine
grain size
alumina ceramic
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KR1019950035950A
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English (en)
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KR100256142B1 (ko
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에스. 다이어 타모시
쳉 트성난
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제임스 조셉 드롱
어플라이드 머티어리얼스, 인코포레이티드
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/10—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on aluminium oxide
    • C04B35/111—Fine ceramics
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Structural Engineering (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

본 발명은 약99.5중량% 내지 99.8중량%의 알루미나 및 약 0.5중량% 내지 0.2중량%의 결합체로 이루어지고 그리고 단일모드의 결정립크기를 갖는 플라즈마 불소 저항 다결정 알루미나 세라믹 재료에 관한 것이다.

Description

플라즈마 불소 저항다결정아루미나 세라믹 재료 및 그 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (10)

  1. 플라즈마 불소 저항 다결정 알루미나 세라믹 재료.
  2. 제1항에 있어서, 단일의 결정립크기 분포를 갖는 세라믹 재료.
  3. 제2항에 있어서, 상기 단일 모드의 결정립크기 분포는 15㎛ 내지 30㎛ 사이에 집중된 세라믹 재료.
  4. 플라즈마 불소 저항 다결정 알루미나 세라믹 재료에 있어서, 99.5중량% 내지 99.8중량%의 알루미나 및 0.5중량% 내지0.2중량%의 결합제를 포함하고 있으며 15㎛ 내지 30㎛에 집중된 단일모드의 결정립크기 분포를 갖는 플라즈마 불소 저항 다결정 알루미나 세라믹 재료.
  5. 플라즈마 불소 저항 다결정 알루미나 세라믹 재료의 제조방법에 있어서, a) 99.5중량 내지 99.8%의 알루미나 및 0.5중량% 내지0.2중량%의 결합제를 포함하고 그리고 단일의 결정립크기 분포를 갖는 분말로부터 생체를 형성하는 단계와, 그리고 b) 상기 생체를 소결시키는 단계를 포함하는 플라즈마 불소 저항 다결정 알루미나 세라믹 재료를 제조하는 방법.
  6. 제5항의 방법에 의해 제조된 세라믹 재료.
  7. 제1항의 세라믹 재료를 포함하는 제조물.
  8. 제4항의 세라믹 재료를 포함하는 제조물.
  9. 제7항에 있어서, 진공 처리 장치에 사용하기 위한 성분인 제조물.
  10. 제9항에 있어서, 초크, 노즐, 서셉터, 가열기 판, 클램핑 링, 차폐링, 기판 보우트, 및 챔버 벽으로 이루어진 그룹으로부터 선택된 제조물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019950035950A 1994-10-18 1995-10-18 플라즈마 불소 저항성 다결정질 알루미나 세라믹 재료 및 그 제조방법 KR100256142B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US32567294A 1994-10-18 1994-10-18
US8/325672 1994-10-18
US08/325,672 1994-10-18

Publications (2)

Publication Number Publication Date
KR960014037A true KR960014037A (ko) 1996-05-22
KR100256142B1 KR100256142B1 (ko) 2000-05-15

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EP (1) EP0708065A1 (ko)
JP (1) JPH08231266A (ko)
KR (1) KR100256142B1 (ko)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6083451A (en) * 1995-04-18 2000-07-04 Applied Materials, Inc. Method of producing a polycrystalline alumina ceramic which is resistant to a fluorine-comprising plasma
TW579372B (en) * 1998-07-29 2004-03-11 Sumitomo Chemical Co Process for producing alumina sintered body
JP4213790B2 (ja) * 1998-08-26 2009-01-21 コバレントマテリアル株式会社 耐プラズマ部材およびそれを用いたプラズマ処理装置
KR20030017753A (ko) * 2001-08-22 2003-03-04 삼성전자주식회사 이중층 내벽 구조의 챔버
US7304010B2 (en) * 2004-02-23 2007-12-04 Kyocera Corporation Aluminum oxide sintered body, and members using same for semiconductor and liquid crystal manufacturing apparatuses
JP2006089358A (ja) * 2004-09-27 2006-04-06 Kyocera Corp 酸化アルミニウム質焼結体およびその製造方法ならびにこれを用いた半導体製造装置
CN101121607B (zh) * 2006-08-07 2012-05-23 张勇 一种复合承烧板及其制备方法
CN101468915A (zh) * 2007-12-26 2009-07-01 中国科学院上海硅酸盐研究所 一种具有择优取向的多晶氧化铝透明陶瓷及其制备方法
JP5806158B2 (ja) * 2012-03-30 2015-11-10 京セラ株式会社 アルミン酸マグネシウム質焼結体
KR102439674B1 (ko) 2022-07-25 2022-09-02 주식회사 코닉스 내플라즈마성이 향상된 알루미나 세라믹 소재 및 내플라즈마성이 향상된 알루미나 세라믹 소재의 제조 장치

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2538987A1 (fr) * 1983-01-05 1984-07-06 Commissariat Energie Atomique Enceinte pour le traitement et notamment la gravure de substrats par la methode du plasma reactif
JP3130987B2 (ja) * 1991-11-29 2001-01-31 京セラ株式会社 アルミナセラミックスおよびその製造方法
JP3103646B2 (ja) * 1992-01-31 2000-10-30 東芝セラミックス株式会社 アルミナ質ベルジヤ−

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KR100256142B1 (ko) 2000-05-15
JPH08231266A (ja) 1996-09-10
EP0708065A1 (en) 1996-04-24

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