KR910009353B1 - 반도체장치 및 그 제조방법 - Google Patents

반도체장치 및 그 제조방법 Download PDF

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Publication number
KR910009353B1
KR910009353B1 KR1019890000574A KR890000574A KR910009353B1 KR 910009353 B1 KR910009353 B1 KR 910009353B1 KR 1019890000574 A KR1019890000574 A KR 1019890000574A KR 890000574 A KR890000574 A KR 890000574A KR 910009353 B1 KR910009353 B1 KR 910009353B1
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KR
South Korea
Prior art keywords
layer
region
semiconductor device
regions
wiring
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Expired
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KR1019890000574A
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English (en)
Korean (ko)
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KR890012401A (ko
Inventor
다케오 나카야마
Original Assignee
가부시키가이샤 도시바
아오이 죠이치
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Application filed by 가부시키가이샤 도시바, 아오이 죠이치 filed Critical 가부시키가이샤 도시바
Publication of KR890012401A publication Critical patent/KR890012401A/ko
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Publication of KR910009353B1 publication Critical patent/KR910009353B1/ko
Expired legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes

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  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Electrodes Of Semiconductors (AREA)
KR1019890000574A 1988-01-21 1989-01-20 반도체장치 및 그 제조방법 Expired KR910009353B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP63-11390 1988-01-21
JP63011390A JPH01185949A (ja) 1988-01-21 1988-01-21 半導体集積回路

Publications (2)

Publication Number Publication Date
KR890012401A KR890012401A (ko) 1989-08-26
KR910009353B1 true KR910009353B1 (ko) 1991-11-12

Family

ID=11776681

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890000574A Expired KR910009353B1 (ko) 1988-01-21 1989-01-20 반도체장치 및 그 제조방법

Country Status (3)

Country Link
US (1) US4994894A (https=)
JP (1) JPH01185949A (https=)
KR (1) KR910009353B1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5244843A (en) * 1991-12-17 1993-09-14 Intel Corporation Process for forming a thin oxide layer
EP0598168B1 (en) * 1992-11-18 1997-05-28 STMicroelectronics S.r.l. Formation of direct contacts in high-density MOS/CMOS processes
EP1696321A1 (en) 2005-02-23 2006-08-30 Deutsche Thomson-Brandt Gmbh Method and apparatus for executing software applications
JP4628817B2 (ja) 2005-02-21 2011-02-09 富士フイルム株式会社 画像レイアウト装置および方法並びにプログラム

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5919354A (ja) * 1982-07-24 1984-01-31 Fujitsu Ltd 半導体装置

Also Published As

Publication number Publication date
JPH01185949A (ja) 1989-07-25
JPH0581183B2 (https=) 1993-11-11
US4994894A (en) 1991-02-19
KR890012401A (ko) 1989-08-26

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