KR910006246A - 트리아졸 화합물, 이의 제조방법 및 용도 - Google Patents

트리아졸 화합물, 이의 제조방법 및 용도 Download PDF

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KR910006246A
KR910006246A KR1019900015316A KR900015316A KR910006246A KR 910006246 A KR910006246 A KR 910006246A KR 1019900015316 A KR1019900015316 A KR 1019900015316A KR 900015316 A KR900015316 A KR 900015316A KR 910006246 A KR910006246 A KR 910006246A
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가쓰미 이또오
겐지 오꼬노지
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우메모또 요시마사
다께다야꾸힝고오교 가부시끼가이샤
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Abstract

내용 없음

Description

트리아졸 화합물, 이의 제조방법 및 용도
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 화합물43히드로클로라이드의 X선 분말 회절 패턴을 나타낸 것이다.
제2도는 화합물43히드로브로마이드의 X선 분말 회절 패턴을 나타낸 것이다.

Claims (18)

  1. 다음 일반식(Ⅰ)의 화합물 또는 이의 염:
    상기식에서, R0, R1및 R2는 동일하거나 상이하며, 수소원자 또는 저급 알킬기를 나타내며, A는 다음 일반식:
    〔여기서, X는 화합적 결합 또는 다음 일반식:
    (여기서, X'는 화학적 결합이거나 구성원자로서 황 또는 산소원자를 함유할 수도 있는, C1내지 C5의 알킬렌기를 나타내고, R5및 R6은 동일하거나 상이하며 수소원자 또는 저급알킬기를 나타낸다)을 나타내고, R3은 치환될 수 있는 방향족 헤테로시클릭기이며, n은 0, 1 또는 2이다〕또는 다음 일반식: -S-R4(여기서, R4는 수소원자, 알카노일기를 나탄낸다)을 나타내는데, 다만, A중의 X 또는 X'가 화학적 결합을 나타내거나 A가 일반식 -S-R4(여기서, R4는 상기에서 정의한 바와 같다)를 나타낼 경우, R0또는 R1은 저급알킬기이다.
  2. 제1항에 있어서, R0또는 R2가 수소원자이고, R1이 저급 알킬기인 화합물.
  3. 제1항에 있어서, R5및 R6이 상이하거나, 동일하며, 수소원자 또는 메틸기인 화합물.
  4. 제1항에 있어서, n이 0인 화합물.
  5. 제1항에 있어서, R0및 R2가 수소원자이며, R3이 메틸기인 화합물.
  6. 제5항에 있어서, 화합물의 C-2 및 C-3비대칭 중심이 각각 R- 및 R-배열을 갖는 화합물.
  7. 제1항에 있어서, (2R, 3R)-2-(2,4-디플루오로페닐)-3-메르캅토-1-일-1-(1H-1,2,4-트리아졸-1-일)-2-부탄올인 화합물.
  8. 제1항에 있어서, (2RS, 3RS)-2-(2,4-디플루오로페닐)-3-메르캅토-1-일-1-(1H-1,2,4-트리아졸-1-일)-2-부탄올인 화합물.
  9. 다음 일반식(Ⅱ)의 화합물을 다음 일반식(Ⅲ)의 화합물과 반응시키고, 필요에 따라 반응 생성물을 산화시킴을 특징으로 하는 일반식(Ⅰ)의 화합물 또는 이의 염의 제조방법:
    상기식들에서, R0, R1및 R2는 동일하거나 상이하며, 수소원자 또는 저급 알킬기를 나타내며,
    A는 다음 일반식:
    〔여기서, X는 화합적 결합 또는 다음 일반식:
    (여기서, X'는 화학적 결합이거나 구성원자로서 황 또는 산소원자를 함유할 수도 있는, C1내지 C5의 알킬렌기를 나타내고, R5및 R6은 동일하거나 상이하며 수소원자 또는 저급알킬기를 나타낸다)을 나타내고, R3은 치환될 수 있는 방향족 헤테로시클릭기이며, n은 0, 1 또는 2이다〕또는 다음 일반식: -S-R4(여기서, R4는 수소원자, 알카노일기를 나탄낸다)을 나타내는데, 다만, A중의 X 또는 X'가 화학적 결합을 나타내거나 A가 일반식 -S-R4(여기서, R4는 상기에서 정의한 바와 같다)를 나타낼 경우, R0또는 R1은 저급알킬기이다.
  10. 다음 일반식(Ⅴ)의 화합물은 다음 일반식(Ⅵ)의 화합물과 반응시킴을 특징으로 하는 다음 일반식(Ⅳ)의 화합물, 및 이의 염을 제조하는 방법.
    상기식들에서, R7, R8, R9, R10및 R11은 동일하거나 상이하며, 수소원자 또는 치환될 수 있는 탄화수소 잔기를 나타내고, X와 Y중 적어도 하나는 에스테르화 되거나 아미드화될 수 있는 시아노기 또는 카르복실기이고, 다른 하나는 수소원자, 저급알킬기 또는 아실화될 수 있는 아미노기이다.
  11. 일반식(Ⅰ)의 화합물 또는 이의 약학적 허용염의 유효량, 및 약학적 허용 담체를 함유함을 특징으로 하는 항진균성 조성물:
    상기식에서 R0, R1및 R2는 동일하거나 상이하며, 수소원자 또는 저급알킬기를 나타내며, A는 다음 일반식:
    〔여기서, X는 화합적 결합 또는 다음 일반식:
    (여기서, X'는 화학적 결합이거나 구성원자로서 황 또는 산소원자를 함유할 수도 있는, C1내지 C5의 알킬렌기를 나타내고, R5및 R6은 동일하거나 상이하며 수소원자 또는 저급알킬기를 나타낸다)을 나타내고, R3은 치환될 수 있는 방향족 헤테로시클릭기이며, n은 0, 1 또는 2이다〕또는 다음 일반식: -S-R4(여기서, R4는 수소원자, 알카노일기를 나탄낸다)을 나타내는데, 다만, A중의 X 또는 X'가 화학적 결합을 나타내거나 A가 일반식 -S-R4(여기서, R4는 상기에서 정의한 바와 같다)를 나타낼 경우, R0또는 R1은 저급알킬기이다.
  12. 제11항에 있어서, R0또는 R2가 수소원자이고, R1이 저급 알킬기인 항진균성 조성물.
  13. 제11항에 있어서, R5및 R6이 상이하거나 동일하며, 수소원자 또는 메틸기인 항진균성 조성물.
  14. 제11항에 있어서, n이 0인 항진균성 조성물.
  15. 제11항에 있어서, R0또는 R2가 수소원자이며, R3이 메틸기인 항진균성 조성물.
  16. 제15항에 있어서, 화합물의 C-2 및 C-3비대칭 중심이 각각 R- 및 R-배열을 갖는 항진균성 조성물.
  17. 제11항에 있어서, (2R, 3R)-2-(2,4-디플루오로페닐)-3-메르캅토-1-일-1-(1H-1,2,4-트리아졸-1-일)-2-부탄올인 항진균성 화합물.
  18. 제1항에 있어서, (2RS, 3RS)-2-(2,4-디플루오로페닐)-3-메르캅토-1-일-1-(1H-1,2,4-트리아졸-1-일)-2-부탄올인 항진균성 화합물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900015316A 1989-09-26 1990-09-26 트리아졸 화합물, 이의 제조방법 및 용도 KR910006246A (ko)

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KR19980041071A (ko) * 1996-11-30 1998-08-17 구자홍 헤테로정션 바이폴라 트랜지스터

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FI913983A (fi) * 1990-08-26 1992-02-29 Sankyo Co Svampmotverkande triazolderivat, deras framstaellning och anvaendningar.
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CA2026143A1 (en) 1991-03-27
EP0728752A1 (en) 1996-08-28
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EP0421210A3 (en) 1992-08-12
US5405861A (en) 1995-04-11

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