KR890004940B1 - 두꺼운 피막 저항기 조성물 - Google Patents
두꺼운 피막 저항기 조성물 Download PDFInfo
- Publication number
- KR890004940B1 KR890004940B1 KR1019840008045A KR840008045A KR890004940B1 KR 890004940 B1 KR890004940 B1 KR 890004940B1 KR 1019840008045 A KR1019840008045 A KR 1019840008045A KR 840008045 A KR840008045 A KR 840008045A KR 890004940 B1 KR890004940 B1 KR 890004940B1
- Authority
- KR
- South Korea
- Prior art keywords
- weight
- composition
- mixture
- sno
- conductive phase
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/065—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
- H01C17/06506—Precursor compositions therefor, e.g. pastes, inks, glass frits
- H01C17/06513—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the resistive component
- H01C17/06533—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the resistive component composed of oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
- H01C7/06—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material including means to minimise changes in resistance with changes in temperature
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49082—Resistor making
- Y10T29/49099—Coating resistive material on a base
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31627—Next to aldehyde or ketone condensation product
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Non-Adjustable Resistors (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Glass Compositions (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US562,964 | 1983-12-19 | ||
| US06/562,964 US4548742A (en) | 1983-12-19 | 1983-12-19 | Resistor compositions |
| US562.964 | 1983-12-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR850004865A KR850004865A (ko) | 1985-07-27 |
| KR890004940B1 true KR890004940B1 (ko) | 1989-11-30 |
Family
ID=24248523
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019840008045A Expired KR890004940B1 (ko) | 1983-12-19 | 1984-12-18 | 두꺼운 피막 저항기 조성물 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US4548742A (enExample) |
| EP (1) | EP0146120B1 (enExample) |
| JP (1) | JPS60157201A (enExample) |
| KR (1) | KR890004940B1 (enExample) |
| CA (1) | CA1228474A (enExample) |
| DE (1) | DE3469633D1 (enExample) |
| DK (1) | DK157957C (enExample) |
| GR (1) | GR82483B (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4645621A (en) * | 1984-12-17 | 1987-02-24 | E. I. Du Pont De Nemours And Company | Resistor compositions |
| US4652397A (en) * | 1984-12-17 | 1987-03-24 | E. I. Du Pont De Nemours And Company | Resistor compositions |
| US4657699A (en) * | 1984-12-17 | 1987-04-14 | E. I. Du Pont De Nemours And Company | Resistor compositions |
| US4720418A (en) * | 1985-07-01 | 1988-01-19 | Cts Corporation | Pre-reacted resistor paint, and resistors made therefrom |
| US4654166A (en) * | 1986-06-13 | 1987-03-31 | E. I. Du Pont De Nemours And Company | Resistor compositions |
| DE3627682A1 (de) * | 1986-08-14 | 1988-02-25 | Bbc Brown Boveri & Cie | Praezisionswiderstandsnetzwerk, insbesondere fuer dickschicht-hybrid-schaltungen |
| JP2699381B2 (ja) * | 1987-04-28 | 1998-01-19 | 富士ゼロックス株式会社 | 抵抗体の製造方法 |
| US4961999A (en) * | 1988-07-21 | 1990-10-09 | E. I. Du Pont De Nemours And Company | Thermistor composition |
| US4906406A (en) * | 1988-07-21 | 1990-03-06 | E. I. Du Pont De Nemours And Company | Thermistor composition |
| JP2802770B2 (ja) * | 1989-03-31 | 1998-09-24 | 昭栄化学工業株式会社 | 抵抗組成物 |
| US5242623A (en) * | 1991-08-13 | 1993-09-07 | E. I. Du Pont De Nemours And Company | Screen-printable thick film paste composition |
| DE4207220A1 (de) * | 1992-03-07 | 1993-09-09 | Philips Patentverwaltung | Festkoerperelement fuer eine thermionische kathode |
| JPH08111047A (ja) * | 1994-10-12 | 1996-04-30 | Hitachi Ltd | 磁気記録再生装置 |
| US6787068B1 (en) | 1999-10-08 | 2004-09-07 | E. I. Du Pont De Nemours And Company | Conductor composition |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4065743A (en) * | 1975-03-21 | 1977-12-27 | Trw, Inc. | Resistor material, resistor made therefrom and method of making the same |
| US4176094A (en) * | 1977-12-02 | 1979-11-27 | Exxon Research & Engineering Co. | Method of making stoichiometric lead and bismuth pyrochlore compounds using an alkaline medium |
| US4129525A (en) * | 1977-12-02 | 1978-12-12 | Exxon Research & Engineering Co. | Method of making lead-rich and bismuth-rich pyrochlore compounds using an alkaline medium |
| US4163706A (en) * | 1977-12-02 | 1979-08-07 | Exxon Research & Engineering Co. | Bi2 [M2-x Bix ]O7-y compounds wherein M is Ru, Ir or mixtures thereof, and electrochemical devices containing same (Bat-24) |
| FR2437427A1 (fr) * | 1978-09-08 | 1980-04-25 | Labo Electronique Physique | Encre serigraphiable, a cuire sous atmosphere non oxydante |
| DE3220250A1 (de) * | 1982-05-28 | 1983-12-01 | Siemens AG, 1000 Berlin und 8000 München | Halbleiterbauelement mit planarstruktur |
| US4548741A (en) * | 1982-06-01 | 1985-10-22 | E. I. Du Pont De Nemours And Company | Method for doping tin oxide |
| US4476039A (en) * | 1983-01-21 | 1984-10-09 | E. I. Du Pont De Nemours And Company | Stain-resistant ruthenium oxide-based resistors |
-
1983
- 1983-12-19 US US06/562,964 patent/US4548742A/en not_active Expired - Lifetime
-
1984
- 1984-12-13 EP EP19840115336 patent/EP0146120B1/en not_active Expired
- 1984-12-13 DE DE8484115336T patent/DE3469633D1/de not_active Expired
- 1984-12-17 GR GR82483A patent/GR82483B/el unknown
- 1984-12-18 CA CA000470418A patent/CA1228474A/en not_active Expired
- 1984-12-18 KR KR1019840008045A patent/KR890004940B1/ko not_active Expired
- 1984-12-18 DK DK608584A patent/DK157957C/da not_active IP Right Cessation
- 1984-12-19 JP JP59266533A patent/JPS60157201A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| KR850004865A (ko) | 1985-07-27 |
| GR82483B (en) | 1985-04-18 |
| DE3469633D1 (en) | 1988-04-07 |
| EP0146120A3 (en) | 1985-08-14 |
| EP0146120B1 (en) | 1988-03-02 |
| DK157957B (da) | 1990-03-05 |
| US4548742A (en) | 1985-10-22 |
| JPS60157201A (ja) | 1985-08-17 |
| DK608584D0 (da) | 1984-12-18 |
| DK157957C (da) | 1990-08-13 |
| EP0146120A2 (en) | 1985-06-26 |
| JPH0216001B2 (enExample) | 1990-04-13 |
| DK608584A (da) | 1985-06-20 |
| CA1228474A (en) | 1987-10-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0071190B1 (en) | Thick film resistor compositions | |
| KR910000922B1 (ko) | 내오염성 산화루디늄 기제 저항기 조성물 | |
| EP0095775B1 (en) | Compositions for conductive resistor phases and methods for their preparation including a method for doping tin oxide | |
| KR930001968B1 (ko) | 서미스터 조성물 | |
| KR890004940B1 (ko) | 두꺼운 피막 저항기 조성물 | |
| KR900003174B1 (ko) | 후막 저항기 조성물 | |
| JPS6036350A (ja) | ホウケイ酸ガラス組成物 | |
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| KR870001761B1 (ko) | 붕규산염 유리조성물 | |
| KR900007660B1 (ko) | 후막 필름 저항기 조성물 | |
| KR870001760B1 (ko) | 붕규산염 유리조성물 | |
| US20040043885A1 (en) | Thick film compositions containing pyrochlore-related compounds | |
| EP0201362B1 (en) | Base metal resistive paints | |
| JPH0422005B2 (enExample) | ||
| JPH0412008B2 (enExample) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| PA0109 | Patent application |
St.27 status event code: A-0-1-A10-A12-nap-PA0109 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| G160 | Decision to publish patent application | ||
| PG1605 | Publication of application before grant of patent |
St.27 status event code: A-2-2-Q10-Q13-nap-PG1605 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
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| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U11-oth-PR1002 Fee payment year number: 1 |
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| FPAY | Annual fee payment |
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St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 10 |
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| PN2301 | Change of applicant |
St.27 status event code: A-5-5-R10-R13-asn-PN2301 St.27 status event code: A-5-5-R10-R11-asn-PN2301 |
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| LAPS | Lapse due to unpaid annual fee | ||
| PC1903 | Unpaid annual fee |
St.27 status event code: A-4-4-U10-U13-oth-PC1903 Not in force date: 19991201 Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE |
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| PC1903 | Unpaid annual fee |
St.27 status event code: N-4-6-H10-H13-oth-PC1903 Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE Not in force date: 19991201 |
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| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |
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| PN2301 | Change of applicant |
St.27 status event code: A-5-5-R10-R13-asn-PN2301 St.27 status event code: A-5-5-R10-R11-asn-PN2301 |