KR890004397A - Double metal formation method of integrated circuit - Google Patents
Double metal formation method of integrated circuit Download PDFInfo
- Publication number
- KR890004397A KR890004397A KR1019870008802A KR870008802A KR890004397A KR 890004397 A KR890004397 A KR 890004397A KR 1019870008802 A KR1019870008802 A KR 1019870008802A KR 870008802 A KR870008802 A KR 870008802A KR 890004397 A KR890004397 A KR 890004397A
- Authority
- KR
- South Korea
- Prior art keywords
- insulating layer
- negative photoresist
- integrated circuit
- formation method
- double metal
- Prior art date
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- Drying Of Semiconductors (AREA)
Abstract
내용 없음No content
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제1도는 종래의 이중메탈 형성방법을 보인 공정도. 제2도는 본 발며엥 의한 이중메탈 형성방법을 보인 설명도.1 is a process chart showing a conventional double metal forming method. 2 is an explanatory diagram showing a method of forming a double metal by the present baldengeng.
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019870008802A KR890004397A (en) | 1987-08-11 | 1987-08-11 | Double metal formation method of integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019870008802A KR890004397A (en) | 1987-08-11 | 1987-08-11 | Double metal formation method of integrated circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
KR890004397A true KR890004397A (en) | 1989-04-21 |
Family
ID=68279599
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019870008802A KR890004397A (en) | 1987-08-11 | 1987-08-11 | Double metal formation method of integrated circuit |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR890004397A (en) |
-
1987
- 1987-08-11 KR KR1019870008802A patent/KR890004397A/en not_active Application Discontinuation
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