KR890003021B1 - 도금전류 자동보상 제어장치 - Google Patents

도금전류 자동보상 제어장치 Download PDF

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Publication number
KR890003021B1
KR890003021B1 KR1019840007988A KR840007988A KR890003021B1 KR 890003021 B1 KR890003021 B1 KR 890003021B1 KR 1019840007988 A KR1019840007988 A KR 1019840007988A KR 840007988 A KR840007988 A KR 840007988A KR 890003021 B1 KR890003021 B1 KR 890003021B1
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KR
South Korea
Prior art keywords
plating
current
cell
strip
controller
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
KR1019840007988A
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English (en)
Korean (ko)
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KR850005015A (ko
Inventor
가쓰미 나가노
미찌오 사또오
히로오 고시
하루오 고오모도
시게하루 하마다
야스오 시이노기
Original Assignee
미쯔비시 덴끼 가부시기가이샤
가다야마 니하찌로오
신닛뽄세이데쓰 가부시기가이샤
다께다 유다까
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 미쯔비시 덴끼 가부시기가이샤, 가다야마 니하찌로오, 신닛뽄세이데쓰 가부시기가이샤, 다께다 유다까 filed Critical 미쯔비시 덴끼 가부시기가이샤
Publication of KR850005015A publication Critical patent/KR850005015A/ko
Application granted granted Critical
Publication of KR890003021B1 publication Critical patent/KR890003021B1/ko
Expired legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
    • G01N27/416—Systems
    • G01N27/42—Measuring deposition or liberation of materials from an electrolyte; Coulometry, i.e. measuring coulomb-equivalent of material in an electrolyte

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Automation & Control Theory (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Molecular Biology (AREA)
  • Electroplating Methods And Accessories (AREA)
KR1019840007988A 1983-12-16 1984-12-15 도금전류 자동보상 제어장치 Expired KR890003021B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP58237711A JPS60128295A (ja) 1983-12-16 1983-12-16 メツキ電流自動補償制御装置
JP?83-237711 1983-12-26
JP237711 1983-12-26

Publications (2)

Publication Number Publication Date
KR850005015A KR850005015A (ko) 1985-08-19
KR890003021B1 true KR890003021B1 (ko) 1989-08-18

Family

ID=17019363

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019840007988A Expired KR890003021B1 (ko) 1983-12-16 1984-12-15 도금전류 자동보상 제어장치

Country Status (3)

Country Link
JP (1) JPS60128295A (enrdf_load_stackoverflow)
KR (1) KR890003021B1 (enrdf_load_stackoverflow)
DE (1) DE3445851A1 (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3939681A1 (de) * 1989-12-01 1991-06-06 Schering Ag Verfahren zur steuerung des ablaufes von galvanischen anlagen, sowie zur durchfuehrung des verfahrens dienender anordnung
FR2704241B1 (fr) * 1993-04-22 1995-06-30 Lorraine Laminage Procede de regulation d'electro-deposition sur une bande de metal.
DE69713849T2 (de) * 1996-09-17 2003-02-27 Texas Instruments Inc., Dallas Elektroplattierungsverfahren
JP5795514B2 (ja) 2011-09-29 2015-10-14 アルメックスＰｅ株式会社 連続メッキ装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6026257B2 (ja) * 1977-06-03 1985-06-22 松下電子工業株式会社 カラ−受像管
DE2831949A1 (de) * 1978-07-18 1980-02-07 Schering Ag Regeleinrichtung fuer galvanogleichrichter mit informationsspeicherung und -verarbeitung
GB2085922B (en) * 1980-10-15 1984-01-25 Metal Box Co Ltd Electrocoating apparatus
JPS58140820A (ja) * 1982-02-16 1983-08-20 Nippon Steel Corp メツキ電流自動切換制御装置

Also Published As

Publication number Publication date
KR850005015A (ko) 1985-08-19
DE3445851A1 (de) 1985-06-27
DE3445851C2 (enrdf_load_stackoverflow) 1991-08-22
JPS60128295A (ja) 1985-07-09

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