KR880701790A - 무전해 도금욕의 조절 - Google Patents

무전해 도금욕의 조절

Info

Publication number
KR880701790A
KR880701790A KR1019880700759A KR880700759A KR880701790A KR 880701790 A KR880701790 A KR 880701790A KR 1019880700759 A KR1019880700759 A KR 1019880700759A KR 880700759 A KR880700759 A KR 880700759A KR 880701790 A KR880701790 A KR 880701790A
Authority
KR
South Korea
Prior art keywords
control
electroless plating
plating bath
bath
electroless
Prior art date
Application number
KR1019880700759A
Other languages
English (en)
Inventor
두피 죤
파우노빅 밀란
앰 크리스챤 스티븐
에프 맥콜마크 죤
Original Assignee
콜모겐 테크놀러지스 코오포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 콜모겐 테크놀러지스 코오포레이션 filed Critical 콜모겐 테크놀러지스 코오포레이션
Publication of KR880701790A publication Critical patent/KR880701790A/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1633—Process of electroless plating
    • C23C18/1675—Process conditions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1633—Process of electroless plating
    • C23C18/1675—Process conditions
    • C23C18/1683—Control of electrolyte composition, e.g. measurement, adjustment

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Chemically Coating (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
KR1019880700759A 1986-10-31 1988-06-30 무전해 도금욕의 조절 KR880701790A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/926,362 US4814197A (en) 1986-10-31 1986-10-31 Control of electroless plating baths
PCT/US1987/002854 WO1988003180A1 (en) 1986-10-31 1987-10-30 Control of electroless plating baths

Publications (1)

Publication Number Publication Date
KR880701790A true KR880701790A (ko) 1988-11-05

Family

ID=25453110

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019880700759A KR880701790A (ko) 1986-10-31 1988-06-30 무전해 도금욕의 조절

Country Status (14)

Country Link
US (1) US4814197A (ko)
EP (1) EP0265901B1 (ko)
JP (1) JP2759322B2 (ko)
KR (1) KR880701790A (ko)
AU (1) AU602041B2 (ko)
BR (1) BR8707517A (ko)
CA (1) CA1265710A (ko)
CH (1) CH674582A5 (ko)
DE (1) DE3736429C2 (ko)
ES (1) ES2038151T3 (ko)
FR (1) FR2609806B1 (ko)
GB (1) GB2207249B (ko)
NL (1) NL8702592A (ko)
WO (1) WO1988003180A1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101511408B1 (ko) * 2008-11-26 2015-04-15 아토테크더치랜드게엠베하 무전해 금속 및 금속 합금 도금 전해질에서의 안정제 첨가물의 제어 방법

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EP0265895B1 (en) * 1986-10-31 1993-02-10 AMP-AKZO CORPORATION (a Delaware corp.) Method for electrolessly depositing high quality copper
AU3304389A (en) * 1988-04-29 1989-11-02 Kollmorgen Corporation Method of consistently producing a copper deposit on a substrate by electroless deposition which deposit is essentially free of fissures
JP2888001B2 (ja) * 1992-01-09 1999-05-10 日本電気株式会社 金属メッキ装置
US5352350A (en) * 1992-02-14 1994-10-04 International Business Machines Corporation Method for controlling chemical species concentration
US5484626A (en) * 1992-04-06 1996-01-16 Shipley Company L.L.C. Methods and apparatus for maintaining electroless plating solutions
WO1994017464A1 (en) * 1993-01-19 1994-08-04 Pulsafeeder, Inc. Modular fluid characteristic sensor and additive controller
US5368715A (en) * 1993-02-23 1994-11-29 Enthone-Omi, Inc. Method and system for controlling plating bath parameters
DE19546206A1 (de) * 1994-12-19 1996-06-20 At & T Corp Verfahren zum Prüfen von Materialien zur Verwendung bei der chemischen oder außenstromlosen Beschichtung
US5631845A (en) * 1995-10-10 1997-05-20 Ford Motor Company Method and system for controlling phosphate bath constituents
KR100201377B1 (ko) * 1995-10-27 1999-06-15 김무 다성분 도금용액의 농도조절장치
US5993892A (en) * 1996-09-12 1999-11-30 Wasserman; Arthur Method of monitoring and controlling electroless plating in real time
US6565729B2 (en) * 1998-03-20 2003-05-20 Semitool, Inc. Method for electrochemically depositing metal on a semiconductor workpiece
US7020537B2 (en) * 1999-04-13 2006-03-28 Semitool, Inc. Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
US7189318B2 (en) * 1999-04-13 2007-03-13 Semitool, Inc. Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
WO2001090434A2 (en) * 2000-05-24 2001-11-29 Semitool, Inc. Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
PL342328A1 (en) * 2000-09-01 2002-03-11 Kghm Polska Miedz Sa Method fo measuring concentration of copper ions in industrial electrolytes
WO2006007533A1 (en) * 2004-07-01 2006-01-19 Tracedetect, Inc. Method for ultrasonic cleaning of a working electrode in electrochemical cell useful for automated trace metals measurement
JP2007051362A (ja) * 2005-07-19 2007-03-01 Ebara Corp めっき装置及びめっき液の管理方法
US20080156650A1 (en) * 2006-11-08 2008-07-03 Surfect Technologies, Inc. Electrode chemical control system and method
US8172627B2 (en) 2008-12-03 2012-05-08 Tyco Electronics Corporation Electrical connector with plated plug and receptacle
LT2821780T (lt) 2013-07-02 2018-08-10 Ancosys Gmbh Elektrocheminio nusodinimo ir elektrocheminio ėsdinimo analizė vietoje atspaudavimo būdu
TWI717427B (zh) 2015-12-03 2021-02-01 德商德國艾托特克公司 用於監測金屬鍍浴中含硫化合物之總量的方法

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US2851655A (en) * 1956-09-25 1958-09-09 Foxboro Co Amperometric continuous measurement system
US3401065A (en) * 1964-08-18 1968-09-10 Amchem Prod Automatic control of nitrite addition in acid phosphate coating solutions
US3532519A (en) * 1967-11-28 1970-10-06 Matsushita Electric Ind Co Ltd Electroless copper plating process
JPS5036197B1 (ko) * 1968-12-24 1975-11-21
US3959108A (en) * 1971-12-27 1976-05-25 Plumpe Jr William H System for automatically measuring and controlling the sulfate content of a chromium plating solution
US4096301A (en) * 1976-02-19 1978-06-20 Macdermid Incorporated Apparatus and method for automatically maintaining an electroless copper plating bath
GB1585057A (en) * 1976-06-28 1981-02-25 Ici Ltd Sensing concentration of coating solution
JPS539235A (en) * 1976-07-14 1978-01-27 Tokyo Shibaura Electric Co Method of adjusting concentration of nonnelectrolytic plating solution
JPS539234A (en) * 1976-07-14 1978-01-27 Tokyo Shibaura Electric Co Method of adjusting concentration of reducing agent for nonnelectrolytic plating solution
JPS539233A (en) * 1976-07-14 1978-01-27 Tokyo Shibaura Electric Co Method of adjusting concentration of nonnelectrolytic copper plating solution
US4132605A (en) * 1976-12-27 1979-01-02 Rockwell International Corporation Method for evaluating the quality of electroplating baths
DE2711989C2 (de) * 1977-03-18 1980-04-30 Siemens Ag, 1000 Berlin Und 8000 Muenchen Elektrochemische Bestimmung von SchwermetaUen in Wasser
US4209331A (en) * 1978-05-25 1980-06-24 Macdermid Incorporated Electroless copper composition solution using a hypophosphite reducing agent
IT1112649B (it) * 1978-07-28 1986-01-20 Oxon Italia Spa Composto chimico eterociclio 6-fenil-(1,2,3)-oxadiazolo-(4,5 d)-piridazin-7(6h)-one e procedimento per la sua produzione
US4336111A (en) * 1978-11-02 1982-06-22 The Boeing Company Method for determining the strength of a metal processing solution
JPS5926660B2 (ja) * 1979-03-07 1984-06-29 株式会社東芝 無電解メツキ反応の測定方法
JPS55158554A (en) * 1979-05-28 1980-12-10 Nissan Eng Kk Apparatus for measuring concentration of oxidating and reducing substance
US4353933A (en) * 1979-11-14 1982-10-12 C. Uyemura & Co., Ltd. Method for controlling electroless plating bath
JPS6016517B2 (ja) * 1979-12-29 1985-04-25 上村工業株式会社 無電解めつき制御方法
JPS56120943A (en) * 1980-02-29 1981-09-22 Hitachi Ltd Manufacture of ph-detecting electrode
JPS5841344A (ja) * 1981-09-07 1983-03-10 Baionikusu Kiki Kk ボルタンメトリ−分析法
EP0132594B1 (en) * 1983-07-25 1988-09-07 Hitachi, Ltd. Electroless copper plating solution
JPS60104246A (ja) * 1983-11-11 1985-06-08 C Uyemura & Co Ltd 化学銅めつき浴中のホルムアルデヒドの分析方法
US4565575A (en) * 1984-11-02 1986-01-21 Shiplay Company Inc. Apparatus and method for automatically maintaining an electroless plating bath
US4623554A (en) * 1985-03-08 1986-11-18 International Business Machines Corp. Method for controlling plating rate in an electroless plating system
US4631116A (en) * 1985-06-05 1986-12-23 Hughes Aircraft Company Method of monitoring trace constituents in plating baths
US4654126A (en) * 1985-10-07 1987-03-31 International Business Machines Corporation Process for determining the plating activity of an electroless plating bath

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101511408B1 (ko) * 2008-11-26 2015-04-15 아토테크더치랜드게엠베하 무전해 금속 및 금속 합금 도금 전해질에서의 안정제 첨가물의 제어 방법

Also Published As

Publication number Publication date
DE3736429A1 (de) 1988-05-19
EP0265901A3 (en) 1989-05-10
ES2038151T3 (es) 1993-07-16
CH674582A5 (ko) 1990-06-15
DE3736429C2 (de) 1988-12-01
US4814197A (en) 1989-03-21
GB8725399D0 (en) 1987-12-02
GB2207249A (en) 1989-01-25
AU8326987A (en) 1988-05-25
FR2609806A1 (fr) 1988-07-22
AU602041B2 (en) 1990-09-27
EP0265901B1 (en) 1993-01-27
EP0265901A2 (en) 1988-05-04
GB2207249B (en) 1991-03-27
JPH01501324A (ja) 1989-05-11
BR8707517A (pt) 1989-02-21
CA1265710A (en) 1990-02-13
WO1988003180A1 (en) 1988-05-05
FR2609806B1 (fr) 1993-09-10
JP2759322B2 (ja) 1998-05-28
NL8702592A (nl) 1988-05-16

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Legal Events

Date Code Title Description
A201 Request for examination
N231 Notification of change of applicant
E902 Notification of reason for refusal
E601 Decision to refuse application