KR870011688A - 고온 저항층의 제조방법 - Google Patents
고온 저항층의 제조방법 Download PDFInfo
- Publication number
- KR870011688A KR870011688A KR870004318A KR870004318A KR870011688A KR 870011688 A KR870011688 A KR 870011688A KR 870004318 A KR870004318 A KR 870004318A KR 870004318 A KR870004318 A KR 870004318A KR 870011688 A KR870011688 A KR 870011688A
- Authority
- KR
- South Korea
- Prior art keywords
- group
- general formula
- following general
- polyamide
- iii
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004642 Polyimide Substances 0.000 claims abstract 2
- 125000003118 aryl group Chemical group 0.000 claims abstract 2
- 238000010438 heat treatment Methods 0.000 claims abstract 2
- 229910052760 oxygen Inorganic materials 0.000 claims abstract 2
- 229920001721 polyimide Polymers 0.000 claims abstract 2
- 229910052717 sulfur Inorganic materials 0.000 claims abstract 2
- 238000000034 method Methods 0.000 claims 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 239000004952 Polyamide Substances 0.000 claims 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 125000001624 naphthyl group Chemical group 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims 1
- 229920002647 polyamide Polymers 0.000 claims 1
- 239000011593 sulfur Chemical group 0.000 claims 1
- 229920005575 poly(amic acid) Polymers 0.000 abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 1
- 239000011241 protective layer Substances 0.000 abstract 1
- 230000000306 recurrent effect Effects 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/18—Polybenzimidazoles
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
- C08G69/02—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids
- C08G69/26—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1046—Polyimides containing oxygen in the form of ether bonds in the main chain
- C08G73/105—Polyimides containing oxygen in the form of ether bonds in the main chain with oxygen only in the diamino moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1057—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
- C08G73/106—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1057—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
- C08G73/1064—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1067—Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
- C08G73/1071—Wholly aromatic polyimides containing oxygen in the form of ether bonds in the main chain
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1075—Partially aromatic polyimides
- C08G73/1078—Partially aromatic polyimides wholly aromatic in the diamino moiety
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Polyamides (AREA)
- Organic Insulating Materials (AREA)
- Glass Compositions (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (4)
- 적어도 50몰%가 하기일반식(Ⅰ)의 반복단위로 이루어진 폴리아미드-카복실산 용액을 피복시킬 표면에 적용시키고, 용액을 건조시킨 다음, 생성되는 폴리아미드-카복실산층을 180내지 400℃ 범위의 온도로 가열하여 폴리아미드로 전환시킴을 특징으로 하여, 부품상에 굳게 접착되고, 전기적으로 절연된 고온 저항층을 제조하는 방법.상기식에서, R1은 단일핵 내지 4핵 방향족 그룹이고, X는 산소, 황, CO,SOx또는 CR2R3(여기서, R2및 R3은 동일하거나 방이하며, 수소 또는 CH3이다.)
- 제1항에 있어서, R1이 펜-1,2,4,5-테트라일그룹 또는 하기일반식(Ⅱ)의 그룹인 방법,상기식에서, Y는 단일결합, X(여기서, X는 제1항에서 정의한 바와 같다)의 의미를 갖는 그룹 또는 하기일반식(Ⅲ)의 그룹이다.(상기식에서, X는 제1항에서 정의한 바와 같다)
- 제2항에 있어서, 폴리아미드-카복실산이 하기일반식(Ⅳ)의 단위를 추가로 함유하는 방법.상기식에서, Z는 하기일반식(Ⅵ),(Ⅶ) 또는 (Ⅷ)의 그룹, 페닐렌그룹 또는 나프탈렌그룹이다.[상기식에서, R4,R5,R6및 R7은 동일하거나 상이하며, 수소원자 또는 탄소수 1내지 3의 알킬그룹이고;V는 단일결합, X(여기서, X는 정1항에서 정의한 바와 같다)의 의미를 갖는 그룹, 또는 그룹및중의 하나이다.]
- 제1항에 있어서, 폴리이미드의 적어도 50몰%가 하기일반식(V)의 반복단위로 이루어진 방법.상기식에서, R1및 X는 제1항에서 정의한 바와 같다.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEP3515039.8 | 1986-05-03 | ||
DE19863615039 DE3615039A1 (de) | 1986-05-03 | 1986-05-03 | Polyamidcarbonsaeuren, daraus hergestellte polyimide und verfahren zur herstellung von hochtemperaturbestaendigen schichten |
Publications (2)
Publication Number | Publication Date |
---|---|
KR870011688A true KR870011688A (ko) | 1987-12-26 |
KR960004118B1 KR960004118B1 (en) | 1996-03-26 |
Family
ID=6300116
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR87004318A KR960004118B1 (en) | 1986-05-03 | 1987-05-02 | Process for preparing high temperature resistant layers |
Country Status (8)
Country | Link |
---|---|
US (1) | US4871833A (ko) |
EP (1) | EP0244715B1 (ko) |
JP (1) | JP2669420B2 (ko) |
KR (1) | KR960004118B1 (ko) |
AT (1) | ATE58744T1 (ko) |
DE (2) | DE3615039A1 (ko) |
HK (1) | HK83793A (ko) |
SG (1) | SG58592G (ko) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2575421B2 (ja) * | 1987-11-09 | 1997-01-22 | 株式会社フジクラ | 耐熱性電線及びケーブル |
JPH01229203A (ja) * | 1988-03-09 | 1989-09-12 | Mitsui Toatsu Chem Inc | ポリイミド樹脂を用いたフィルター |
JPH01231005A (ja) * | 1988-03-11 | 1989-09-14 | Mitsui Toatsu Chem Inc | ポリイミド樹脂フィルター |
US5071997A (en) * | 1989-07-20 | 1991-12-10 | University Of Akron | Polyimides comprising substituted benzidines |
US5210174A (en) * | 1989-11-22 | 1993-05-11 | Mitsui Toatsu Chemicals, Inc. | Preparation process of polyimide |
US5252703A (en) * | 1990-06-01 | 1993-10-12 | Ube Industries, Ltd. | Polyimidosiloxane resin and composition thereof and method of applying same |
US5196500A (en) * | 1990-12-17 | 1993-03-23 | E. I. Du Pont De Nemours And Company | Tetrapolyimide film containing benzophenone tetracarboxylic dianhydride |
US5310863A (en) * | 1993-01-08 | 1994-05-10 | International Business Machines Corporation | Polyimide materials with improved physico-chemical properties |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3179614A (en) * | 1961-03-13 | 1965-04-20 | Du Pont | Polyamide-acids, compositions thereof, and process for their preparation |
US3190856A (en) * | 1961-06-27 | 1965-06-22 | Shawinigan Resins Corp | Polyamides from benzophenonetetra-carboxylic acids and a primary diamine |
GB1216505A (en) * | 1967-06-06 | 1970-12-23 | Nat Res Dev | Improvements in or relating to aromatic polyimides |
GB1457191A (en) * | 1974-02-28 | 1976-12-01 | Secr Defence | Aromatic fluoro-polyimide adhesive compositions |
JPS56159314A (en) * | 1980-05-09 | 1981-12-08 | Ube Ind Ltd | Preparation of polyimide fiber |
GB2101149A (en) * | 1981-04-14 | 1983-01-12 | Hitachi Chemical Co Ltd | Process for producing polyamide acid silicon type intermediate and polyimide silicon copolymer resin |
JPS58152018A (ja) * | 1982-03-05 | 1983-09-09 | Hitachi Chem Co Ltd | 半導体装置の保護被膜材料用組成物 |
US4629777A (en) * | 1983-05-18 | 1986-12-16 | Ciba-Geigy Corporation | Polyimides, a process for their preparation and their use |
JPS59113035A (ja) * | 1983-12-05 | 1984-06-29 | Nitto Electric Ind Co Ltd | 珪素含有材からなる素地表面に密着性良好なポリイミド層を形成する方法 |
US4535115A (en) * | 1984-08-20 | 1985-08-13 | Gulf Oil Corporation | Method of preparation of polyimide acids |
US4687836A (en) * | 1984-10-15 | 1987-08-18 | Mitsui Toatsu Chemicals, Inc. | Polyimide adhesives, coats and prepreg |
-
1986
- 1986-05-03 DE DE19863615039 patent/DE3615039A1/de not_active Withdrawn
-
1987
- 1987-04-24 EP EP87106017A patent/EP0244715B1/de not_active Expired - Lifetime
- 1987-04-24 AT AT87106017T patent/ATE58744T1/de not_active IP Right Cessation
- 1987-04-24 DE DE8787106017T patent/DE3766409D1/de not_active Expired - Fee Related
- 1987-05-02 KR KR87004318A patent/KR960004118B1/ko not_active IP Right Cessation
- 1987-05-04 US US07/045,570 patent/US4871833A/en not_active Expired - Fee Related
- 1987-05-06 JP JP62109070A patent/JP2669420B2/ja not_active Expired - Lifetime
-
1992
- 1992-06-03 SG SG585/92A patent/SG58592G/en unknown
-
1993
- 1993-08-12 HK HK837/93A patent/HK83793A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
SG58592G (en) | 1992-07-24 |
JPS62295923A (ja) | 1987-12-23 |
JP2669420B2 (ja) | 1997-10-27 |
ATE58744T1 (de) | 1990-12-15 |
DE3766409D1 (de) | 1991-01-10 |
KR960004118B1 (en) | 1996-03-26 |
DE3615039A1 (de) | 1987-11-05 |
EP0244715B1 (de) | 1990-11-28 |
HK83793A (en) | 1993-08-20 |
US4871833A (en) | 1989-10-03 |
EP0244715A1 (de) | 1987-11-11 |
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A201 | Request for examination | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
LAPS | Lapse due to unpaid annual fee |