KR860008702A - 땜납 도금회로와 관통공을 갖는 인쇄회로판의 제조 방법 - Google Patents

땜납 도금회로와 관통공을 갖는 인쇄회로판의 제조 방법 Download PDF

Info

Publication number
KR860008702A
KR860008702A KR1019860003140A KR860003140A KR860008702A KR 860008702 A KR860008702 A KR 860008702A KR 1019860003140 A KR1019860003140 A KR 1019860003140A KR 860003140 A KR860003140 A KR 860003140A KR 860008702 A KR860008702 A KR 860008702A
Authority
KR
South Korea
Prior art keywords
photosensitive resin
conductive coating
parts
manufacturing
resin composition
Prior art date
Application number
KR1019860003140A
Other languages
English (en)
Other versions
KR930010060B1 (ko
Inventor
가쓰끼요 이시까와
가쓰끼요 이시가와
간지 니시지마
마모루 세이오
Original Assignee
닛뽄 페인트 가부시끼가이샤
스즈끼 마사오
닛뽄 페인트 가부시끼 가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 닛뽄 페인트 가부시끼가이샤, 스즈끼 마사오, 닛뽄 페인트 가부시끼 가이샤 filed Critical 닛뽄 페인트 가부시끼가이샤
Publication of KR860008702A publication Critical patent/KR860008702A/ko
Application granted granted Critical
Publication of KR930010060B1 publication Critical patent/KR930010060B1/ko

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/164Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061Etching masks
    • H05K3/062Etching masks consisting of metals or alloys or metallic inorganic compounds
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/108Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0786Using an aqueous solution, e.g. for cleaning or during drilling of holes
    • H05K2203/0793Aqueous alkaline solution, e.g. for cleaning or etching
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/13Moulding and encapsulation; Deposition techniques; Protective layers
    • H05K2203/1333Deposition techniques, e.g. coating
    • H05K2203/135Electrophoretic deposition of insulating material
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3457Solder materials or compositions; Methods of application thereof
    • H05K3/3473Plating of solder
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • H05K3/425Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern
    • H05K3/427Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern initial plating of through-holes in metal-clad substrates
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155Manufacturing circuit on or in base
    • Y10T29/49165Manufacturing circuit on or in base by forming conductive walled aperture in base

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)

Abstract

내용 없음

Description

땜납 도금회로와 관통공을 갖는 인쇄회로판의 제조 방법.
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1 내지 제6도는 본 발명 방법의 각 단계에서 취급되는 감광성 물질을 도시한 것이다.

Claims (9)

  1. 관통공을 포함하여 그의 표면이 전도성 피복으로 이미 피복된 다수의 관통공을 갖는 기판을 제공하는 단계와 전착수단에 의하여, 감광성수지 100중량부당 0.01 내지 5중량부의 양으로 킬레이트계를 함유하는 음이온성의 광숙성형 감광성수지 조성물로 상기 전도성피복상에 감광성 수지층을 형성시키는 단계와; 상기 감광성 수지층을 그 위에 위치한 회로패턴의 포지티브 마스크를 통하여 노출시키는 단계와, 알칼리 수용액이나 반수용액으로 비 노출영역으로부터 미숙성된 감광성 수지를 제거하고, 이에 의하여 도금내식막을 형성하고, 노출된 전도성 피복을 땜납도금하는 단계와, 노출된 영역에서 도금내식막을 제거하고, 마지막으로 부식시켜서 노출된 영역에 아직도 잔류하는 전도성 피복을 제거하는 단계로, 구성되는 것을 특징으로 하는 땜납도금회로와 관통공을 갖는 인쇄회로판의 제조방법.
  2. 제1항에 있어서, 킬레이트제가 아미노-폴리카르복실산 화합물인 것을 특징으로 하는 제조방법.
  3. 제1항에 있어서, 음이온성의 광숙성형 감광성수지 조성물 (a) 다음 일반식(Ⅰ)로 표시되는 불포화 화합물, (b) 기타 공중합성의 불포화 화합물과의 공중합체를 기제로하는 것을 특징으로 하는 제조방법.
    상기 식에서, n은 1 내지 3의 정수; R1은 수소나 메틸기; R2는 수소, 1 내지 5개 탄소원자의 알킬, 알콕시 또는 니트로기이다.
  4. 제1항에 있어서, 음이온성의 광숙성형 감광성수지 조성물이 수지 100중량부당 0.1 내지 20중량부의 양으로 가소제를 함유하는 것을 특징으로 하는, 제조방법.
  5. 제4항에 있어서, 가소제가 폴리알킬렌 글리콜 페닐에테르인 것을 특징으로 하는 제조방법.
  6. 관통공을 포함하여 그의 전표면을 전도성 피복으로 미리 피본시킨 다수의 상기 관통공을 갖는 기간을 마련하는 단계와, 전착수단에 의하여 상기 전도성 피복상에 양이온성의 광숙성형 감광성 수지 조성물로 감광성 수지츠을 형성하는 단계와, 상기 감광성층를 그위에 위치한 회로패턴의 포지티브마스크를 통하여 노출시키는 단계와, 상기 감광성층을 산성수용액이나 용제로 현상시킴으로써 비노출 영역으로부터 미성숙된 감광성 수지를 제거하고 도금 내식막을 형성하는 단계와, 노출된 전도성 피복을 땜납 도금하는 단계와, 노출된 영역의 도금내식막을 제거하고, 마지막으로 부식단계를 밟게하여 노출영역에 아직도 잔류하는 전도성 피복을 제거하는 단계로 구성되는 것을 특징으로 하는 땜납도금회로와 관통공을 갖는 인쇄회로판의 제조방법.
  7. 제6항에 있어서, 양이온성의 광숙성형 감광성수지 조성물 (a) 다음 일반식(Ⅰ)로 표시되는 불포화 화합물과, (b) 기타 공중합성 불포화 화합물과의 공중합체를 기제로 하는 것을 특징으로 하는 제조방법.
    상기 식에서, n은 1 내지 3의 정수; R1은 수소나 메틸기; R2는 수소, 탄소원자 1 내지 5개의 알킬, 알콕시 또는 니트로기이다.
  8. 제6항에 있어서, 양이온성의 광숙성형 감광성수지 100중량부당 0.1 내지 20중량부의 양으로 가소제를 함유하는 것을 특징으로 하는 제조방법.
  9. 제8항에 있어서, 가소제가 폴리알킬렌 글리콜 페닐에테르일 것을 특징으로 하는 제조방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019860003140A 1985-04-24 1986-04-23 땜납도금회로와 관통공을 갖는 인쇄회로판의 제조방법 KR930010060B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP60087997A JPS61247090A (ja) 1985-04-24 1985-04-24 半田スル−ホ−ルを有する回路板の製造方法
JP87997 1985-04-24
JP85-87997 1985-04-24

Publications (2)

Publication Number Publication Date
KR860008702A true KR860008702A (ko) 1986-11-17
KR930010060B1 KR930010060B1 (ko) 1993-10-14

Family

ID=13930433

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019860003140A KR930010060B1 (ko) 1985-04-24 1986-04-23 땜납도금회로와 관통공을 갖는 인쇄회로판의 제조방법

Country Status (5)

Country Link
US (1) US4671854A (ko)
EP (1) EP0204415B1 (ko)
JP (1) JPS61247090A (ko)
KR (1) KR930010060B1 (ko)
DE (2) DE204415T1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010039676A (ko) * 1999-06-24 2001-05-15 고오사이 아끼오 포지티브 내식막 조성물

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5648320A (en) * 1985-05-31 1997-07-15 Jacobs; Richard L. Method of manufacturing ceramic superconductor circuit board
US5119272A (en) * 1986-07-21 1992-06-02 Mitsumi Electric Co., Ltd. Circuit board and method of producing circuit board
JPS63224389A (ja) * 1987-03-13 1988-09-19 名幸電子工業株式会社 二重スル−ホ−ル付導体回路板及びその製造方法
JPS63246890A (ja) * 1987-04-02 1988-10-13 関西ペイント株式会社 プリント回路の形成方法
GB8712731D0 (en) * 1987-05-30 1987-07-01 Ciba Geigy Ag Metallic patterns
JPS6420694A (en) * 1987-07-15 1989-01-24 Kansai Paint Co Ltd Manufacture of printed wiring board
EP0302827B1 (en) * 1987-08-05 1994-07-06 Ciba-Geigy Ag Process for the formation of images
JPH01256193A (ja) * 1988-04-06 1989-10-12 Oki Densen Kk 小径スルーホール基板の製造方法
JPH0795577B2 (ja) * 1988-04-12 1995-10-11 富士プラント工業株式会社 リードフレームへの部分メッキ方法
CA1334897C (en) * 1988-08-02 1995-03-28 Mamoru Seio Electrodeposition coating composition and image-forming method using the same
JP2585070B2 (ja) * 1988-08-02 1997-02-26 日本ペイント株式会社 画像形成方法
GB8822145D0 (en) * 1988-09-21 1988-10-26 Ciba Geigy Ag Method
US5045435A (en) * 1988-11-25 1991-09-03 Armstrong World Industries, Inc. Water-borne, alkali-developable, photoresist coating compositions and their preparation
US5004672A (en) * 1989-07-10 1991-04-02 Shipley Company Inc. Electrophoretic method for applying photoresist to three dimensional circuit board substrate
US5071359A (en) * 1990-04-27 1991-12-10 Rogers Corporation Array connector
US5245751A (en) * 1990-04-27 1993-09-21 Circuit Components, Incorporated Array connector
JPH0476985A (ja) * 1990-07-18 1992-03-11 Cmk Corp プリント配線板の製造法
DE69130691T2 (de) * 1990-08-02 1999-07-22 Ppg Industries, Inc., Pittsburgh, Pa. Lichtempfindliche, elektroabscheidbare Photoresistzusammensetzung
US5268256A (en) * 1990-08-02 1993-12-07 Ppg Industries, Inc. Photoimageable electrodepositable photoresist composition for producing non-tacky films
JPH04146687A (ja) * 1990-10-08 1992-05-20 Nippon Paint Co Ltd ソルダーマスクされた回路基板の製法
US5403698A (en) * 1990-10-16 1995-04-04 Hitachi Chemical Company, Ltd. Negative type photosensitive electrodepositing resin composition
US5202222A (en) * 1991-03-01 1993-04-13 Shipley Company Inc. Selective and precise etching and plating of conductive substrates
CA2067709C (en) * 1991-06-05 1997-12-02 James A. Johnson Process for the manufacture of printed circuits using electrophoretically deposited organic resists
JPH0690014A (ja) * 1992-07-22 1994-03-29 Mitsubishi Electric Corp 薄型太陽電池及びその製造方法,エッチング方法及び自動エッチング装置,並びに半導体装置の製造方法
US6159658A (en) * 1996-03-19 2000-12-12 Toray Industries, Inc. Photosensitive resin composition with polymer having an ionic group and having a polymerizable group in the side chain and printing plate materials
US6653055B1 (en) * 1998-09-18 2003-11-25 Vantico, Inc. Method for producing etched circuits
MY139405A (en) * 1998-09-28 2009-09-30 Ibiden Co Ltd Printed circuit board and method for its production
GB2354636A (en) * 1999-09-25 2001-03-28 Ibm Mounting chips on substrates
DE10045072A1 (de) * 2000-09-12 2002-04-04 Epcos Ag Verfahren zur Herstellung einer elektrisch leitfähigen Struktur auf einer nichtplanen Oberfläche und Verwendung des Verfahrens
EP1209527A1 (en) * 2000-11-28 2002-05-29 Shipley Company LLC Photoresist composition
TWI269118B (en) * 2001-03-05 2006-12-21 Sumitomo Chemical Co Chemical amplifying type positive resist composition
WO2004014114A1 (ja) * 2002-07-31 2004-02-12 Sony Corporation 素子内蔵基板の製造方法および素子内蔵基板、ならびに、プリント配線板の製造方法およびプリント配線板
CN100518448C (zh) * 2005-11-22 2009-07-22 楠梓电子股份有限公司 电路板导通孔的制造方法
KR100797692B1 (ko) * 2006-06-20 2008-01-23 삼성전기주식회사 인쇄회로기판 및 그 제조방법
US8324511B1 (en) * 2010-04-06 2012-12-04 Amkor Technology, Inc. Through via nub reveal method and structure
WO2023148511A1 (en) * 2022-02-07 2023-08-10 Sun Chemical Corporation Water-based de-metallization resist

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1528489A (fr) * 1966-07-01 1968-06-07 Eastman Kodak Co Nouvelles compositions photosensibles utiles, notamment, pour la préparation de planches de reproduction photomécanique
JPS5239174A (en) * 1975-09-25 1977-03-26 Hitachi Ltd Method of producing printed circuit board
JPS52112770A (en) * 1976-03-19 1977-09-21 Hitachi Ltd Method of producing printed substrate
JPS55148491A (en) * 1979-05-09 1980-11-19 Meidensha Electric Mfg Co Ltd Method of fabricating printed circuit board
US4390615A (en) * 1979-11-05 1983-06-28 Courtney Robert W Coating compositions
US4325780A (en) * 1980-09-16 1982-04-20 Schulz Sr Robert M Method of making a printed circuit board
US4455364A (en) * 1981-11-14 1984-06-19 Konishiroku Photo Industry Co., Ltd. Process for forming metallic image, composite material for the same
JPS59202684A (ja) * 1983-05-04 1984-11-16 株式会社日立製作所 プリント基板の製造方法
US4487654A (en) * 1983-10-27 1984-12-11 Ael Microtel Limited Method of manufacturing printed wiring boards
US4601916A (en) * 1984-07-18 1986-07-22 Kollmorgen Technologies Corporation Process for bonding metals to electrophoretically deposited resin coatings

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010039676A (ko) * 1999-06-24 2001-05-15 고오사이 아끼오 포지티브 내식막 조성물

Also Published As

Publication number Publication date
KR930010060B1 (ko) 1993-10-14
US4671854A (en) 1987-06-09
EP0204415A2 (en) 1986-12-10
JPS61247090A (ja) 1986-11-04
DE204415T1 (de) 1987-04-09
DE3676744D1 (de) 1991-02-14
EP0204415B1 (en) 1991-01-09
EP0204415A3 (en) 1987-10-28

Similar Documents

Publication Publication Date Title
KR860008702A (ko) 땜납 도금회로와 관통공을 갖는 인쇄회로판의 제조 방법
US4751172A (en) Process for forming metal images
KR860007860A (ko) 회로판의 제조방법
US5158860A (en) Selective metallization process
CA1136472A (en) Photoresist formulations containing a n-substituted benzotriazole adhesion promoter
US4009033A (en) High speed positive photoresist composition
KR900005850B1 (ko) 포지티브형(型) 포토레지스트 조성물용(用) 현상액
CA1177373A (en) Stripping compositions and methods of stripping resists
JP2994556B2 (ja) ホトレジスト剥離方法
EP0407951A2 (en) Method for applying a photoresist to a 3-D conductive substrate
KR950007339B1 (ko) 안정화 콜린 염기 용액
KR860003753A (ko) 동스로우호올프린트 배선판의 제조방법
EP0029901A1 (en) Lithographic resist composition for use in a method of forming a film on a substrate
KR19980071603A (ko) 네가형 포토레지스트용 박리액 조성물
DE69300317T2 (de) Photolackentschichtungsverfahren.
TW353159B (en) Method of developing positive photoresist and compositions therefor
KR880013042A (ko) 수성 현상성, 방사선-경화성 조성물
ATE242590T1 (de) Verfahren zur herstellung von geätzten schaltungen
US3287191A (en) Etching of printed circuit components
KR940005202A (ko) 인쇄 배선기판의 제조방법
US5275694A (en) Process for production of copper through-hole printed wiring boards
JPS616827A (ja) フオトレジストのストリツパー
KR880002416A (ko) 인쇄 회로 기판의 제조방법
US4931103A (en) Tricholine phosphate surface treating agent
JPH0783170B2 (ja) 配線板及びその製造法

Legal Events

Date Code Title Description
A201 Request for examination
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 19970830

Year of fee payment: 5

LAPS Lapse due to unpaid annual fee