KR860004368A - 패턴 발생 장치 - Google Patents
패턴 발생 장치 Download PDFInfo
- Publication number
- KR860004368A KR860004368A KR1019850007653A KR850007653A KR860004368A KR 860004368 A KR860004368 A KR 860004368A KR 1019850007653 A KR1019850007653 A KR 1019850007653A KR 850007653 A KR850007653 A KR 850007653A KR 860004368 A KR860004368 A KR 860004368A
- Authority
- KR
- South Korea
- Prior art keywords
- pattern
- generator
- patterns
- data
- pattern generator
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2801—Testing of printed circuits, backplanes, motherboards, hybrid circuits or carriers for multichip packages [MCP]
- G01R31/281—Specific types of tests or tests for a specific type of fault, e.g. thermal mapping, shorts testing
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Image Processing (AREA)
- Image Analysis (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도에서 제3도까지는, 본 발명의 제1의 특징을 설명하기 위한 도면.
제1도는, 패턴 검사 장치의 제1의 전체구성을 도시한 도면.
제2도는, 전형적인 프린트 기판의 패턴의 도면.
제3도는 프린트 기판의 패턴을 묘화하는 방법을 설명하기 위한 도면.
Claims (3)
- 여러 종류의 패턴을 기억하는 메모리 제12도 28이 상기 패턴의 좌표 및 그 패턴을 구성하는 패턴 요소의 종결을 표시하는 패턴 코오드를 그 패턴의 발생순으로 나란히 늘어놓는 것으로 된 도형 데이터와, 제4도, 제6도, 제12도와, 사익 도형 데이터를 입력하여 상기 패턴 코오드에 따라서 패턴 요소 발생부 제12도, 25,26,27, 제14도, 제16도, 제18도의 일부를 기동시키는 패턴 발생부 선택회로 제12도, 24와, 상기 도형 데이터에서 지시되는 순서로 상기 패턴 요소를 상기 좌표 위치에 따라서 발생시키는 패턴요소 발생부 제12도 25,26,27, 제14도, 제16도, 제18도와 외부에서 주어지는 주사 신호에 동기해서 상기 패턴요소 발생부에서 발생한 패턴 요소의 논리화를 취하는 라스터 변환부 제12도, 29,30,31,32으로 되는 패턴 발생장치
- 특허청구의 범위 제1항의 패턴 발생 장치에 있어서, 상기 패턴 요소 발생부는 원호 패턴 발생부(제2도, 27, 제18도), 애페추어 패턴 발생부(제12도 25, 제14도) 및 장방형 패턴 발생부(제12도 26, 제16도)로 되며, 그 패턴의 좌표 위치에 대응하는 데이터만을 입력하는 것을 특징으로 하는 패턴 발생장치.
- ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59-228983 | 1984-11-01 | ||
JP59228983A JPS61108134A (ja) | 1984-11-01 | 1984-11-01 | マスク検査装置 |
JP60082384A JPS61241996A (ja) | 1985-04-19 | 1985-04-19 | パタ−ン発生方法 |
JP60-82384 | 1985-04-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR860004368A true KR860004368A (ko) | 1986-06-20 |
KR900001976B1 KR900001976B1 (ko) | 1990-03-30 |
Family
ID=26423416
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019850007653A KR900001976B1 (ko) | 1984-11-01 | 1985-10-17 | 다수 개의 패턴 발생기를 포함하는 패턴 검사 장치 |
Country Status (2)
Country | Link |
---|---|
US (1) | US4744047A (ko) |
KR (1) | KR900001976B1 (ko) |
Families Citing this family (41)
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DE3752280T2 (de) * | 1986-07-30 | 2000-02-03 | Hitachi Ltd | Mustergenerator |
US4949390A (en) * | 1987-04-16 | 1990-08-14 | Applied Vision Systems, Inc. | Interconnect verification using serial neighborhood processors |
GB2204216B (en) * | 1987-04-30 | 1991-02-06 | Ibm | Curve generation in a display system |
US4974175A (en) * | 1987-06-19 | 1990-11-27 | Hitachi, Ltd. | Drawing information processing method and apparatus |
US4985855A (en) * | 1987-08-24 | 1991-01-15 | International Business Machines Corp. | Method for producing installation instructions for three dimensional assemblies |
JPS6488881A (en) * | 1987-08-24 | 1989-04-03 | Ibm | Generation of assembling screen |
US4989255A (en) * | 1988-03-25 | 1991-01-29 | Texas Instruments Incorporated | Expansion of compact database for pattern inspector or writer |
US5018210A (en) * | 1988-03-25 | 1991-05-21 | Texas Instruments Incorporated | Pattern comparator with substage illumination and polygonal data representation |
US4979223A (en) * | 1988-03-25 | 1990-12-18 | Texas Instruments Incorporated | Data handling system for pattern inspector or writer |
US4985927A (en) * | 1988-03-25 | 1991-01-15 | Texas Instruments Incorporated | Method of detecting and reviewing pattern defects |
JP2954223B2 (ja) * | 1988-11-08 | 1999-09-27 | 富士通株式会社 | 半導体装置の製造方法 |
US5197105A (en) * | 1990-05-30 | 1993-03-23 | Dainippon Screen Mfg. Co. Ltd. | Method of reading optical image of inspected surface and image reading system employabale therein |
JP2501726B2 (ja) * | 1991-10-08 | 1996-05-29 | インターナショナル・ビジネス・マシーンズ・コーポレイション | コンピュ―タ・イメ―ジ生成装置及びデ―タ減縮方法 |
JPH05119122A (ja) * | 1991-10-25 | 1993-05-18 | Fujitsu Ltd | スキヤン回路のテストパターン生成方法 |
JP2757647B2 (ja) * | 1992-01-27 | 1998-05-25 | 日本電気株式会社 | メッキ膜厚均一化方式 |
US5481472A (en) * | 1993-05-18 | 1996-01-02 | International Business Machines Corporation | Method and apparatus for automatically recognizing repeated shapes for data compaction |
GB2300287B (en) * | 1995-04-27 | 2000-04-26 | Canon Kk | Method and apparatus for processing finite element meshing model |
US5844809A (en) * | 1995-07-28 | 1998-12-01 | Kabushiki Kaisha Toshiba | Method and apparatus for generating two-dimensional circuit pattern |
JPH1140482A (ja) * | 1997-07-22 | 1999-02-12 | Nec Corp | 荷電粒子ビーム直描データ作成方法および描画方法 |
US5990540A (en) * | 1997-12-15 | 1999-11-23 | Kabushiki Kaisha Toshiba | Semiconductor device and method for manufacturing the same |
US6251550B1 (en) | 1998-07-10 | 2001-06-26 | Ball Semiconductor, Inc. | Maskless photolithography system that digitally shifts mask data responsive to alignment data |
US6529262B1 (en) | 1999-04-14 | 2003-03-04 | Ball Semiconductor, Inc. | System and method for performing lithography on a substrate |
US6507944B1 (en) * | 1999-07-30 | 2003-01-14 | Fujitsu Limited | Data processing method and apparatus, reticle mask, exposing method and apparatus, and recording medium |
US6379867B1 (en) | 2000-01-10 | 2002-04-30 | Ball Semiconductor, Inc. | Moving exposure system and method for maskless lithography system |
US6425669B1 (en) | 2000-05-24 | 2002-07-30 | Ball Semiconductor, Inc. | Maskless exposure system |
US6509955B2 (en) | 2000-05-25 | 2003-01-21 | Ball Semiconductor, Inc. | Lens system for maskless photolithography |
US6493867B1 (en) | 2000-08-08 | 2002-12-10 | Ball Semiconductor, Inc. | Digital photolithography system for making smooth diagonal components |
US6537738B1 (en) | 2000-08-08 | 2003-03-25 | Ball Semiconductor, Inc. | System and method for making smooth diagonal components with a digital photolithography system |
US6512625B2 (en) | 2000-11-22 | 2003-01-28 | Ball Semiconductor, Inc. | Light modulation device and system |
US6473237B2 (en) | 2000-11-14 | 2002-10-29 | Ball Semiconductor, Inc. | Point array maskless lithography |
US6965387B2 (en) | 2001-08-03 | 2005-11-15 | Ball Semiconductor, Inc. | Real time data conversion for a digital display |
JP2003249591A (ja) * | 2002-02-26 | 2003-09-05 | Nec Electronics Corp | エリアio型半導体装置の配線基板の設計方法 |
US6870604B2 (en) * | 2002-04-23 | 2005-03-22 | Ball Semiconductor, Inc. | High resolution point array |
US7164961B2 (en) * | 2002-06-14 | 2007-01-16 | Disco Corporation | Modified photolithography movement system |
US20050289488A1 (en) * | 2004-06-29 | 2005-12-29 | I-Ju Chou | System and method for mask defect detection |
US20060051687A1 (en) * | 2004-09-07 | 2006-03-09 | Takema Ito | Inspection system and inspection method for pattern profile |
JP4588421B2 (ja) * | 2004-11-29 | 2010-12-01 | 富士通株式会社 | テストパターン生成装置、回路設計装置、テストパターン生成方法、回路設計方法、テストパターン生成プログラム、回路設計プログラム |
US7289926B2 (en) * | 2005-06-28 | 2007-10-30 | International Business Machines Corporation | System and method for examining high-frequency clock-masking signal patterns at full speed |
TW200721924A (en) * | 2005-11-23 | 2007-06-01 | Inventec Corp | Arc-like winding system and method |
US7932993B2 (en) * | 2006-09-16 | 2011-04-26 | Wenhui Mei | Divided sub-image array scanning and exposing system |
KR101610148B1 (ko) * | 2014-11-17 | 2016-04-08 | 현대자동차 주식회사 | 차체 검사 시스템 및 방법 |
Family Cites Families (10)
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---|---|---|---|---|
US4013832A (en) * | 1975-07-28 | 1977-03-22 | Mcdonnell Douglas Corporation | Solid state image modulator |
JPS57180128A (en) * | 1981-04-30 | 1982-11-06 | Toshiba Corp | Equipment for electron beam exposure |
US4584573A (en) * | 1981-07-20 | 1986-04-22 | Sharp Kabushiki Kaisha | Combined character and background pattern print control system |
US4498079A (en) * | 1981-08-20 | 1985-02-05 | Bally Manufacturing Corporation | Prioritized overlay of foreground objects line buffer system for a video display system |
JPS58201185A (ja) * | 1982-05-19 | 1983-11-22 | Toshiba Corp | 位置検出装置 |
GB2130854B (en) * | 1982-10-10 | 1986-12-10 | Singer Co | Display system |
US4620288A (en) * | 1983-10-26 | 1986-10-28 | American Semiconductor Equipment Technologies | Data handling system for a pattern generator |
JPH061370B2 (ja) * | 1983-11-24 | 1994-01-05 | 株式会社東芝 | マスク欠陥検査装置 |
US4639919A (en) * | 1983-12-19 | 1987-01-27 | International Business Machines Corporation | Distributed pattern generator |
US4641255A (en) * | 1985-05-22 | 1987-02-03 | Honeywell Gmbh | Apparatus for simulation of visual fields of view |
-
1985
- 1985-10-17 KR KR1019850007653A patent/KR900001976B1/ko not_active IP Right Cessation
- 1985-10-31 US US06/793,219 patent/US4744047A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US4744047A (en) | 1988-05-10 |
KR900001976B1 (ko) | 1990-03-30 |
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