KR860000063A - 모발용 화장료(化粧料) 및 그의 제조방법 - Google Patents

모발용 화장료(化粧料) 및 그의 제조방법 Download PDF

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KR860000063A
KR860000063A KR1019850004564A KR850004564A KR860000063A KR 860000063 A KR860000063 A KR 860000063A KR 1019850004564 A KR1019850004564 A KR 1019850004564A KR 850004564 A KR850004564 A KR 850004564A KR 860000063 A KR860000063 A KR 860000063A
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도오루 오오노 (외 1)
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고바야시 아쯔시
라이온 주식회사
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Abstract

내용 없음

Description

모발용 화장료(化粧料) 및 그의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (25)

  1. (a) 에탄올을 포함하는 용매; (b) 홀수 탄소원자를 갖는 직쇄의 고급지방족 카르복실산, 홀수탄소원자를 갖는 직쇄의 고급 지방족 카르복실산의 유도체, 홀수 탄소원자를 갖는 직쇄의 고급 지방족 알코올 및 홀수 탄소원자를 갖는 직쇄의 고급지방족 알코올의 유도체를 포함하는 군으로부터 선택된 최소한 하나의 화합물인 육모성분; 및 (c) 10이하의 HLB값을 갖는 비이온성 계면활성제를 함유하는 용액형태의 조성물.
  2. 제1항에 있어서, 상술한 육모성분이 하기의 일반식들로 나타내지는 기를 함유하는 화합물군으로부터 선택된 최소한 하나의 화합물인 조성물.
    (식중 R1은 8이상의 짝수 탄소원자를 갖는 직쇄 지방족기를 나타낸다),(식중 R2는 7이상의 홀수 탄소원자를 갖는 직쇄지방족기를 나타낸다), 또는 R3-O-(R3은 9이상의 홀수 탄소원자를 갖는 직쇄지방족기를 나타낸다).
  3. 제2항에 있어서, 상술한 육모성분이 하기의 일반식들로 나타내지는 것으로부터 선택된 최소한 하나의 화합물인 조성물.
    [상기식중, R1은 상기에서 정의한 바와 동일하고, X1은 -0- 또는(식중 R4는 수소 또는 유기성기를 나타낸다)를 나타내고, Y1은 수소, 유기성기 또는 무기성기를 나타낸다.]
    [상기식중, R2는 상기에서 정의한 바와 동일하고, X2및 X2'는 각각 -0- 또는(식중 R5는 수소 또는 유기성기를 나타낸다)를 나타내고, Y2및 Y2'는 각각 수소, 유기성기 또는 무기성기를 나타낸다] 또는 R3-O-Y3(상기식중, R3는 상기에서 정의한 바와 동일하고 Y3은 수소, 유기성기 또는 무기성기를 나타낸다).
  4. 제3항에 있어서, X1이 -0-를 나타내고, Y1이 수소를 나타내며, R1이 데실, 도데실, 테트라데실 또는 헥사데실을 나타내는 조성물.
  5. 제3항에 있어서, X1이 -0-를 나타내고 Y1
    (식중 Y4및 Y5는 각각 수소, 유기성기 또는 무기성기를 나타낸다)를 나타내는 조성물.
  6. 제5항에 있어서, Y4및 Y5중 최소한 하나가(식중 R1은 상기에서 정의한 바와 동일하다)를 나타내는 조성물.
  7. 제5항에 있어서, Y4가 직쇄지방족기를 나타내고 Y5[식중 L1은 O-또는 O-L4(식중 L2는 콜린잔기, 에탄올아민잔기, 세린잔기 또는 이노시톨잔기를 나타낸다)를 나타낸다]를 나타내는 조성물.
  8. 8. 제3항에 있어서, X1이 -0-를 나타내고 Y1이,
    (식중 Y6및 Y7는 각각 수소, 유기성기 및 무기성기를 나타낸다)를 나타내는 조성물.
  9. 제8항에 있어서, Y6이 직쇄 지방족기를 나타내고 Y7[식중, L3은 O-또는 O-L4(식중 L4는 콜린잔기, 에탄올아민 잔기, 세린잔기 또는 이느시톨 잔기를 나타낸다)를 나타낸다]를 나타내는 조성물.
  10. 제3항에 있어서, X1이 -0-를 나타내고 Y1이 알칼리금속 또는(식중, R1은 상기에서 정의한 바와 동일하고, M는 금속이고 n는 금속M의 원자가를 나타낸다)를 나타내는 조성물.
  11. 제3항에 있어서, X1이 -0-를 나타내고, Y1이 일차 또는 이차 알코올의 잔기, 에탄올아민의 잔기, 폴리옥시에틸렌잔기, 소르비탄잔기 또는 수크로오스 잔기를 나타내는 조성물.
  12. 제3항에 있어서, X1이 -0-이고 Y1이 스테로이드 골격을 갖는 유기성 기인 조성물.
  13. 제3항에 있어서, X1이고 Y1(식중 R5는 유기성기를 나타낸다)를 나타내는 조성물.
  14. 제13항에 있어서, R4(식중 R6은 유기성기를 나타낸다)를 나타내는 조성물.
  15. 제3항에 있어서, X1은 -NH-를 나타내고, Y1(식중 Z는 당잔기, 포스페이트 잔기, 콜린잔기 또는 에탄올아민 잔기를 나타낸다)를 나타내는 조성물.
  16. 제3항에 있어서, X2및 X2'가 각각 -0-를 나타내고 Y2및 Y2'가 각각 수소를 나타내는 조성물.
  17. 제3항에 있어서, Y3(식중 Y8은 카르복실산 잔기 또는 무기산잔기를 나타낸다)을 나타내는 조성물.
  18. 제17항에 있어서, Y8이 2-24 탄소원자를 갖는 지방산, 숙신산, 푸마르산, 락트산, 피루브산, 말산 또는 옥살로 아세트산의 잔기를 나타내고 상술한 무기산 잔기가 인산잔기인 조성물.
  19. 제3항에 있어서, Y3이 일차 또는 이차 알코올의 잔기 또는 당 잔기를 나타내는 조성물.
  20. 제19항에 있어서, Y3이 2~24 탄소원자를 갖는 일차알코올, 글리세린, 폴리그리세린, 에틸렌글리콜, 프로필렌글리콜, 부탄디올, 글루코오스, 리보오스, 갈락토오스, 아라비노오스, 만노오스, 크실로오스, 소리비톨 또는 만니톨의 잔기를 나타내는 조성물.
  21. 제1항에 있어서, 상술한 육모성분의 양이 0.1~10중량% 범위내인 조성물.
  22. 제1항에 있어서, 상술한 계면활성제가 소르비탄의 지방산에스테르, 폴리옥시에틸렌소리비탄에테르의 지방산에스테르, 폴리옥시에틸렌소르비트에테르의 지방산에스테르, 풀리옥시에틸렌-경화피마자유, 폴리옥시에틸렌-경화 피마자유의 지방산에스테르, 폴리글리세린에테르의 지방산에스테르, 고급알코올의 N-(긴 사슬 아실)-L-글루탐산디에스테르, 폴리옥시에틸렌고급알코올 에스테르의 N-(긴 사슬 아실)-L-글루탐산 디에스테르를 포함하는 군으로부터 선택된 것인 조성물.
  23. 제1항에 있어서, 상술한 계면활성제의 양이 0.1~10중량% 범위내인 조성물.
  24. 제1항에 있어서, 상술한 용매가 50~95중량%의 에탄올을 함유하는 에탄올 수용액인 조성물.
  25. (a) 에탄올을 포함하는 용매; (b) 홀수 탄소원자를 갖는 직쇄의 고급지방족 카르복실산, 홀수 탄소원자를 갖는 직쇄의 고급 지방족 카르복실산의 유도체, 홀수 탄소원자를 갖는 직쇄의 고급지방족 알코올 및 홀수 탄소원자를 직쇄의 고급 지방족 알코올의 유도체를 포함하는 군으로부터 선택된 최소한 하나의 화합물은 육모성분; 및 (c) 10 이하의 HLB 값을 갖는 비이온성 계면활성제를 혼합함을 특징으로하는 액체모발용 화장료의 제조방법.
    ※ 참고사항 : 최초출원내용에 의하여 공개하는 것임.
KR1019850004564A 1984-06-29 1985-06-26 모발용 화장료(化粧料) 및 그의 제조방법 KR930000042B1 (ko)

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JP59134792A JPS6115815A (ja) 1984-06-29 1984-06-29 毛髪用化粧料
JP59-134792 1984-06-29

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KR860000063A true KR860000063A (ko) 1986-01-25
KR930000042B1 KR930000042B1 (ko) 1993-01-06

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FR2740331B1 (fr) * 1995-10-25 1997-12-19 Sederma Sa Nouvelles compositions cosmetiques pour le traitement des cheveux et du cuir chevelu
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JPWO2006064829A1 (ja) * 2004-12-16 2008-06-12 ライオン株式会社 毛髪化粧料
JP6479487B2 (ja) * 2015-01-19 2019-03-06 サンスター株式会社 化粧料組成物

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US4745103A (en) 1988-05-17
DE3522853C2 (de) 2001-11-08
JPS6115815A (ja) 1986-01-23
DE3522853A1 (de) 1986-01-02
JPH0237886B2 (ko) 1990-08-28
KR930000042B1 (ko) 1993-01-06

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