KR850007987A - 박막 제조 방법 - Google Patents

박막 제조 방법 Download PDF

Info

Publication number
KR850007987A
KR850007987A KR1019850002947A KR850002947A KR850007987A KR 850007987 A KR850007987 A KR 850007987A KR 1019850002947 A KR1019850002947 A KR 1019850002947A KR 850002947 A KR850002947 A KR 850002947A KR 850007987 A KR850007987 A KR 850007987A
Authority
KR
South Korea
Prior art keywords
metal
thin film
vapor
gas
film manufacturing
Prior art date
Application number
KR1019850002947A
Other languages
English (en)
Other versions
KR900009101B1 (ko
Inventor
마사시 가사야 (외 1)
Original Assignee
모찌즈끼 가즈시게
지이제루 기기 가부시기 가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 모찌즈끼 가즈시게, 지이제루 기기 가부시기 가이샤 filed Critical 모찌즈끼 가즈시게
Publication of KR850007987A publication Critical patent/KR850007987A/ko
Application granted granted Critical
Publication of KR900009101B1 publication Critical patent/KR900009101B1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/027—Graded interfaces

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Fuel-Injection Apparatus (AREA)

Abstract

내용 없음

Description

박막 제조 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 밸브의 절연막을 본 발명의 제조방법에 따라 마련한 연료분사밸브의 한 실시예를 로여주는 단면도.
제2도는 제1도에 나타낸 밸브표면의 박막의 조성구조를 보여주는 그래프.
제3도는 제1도에 나타낸 박막을 형성하기 위한 이온 플레이팅장치의 구성도.
도면의 주요 부분의 부호의 설명
1 : 연료분사밸브, 2 : 노즐호울더, 3 : 중간플레이트, 4 : 노즐, 5 : 리테이닝너트, 6 : 노즐보디, 7 : 안내구멍, 8 : 니이들밸브, 9 : 원추체, 10 : 밸브시이트, 11 : 챔버, 12 : 연료통로, 13 : 가압핀, 14 : 스프링시이트, 15 : 스프링챔버, 16 : 가압코일스프링, 17 : 절연슬리이브, 18 : 전극, 19 : 원판부, 20 : 견부, 21 : 구멍, 22,23,24 : 부호, 26 : 박막, 31 : 진공용기, 32 : 직류고전압원, 33 : 분할판, 34 : 증발원, 35 : 전자총, 36 : 진공펌프, 37,39 : 콕크, 38,40 : 봄베

Claims (1)

  1. 필요로 하는 피코오팅제의 표면상에 증착법에 따라 박막을 마련하도록 한 박막제조 방법에 있어서 필요로 하는 금속의 증기와 이 금속과 반응하여 필요로 하는 금속의 증기와 그 금속과 반응하여 필요로 하는 화합물을 형성하는 가스와를 전기한 피코오팅제가 배치되어 있는 반응실내에서 최소한 일부를 이온화하고 코오팅재에 주어져 있는 일정한 전위에 의하여 이온화되어 있는 금속 또는 금속과 가스와의 화합물을 피코오팅재에 침착시킬 때에 금속의 증기분압과 가스분압과의 비가 서서히 변화하도록 한 것을 특징으로 하는 박막 제조방법 .
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019850002947A 1984-05-04 1985-05-01 박막 제조방법 KR900009101B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP84-88474 1984-05-04
JP59-88474 1984-05-04
JP59088474A JPS60234965A (ja) 1984-05-04 1984-05-04 薄膜製造方法

Publications (2)

Publication Number Publication Date
KR850007987A true KR850007987A (ko) 1985-12-11
KR900009101B1 KR900009101B1 (ko) 1990-12-22

Family

ID=13943770

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019850002947A KR900009101B1 (ko) 1984-05-04 1985-05-01 박막 제조방법

Country Status (4)

Country Link
JP (1) JPS60234965A (ko)
KR (1) KR900009101B1 (ko)
DE (1) DE3515807A1 (ko)
GB (1) GB2158104A (ko)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8508338D0 (en) * 1985-03-29 1985-05-09 British Aerospace Application of stop-off coating
JPS6222314A (ja) * 1985-07-22 1987-01-30 株式会社ボッシュオートモーティブ　システム 薄膜製造方法
CH669347A5 (ko) * 1986-05-28 1989-03-15 Vni Instrument Inst
US5021365A (en) * 1986-06-16 1991-06-04 International Business Machines Corporation Compound semiconductor interface control using cationic ingredient oxide to prevent fermi level pinning
KR920002168B1 (ko) * 1986-09-25 1992-03-19 유니온 카바이드 코포레이션 질화지르코늄 피복제품과 그 제조방법
JP2524179B2 (ja) * 1987-12-22 1996-08-14 セイコーエプソン株式会社 スパッタ成膜法
US4859253A (en) * 1988-07-20 1989-08-22 International Business Machines Corporation Method for passivating a compound semiconductor surface and device having improved semiconductor-insulator interface
USRE34173E (en) * 1988-10-11 1993-02-02 Midwest Research Technologies, Inc. Multi-layer wear resistant coatings
US4904542A (en) * 1988-10-11 1990-02-27 Midwest Research Technologies, Inc. Multi-layer wear resistant coatings
GB9005321D0 (en) * 1990-03-09 1990-05-02 Matthews Allan Modulated structure composites produced by vapour disposition
JPH04368A (ja) * 1990-04-17 1992-01-06 Riken Corp 耐摩耗性被膜及びその製造法
DE59309018D1 (de) * 1992-07-02 1998-11-05 Balzers Hochvakuum Verfahren zur Herstellung einer Metalloxidschicht, Vakuumbehandlungsanlage hierfür sowie mit mindestens einer Metalloxidschicht beschichteter Teil
US5587227A (en) * 1994-10-27 1996-12-24 Kabushiki Kaisha Riken Coating of chromium and nitrogen having good wear resistance properties
US5672386A (en) * 1994-10-27 1997-09-30 Kabushiki Kaisha Riken Process for forming a coating of chromium and nitrogen having good wear resistance properties
JP5090251B2 (ja) * 2008-05-21 2012-12-05 オーエスジー株式会社 硬質被膜および硬質被膜被覆工具
JP5441822B2 (ja) * 2010-06-08 2014-03-12 シチズンホールディングス株式会社 硬質装飾部材

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1335065A (en) * 1970-06-22 1973-10-24 Optical Coating Laboratory Inc Coated plastics articles and methods of manufacture thereof
US3823995A (en) * 1972-03-30 1974-07-16 Corning Glass Works Method of forming light focusing fiber waveguide
US3791852A (en) * 1972-06-16 1974-02-12 Univ California High rate deposition of carbides by activated reactive evaporation
US3900592A (en) * 1973-07-25 1975-08-19 Airco Inc Method for coating a substrate to provide a titanium or zirconium nitride or carbide deposit having a hardness gradient which increases outwardly from the substrate
JPS5621068B2 (ko) * 1974-12-25 1981-05-16
DE2605174B2 (de) * 1976-02-10 1978-07-27 Resista Fabrik Elektrischer Widerstaende Gmbh, 8300 Landshut Verfahren zur Herstellung von Dünnschicht-Widerstandselementen
DE2705225C2 (de) * 1976-06-07 1983-03-24 Nobuo Tokyo Nishida Ornamentteil für Uhren usw.
JPS5625960A (en) * 1979-08-09 1981-03-12 Mitsubishi Metal Corp Surface-coated high speed steel material for cutting tool
JPS5779169A (en) * 1980-11-06 1982-05-18 Sumitomo Electric Ind Ltd Physical vapor deposition method
DE3507927A1 (de) * 1985-03-06 1986-09-11 Dr.Ing.H.C. F. Porsche Ag, 7000 Stuttgart Verfahren und handgeraet zum halbmechanischen verzinken von blechoberflaechen

Also Published As

Publication number Publication date
JPS60234965A (ja) 1985-11-21
GB8510576D0 (en) 1985-05-30
DE3515807A1 (de) 1985-11-07
GB2158104A (en) 1985-11-06
JPH0237426B2 (ko) 1990-08-24
KR900009101B1 (ko) 1990-12-22

Similar Documents

Publication Publication Date Title
KR850007987A (ko) 박막 제조 방법
US5078848A (en) Procedure and apparatus for the coating of materials by means of a pulsating plasma beam
US4254159A (en) Method of producing gold-color coatings
US6078133A (en) Field emission device having an amorphous multi-layered structure
EP0818622B1 (en) Using a coated fuel injector and method of making
US4415421A (en) Process for manufacturing ornamental parts and ion plating apparatus to be used therefor
DE3787705D1 (de) Vorrichtung und Verfahren zum Auftragen von Dünnschichtüberzügen im Vacuum.
US3192892A (en) Ion bombardment cleaning and coating apparatus
GB2138449A (en) Method for pure ion plating using magnetic fields
KR900001052A (ko) 마이크로 일렉트로닉 필드 이오나이저와 그 제조방법
DE3027404A1 (de) Verfahren zur herstellung goldfarbener ueberzuege
DE3624467A1 (de) Verfahren zum herstellen transparenter schutzschichten aus siliziumverbindungen
KR970021367A (ko) 플라즈마 화학 기상 성장법에 의해 비결정 탄소 박막을 형성하기 위한 방법 및 장치
GB1160895A (en) Coating Surfaces by Vapour Deposition
KR900008966B1 (ko) 밸브 장치
KR920000590B1 (ko) 박막 제조방법
GB1341759A (en) Film deposition
JPH0372067A (ja) 複数の蒸発ルツボを備えたアーク放電型蒸発器
GB1153363A (en) Method of Coating.
GB2028575A (en) Ion sources
DE2624005A1 (de) Verfahren zum aufbringen von duennen schichten nach dem ion-plating- verfahren und vorrichtung dazu
JPS57141025A (en) Production for magnetic recording medium
GB889018A (en) Improvements relating to the stabilisation of low pressure d.c. arc discharges
JPH044354Y2 (ko)
JPS6425972A (en) Ion plating device

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
LAPS Lapse due to unpaid annual fee