KR840007316A - 광기전력 장치 - Google Patents
광기전력 장치 Download PDFInfo
- Publication number
- KR840007316A KR840007316A KR1019830005865A KR830005865A KR840007316A KR 840007316 A KR840007316 A KR 840007316A KR 1019830005865 A KR1019830005865 A KR 1019830005865A KR 830005865 A KR830005865 A KR 830005865A KR 840007316 A KR840007316 A KR 840007316A
- Authority
- KR
- South Korea
- Prior art keywords
- photovoltaic device
- layer
- light incident
- group
- incident side
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 claims 8
- 229910044991 metal oxide Inorganic materials 0.000 claims 6
- 150000004706 metal oxides Chemical class 0.000 claims 6
- 229910052757 nitrogen Inorganic materials 0.000 claims 5
- 230000003287 optical effect Effects 0.000 claims 4
- 150000001875 compounds Chemical class 0.000 claims 3
- 229910052732 germanium Inorganic materials 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 229910052710 silicon Inorganic materials 0.000 claims 3
- 229910052718 tin Inorganic materials 0.000 claims 3
- 229910006404 SnO 2 Inorganic materials 0.000 claims 2
- 229910021417 amorphous silicon Inorganic materials 0.000 claims 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims 2
- 229910052709 silver Inorganic materials 0.000 claims 2
- 239000004215 Carbon black (E152) Substances 0.000 claims 1
- 229910017875 a-SiN Inorganic materials 0.000 claims 1
- -1 carbohydrate fluoride Chemical class 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 238000000354 decomposition reaction Methods 0.000 claims 1
- 230000007423 decrease Effects 0.000 claims 1
- 229930195733 hydrocarbon Natural products 0.000 claims 1
- 150000002430 hydrocarbons Chemical class 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 238000002834 transmittance Methods 0.000 claims 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/054—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means
- H01L31/056—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means the light-reflecting means being of the back surface reflector [BSR] type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PIN type, e.g. amorphous silicon PIN solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Photovoltaic Devices (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (16)
- 전극/PIN/전극의 구조를 갖는 PIN접합형 광기전력 장치에 있어서, 광입사측의 반대쪽에 위치한 P도는 N층은 약 1.8eV이상의 광학적 밴드 갭과 20℃에서 약 10-8(Ω.cm)-1이상의 암전도도를 갖는 반도체인 것을 특징으로 하는 광기전력 장치.
- 제1항에 있어서, 광입사측의 반대쪽에 위치한 이면 전극의 반사율이 70%이상인 것을 특징으로 하는 광기전력 장치.
- 제2항에 있어서, 상기 이면 전극은 Ag, A1, Ti―Ag, Ni 및 Cr등으로 구성되는 그룹에서 선택된 금속인 것을 특징으로 하는 광기전력 장치.
- 제1항에 있어서, 이면 전극과 반도체 사이에 금속산화물이 삽입되는 것을 특징으로 하는 광기전력 장치.
- 제4항에 있어서, 상기 금속 산화물의 광투과율은 약 80%이상인 것을 특징으로 하는 광기전력 장치.
- 제4항에 있어서, 상기 금속 산화물은 SnO2, In2O3, In2O3+SnO2로 구성되는 그룹에서 ; 선택된 도전성 금속 산화물의 층이거나 최소한 두 개 이상의 상기 층을 조합한 것을 특징으로 하는 광기전력 장치.
- 제4항에 있어서, 상기 금속 산화물은 두께가 10~100Å인 절연 금속 산화물인 것을 특징으로 하는 광기전력 장치.
- 제1항에 있어서, I층은 Si, Ge 및 Sn으로 구성되는 그룹에서 선택된 주요원소로 제조된 무정형 반도체이거나 Si, Ge, Sn, C, N 및 O의 그룹에서 선택된 최소한 두 개의 원소로 제조된 무정형 반도체인 것을 특징으로 하는 광기전력 장치.
- 제8항에 있어서, I층은 Si화합물, Ge화합물 및 Sn화합물로 구성되는 그룹에서 선택된 화합물의 혼합물로 그리고 하이드로카이본 및 카아본 플로라이드로 구성되는 그룹에서 선택된 화합물로 글로우 방전분해에 의해 얻어지는 것을 특징으로 하는 광기전력 장치.
- 제1항에 있어서, P, I, N층으로 구성되는 다수의 PIN유닛의 각각의 반복적으로 제공되는 다층 구조를 갖는 것을 특징으로 하는 광기전력 장치.
- 제10항에 있어서, 각 I층의 광학적 밴드 갭이 광입사측으로부터 차례로 감소하는 것을 특징으로 하는 광기전력 장치.
- 제1항에 있어서, 광입사측에 위치한 P 또는 N층은 광학적 밴드 갭이 약 1.85eV이상이고 암전도도가 약 10-8(Ω.cm)-1이상인 반도체인 것을 특징으로 하는 광기전력 장치.
- 제10항에 있어서, 광입사측에 위치한 P 또는 N층은 광학적 밴드 갭이 약 1.85eV이상이고 암전도도가 20℃에서 약 10-8(Ω.cm)-1이상인 반도체인 것을 특징으로 하는 광기전력 장치.
- 제1항에 있어서, 광입사측의 반대쪽에 위치한 P 또는 N층은 무정형 반도체이거나 a―SiC:H, a―SiC:F:H, a―SiCN:H, a―SiCN:F:H, a―SiN:H, a―SiN:F:H, a―SiO:F:H, a―SiON:H 및 a―SiON:F:H등으로부터 선택된 미결정상을 포함하는 무정형 반도체인 것을 특징으로 하는 광기전력 장치.
- 제14항에 있어서, I층은 a―Si:H 또는 a―Si:F:H인 것을 특징으로 하는 광기전력 장치.
- ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57219862A JPS59108370A (ja) | 1982-12-14 | 1982-12-14 | 光起電力装置 |
JP219862 | 1982-12-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR840007316A true KR840007316A (ko) | 1984-12-06 |
KR910001742B1 KR910001742B1 (ko) | 1991-03-22 |
Family
ID=16742215
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019830005865A KR910001742B1 (ko) | 1982-12-14 | 1983-12-10 | 광기전력 장치 |
Country Status (7)
Country | Link |
---|---|
US (1) | US4476346A (ko) |
EP (1) | EP0111247B1 (ko) |
JP (1) | JPS59108370A (ko) |
KR (1) | KR910001742B1 (ko) |
AU (1) | AU567463B2 (ko) |
CA (1) | CA1212444A (ko) |
DE (1) | DE3381867D1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR101154654B1 (ko) * | 2010-10-05 | 2012-06-11 | 엘지이노텍 주식회사 | 태양광 발전장치 및 이의 제조방법 |
Families Citing this family (43)
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EP0095283A3 (en) * | 1982-05-15 | 1984-12-27 | The British Petroleum Company p.l.c. | Memory device |
JPS59201471A (ja) * | 1983-04-29 | 1984-11-15 | Semiconductor Energy Lab Co Ltd | 光電変換半導体装置 |
JPS59130483A (ja) * | 1982-12-24 | 1984-07-27 | Ricoh Co Ltd | 薄膜太陽電池 |
JPS60119567A (ja) * | 1983-12-01 | 1985-06-27 | Ricoh Co Ltd | 電子写真感光体 |
US4738729A (en) * | 1984-10-19 | 1988-04-19 | Toshihiko Yoshida | Amorphous silicon semiconductor solar cell |
US4609771A (en) * | 1984-11-02 | 1986-09-02 | Sovonics Solar Systems | Tandem junction solar cell devices incorporating improved microcrystalline p-doped semiconductor alloy material |
US4726851A (en) * | 1984-11-27 | 1988-02-23 | Toa Nenryo Kogyo K.K. | Amorphous silicon semiconductor film and production process thereof |
US5140397A (en) * | 1985-03-14 | 1992-08-18 | Ricoh Company, Ltd. | Amorphous silicon photoelectric device |
JPS6350076A (ja) * | 1986-08-20 | 1988-03-02 | Sanyo Electric Co Ltd | 光起電力装置 |
US4776894A (en) * | 1986-08-18 | 1988-10-11 | Sanyo Electric Co., Ltd. | Photovoltaic device |
JPS6352486A (ja) * | 1986-08-22 | 1988-03-05 | Hitachi Ltd | 非晶質太陽電池 |
JPS6384075A (ja) * | 1986-09-26 | 1988-04-14 | Sanyo Electric Co Ltd | 光起電力装置 |
EP0283699B1 (en) * | 1987-03-23 | 1994-06-15 | Hitachi, Ltd. | Photoelectric conversion device |
US4775425A (en) * | 1987-07-27 | 1988-10-04 | Energy Conversion Devices, Inc. | P and n-type microcrystalline semiconductor alloy material including band gap widening elements, devices utilizing same |
US4772335A (en) * | 1987-10-15 | 1988-09-20 | Stemcor Corporation | Photovoltaic device responsive to ultraviolet radiation |
KR890702257A (ko) * | 1987-10-15 | 1989-12-23 | 원본 미기재 | 저 노이즈 광검출 및 그것을 위한 광 검출기 |
US5053844A (en) * | 1988-05-13 | 1991-10-01 | Ricoh Company, Ltd. | Amorphous silicon photosensor |
JP2846651B2 (ja) * | 1989-03-31 | 1999-01-13 | 三洋電機株式会社 | 光起電力装置 |
US5055141A (en) * | 1990-01-19 | 1991-10-08 | Solarex Corporation | Enhancement of short-circuit current by use of wide bandgap n-layers in p-i-n amorphous silicon photovoltaic cells |
JP3688726B2 (ja) * | 1992-07-17 | 2005-08-31 | 株式会社東芝 | 半導体装置の製造方法 |
US5935705A (en) * | 1997-10-15 | 1999-08-10 | National Science Council Of Republic Of China | Crystalline Six Cy Nz with a direct optical band gap of 3.8 eV |
US6166318A (en) | 1998-03-03 | 2000-12-26 | Interface Studies, Inc. | Single absorber layer radiated energy conversion device |
JP2001345460A (ja) * | 2000-03-29 | 2001-12-14 | Sanyo Electric Co Ltd | 太陽電池装置 |
WO2007074683A1 (ja) * | 2005-12-26 | 2007-07-05 | Kaneka Corporation | 積層型光電変換装置 |
US7655542B2 (en) * | 2006-06-23 | 2010-02-02 | Applied Materials, Inc. | Methods and apparatus for depositing a microcrystalline silicon film for photovoltaic device |
US8158880B1 (en) * | 2007-01-17 | 2012-04-17 | Aqt Solar, Inc. | Thin-film photovoltaic structures including semiconductor grain and oxide layers |
US20080173350A1 (en) * | 2007-01-18 | 2008-07-24 | Applied Materials, Inc. | Multi-junction solar cells and methods and apparatuses for forming the same |
US8203071B2 (en) * | 2007-01-18 | 2012-06-19 | Applied Materials, Inc. | Multi-junction solar cells and methods and apparatuses for forming the same |
US20080223440A1 (en) * | 2007-01-18 | 2008-09-18 | Shuran Sheng | Multi-junction solar cells and methods and apparatuses for forming the same |
US7582515B2 (en) * | 2007-01-18 | 2009-09-01 | Applied Materials, Inc. | Multi-junction solar cells and methods and apparatuses for forming the same |
US20080245414A1 (en) * | 2007-04-09 | 2008-10-09 | Shuran Sheng | Methods for forming a photovoltaic device with low contact resistance |
US7875486B2 (en) * | 2007-07-10 | 2011-01-25 | Applied Materials, Inc. | Solar cells and methods and apparatuses for forming the same including I-layer and N-layer chamber cleaning |
US20090104733A1 (en) * | 2007-10-22 | 2009-04-23 | Yong Kee Chae | Microcrystalline silicon deposition for thin film solar applications |
EP2215652A4 (en) | 2007-11-02 | 2011-10-05 | Applied Materials Inc | PLASMA TREATMENT BETWEEN DECISION PROCESSES |
US8895842B2 (en) * | 2008-08-29 | 2014-11-25 | Applied Materials, Inc. | High quality TCO-silicon interface contact structure for high efficiency thin film silicon solar cells |
US20100059110A1 (en) * | 2008-09-11 | 2010-03-11 | Applied Materials, Inc. | Microcrystalline silicon alloys for thin film and wafer based solar applications |
US20110114177A1 (en) * | 2009-07-23 | 2011-05-19 | Applied Materials, Inc. | Mixed silicon phase film for high efficiency thin film silicon solar cells |
WO2011046664A2 (en) * | 2009-10-15 | 2011-04-21 | Applied Materials, Inc. | A barrier layer disposed between a substrate and a transparent conductive oxide layer for thin film silicon solar cells |
US20110126875A1 (en) * | 2009-12-01 | 2011-06-02 | Hien-Minh Huu Le | Conductive contact layer formed on a transparent conductive layer by a reactive sputter deposition |
WO2011076466A2 (en) * | 2009-12-22 | 2011-06-30 | Oerlikon Solar Ag, Truebbach | Thin-film silicon tandem solar cell and method for manufacturing the same |
US20110232753A1 (en) * | 2010-03-23 | 2011-09-29 | Applied Materials, Inc. | Methods of forming a thin-film solar energy device |
CN104025307A (zh) | 2012-01-04 | 2014-09-03 | Tel太阳能公司 | 薄膜太阳能电池中的中间反射结构 |
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US4109271A (en) * | 1977-05-27 | 1978-08-22 | Rca Corporation | Amorphous silicon-amorphous silicon carbide photovoltaic device |
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CA1176740A (en) * | 1980-12-03 | 1984-10-23 | Yoshihisa Tawada | High-voltage photovoltaic cell having a hetero junction of amorphous semiconductor and amorphous silicon |
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US4407710A (en) * | 1981-10-15 | 1983-10-04 | Exxon Research And Engineering Co. | Hybrid method of making an amorphous silicon P-I-N semiconductor device |
JPS5955076A (ja) * | 1982-09-24 | 1984-03-29 | Agency Of Ind Science & Technol | 薄膜太陽電池 |
-
1982
- 1982-12-14 JP JP57219862A patent/JPS59108370A/ja active Pending
-
1983
- 1983-02-08 US US06/465,016 patent/US4476346A/en not_active Expired - Fee Related
- 1983-11-28 CA CA000442062A patent/CA1212444A/en not_active Expired
- 1983-11-29 AU AU21787/83A patent/AU567463B2/en not_active Ceased
- 1983-11-30 EP EP83112011A patent/EP0111247B1/en not_active Expired - Lifetime
- 1983-11-30 DE DE8383112011T patent/DE3381867D1/de not_active Expired - Fee Related
- 1983-12-10 KR KR1019830005865A patent/KR910001742B1/ko not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR101154654B1 (ko) * | 2010-10-05 | 2012-06-11 | 엘지이노텍 주식회사 | 태양광 발전장치 및 이의 제조방법 |
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CA1212444A (en) | 1986-10-07 |
KR910001742B1 (ko) | 1991-03-22 |
US4476346A (en) | 1984-10-09 |
EP0111247B1 (en) | 1990-09-05 |
AU567463B2 (en) | 1987-11-19 |
DE3381867D1 (de) | 1990-10-11 |
EP0111247A2 (en) | 1984-06-20 |
AU2178783A (en) | 1984-06-21 |
EP0111247A3 (en) | 1986-08-13 |
JPS59108370A (ja) | 1984-06-22 |
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