KR830006809A - 2차 전자 검출장치 - Google Patents

2차 전자 검출장치 Download PDF

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Publication number
KR830006809A
KR830006809A KR1019810002642A KR810002642A KR830006809A KR 830006809 A KR830006809 A KR 830006809A KR 1019810002642 A KR1019810002642 A KR 1019810002642A KR 810002642 A KR810002642 A KR 810002642A KR 830006809 A KR830006809 A KR 830006809A
Authority
KR
South Korea
Prior art keywords
optical axis
detection device
electronic detection
electron
provided around
Prior art date
Application number
KR1019810002642A
Other languages
English (en)
Other versions
KR850001390B1 (ko
Inventor
노부아끼 다무라
스스무 다까시마
Original Assignee
가세이 다다오
니혼 덴시 가부시끼 가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP10551680A external-priority patent/JPS5730253A/ja
Application filed by 가세이 다다오, 니혼 덴시 가부시끼 가이샤 filed Critical 가세이 다다오
Publication of KR830006809A publication Critical patent/KR830006809A/ko
Application granted granted Critical
Publication of KR850001390B1 publication Critical patent/KR850001390B1/ko

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/40—Imaging
    • G01N2223/418—Imaging electron microscope
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/50—Detectors
    • G01N2223/505—Detectors scintillation
    • G01N2223/5055—Detectors scintillation scintillation crystal coupled to PMT
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2443—Scintillation detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2445—Photon detectors for X-rays, light, e.g. photomultipliers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation

Abstract

내용 없음

Description

2차 전자 검출장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제 2 도 및 제 3 도는 제각기 본 발명의 일실시예 장치를 도시한 개략도.

Claims (1)

  1. 전자총에서 광축에 연하여 취출된 전자선을 대몰렌즈의 자장내에 설치된 시료에 조사하여 대물렌즈부터 전자총축에 설치된 신치레이터와 광전자중배관에 의하여 시료부터 발생하는 2차 전자를 검출하게한 주사전자 현미경에 있어서 상기 신치레이터 근방의 광축의 주위에 설치된 편향방지를 위한 파이프형전극의 주위에 설치되어 광축에 관하여 거의 대칭인 형상을 갖는 2차전자 집속용의 전극을 가진것을 특징으로 하는 주사 현미경용 2차 전자 검출장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019810002642A 1980-07-31 1981-07-21 2차 전자 검출장치 KR850001390B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP10551680A JPS5730253A (en) 1979-06-28 1980-07-31 Secondary electron detector for scan type electron microscope
JP55-105516 1980-07-31

Publications (2)

Publication Number Publication Date
KR830006809A true KR830006809A (ko) 1983-10-06
KR850001390B1 KR850001390B1 (ko) 1985-09-24

Family

ID=14409758

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019810002642A KR850001390B1 (ko) 1980-07-31 1981-07-21 2차 전자 검출장치

Country Status (2)

Country Link
US (1) US4442355A (ko)
KR (1) KR850001390B1 (ko)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8327737D0 (en) * 1983-10-17 1983-11-16 Texas Instruments Ltd Electron detector
US4596929A (en) * 1983-11-21 1986-06-24 Nanometrics Incorporated Three-stage secondary emission electron detection in electron microscopes
JPS60212953A (ja) * 1984-04-06 1985-10-25 Hitachi Ltd 電子線装置
DE3576213D1 (de) * 1984-09-18 1990-04-05 Integrated Circuit Testing Gegenfeld-spektrometer fuer die elektronenstrahl-messtechnik.
US4864228A (en) * 1985-03-15 1989-09-05 Fairchild Camera And Instrument Corporation Electron beam test probe for integrated circuit testing
US4680468A (en) * 1985-08-05 1987-07-14 Canadian Patents And Development Limited-Societe Canadienne Des Brevets Et D'exploitation Limitee Particle detector
GB8604181D0 (en) * 1986-02-20 1986-03-26 Texas Instruments Ltd Electron beam apparatus
US4766372A (en) * 1987-02-10 1988-08-23 Intel Corporation Electron beam tester
DE3938660A1 (de) * 1989-11-21 1991-05-23 Integrated Circuit Testing Korpuskularstrahlgeraet
JPH071685B2 (ja) * 1990-09-06 1995-01-11 株式会社日立製作所 走査電子顕微鏡
JP3081393B2 (ja) * 1992-10-15 2000-08-28 株式会社日立製作所 走査電子顕微鏡
JPH08510596A (ja) * 1994-03-18 1996-11-05 フィリップス エレクトロニクス ネムローゼ フェンノートシャップ 二次電子の偏向ユニットを有する粒子光学機器
US5475228A (en) * 1994-11-28 1995-12-12 University Of Puerto Rico Unipolar blocking method and apparatus for monitoring electrically charged particles
JPH1167139A (ja) * 1997-08-25 1999-03-09 Hitachi Ltd 走査電子顕微鏡
EP1022766B1 (en) * 1998-11-30 2004-02-04 Advantest Corporation Particle beam apparatus
GB2367686B (en) * 2000-08-10 2002-12-11 Leo Electron Microscopy Ltd Improvements in or relating to particle detectors
EP1605492B1 (en) * 2004-06-11 2015-11-18 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device with retarding field analyzer
JP4636897B2 (ja) * 2005-02-18 2011-02-23 株式会社日立ハイテクサイエンスシステムズ 走査電子顕微鏡
CZ299864B6 (cs) * 2007-10-04 2008-12-17 Ústav prístrojové techniky AV CR, v.v.i. Ionizacní detektor environmentálního rastrovacíhoelektronového mikroskopu
WO2009142546A2 (en) * 2008-05-22 2009-11-26 Vladimir Yegorovich Balakin Multi-field charged particle cancer therapy method and apparatus
US8688197B2 (en) * 2008-05-22 2014-04-01 Vladimir Yegorovich Balakin Charged particle cancer therapy patient positioning method and apparatus
US9058910B2 (en) * 2008-05-22 2015-06-16 Vladimir Yegorovich Balakin Charged particle beam acceleration method and apparatus as part of a charged particle cancer therapy system
US8841866B2 (en) 2008-05-22 2014-09-23 Vladimir Yegorovich Balakin Charged particle beam extraction method and apparatus used in conjunction with a charged particle cancer therapy system
US8896239B2 (en) * 2008-05-22 2014-11-25 Vladimir Yegorovich Balakin Charged particle beam injection method and apparatus used in conjunction with a charged particle cancer therapy system
EP2283713B1 (en) 2008-05-22 2018-03-28 Vladimir Yegorovich Balakin Multi-axis charged particle cancer therapy apparatus
EP2403599A4 (en) 2009-03-04 2017-11-22 Zakrytoe Aktsionernoe Obshchestvo Protom Multi-field charged particle cancer therapy method and apparatus
JP5818542B2 (ja) * 2010-07-29 2015-11-18 浜松ホトニクス株式会社 イオン検出装置
JP2012138324A (ja) * 2010-12-28 2012-07-19 Topcon Corp 二次電子検出器、及び荷電粒子ビーム装置
US11239048B2 (en) * 2020-03-09 2022-02-01 Kla Corporation Arrayed column detector

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1128107A (en) * 1965-06-23 1968-09-25 Hitachi Ltd Scanning electron microscope
GB1304344A (ko) * 1969-02-01 1973-01-24
DE2151167C3 (de) * 1971-10-14 1974-05-09 Siemens Ag, 1000 Berlin Und 8000 Muenchen Elektronenstrahl-Mikroanalysator mit Auger-Elektronen-Nachweis
GB1447983A (en) * 1973-01-10 1976-09-02 Nat Res Dev Detector for electron microscopes

Also Published As

Publication number Publication date
KR850001390B1 (ko) 1985-09-24
US4442355A (en) 1984-04-10

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