KR20240067920A - 기판의 제조 방법 및 승화 건조 방법 - Google Patents

기판의 제조 방법 및 승화 건조 방법 Download PDF

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Publication number
KR20240067920A
KR20240067920A KR1020247012086A KR20247012086A KR20240067920A KR 20240067920 A KR20240067920 A KR 20240067920A KR 1020247012086 A KR1020247012086 A KR 1020247012086A KR 20247012086 A KR20247012086 A KR 20247012086A KR 20240067920 A KR20240067920 A KR 20240067920A
Authority
KR
South Korea
Prior art keywords
sublimable
film
substrate
solvent
forming composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020247012086A
Other languages
English (en)
Korean (ko)
Inventor
요시하루 데루이
아야카 요시다
Original Assignee
샌트랄 글래스 컴퍼니 리미티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 샌트랄 글래스 컴퍼니 리미티드 filed Critical 샌트랄 글래스 컴퍼니 리미티드
Publication of KR20240067920A publication Critical patent/KR20240067920A/ko
Pending legal-status Critical Current

Links

Classifications

    • H01L21/02057—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/20—Cleaning during device manufacture
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B5/00—Drying solid materials or objects by processes not involving the application of heat
    • F26B5/04—Drying solid materials or objects by processes not involving the application of heat by evaporation or sublimation of moisture under reduced pressure, e.g. in a vacuum
    • F26B5/041—Drying solid materials or objects by processes not involving the application of heat by evaporation or sublimation of moisture under reduced pressure, e.g. in a vacuum for drying flowable materials, e.g. suspensions, bulk goods, in a continuous operation, e.g. with locks or other air tight arrangements for charging/discharging

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Molecular Biology (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Drying Of Solid Materials (AREA)
KR1020247012086A 2021-09-15 2022-09-08 기판의 제조 방법 및 승화 건조 방법 Pending KR20240067920A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021150186 2021-09-15
JPJP-P-2021-150186 2021-09-15
PCT/JP2022/033662 WO2023042736A1 (ja) 2021-09-15 2022-09-08 基板の製造方法および昇華乾燥方法

Publications (1)

Publication Number Publication Date
KR20240067920A true KR20240067920A (ko) 2024-05-17

Family

ID=85602156

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247012086A Pending KR20240067920A (ko) 2021-09-15 2022-09-08 기판의 제조 방법 및 승화 건조 방법

Country Status (7)

Country Link
US (1) US20240371627A1 (https=)
EP (1) EP4404243A4 (https=)
JP (1) JPWO2023042736A1 (https=)
KR (1) KR20240067920A (https=)
IL (1) IL311467A (https=)
TW (1) TW202332994A (https=)
WO (1) WO2023042736A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2025125474A (ja) * 2024-02-15 2025-08-27 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法、基板処理装置及び基板処理液

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012243869A (ja) 2011-05-17 2012-12-10 Tokyo Electron Ltd 基板乾燥方法及び基板処理装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6022829B2 (ja) * 2012-07-03 2016-11-09 株式会社Ｓｃｒｅｅｎホールディングス 基板乾燥方法および基板乾燥装置
JP7265879B2 (ja) * 2019-02-14 2023-04-27 株式会社Ｓｃｒｅｅｎホールディングス 基板乾燥方法および基板処理装置
WO2020189688A1 (ja) * 2019-03-19 2020-09-24 セントラル硝子株式会社 凹凸パターン乾燥用組成物、及び表面に凹凸パターンを有する基板の製造方法
JP2021150186A (ja) 2020-03-19 2021-09-27 東芝ライテック株式会社 推定装置、推定システム、推定方法および推定プログラム

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012243869A (ja) 2011-05-17 2012-12-10 Tokyo Electron Ltd 基板乾燥方法及び基板処理装置

Also Published As

Publication number Publication date
US20240371627A1 (en) 2024-11-07
TW202332994A (zh) 2023-08-16
JPWO2023042736A1 (https=) 2023-03-23
EP4404243A1 (en) 2024-07-24
IL311467A (en) 2024-05-01
WO2023042736A1 (ja) 2023-03-23
EP4404243A4 (en) 2025-09-24

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