KR20240017167A - 이미징 광학 유닛 - Google Patents

이미징 광학 유닛 Download PDF

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Publication number
KR20240017167A
KR20240017167A KR1020247000236A KR20247000236A KR20240017167A KR 20240017167 A KR20240017167 A KR 20240017167A KR 1020247000236 A KR1020247000236 A KR 1020247000236A KR 20247000236 A KR20247000236 A KR 20247000236A KR 20240017167 A KR20240017167 A KR 20240017167A
Authority
KR
South Korea
Prior art keywords
optical unit
mirrors
plane
imaging
imaging optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020247000236A
Other languages
English (en)
Korean (ko)
Inventor
한스-위르겐 로스탈스키
홀거 뮌츠
크리스토프 멘케
Original Assignee
칼 짜이스 에스엠티 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 칼 짜이스 에스엠티 게엠베하 filed Critical 칼 짜이스 에스엠티 게엠베하
Publication of KR20240017167A publication Critical patent/KR20240017167A/ko
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/08—Anamorphotic objectives
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020247000236A 2021-06-08 2022-06-03 이미징 광학 유닛 Pending KR20240017167A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102021205774.8A DE102021205774A1 (de) 2021-06-08 2021-06-08 Abbildende Optik
DE102021205774.8 2021-06-08
PCT/EP2022/065226 WO2022258529A1 (en) 2021-06-08 2022-06-03 Imaging optical unit

Publications (1)

Publication Number Publication Date
KR20240017167A true KR20240017167A (ko) 2024-02-06

Family

ID=82117637

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247000236A Pending KR20240017167A (ko) 2021-06-08 2022-06-03 이미징 광학 유닛

Country Status (8)

Country Link
US (1) US12596307B2 (https=)
EP (1) EP4352563A1 (https=)
JP (1) JP2024522609A (https=)
KR (1) KR20240017167A (https=)
CN (1) CN117441122A (https=)
DE (1) DE102021205774A1 (https=)
TW (1) TW202307520A (https=)
WO (1) WO2022258529A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102023201790A1 (de) 2023-02-28 2024-08-29 Carl Zeiss Smt Gmbh Verfahren zur interferometrischen Bestimmung der Oberflächenform eines Prüflings
DE102024203605A1 (de) * 2024-04-18 2025-10-23 Carl Zeiss Smt Gmbh Abbildende Optik für die Projektionslithographie

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6577443B2 (en) 1998-05-30 2003-06-10 Carl-Zeiss Stiftung Reduction objective for extreme ultraviolet lithography
DE10155711B4 (de) 2001-11-09 2006-02-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Im EUV-Spektralbereich reflektierender Spiegel
JP2009508150A (ja) 2005-09-13 2009-02-26 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影光学系、ある機器を製造するための方法、光学面を設計する方法
DE102007033967A1 (de) 2007-07-19 2009-01-29 Carl Zeiss Smt Ag Projektionsobjektiv
DE102008033341A1 (de) 2007-07-24 2009-01-29 Carl Zeiss Smt Ag Projektionsobjektiv
DE102009011328A1 (de) 2009-03-05 2010-08-19 Carl Zeiss Smt Ag Abbildende Optik
DE102009045096A1 (de) 2009-09-29 2010-10-07 Carl Zeiss Smt Ag Beleuchtungssystem mit einer Spiegelanordnung aus zwei Spiegeln
DE102010040811A1 (de) 2010-09-15 2012-03-15 Carl Zeiss Smt Gmbh Abbildende Optik
DE102011075579A1 (de) 2011-05-10 2012-11-15 Carl Zeiss Smt Gmbh Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Spiegel
DE102012202675A1 (de) 2012-02-22 2013-01-31 Carl Zeiss Smt Gmbh Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithografie mit einer derartigen abbildenden Optik
WO2014019617A1 (en) 2012-08-01 2014-02-06 Carl Zeiss Smt Gmbh Imaging optical unit for a projection exposure apparatus
DE102014208770A1 (de) 2013-07-29 2015-01-29 Carl Zeiss Smt Gmbh Projektionsoptik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen Projektionsoptik
DE102015226531A1 (de) 2015-04-14 2016-10-20 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
WO2016188934A1 (de) 2015-05-28 2016-12-01 Carl Zeiss Smt Gmbh Abbildende optik zur abbildung eines objektfeldes in ein bildfeld sowie projektionsbelichtungsanlage mit einer derartigen abbildenden optik
DE102015221984A1 (de) * 2015-11-09 2017-05-11 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
DE102016212578A1 (de) * 2016-07-11 2018-01-11 Carl Zeiss Smt Gmbh Projektionsoptik für die EUV-Projektionslithographie
DE102019208961A1 (de) * 2019-06-19 2020-12-24 Carl Zeiss Smt Gmbh Projektionsoptik und Projektionsbelichtungsanlage mit einer solchen Projektionsoptik
DE102019219209A1 (de) 2019-12-10 2020-01-23 Carl Zeiss Smt Gmbh Oberflächenprofil-Messeinrichtung zur Vermessung der Spiegel einer abbildenden Optik
DE102022206110A1 (de) * 2022-06-20 2023-12-21 Carl Zeiss Smt Gmbh Abbildende EUV-Optik zur Abbildung eines Objektfeldes in ein Bildfeld

Also Published As

Publication number Publication date
CN117441122A (zh) 2024-01-23
JP2024522609A (ja) 2024-06-21
US12596307B2 (en) 2026-04-07
TW202307520A (zh) 2023-02-16
US20240094637A1 (en) 2024-03-21
WO2022258529A1 (en) 2022-12-15
DE102021205774A1 (de) 2022-12-08
EP4352563A1 (en) 2024-04-17

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