KR20230142534A - 헥사플루오로이소프로판올기를 포함하는 규소 화합물, 규소 화합물의 제조 방법, 폴리실록산 및 폴리실록산의 제조 방법 - Google Patents

헥사플루오로이소프로판올기를 포함하는 규소 화합물, 규소 화합물의 제조 방법, 폴리실록산 및 폴리실록산의 제조 방법 Download PDF

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Publication number
KR20230142534A
KR20230142534A KR1020237029113A KR20237029113A KR20230142534A KR 20230142534 A KR20230142534 A KR 20230142534A KR 1020237029113 A KR1020237029113 A KR 1020237029113A KR 20237029113 A KR20237029113 A KR 20237029113A KR 20230142534 A KR20230142534 A KR 20230142534A
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KR
South Korea
Prior art keywords
formula
group
silicon compound
carbon atoms
integer
Prior art date
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Pending
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KR1020237029113A
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English (en)
Korean (ko)
Inventor
도모히로 가타무라
준야 나카츠지
유타카 스기타
유리 오이카와
가즈히로 야마나카
Original Assignee
샌트랄 글래스 컴퍼니 리미티드
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Publication of KR20230142534A publication Critical patent/KR20230142534A/ko
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/20—Purification, separation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
KR1020237029113A 2021-02-05 2022-01-27 헥사플루오로이소프로판올기를 포함하는 규소 화합물, 규소 화합물의 제조 방법, 폴리실록산 및 폴리실록산의 제조 방법 Pending KR20230142534A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021017792 2021-02-05
JPJP-P-2021-017792 2021-02-05
PCT/JP2022/003177 WO2022168735A1 (ja) 2021-02-05 2022-01-27 ヘキサフルオロイソプロパノール基を含むケイ素化合物、ケイ素化合物の製造方法、ポリシロキサン及びポリシロキサンの製造方法

Publications (1)

Publication Number Publication Date
KR20230142534A true KR20230142534A (ko) 2023-10-11

Family

ID=82741564

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020237029113A Pending KR20230142534A (ko) 2021-02-05 2022-01-27 헥사플루오로이소프로판올기를 포함하는 규소 화합물, 규소 화합물의 제조 방법, 폴리실록산 및 폴리실록산의 제조 방법

Country Status (5)

Country Link
JP (1) JPWO2022168735A1 (https=)
KR (1) KR20230142534A (https=)
CN (1) CN116802186A (https=)
TW (1) TW202246291A (https=)
WO (1) WO2022168735A1 (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002055456A (ja) 2000-06-02 2002-02-20 Shin Etsu Chem Co Ltd 高分子化合物、レジスト材料及びパターン形成方法
JP2004256503A (ja) 2003-02-27 2004-09-16 Toagosei Co Ltd 有機ケイ素化合物の製造方法
JP2014156461A (ja) 2013-01-21 2014-08-28 Central Glass Co Ltd ヘキサフルオロイソプロパノール基を含む珪素化合物およびその製造方法、並びにそれが重合してなる高分子化合物
WO2019167770A1 (ja) 2018-02-28 2019-09-06 セントラル硝子株式会社 ヘキサフルオロイソプロパノール基を含む珪素化合物、およびその製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6323225B2 (ja) * 2013-11-01 2018-05-16 セントラル硝子株式会社 ポジ型感光性樹脂組成物、それを用いた膜の製造方法および電子部品
US20210395461A1 (en) * 2018-10-30 2021-12-23 Central Glass Company, Limited Resin composition, photosensitive resin composition, cured film, method for manufacturing cured film, patterned cured film, method for producing patterned cured film

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002055456A (ja) 2000-06-02 2002-02-20 Shin Etsu Chem Co Ltd 高分子化合物、レジスト材料及びパターン形成方法
JP2004256503A (ja) 2003-02-27 2004-09-16 Toagosei Co Ltd 有機ケイ素化合物の製造方法
JP2014156461A (ja) 2013-01-21 2014-08-28 Central Glass Co Ltd ヘキサフルオロイソプロパノール基を含む珪素化合物およびその製造方法、並びにそれが重合してなる高分子化合物
WO2019167770A1 (ja) 2018-02-28 2019-09-06 セントラル硝子株式会社 ヘキサフルオロイソプロパノール基を含む珪素化合物、およびその製造方法

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TW202246291A (zh) 2022-12-01
CN116802186A (zh) 2023-09-22
WO2022168735A1 (ja) 2022-08-11
JPWO2022168735A1 (https=) 2022-08-11

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PA0105 International application

Patent event date: 20230825

Patent event code: PA01051R01D

Comment text: International Patent Application

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