KR20230135167A - 멀티빔 입자 빔 시스템 및 그 동작 방법 - Google Patents

멀티빔 입자 빔 시스템 및 그 동작 방법 Download PDF

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Publication number
KR20230135167A
KR20230135167A KR1020237031206A KR20237031206A KR20230135167A KR 20230135167 A KR20230135167 A KR 20230135167A KR 1020237031206 A KR1020237031206 A KR 1020237031206A KR 20237031206 A KR20237031206 A KR 20237031206A KR 20230135167 A KR20230135167 A KR 20230135167A
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KR
South Korea
Prior art keywords
aperture
apertures
particle beam
plate
multiaperture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020237031206A
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English (en)
Korean (ko)
Inventor
디르크 자이들러
크리스토프 리데셀
아르네 토마
게오르고 메탈리디스
조르그 자코비
스테판 슈베르트
랄프 렌케
울리히 비허
얀코 사로프
게오르그 쿠리지
Original Assignee
칼 짜이스 멀티셈 게엠베하
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Application filed by 칼 짜이스 멀티셈 게엠베하 filed Critical 칼 짜이스 멀티셈 게엠베하
Publication of KR20230135167A publication Critical patent/KR20230135167A/ko
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1475—Scanning means magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1477—Scanning means electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0451—Diaphragms with fixed aperture
    • H01J2237/0453—Diaphragms with fixed aperture multiple apertures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1532—Astigmatism
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24564—Measurements of electric or magnetic variables, e.g. voltage, current, frequency

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Electron Beam Exposure (AREA)
  • Powder Metallurgy (AREA)
KR1020237031206A 2018-10-01 2019-09-30 멀티빔 입자 빔 시스템 및 그 동작 방법 Pending KR20230135167A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE102018124219.0A DE102018124219A1 (de) 2018-10-01 2018-10-01 Vielstrahl-Teilchenstrahlsystem und Verfahren zum Betreiben eines solchen
DE102018124219.0 2018-10-01
PCT/EP2019/076472 WO2020070074A1 (de) 2018-10-01 2019-09-30 Vielstrahl-teilchenstrahlsystem und verfahren zum betreiben eines solchen
KR1020217012661A KR102579698B1 (ko) 2018-10-01 2019-09-30 멀티빔 입자 빔 시스템 및 그 동작 방법

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020217012661A Division KR102579698B1 (ko) 2018-10-01 2019-09-30 멀티빔 입자 빔 시스템 및 그 동작 방법

Publications (1)

Publication Number Publication Date
KR20230135167A true KR20230135167A (ko) 2023-09-22

Family

ID=68136382

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020237031206A Pending KR20230135167A (ko) 2018-10-01 2019-09-30 멀티빔 입자 빔 시스템 및 그 동작 방법
KR1020217012661A Active KR102579698B1 (ko) 2018-10-01 2019-09-30 멀티빔 입자 빔 시스템 및 그 동작 방법

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KR1020217012661A Active KR102579698B1 (ko) 2018-10-01 2019-09-30 멀티빔 입자 빔 시스템 및 그 동작 방법

Country Status (7)

Country Link
US (1) US12255040B2 (https=)
EP (2) EP3861565B1 (https=)
JP (2) JP7206380B2 (https=)
KR (2) KR20230135167A (https=)
CN (1) CN113169017B (https=)
DE (1) DE102018124219A1 (https=)
WO (1) WO2020070074A1 (https=)

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DE102018007652B4 (de) 2018-09-27 2021-03-25 Carl Zeiss Multisem Gmbh Teilchenstrahl-System sowie Verfahren zur Stromregulierung von Einzel-Teilchenstrahlen
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DE102020123567B4 (de) 2020-09-09 2025-02-13 Carl Zeiss Multisem Gmbh Vielzahl-Teilchenstrahl-System mit Kontrast-Korrektur-Linsen-System
TW202220012A (zh) 2020-09-30 2022-05-16 德商卡爾蔡司多重掃描電子顯微鏡有限公司 在可調工作距離附近具快速自動對焦之多重粒子束顯微鏡及相關方法
DE102021200799B3 (de) 2021-01-29 2022-03-31 Carl Zeiss Multisem Gmbh Verfahren mit verbesserter Fokuseinstellung unter Berücksichtigung eines Bildebenenkipps in einem Vielzahl-Teilchenstrahlmikroskop
TW202312205A (zh) 2021-05-27 2023-03-16 德商卡爾蔡司多重掃描電子顯微鏡有限公司 多重射束帶電粒子系統與在多重射束帶電粒子系統中控制工作距離的方法
DE102021116969B3 (de) 2021-07-01 2022-09-22 Carl Zeiss Multisem Gmbh Verfahren zur bereichsweisen Probeninspektion mittels eines Vielstrahl-Teilchenmikroskopes, Computerprogrammprodukt und Vielstrahl-Teilchenmikroskop zur Halbleiterprobeninspektion
EP4385053A1 (en) * 2021-08-10 2024-06-19 Carl Zeiss MultiSEM GmbH Multi-beam generating unit with increased focusing power
CN119054040A (zh) * 2022-04-11 2024-11-29 华为技术有限公司 一种粒子矫正器和粒子系统
CN119013755A (zh) * 2022-04-12 2024-11-22 华为技术有限公司 一种粒子系统和粒子束的矫正方法
JP2024131429A (ja) 2023-03-16 2024-09-30 セイコーエプソン株式会社 メンテナンスユニット、及び液体吐出装置
TW202529141A (zh) 2023-09-26 2025-07-16 德商卡爾蔡司多重掃描電子顯微鏡有限公司 具有增強聚焦功率的多束生成單元
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