KR20230079024A - 광경화성 착색 수지 조성물, 경화물, 컬러 필터, 표시 장치 - Google Patents

광경화성 착색 수지 조성물, 경화물, 컬러 필터, 표시 장치 Download PDF

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Publication number
KR20230079024A
KR20230079024A KR1020237007955A KR20237007955A KR20230079024A KR 20230079024 A KR20230079024 A KR 20230079024A KR 1020237007955 A KR1020237007955 A KR 1020237007955A KR 20237007955 A KR20237007955 A KR 20237007955A KR 20230079024 A KR20230079024 A KR 20230079024A
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KR
South Korea
Prior art keywords
group
carbon atoms
mass
resin composition
colored resin
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KR1020237007955A
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English (en)
Korean (ko)
Inventor
세이지 이시하라
마키 후지타
Original Assignee
가부시키가이샤 디엔피 파인 케미칼
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Publication of KR20230079024A publication Critical patent/KR20230079024A/ko
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
KR1020237007955A 2020-09-29 2021-09-17 광경화성 착색 수지 조성물, 경화물, 컬러 필터, 표시 장치 Pending KR20230079024A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2020-163774 2020-09-29
JP2020163774 2020-09-29
PCT/JP2021/034241 WO2022070977A1 (ja) 2020-09-29 2021-09-17 光硬化性着色樹脂組成物、硬化物、カラーフィルタ、表示装置

Publications (1)

Publication Number Publication Date
KR20230079024A true KR20230079024A (ko) 2023-06-05

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KR1020237007955A Pending KR20230079024A (ko) 2020-09-29 2021-09-17 광경화성 착색 수지 조성물, 경화물, 컬러 필터, 표시 장치

Country Status (5)

Country Link
JP (1) JPWO2022070977A1 (enrdf_load_stackoverflow)
KR (1) KR20230079024A (enrdf_load_stackoverflow)
CN (1) CN116157738A (enrdf_load_stackoverflow)
TW (1) TW202222991A (enrdf_load_stackoverflow)
WO (1) WO2022070977A1 (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7464184B1 (ja) 2023-02-01 2024-04-09 ａｒｔｉｅｎｃｅ株式会社 感光性着色組成物、それを用いた膜、カラーフィルタ、固体撮像素子、及び画像表示装置
JP7478332B1 (ja) 2023-02-22 2024-05-07 ａｒｔｉｅｎｃｅ株式会社 感光性組成物、それを用いた膜、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11149010A (ja) 1997-11-18 1999-06-02 Jsr Corp カラーフィルタ用感放射線性組成物
JP2010256891A (ja) 2009-04-01 2010-11-11 Toyo Ink Mfg Co Ltd 感光性着色組成物およびカラーフィルタ
JP2015152153A (ja) 2014-02-18 2015-08-24 日本発條株式会社 リンクアーム部材

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5685803B2 (ja) * 2008-07-24 2015-03-18 Jsr株式会社 感放射線性樹脂組成物および液晶表示素子用スペーサーとその製造法
JP6385853B2 (ja) * 2015-02-20 2018-09-05 富士フイルム株式会社 感光性組成物、硬化膜の製造方法、硬化膜、タッチパネル、タッチパネル表示装置、液晶表示装置、及び、有機ｅｌ表示装置
JP2018205605A (ja) * 2017-06-07 2018-12-27 三菱ケミカル株式会社 着色感光性樹脂組成物、硬化物、有機電界発光素子、画像表示装置及び照明
JP7249119B2 (ja) * 2018-09-27 2023-03-30 東京応化工業株式会社 感光性樹脂組成物、パターニングされた硬化膜の製造方法及び硬化膜

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11149010A (ja) 1997-11-18 1999-06-02 Jsr Corp カラーフィルタ用感放射線性組成物
JP2010256891A (ja) 2009-04-01 2010-11-11 Toyo Ink Mfg Co Ltd 感光性着色組成物およびカラーフィルタ
JP2015152153A (ja) 2014-02-18 2015-08-24 日本発條株式会社 リンクアーム部材

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CN116157738A (zh) 2023-05-23
WO2022070977A1 (ja) 2022-04-07
TW202222991A (zh) 2022-06-16
JPWO2022070977A1 (enrdf_load_stackoverflow) 2022-04-07

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