KR20220100629A - 세라믹 기판, 복합 기판 및 회로 기판 그리고 세라믹 기판의 제조 방법, 복합 기판의 제조 방법, 회로 기판의 제조 방법 및 복수의 회로 기판의 제조 방법 - Google Patents
세라믹 기판, 복합 기판 및 회로 기판 그리고 세라믹 기판의 제조 방법, 복합 기판의 제조 방법, 회로 기판의 제조 방법 및 복수의 회로 기판의 제조 방법 Download PDFInfo
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- KR20220100629A KR20220100629A KR1020227019594A KR20227019594A KR20220100629A KR 20220100629 A KR20220100629 A KR 20220100629A KR 1020227019594 A KR1020227019594 A KR 1020227019594A KR 20227019594 A KR20227019594 A KR 20227019594A KR 20220100629 A KR20220100629 A KR 20220100629A
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- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
- C04B2237/32—Ceramic
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- C04B2237/368—Silicon nitride
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- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
- C04B2237/66—Forming laminates or joined articles showing high dimensional accuracy, e.g. indicated by the warpage
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- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
- C04B2237/76—Forming laminates or joined articles comprising at least one member in the form other than a sheet or disc, e.g. two tubes or a tube and a sheet or disc
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| JPJP-P-2019-206750 | 2019-11-15 | ||
| JP2019206750 | 2019-11-15 | ||
| PCT/JP2020/042420 WO2021095843A1 (ja) | 2019-11-15 | 2020-11-13 | セラミック基板、複合基板及び回路基板並びにセラミック基板の製造方法、複合基板の製造方法、回路基板の製造方法及び複数の回路基板の製造方法 |
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| JP7695850B2 (ja) * | 2021-09-21 | 2025-06-19 | デンカ株式会社 | セラミック複合基板、及びセラミック複合基板の製造方法 |
| CN118119577A (zh) | 2021-12-23 | 2024-05-31 | 株式会社德山 | 生片、氮化硅烧结体的制造方法及氮化硅烧结体 |
| CN115124351B (zh) * | 2022-07-18 | 2023-10-20 | 合肥圣达电子科技实业有限公司 | 氮化铝多层用高温阻焊浆料及其制备方法 |
| WO2025205771A1 (ja) * | 2024-03-28 | 2025-10-02 | 京セラ株式会社 | 窒化珪素基板及び冷却装置 |
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| JP2018018971A (ja) | 2016-07-28 | 2018-02-01 | 日立金属株式会社 | セラミック基板の製造方法 |
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| US4155960A (en) * | 1977-03-02 | 1979-05-22 | Norton Company | Porcelain tower packing |
| JPH02141476A (ja) * | 1988-11-21 | 1990-05-30 | Murata Mfg Co Ltd | セラミック基板の製造方法 |
| JP3722573B2 (ja) * | 1996-12-11 | 2005-11-30 | 電気化学工業株式会社 | セラミックス基板及びそれを用いた回路基板とその製造方法 |
| EP1201623B1 (en) * | 2000-10-27 | 2016-08-31 | Kabushiki Kaisha Toshiba | Silicon nitride ceramic substrate and silicon nitride ceramic circuit board using the substrate |
| GB2412384A (en) * | 2004-03-24 | 2005-09-28 | David Bartlett | Three-dimensional tiles |
| JP2007019123A (ja) | 2005-07-06 | 2007-01-25 | Sumitomo Metal Electronics Devices Inc | セラミック回路基板集合体 |
| JP2007198626A (ja) * | 2006-01-24 | 2007-08-09 | Tdk Corp | 焼成炉 |
| JP2008186897A (ja) * | 2007-01-29 | 2008-08-14 | Tdk Corp | 多層セラミック基板の製造方法 |
| JP6012990B2 (ja) * | 2012-03-19 | 2016-10-25 | 日本軽金属株式会社 | 放熱器一体型基板の製造方法 |
| EP3255666B1 (en) * | 2015-02-02 | 2021-10-13 | Kabushiki Kaisha Toshiba | Silicon nitride circuit substrate and electronic component module using same |
| JP6399252B2 (ja) * | 2016-03-28 | 2018-10-03 | 日立金属株式会社 | 回路基板および窒化ケイ素焼結基板の製造方法 |
| JP6672960B2 (ja) | 2016-03-31 | 2020-03-25 | 日立金属株式会社 | セラミック焼結板の製造方法 |
| US10377076B2 (en) * | 2017-07-31 | 2019-08-13 | City University Of Hong Kong | System and method for four-dimensional printing of ceramic origami structures |
| KR20190022383A (ko) * | 2017-08-24 | 2019-03-06 | 주식회사 아모센스 | 세라믹 기판 제조방법 및 세라믹 기판 |
| US10916433B2 (en) | 2018-04-06 | 2021-02-09 | Applied Materials, Inc. | Methods of forming metal silicide layers and metal silicide layers formed therefrom |
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| EP4059911B1 (en) | 2024-04-10 |
| EP4059911A1 (en) | 2022-09-21 |
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| JPWO2021095843A1 (https=) | 2021-05-20 |
| EP4059911A4 (en) | 2023-01-04 |
| JP7168795B2 (ja) | 2022-11-09 |
| CN114667806B (zh) | 2024-04-02 |
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