KR20200115218A - 블랙 레지스트용 감광성 수지 조성물 및 이것을 경화해서 이루어지는 차광막 및 컬러 필터 - Google Patents

블랙 레지스트용 감광성 수지 조성물 및 이것을 경화해서 이루어지는 차광막 및 컬러 필터 Download PDF

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Publication number
KR20200115218A
KR20200115218A KR1020200034774A KR20200034774A KR20200115218A KR 20200115218 A KR20200115218 A KR 20200115218A KR 1020200034774 A KR1020200034774 A KR 1020200034774A KR 20200034774 A KR20200034774 A KR 20200034774A KR 20200115218 A KR20200115218 A KR 20200115218A
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KR
South Korea
Prior art keywords
photosensitive resin
light
resin composition
acid
black
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020200034774A
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English (en)
Korean (ko)
Inventor
준야 오가와
미츠루 스다
Original Assignee
닛테츠 케미컬 앤드 머티리얼 가부시키가이샤
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Publication of KR20200115218A publication Critical patent/KR20200115218A/ko
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polyesters Or Polycarbonates (AREA)
KR1020200034774A 2019-03-29 2020-03-23 블랙 레지스트용 감광성 수지 조성물 및 이것을 경화해서 이루어지는 차광막 및 컬러 필터 Ceased KR20200115218A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2019-067579 2019-03-29
JP2019067579A JP7737779B2 (ja) 2019-03-29 2019-03-29 ブラックレジスト用感光性樹脂組成物およびこれを硬化してなる遮光膜並びにカラーフィルター

Publications (1)

Publication Number Publication Date
KR20200115218A true KR20200115218A (ko) 2020-10-07

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KR1020200034774A Ceased KR20200115218A (ko) 2019-03-29 2020-03-23 블랙 레지스트용 감광성 수지 조성물 및 이것을 경화해서 이루어지는 차광막 및 컬러 필터

Country Status (4)

Country Link
JP (2) JP7737779B2 (https=)
KR (1) KR20200115218A (https=)
CN (1) CN111752106A (https=)
TW (1) TWI829905B (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220404698A1 (en) * 2021-05-24 2022-12-22 Echem Solutions Corp. Black light-shielding photosensitive resin composition, black matrix, black light-shielding film, frame and filling material for splicing area
KR20240056083A (ko) * 2022-10-21 2024-04-30 동우 화인켐 주식회사 감광성 수지 조성물, 이를 이용하여 제조된 격벽 구조물 및 상기 격벽 구조물을 포함하는 표시 장치

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7739732B2 (ja) * 2020-12-10 2025-09-17 ａｒｔｉｅｎｃｅ株式会社 感光性着色組成物、硬化膜、及び光学フィルタ
CN115390360B (zh) * 2021-05-24 2026-01-27 新应材股份有限公司 黑色遮光感光性树脂组成物、黑色矩阵、黑色遮光膜、边框以及拼接区域的填充物质
TWI784721B (zh) * 2021-09-22 2022-11-21 住華科技股份有限公司 感光性著色樹脂組成物及應用其之彩色濾光片與顯示裝置

Citations (1)

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Publication number Priority date Publication date Assignee Title
JP2015161815A (ja) 2014-02-27 2015-09-07 凸版印刷株式会社 黒色感光性樹脂組成物、ブラックマトリクス、カラーフィルタ、液晶表示装置及び有機エレクトロルミネッセンス表示装置

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JP5075333B2 (ja) 2005-11-11 2012-11-21 富士フイルム株式会社 光学フィルム、偏光板、及び画像表示装置
CN102471425B (zh) * 2009-07-29 2015-03-04 日本化药株式会社 感光性树脂组合物、使用了该感光性树脂组合物的防反射膜和防反射硬涂膜
JP2011048195A (ja) * 2009-08-27 2011-03-10 Asahi Glass Co Ltd 光学素子隔壁形成用感光性組成物、これを用いたブラックマトリックスおよびその製造方法、並びにカラーフィルタオンアレイの製造方法
JP2011075691A (ja) * 2009-09-29 2011-04-14 Dainippon Printing Co Ltd 有機エレクトロルミネッセンス表示装置用カラーフィルタ
JP6607682B2 (ja) * 2015-03-05 2019-11-20 日鉄ケミカル＆マテリアル株式会社 遮光膜用黒色樹脂組成物、当該組成物を硬化させた遮光膜を有する遮光膜付基板、並びに当該遮光膜付基板を有するカラーフィルター及びタッチパネル
KR20170110316A (ko) * 2016-03-23 2017-10-11 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 표시장치
TWI691794B (zh) * 2016-09-29 2020-04-21 奇美實業股份有限公司 負型白色感光性樹脂組成物及其應用
CN112578635A (zh) * 2019-09-30 2021-03-30 日铁化学材料株式会社 黑阻剂用感光性树脂组合物及其制造方法、遮光膜、彩色滤光片、触控面板、及显示装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015161815A (ja) 2014-02-27 2015-09-07 凸版印刷株式会社 黒色感光性樹脂組成物、ブラックマトリクス、カラーフィルタ、液晶表示装置及び有機エレクトロルミネッセンス表示装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220404698A1 (en) * 2021-05-24 2022-12-22 Echem Solutions Corp. Black light-shielding photosensitive resin composition, black matrix, black light-shielding film, frame and filling material for splicing area
KR20240056083A (ko) * 2022-10-21 2024-04-30 동우 화인켐 주식회사 감광성 수지 조성물, 이를 이용하여 제조된 격벽 구조물 및 상기 격벽 구조물을 포함하는 표시 장치

Also Published As

Publication number Publication date
JP2024107124A (ja) 2024-08-08
CN111752106A (zh) 2020-10-09
JP2020166156A (ja) 2020-10-08
TW202102943A (zh) 2021-01-16
TWI829905B (zh) 2024-01-21
JP7737779B2 (ja) 2025-09-11

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