KR20190093576A - 전도성 특징부를 에칭하는 방법 및 관련 디바이스와 시스템 - Google Patents
전도성 특징부를 에칭하는 방법 및 관련 디바이스와 시스템 Download PDFInfo
- Publication number
- KR20190093576A KR20190093576A KR1020197016384A KR20197016384A KR20190093576A KR 20190093576 A KR20190093576 A KR 20190093576A KR 1020197016384 A KR1020197016384 A KR 1020197016384A KR 20197016384 A KR20197016384 A KR 20197016384A KR 20190093576 A KR20190093576 A KR 20190093576A
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- etch
- substrate
- conductive
- corrosion resistant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/068—Apparatus for etching printed circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/282—Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
- H05K2203/013—Inkjet printing, e.g. for printing insulating material or resist
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0392—Pretreatment of metal, e.g. before finish plating, etching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1163—Chemical reaction, e.g. heating solder by exothermic reaction
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1184—Underetching, e.g. etching of substrate under conductors or etching of conductor under dielectrics; Means for allowing or controlling underetching
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662432710P | 2016-12-12 | 2016-12-12 | |
| US62/432,710 | 2016-12-12 | ||
| US15/835,116 | 2017-12-07 | ||
| US15/835,116 US10398034B2 (en) | 2016-12-12 | 2017-12-07 | Methods of etching conductive features, and related devices and systems |
| PCT/IL2017/051338 WO2018109762A1 (en) | 2016-12-12 | 2017-12-11 | Methods of etching conductive features, and related devices and systems |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20190093576A true KR20190093576A (ko) | 2019-08-09 |
Family
ID=62558108
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020197016384A Ceased KR20190093576A (ko) | 2016-12-12 | 2017-12-11 | 전도성 특징부를 에칭하는 방법 및 관련 디바이스와 시스템 |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US10398034B2 (enExample) |
| EP (1) | EP3551781B1 (enExample) |
| JP (2) | JP2020501375A (enExample) |
| KR (1) | KR20190093576A (enExample) |
| CN (1) | CN110249075A (enExample) |
| WO (1) | WO2018109762A1 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3304197A4 (en) | 2015-06-04 | 2019-01-23 | Kateeva, Inc. | METHOD FOR PRODUCING AN ESTETRESIST PATTERN ON A METALLIC SURFACE |
| KR102626521B1 (ko) | 2015-08-13 | 2024-01-17 | 카티바, 인크. | 금속 표면 상에 에치 레지스트 패턴을 형성하는 방법 |
| US10398034B2 (en) * | 2016-12-12 | 2019-08-27 | Kateeva, Inc. | Methods of etching conductive features, and related devices and systems |
| WO2020165897A1 (en) | 2019-02-14 | 2020-08-20 | Orbotech Ltd | A method and apparatus for preparing a pcb product having highly dense conductors |
| KR20220127272A (ko) * | 2020-01-13 | 2022-09-19 | 카티바, 인크. | 잉크젯 인쇄 회로 기판 |
| US11963300B2 (en) | 2020-08-14 | 2024-04-16 | Au Optronics Corporation | Panel device and manufacturing method of panel device |
| DE102021122646A1 (de) * | 2021-09-01 | 2023-03-02 | At&S Austria Technologie & Systemtechnik Aktiengesellschaft | Komponententräger-Ätzsystem mit physisch getrennten Äzmodulen und Komponententräger |
| TWI849785B (zh) | 2023-03-08 | 2024-07-21 | 友達光電股份有限公司 | 電路裝置 |
| CN118612936B (zh) * | 2024-06-21 | 2024-12-06 | 南华大学 | 一种可拉伸的金属基电/热导件 |
| CN119603888B (zh) * | 2024-12-18 | 2025-09-23 | 西安电子科技大学 | 一种面向曲面电路三维打印的基材表面改性与附着力增强方法 |
Family Cites Families (64)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4015706A (en) | 1971-11-15 | 1977-04-05 | Chemcut Corporation | Connecting modules for an etching system |
| US4127438A (en) | 1977-11-07 | 1978-11-28 | International Business Machines Corporation | Adhesion promoter for additively plated printed circuit boards |
| DE3402883A1 (de) | 1984-01-27 | 1985-08-01 | Siemens AG, 1000 Berlin und 8000 München | Leiterplatten aus schichtpressstoffen |
| DE3683194D1 (de) * | 1985-06-07 | 1992-02-13 | Sekisui Chemical Co Ltd | Photovernetzbare zusammensetzung. |
| US4946711A (en) | 1987-10-14 | 1990-08-07 | Desoto, Inc. | Masking compositions and method for applying the same |
| JP2585070B2 (ja) | 1988-08-02 | 1997-02-26 | 日本ペイント株式会社 | 画像形成方法 |
| WO1992011322A2 (en) | 1990-12-20 | 1992-07-09 | Exxon Chemical Patents Inc. | Uv/eb curable butyl copolymers for lithographic and corrosion-resistant coating applications |
| GB9425031D0 (en) | 1994-12-09 | 1995-02-08 | Alpha Metals Ltd | Printed circuit board manufacture |
| DE69635203T2 (de) | 1995-07-11 | 2006-06-29 | Delphi Technologies, Inc., Troy | Beschichtungen und Verfahren, insbesondere für Leiterplatten |
| EP0860742B1 (en) | 1997-02-25 | 2001-04-04 | E.I. Du Pont De Nemours And Company | Flexible, flame-retardant, photoimageable composition for coating printing circuits |
| US6222136B1 (en) | 1997-11-12 | 2001-04-24 | International Business Machines Corporation | Printed circuit board with continuous connective bumps |
| IL129307A0 (en) | 1999-04-04 | 2000-02-17 | Scitex Corp Ltd | Process for direct digital printing of circuit boards |
| GB9916060D0 (en) | 1999-07-08 | 1999-09-08 | Isis Innovation | Printed circuit fabrication |
| JP3622910B2 (ja) | 1999-07-30 | 2005-02-23 | セイコーエプソン株式会社 | 記録媒体に二液を用いて印刷する記録方法 |
| WO2001013179A1 (en) | 1999-08-13 | 2001-02-22 | Board Of Regents, University Of Texas System | Water-processable photoresist compositions |
| TWI284780B (en) | 2000-03-29 | 2007-08-01 | Univ Kanagawa | Photocurable/thermosetting resin composition, photosensitive dry film formed therefrom, and method of forming pattern with the same |
| DE10066028C2 (de) | 2000-07-07 | 2003-04-24 | Atotech Deutschland Gmbh | Kupfersubstrat mit aufgerauhten Oberflächen |
| JP3754303B2 (ja) | 2001-02-16 | 2006-03-08 | 株式会社日立インフォメーションテクノロジー | Sdramリフレッシュ回路 |
| US7150816B2 (en) | 2001-08-31 | 2006-12-19 | Semitool, Inc. | Apparatus and method for deposition of an electrophoretic emulsion |
| US6709962B2 (en) | 2002-03-19 | 2004-03-23 | N. Edward Berg | Process for manufacturing printed circuit boards |
| US20030177639A1 (en) | 2002-03-19 | 2003-09-25 | Berg N. Edward | Process and apparatus for manufacturing printed circuit boards |
| GB0221891D0 (en) | 2002-09-20 | 2002-10-30 | Avecia Ltd | Process |
| TWI291726B (en) | 2002-10-25 | 2007-12-21 | Nanya Technology Corp | Process for etching metal layer |
| US7005241B2 (en) * | 2003-06-09 | 2006-02-28 | Shinko Electric Industries Co., Ltd. | Process for making circuit board or lead frame |
| US7477627B2 (en) | 2003-09-10 | 2009-01-13 | Intel Corporation | Method and device of adaptive control of data rate, fragmentation and request to send protection in wireless networks |
| US7445697B2 (en) | 2003-10-22 | 2008-11-04 | Nexx Systems, Inc. | Method and apparatus for fluid processing a workpiece |
| GB0324947D0 (en) | 2003-10-25 | 2003-11-26 | Avecia Ltd | Process |
| US20060207888A1 (en) * | 2003-12-29 | 2006-09-21 | Taylor E J | Electrochemical etching of circuitry for high density interconnect electronic modules |
| US7357879B2 (en) * | 2004-03-03 | 2008-04-15 | Ibiden Co., Ltd. | Etching solution, method of etching and printed wiring board |
| KR100585138B1 (ko) | 2004-04-08 | 2006-05-30 | 삼성전자주식회사 | 반도체 소자 제조용 마스크 패턴 및 그 형성 방법과 미세패턴을 가지는 반도체 소자의 제조 방법 |
| US20050250052A1 (en) | 2004-05-10 | 2005-11-10 | Nguyen Khe C | Maskless lithography using UV absorbing nano particle |
| JP4731135B2 (ja) * | 2004-07-02 | 2011-07-20 | ルネサスエレクトロニクス株式会社 | 微細パターン形成材料を用いた電子デバイス装置の製造方法 |
| GB0414840D0 (en) | 2004-07-02 | 2004-08-04 | Ncr Int Inc | Self-service terminal |
| KR100733920B1 (ko) | 2004-09-17 | 2007-07-02 | 주식회사 엘지화학 | 에칭 레지스트용 잉크 조성물, 이를 이용한 에칭 레지스트패턴 형성 방법 및 미세 유로 형성 방법 |
| WO2007026366A1 (en) | 2005-08-31 | 2007-03-08 | Printar Ltd. | Uv curable hybridcuring ink jet ink composition and solder mask using the same |
| US20070237899A1 (en) | 2006-04-05 | 2007-10-11 | David Sawoska | Process for creating a pattern on a copper surface |
| US20080308003A1 (en) | 2007-06-13 | 2008-12-18 | Krol Andrew M | UV inkjet resist |
| JP5454834B2 (ja) | 2007-08-30 | 2014-03-26 | 日立化成株式会社 | 粗化処理装置 |
| JP2009158593A (ja) | 2007-12-25 | 2009-07-16 | Tessera Interconnect Materials Inc | バンプ構造およびその製造方法 |
| JP5126354B2 (ja) | 2008-03-17 | 2013-01-23 | 日立化成工業株式会社 | 感光性樹脂組成物、並びにこれを用いた感光性エレメント、ソルダーレジスト及びプリント配線板 |
| KR100986287B1 (ko) * | 2008-05-09 | 2010-10-07 | 삼성전기주식회사 | 잉크젯 토출장치 |
| EP2562599B1 (en) | 2009-01-29 | 2014-12-10 | Digiflex Ltd. | Process for producing a photomask on a photopolymeric surface |
| JP2011243256A (ja) * | 2010-05-19 | 2011-12-01 | Dainippon Printing Co Ltd | サスペンション用フレキシャー基板、サスペンション、ヘッド付サスペンション、およびハードディスクドライブ |
| JPWO2012067107A1 (ja) | 2010-11-17 | 2014-05-12 | 日立化成株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| US20120288683A1 (en) | 2011-05-10 | 2012-11-15 | Chin-Te Kuo | Protuberant structure and method for making the same |
| EP2729595B1 (en) | 2011-07-07 | 2017-02-01 | ATOTECH Deutschland GmbH | Method for providing organic resist adhesion to a copper or copper alloy surface |
| WO2013027220A2 (en) | 2011-08-24 | 2013-02-28 | Digiflex Ltd. | Process for dry-coating of flexogarphic surfaces |
| EP2753159B1 (en) | 2011-08-29 | 2018-12-19 | NGK Insulators, Ltd. | Laminated sintered ceramic wiring substrate, and semiconductor package containing wiring substrate |
| JP2013112882A (ja) * | 2011-11-30 | 2013-06-10 | Kanto Chem Co Inc | TiおよびTi合金層を有する金属積層膜一括エッチング液組成物 |
| JP6012749B2 (ja) | 2012-01-31 | 2016-10-25 | アグフア−ゲヴエルト | 放射線硬化可能なエッチング抵抗性インキジェットインキ印刷 |
| KR20140049358A (ko) * | 2012-10-17 | 2014-04-25 | 삼성전기주식회사 | 드라이필름 레지스트 시트 및 제조방법 |
| US20140252571A1 (en) | 2013-03-06 | 2014-09-11 | Maxim Integrated Products, Inc. | Wafer-level package mitigated undercut |
| JP6164614B2 (ja) * | 2013-12-06 | 2017-07-19 | メック株式会社 | エッチング液、補給液及び銅配線の形成方法 |
| US9562211B2 (en) | 2013-12-06 | 2017-02-07 | Fujifilm Electronic Materials U.S.A., Inc. | Cleaning formulation for removing residues on surfaces |
| TWI500806B (zh) | 2014-03-10 | 2015-09-21 | Nat Univ Tsing Hua | 碳化矽薄膜的製造方法 |
| KR20150109932A (ko) * | 2014-03-21 | 2015-10-02 | 삼성전기주식회사 | 에칭액 조성물 및 이를 이용한 회로 패턴의 제조방법 |
| JP2015227499A (ja) * | 2014-06-03 | 2015-12-17 | 四国化成工業株式会社 | エッチングレジスト材およびプリント配線板の製造方法 |
| CN106572859B (zh) | 2014-08-15 | 2019-08-09 | 纽姆克斯股份有限公司 | Copd治疗的协调递送 |
| JP6579392B2 (ja) | 2014-09-08 | 2019-09-25 | 国立大学法人九州大学 | 有機マイクロディスク構造体の製造方法 |
| US9324669B2 (en) * | 2014-09-12 | 2016-04-26 | International Business Machines Corporation | Use of electrolytic plating to control solder wetting |
| GB2538522B (en) | 2015-05-19 | 2019-03-06 | Dst Innovations Ltd | Electronic circuit and component construction |
| EP3304197A4 (en) | 2015-06-04 | 2019-01-23 | Kateeva, Inc. | METHOD FOR PRODUCING AN ESTETRESIST PATTERN ON A METALLIC SURFACE |
| KR102626521B1 (ko) * | 2015-08-13 | 2024-01-17 | 카티바, 인크. | 금속 표면 상에 에치 레지스트 패턴을 형성하는 방법 |
| US10398034B2 (en) | 2016-12-12 | 2019-08-27 | Kateeva, Inc. | Methods of etching conductive features, and related devices and systems |
-
2017
- 2017-12-07 US US15/835,116 patent/US10398034B2/en active Active
- 2017-12-11 WO PCT/IL2017/051338 patent/WO2018109762A1/en not_active Ceased
- 2017-12-11 CN CN201780086295.0A patent/CN110249075A/zh active Pending
- 2017-12-11 EP EP17880261.7A patent/EP3551781B1/en active Active
- 2017-12-11 JP JP2019531090A patent/JP2020501375A/ja active Pending
- 2017-12-11 KR KR1020197016384A patent/KR20190093576A/ko not_active Ceased
-
2019
- 2019-07-10 US US16/507,358 patent/US11006528B2/en active Active
-
2021
- 2021-04-02 US US17/301,459 patent/US11425822B2/en active Active
-
2023
- 2023-07-07 JP JP2023111882A patent/JP2023139049A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| US20210227696A1 (en) | 2021-07-22 |
| EP3551781A4 (en) | 2020-09-02 |
| WO2018109762A1 (en) | 2018-06-21 |
| JP2023139049A (ja) | 2023-10-03 |
| US20190335589A1 (en) | 2019-10-31 |
| EP3551781B1 (en) | 2025-09-24 |
| US11006528B2 (en) | 2021-05-11 |
| US10398034B2 (en) | 2019-08-27 |
| EP3551781A1 (en) | 2019-10-16 |
| JP2020501375A (ja) | 2020-01-16 |
| US20180192521A1 (en) | 2018-07-05 |
| CN110249075A (zh) | 2019-09-17 |
| US11425822B2 (en) | 2022-08-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US11006528B2 (en) | Methods of etching conductive features, and related devices and systems | |
| JP7288644B2 (ja) | 金属表面上のエッチレジストパターンの製造方法 | |
| JP7713254B2 (ja) | 金属表面上のエッチレジストパターンの製造方法 | |
| CN105960103B (zh) | 一种pcb埋入式线路的制造方法 | |
| TWI886572B (zh) | 蝕刻導電特徵之方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 20190607 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20201103 Comment text: Request for Examination of Application |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20211007 Patent event code: PE09021S01D |
|
| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
Patent event date: 20220414 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20211007 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |