KR20190073290A - 광학 필터 - Google Patents

광학 필터 Download PDF

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Publication number
KR20190073290A
KR20190073290A KR1020180163593A KR20180163593A KR20190073290A KR 20190073290 A KR20190073290 A KR 20190073290A KR 1020180163593 A KR1020180163593 A KR 1020180163593A KR 20180163593 A KR20180163593 A KR 20180163593A KR 20190073290 A KR20190073290 A KR 20190073290A
Authority
KR
South Korea
Prior art keywords
filter
component
optical
component filter
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
KR1020180163593A
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English (en)
Korean (ko)
Inventor
마커스 빌거
주니어 리차드 에이. 브래들리
Original Assignee
비아비 솔루션즈 아이엔씨.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 비아비 솔루션즈 아이엔씨. filed Critical 비아비 솔루션즈 아이엔씨.
Publication of KR20190073290A publication Critical patent/KR20190073290A/ko
Abandoned legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/0214—Constructional arrangements for removing stray light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0488—Optical or mechanical part supplementary adjustable parts with spectral filtering
    • G01J1/0492—Optical or mechanical part supplementary adjustable parts with spectral filtering using at least two different filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0262—Constructional arrangements for removing stray light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/281—Interference filters designed for the infrared light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/281—Interference filters designed for the infrared light
    • G02B5/282—Interference filters designed for the infrared light reflecting for infrared and transparent for visible light, e.g. heat reflectors, laser protection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/12007—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J2003/1213—Filters in general, e.g. dichroic, band
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J2003/1226—Interference filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J2003/1226—Interference filters
    • G01J2003/123—Indexed discrete filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/146—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation with corrections for use in multiple wavelength bands, such as infrared and visible light, e.g. FLIR systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12083—Constructional arrangements
    • G02B2006/12109—Filter
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/003—Light absorbing elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optical Filters (AREA)
KR1020180163593A 2017-12-18 2018-12-17 광학 필터 Abandoned KR20190073290A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/845,607 2017-12-18
US15/845,607 US11156753B2 (en) 2017-12-18 2017-12-18 Optical filters

Publications (1)

Publication Number Publication Date
KR20190073290A true KR20190073290A (ko) 2019-06-26

Family

ID=64664992

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020180163593A Abandoned KR20190073290A (ko) 2017-12-18 2018-12-17 광학 필터

Country Status (8)

Country Link
US (1) US11156753B2 (enExample)
EP (1) EP3499279A1 (enExample)
JP (1) JP2019133137A (enExample)
KR (1) KR20190073290A (enExample)
CN (1) CN110018542A (enExample)
AU (1) AU2018274929A1 (enExample)
CA (1) CA3026713A1 (enExample)
TW (1) TW201928410A (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10876889B2 (en) 2019-02-12 2020-12-29 Viavi Solutions Inc. Sensor device and method of use
CN112179491B (zh) * 2019-07-01 2022-03-25 华为技术有限公司 一种高光谱成像系统、摄像头以及终端设备
US11789188B2 (en) * 2019-07-19 2023-10-17 Viavi Solutions Inc. Optical filter
US11287317B2 (en) * 2019-08-27 2022-03-29 Viavi Solutions Inc. Optical measurement device including internal spectral reference
US11835381B2 (en) * 2019-12-26 2023-12-05 ams Sensors Germany GmbH Integrated radiation sensor
US11914181B2 (en) 2020-04-08 2024-02-27 Samsung Electronics Co., Ltd. Optical filter and spectrometer including the same
EP4160170A4 (en) * 2020-05-29 2023-12-06 Panasonic Intellectual Property Management Co., Ltd. FILTER ARRANGEMENT AND PHOTODETECTOR SYSTEM
EP3943988B1 (en) 2020-07-20 2023-12-27 Samsung Electronics Co., Ltd. Spectral filter, and image sensor and electronic device including the spectral filter
JP2022022121A (ja) 2020-07-23 2022-02-03 三星電子株式会社 イメージセンサ及びイメージ処理方法、並びにイメージセンサを含む電子装置
US12174405B2 (en) * 2020-11-19 2024-12-24 Visera Technologies Company Limited Optical structure having polymer-covered protrusions contacting bandpass filter
US12339478B2 (en) 2021-04-22 2025-06-24 Samsung Electronics Co., Ltd. Spectral filter, and image sensor and electronic device including spectral filter
KR102883986B1 (ko) 2021-10-14 2025-11-07 삼성전자주식회사 이미지 획득 장치 및 방법, 이를 포함하는 전자 장치
CN115268210A (zh) * 2022-07-25 2022-11-01 北京理工大学 一种基于光刻的多光谱计算传感器制备方法及装置

Family Cites Families (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4407067C2 (de) 1994-03-03 2003-06-18 Unaxis Balzers Ag Dielektrisches Interferenz-Filtersystem, LCD-Anzeige und CCD-Anordnung sowie Verfahren zur Herstellung eines dielektrischen Interferenz-Filtersystems
US6800378B2 (en) 1998-02-19 2004-10-05 3M Innovative Properties Company Antireflection films for use with displays
CH693076A5 (de) 1998-02-20 2003-02-14 Unaxis Trading Ag Verfahren zur Herstellung einer Farbfilterschichtsystem-Struktur auf einer Unterlage.
US6638668B2 (en) 2000-05-12 2003-10-28 Ocean Optics, Inc. Method for making monolithic patterned dichroic filter detector arrays for spectroscopic imaging
JP2003042845A (ja) * 2001-07-30 2003-02-13 Sony Corp 光学装置
JP2004080605A (ja) * 2002-08-21 2004-03-11 Minolta Co Ltd 撮像装置
JP4638356B2 (ja) 2004-01-15 2011-02-23 パナソニック株式会社 固体撮像装置、固体撮像装置の製造方法及びこれを用いたカメラ
WO2007011375A1 (en) * 2004-09-13 2007-01-25 Cdm Optics, Inc. Iris image capture devices and associated systems
CN1306288C (zh) 2005-04-27 2007-03-21 中国科学院上海技术物理研究所 具有平整谐振腔层的滤光片列阵
US7692855B2 (en) 2006-06-28 2010-04-06 Essilor International Compagnie Generale D'optique Optical article having a temperature-resistant anti-reflection coating with optimized thickness ratio of low index and high index layers
FR2904432B1 (fr) 2006-07-25 2008-10-24 Commissariat Energie Atomique Structure matricielle de filtrage optique et capteur d'images associe
US8629986B2 (en) 2006-08-09 2014-01-14 Biozoom Technologies, Inc. Optical filter and method for the production of the same, and device for the examination of electromagnetic radiation
US8218108B2 (en) * 2006-09-28 2012-07-10 Sharp Kabushiki Kaisha Liquid crystal display panel and liquid crystal display device
US20100140461A1 (en) 2006-12-13 2010-06-10 Georgia Tech Research Corporation Systems and methods for real time multispectral imaging
WO2008081892A1 (ja) 2006-12-28 2008-07-10 Nippon Shokubai Co., Ltd. 光選択透過フィルター
JP2008244246A (ja) * 2007-03-28 2008-10-09 Matsushita Electric Ind Co Ltd 固体撮像装置、カメラ、車両及び監視装置
FR2926635B1 (fr) 2008-01-21 2012-08-03 Silios Technologies Dispositif de spectroscopie en longueur d'onde a filtres integres
JP5017193B2 (ja) 2008-06-30 2012-09-05 パナソニック株式会社 固体撮像装置及びカメラ
US8264637B2 (en) 2008-10-10 2012-09-11 Samsung Electronics Co., Ltd. Photonic crystal optical filter, reflective color filter, display apparatus using the reflective color filter, and method of manufacturing the reflective color filter
US8363185B2 (en) 2008-10-10 2013-01-29 Samsung Electronics Co., Ltd. Photonic crystal optical filter, transmissive color filter, transflective color filter, and display apparatus using the color filters
JP5489604B2 (ja) 2009-01-14 2014-05-14 ホーヤ レンズ マニュファクチャリング フィリピン インク 光学物品の製造方法
US8692198B2 (en) * 2010-04-21 2014-04-08 Sionyx, Inc. Photosensitive imaging devices and associated methods
JP2012019113A (ja) 2010-07-08 2012-01-26 Panasonic Corp 固体撮像装置
US8408821B2 (en) * 2010-10-12 2013-04-02 Omnivision Technologies, Inc. Visible and infrared dual mode imaging system
EP2492251B1 (de) 2011-02-23 2017-01-04 Schott Ag Substrat mit Antireflexionsbeschichtung und Verahren zu dessen Herstellung
EP2773929B1 (en) 2011-11-04 2023-12-13 IMEC vzw Spectral camera with mosaic of filters for each image pixel
CN104011588B (zh) 2011-12-12 2021-06-22 唯景公司 薄膜装置和制造
JP2013156523A (ja) 2012-01-31 2013-08-15 Topcon Corp 基板
FR2994282B1 (fr) * 2012-07-31 2014-09-05 Commissariat Energie Atomique Structure de filtrage optique dans le domaine visible et/ou infrarouge
WO2014120686A1 (en) * 2013-01-29 2014-08-07 Jds Uniphase Corporation A variable optical filter and a wavelength-selective sensor based thereon
US10782459B2 (en) * 2013-04-16 2020-09-22 Materion Corporation Filter array with reduced stray light
US20140339606A1 (en) 2013-05-16 2014-11-20 Visera Technologies Company Limited Bsi cmos image sensor
KR102299714B1 (ko) 2014-08-18 2021-09-08 삼성전자주식회사 컬러 필터 격리층을 구비하는 이미지 센서 및 상기 이미지 센서의 제조 방법
JP6269387B2 (ja) * 2014-08-21 2018-01-31 セイコーエプソン株式会社 表示装置及び電子機器
DE102014013550A1 (de) 2014-09-12 2016-03-31 Schott Ag Beschichtetes chemisch vorgespanntes flexibles dünnes Glas
US9679933B2 (en) 2014-10-06 2017-06-13 Visera Technologies Company Limited Image sensors and methods of forming the same
US9570491B2 (en) * 2014-10-08 2017-02-14 Omnivision Technologies, Inc. Dual-mode image sensor with a signal-separating color filter array, and method for same
US20160182846A1 (en) * 2014-12-22 2016-06-23 Google Inc. Monolithically integrated rgb pixel array and z pixel array
JP6611443B2 (ja) 2015-03-19 2019-11-27 キヤノン株式会社 光学フィルタおよび光学装置
WO2017022658A1 (ja) * 2015-07-31 2017-02-09 旭硝子株式会社 光学フィルタおよび近赤外線カットフィルタ
EP4550013A3 (en) 2015-11-03 2025-07-30 Materion Corporation Filter array with reduced stray focused light
US10170509B2 (en) 2016-02-12 2019-01-01 Viavi Solutions Inc. Optical filter array
JP6824279B2 (ja) * 2016-02-18 2021-02-03 アップル インコーポレイテッドＡｐｐｌｅ Ｉｎｃ． インサイドアウト方式のポジション、ユーザボディ、及び環境トラッキングを伴うバーチャルリアリティ及びミックスドリアリティ用ヘッドマウントディスプレイ
CN105589251B (zh) 2016-02-29 2020-03-10 京东方科技集团股份有限公司 彩膜基板及其制作方法、显示装置
CN109983374A (zh) * 2016-08-31 2019-07-05 株式会社大真空 光学滤波器

Also Published As

Publication number Publication date
US20190187347A1 (en) 2019-06-20
US11156753B2 (en) 2021-10-26
CN110018542A (zh) 2019-07-16
EP3499279A1 (en) 2019-06-19
CA3026713A1 (en) 2019-06-18
TW201928410A (zh) 2019-07-16
AU2018274929A1 (en) 2019-07-04
JP2019133137A (ja) 2019-08-08

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