CA3026713A1 - Optical filters - Google Patents
Optical filters Download PDFInfo
- Publication number
- CA3026713A1 CA3026713A1 CA3026713A CA3026713A CA3026713A1 CA 3026713 A1 CA3026713 A1 CA 3026713A1 CA 3026713 A CA3026713 A CA 3026713A CA 3026713 A CA3026713 A CA 3026713A CA 3026713 A1 CA3026713 A1 CA 3026713A1
- Authority
- CA
- Canada
- Prior art keywords
- filter
- component
- optical
- layers
- approximately
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 173
- 239000000758 substrate Substances 0.000 claims abstract description 70
- 238000000926 separation method Methods 0.000 claims abstract description 6
- 230000003595 spectral effect Effects 0.000 claims description 62
- 238000000034 method Methods 0.000 claims description 45
- 239000006096 absorbing agent Substances 0.000 claims description 32
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 26
- 238000004544 sputter deposition Methods 0.000 claims description 25
- 239000000463 material Substances 0.000 claims description 24
- 238000000206 photolithography Methods 0.000 claims description 15
- 239000000377 silicon dioxide Substances 0.000 claims description 13
- 238000000576 coating method Methods 0.000 claims description 12
- 239000011248 coating agent Substances 0.000 claims description 11
- 235000012239 silicon dioxide Nutrition 0.000 claims description 10
- 230000007704 transition Effects 0.000 claims description 9
- 150000002290 germanium Chemical class 0.000 claims description 6
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 claims description 6
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 6
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 6
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 5
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 4
- 150000003376 silicon Chemical class 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052732 germanium Inorganic materials 0.000 claims description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 3
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 3
- 239000002210 silicon-based material Substances 0.000 claims description 3
- 238000001514 detection method Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 125
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 11
- 239000001257 hydrogen Substances 0.000 description 9
- 229910052739 hydrogen Inorganic materials 0.000 description 9
- 238000000151 deposition Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 7
- 239000000853 adhesive Substances 0.000 description 6
- 230000001070 adhesive effect Effects 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 2
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 2
- KXNLCSXBJCPWGL-UHFFFAOYSA-N [Ga].[As].[In] Chemical compound [Ga].[As].[In] KXNLCSXBJCPWGL-UHFFFAOYSA-N 0.000 description 2
- 238000001994 activation Methods 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 210000001503 joint Anatomy 0.000 description 2
- -1 m. For example Substances 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 238000000678 plasma activation Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/0214—Constructional arrangements for removing stray light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0488—Optical or mechanical part supplementary adjustable parts with spectral filtering
- G01J1/0492—Optical or mechanical part supplementary adjustable parts with spectral filtering using at least two different filters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0262—Constructional arrangements for removing stray light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
- G02B5/282—Interference filters designed for the infrared light reflecting for infrared and transparent for visible light, e.g. heat reflectors, laser protection
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12007—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J2003/1213—Filters in general, e.g. dichroic, band
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J2003/1226—Interference filters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J2003/1226—Interference filters
- G01J2003/123—Indexed discrete filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
- G02B13/146—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation with corrections for use in multiple wavelength bands, such as infrared and visible light, e.g. FLIR systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/12109—Filter
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/003—Light absorbing elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optical Filters (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/845,607 | 2017-12-18 | ||
| US15/845,607 US11156753B2 (en) | 2017-12-18 | 2017-12-18 | Optical filters |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA3026713A1 true CA3026713A1 (en) | 2019-06-18 |
Family
ID=64664992
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA3026713A Pending CA3026713A1 (en) | 2017-12-18 | 2018-12-06 | Optical filters |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US11156753B2 (enExample) |
| EP (1) | EP3499279A1 (enExample) |
| JP (1) | JP2019133137A (enExample) |
| KR (1) | KR20190073290A (enExample) |
| CN (1) | CN110018542A (enExample) |
| AU (1) | AU2018274929A1 (enExample) |
| CA (1) | CA3026713A1 (enExample) |
| TW (1) | TW201928410A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115268210A (zh) * | 2022-07-25 | 2022-11-01 | 北京理工大学 | 一种基于光刻的多光谱计算传感器制备方法及装置 |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10876889B2 (en) | 2019-02-12 | 2020-12-29 | Viavi Solutions Inc. | Sensor device and method of use |
| CN112179491B (zh) * | 2019-07-01 | 2022-03-25 | 华为技术有限公司 | 一种高光谱成像系统、摄像头以及终端设备 |
| US11789188B2 (en) * | 2019-07-19 | 2023-10-17 | Viavi Solutions Inc. | Optical filter |
| US11287317B2 (en) * | 2019-08-27 | 2022-03-29 | Viavi Solutions Inc. | Optical measurement device including internal spectral reference |
| US11835381B2 (en) * | 2019-12-26 | 2023-12-05 | ams Sensors Germany GmbH | Integrated radiation sensor |
| US11914181B2 (en) | 2020-04-08 | 2024-02-27 | Samsung Electronics Co., Ltd. | Optical filter and spectrometer including the same |
| EP4160170A4 (en) * | 2020-05-29 | 2023-12-06 | Panasonic Intellectual Property Management Co., Ltd. | FILTER ARRANGEMENT AND PHOTODETECTOR SYSTEM |
| EP3943988B1 (en) | 2020-07-20 | 2023-12-27 | Samsung Electronics Co., Ltd. | Spectral filter, and image sensor and electronic device including the spectral filter |
| JP2022022121A (ja) | 2020-07-23 | 2022-02-03 | 三星電子株式会社 | イメージセンサ及びイメージ処理方法、並びにイメージセンサを含む電子装置 |
| US12174405B2 (en) * | 2020-11-19 | 2024-12-24 | Visera Technologies Company Limited | Optical structure having polymer-covered protrusions contacting bandpass filter |
| US12339478B2 (en) | 2021-04-22 | 2025-06-24 | Samsung Electronics Co., Ltd. | Spectral filter, and image sensor and electronic device including spectral filter |
| KR102883986B1 (ko) | 2021-10-14 | 2025-11-07 | 삼성전자주식회사 | 이미지 획득 장치 및 방법, 이를 포함하는 전자 장치 |
Family Cites Families (45)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4407067C2 (de) | 1994-03-03 | 2003-06-18 | Unaxis Balzers Ag | Dielektrisches Interferenz-Filtersystem, LCD-Anzeige und CCD-Anordnung sowie Verfahren zur Herstellung eines dielektrischen Interferenz-Filtersystems |
| US6800378B2 (en) | 1998-02-19 | 2004-10-05 | 3M Innovative Properties Company | Antireflection films for use with displays |
| CH693076A5 (de) | 1998-02-20 | 2003-02-14 | Unaxis Trading Ag | Verfahren zur Herstellung einer Farbfilterschichtsystem-Struktur auf einer Unterlage. |
| US6638668B2 (en) | 2000-05-12 | 2003-10-28 | Ocean Optics, Inc. | Method for making monolithic patterned dichroic filter detector arrays for spectroscopic imaging |
| JP2003042845A (ja) * | 2001-07-30 | 2003-02-13 | Sony Corp | 光学装置 |
| JP2004080605A (ja) * | 2002-08-21 | 2004-03-11 | Minolta Co Ltd | 撮像装置 |
| JP4638356B2 (ja) | 2004-01-15 | 2011-02-23 | パナソニック株式会社 | 固体撮像装置、固体撮像装置の製造方法及びこれを用いたカメラ |
| WO2007011375A1 (en) * | 2004-09-13 | 2007-01-25 | Cdm Optics, Inc. | Iris image capture devices and associated systems |
| CN1306288C (zh) | 2005-04-27 | 2007-03-21 | 中国科学院上海技术物理研究所 | 具有平整谐振腔层的滤光片列阵 |
| US7692855B2 (en) | 2006-06-28 | 2010-04-06 | Essilor International Compagnie Generale D'optique | Optical article having a temperature-resistant anti-reflection coating with optimized thickness ratio of low index and high index layers |
| FR2904432B1 (fr) | 2006-07-25 | 2008-10-24 | Commissariat Energie Atomique | Structure matricielle de filtrage optique et capteur d'images associe |
| US8629986B2 (en) | 2006-08-09 | 2014-01-14 | Biozoom Technologies, Inc. | Optical filter and method for the production of the same, and device for the examination of electromagnetic radiation |
| US8218108B2 (en) * | 2006-09-28 | 2012-07-10 | Sharp Kabushiki Kaisha | Liquid crystal display panel and liquid crystal display device |
| US20100140461A1 (en) | 2006-12-13 | 2010-06-10 | Georgia Tech Research Corporation | Systems and methods for real time multispectral imaging |
| WO2008081892A1 (ja) | 2006-12-28 | 2008-07-10 | Nippon Shokubai Co., Ltd. | 光選択透過フィルター |
| JP2008244246A (ja) * | 2007-03-28 | 2008-10-09 | Matsushita Electric Ind Co Ltd | 固体撮像装置、カメラ、車両及び監視装置 |
| FR2926635B1 (fr) | 2008-01-21 | 2012-08-03 | Silios Technologies | Dispositif de spectroscopie en longueur d'onde a filtres integres |
| JP5017193B2 (ja) | 2008-06-30 | 2012-09-05 | パナソニック株式会社 | 固体撮像装置及びカメラ |
| US8264637B2 (en) | 2008-10-10 | 2012-09-11 | Samsung Electronics Co., Ltd. | Photonic crystal optical filter, reflective color filter, display apparatus using the reflective color filter, and method of manufacturing the reflective color filter |
| US8363185B2 (en) | 2008-10-10 | 2013-01-29 | Samsung Electronics Co., Ltd. | Photonic crystal optical filter, transmissive color filter, transflective color filter, and display apparatus using the color filters |
| JP5489604B2 (ja) | 2009-01-14 | 2014-05-14 | ホーヤ レンズ マニュファクチャリング フィリピン インク | 光学物品の製造方法 |
| US8692198B2 (en) * | 2010-04-21 | 2014-04-08 | Sionyx, Inc. | Photosensitive imaging devices and associated methods |
| JP2012019113A (ja) | 2010-07-08 | 2012-01-26 | Panasonic Corp | 固体撮像装置 |
| US8408821B2 (en) * | 2010-10-12 | 2013-04-02 | Omnivision Technologies, Inc. | Visible and infrared dual mode imaging system |
| EP2492251B1 (de) | 2011-02-23 | 2017-01-04 | Schott Ag | Substrat mit Antireflexionsbeschichtung und Verahren zu dessen Herstellung |
| EP2773929B1 (en) | 2011-11-04 | 2023-12-13 | IMEC vzw | Spectral camera with mosaic of filters for each image pixel |
| CN104011588B (zh) | 2011-12-12 | 2021-06-22 | 唯景公司 | 薄膜装置和制造 |
| JP2013156523A (ja) | 2012-01-31 | 2013-08-15 | Topcon Corp | 基板 |
| FR2994282B1 (fr) * | 2012-07-31 | 2014-09-05 | Commissariat Energie Atomique | Structure de filtrage optique dans le domaine visible et/ou infrarouge |
| WO2014120686A1 (en) * | 2013-01-29 | 2014-08-07 | Jds Uniphase Corporation | A variable optical filter and a wavelength-selective sensor based thereon |
| US10782459B2 (en) * | 2013-04-16 | 2020-09-22 | Materion Corporation | Filter array with reduced stray light |
| US20140339606A1 (en) | 2013-05-16 | 2014-11-20 | Visera Technologies Company Limited | Bsi cmos image sensor |
| KR102299714B1 (ko) | 2014-08-18 | 2021-09-08 | 삼성전자주식회사 | 컬러 필터 격리층을 구비하는 이미지 센서 및 상기 이미지 센서의 제조 방법 |
| JP6269387B2 (ja) * | 2014-08-21 | 2018-01-31 | セイコーエプソン株式会社 | 表示装置及び電子機器 |
| DE102014013550A1 (de) | 2014-09-12 | 2016-03-31 | Schott Ag | Beschichtetes chemisch vorgespanntes flexibles dünnes Glas |
| US9679933B2 (en) | 2014-10-06 | 2017-06-13 | Visera Technologies Company Limited | Image sensors and methods of forming the same |
| US9570491B2 (en) * | 2014-10-08 | 2017-02-14 | Omnivision Technologies, Inc. | Dual-mode image sensor with a signal-separating color filter array, and method for same |
| US20160182846A1 (en) * | 2014-12-22 | 2016-06-23 | Google Inc. | Monolithically integrated rgb pixel array and z pixel array |
| JP6611443B2 (ja) | 2015-03-19 | 2019-11-27 | キヤノン株式会社 | 光学フィルタおよび光学装置 |
| WO2017022658A1 (ja) * | 2015-07-31 | 2017-02-09 | 旭硝子株式会社 | 光学フィルタおよび近赤外線カットフィルタ |
| EP4550013A3 (en) | 2015-11-03 | 2025-07-30 | Materion Corporation | Filter array with reduced stray focused light |
| US10170509B2 (en) | 2016-02-12 | 2019-01-01 | Viavi Solutions Inc. | Optical filter array |
| JP6824279B2 (ja) * | 2016-02-18 | 2021-02-03 | アップル インコーポレイテッドＡｐｐｌｅ Ｉｎｃ． | インサイドアウト方式のポジション、ユーザボディ、及び環境トラッキングを伴うバーチャルリアリティ及びミックスドリアリティ用ヘッドマウントディスプレイ |
| CN105589251B (zh) | 2016-02-29 | 2020-03-10 | 京东方科技集团股份有限公司 | 彩膜基板及其制作方法、显示装置 |
| CN109983374A (zh) * | 2016-08-31 | 2019-07-05 | 株式会社大真空 | 光学滤波器 |
-
2017
- 2017-12-18 US US15/845,607 patent/US11156753B2/en not_active Expired - Fee Related
-
2018
- 2018-12-05 AU AU2018274929A patent/AU2018274929A1/en not_active Abandoned
- 2018-12-06 CA CA3026713A patent/CA3026713A1/en active Pending
- 2018-12-06 TW TW107143818A patent/TW201928410A/zh unknown
- 2018-12-12 EP EP18211892.7A patent/EP3499279A1/en not_active Withdrawn
- 2018-12-17 KR KR1020180163593A patent/KR20190073290A/ko not_active Abandoned
- 2018-12-17 JP JP2018235692A patent/JP2019133137A/ja active Pending
- 2018-12-18 CN CN201811554720.7A patent/CN110018542A/zh active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115268210A (zh) * | 2022-07-25 | 2022-11-01 | 北京理工大学 | 一种基于光刻的多光谱计算传感器制备方法及装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20190187347A1 (en) | 2019-06-20 |
| US11156753B2 (en) | 2021-10-26 |
| CN110018542A (zh) | 2019-07-16 |
| EP3499279A1 (en) | 2019-06-19 |
| TW201928410A (zh) | 2019-07-16 |
| AU2018274929A1 (en) | 2019-07-04 |
| KR20190073290A (ko) | 2019-06-26 |
| JP2019133137A (ja) | 2019-08-08 |
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