KR20180081630A - 기판의 정전하를 측정하기 위한 장비 및 방법 - Google Patents

기판의 정전하를 측정하기 위한 장비 및 방법 Download PDF

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Publication number
KR20180081630A
KR20180081630A KR1020187019055A KR20187019055A KR20180081630A KR 20180081630 A KR20180081630 A KR 20180081630A KR 1020187019055 A KR1020187019055 A KR 1020187019055A KR 20187019055 A KR20187019055 A KR 20187019055A KR 20180081630 A KR20180081630 A KR 20180081630A
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KR
South Korea
Prior art keywords
substrate
component
contact
voltage
roller
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Ceased
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KR1020187019055A
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English (en)
Korean (ko)
Inventor
가브리엘 피어스 아넬로
피터 노울즈
코리 로버트 우스타닉
Original Assignee
코닝 인코포레이티드
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Application filed by 코닝 인코포레이티드 filed Critical 코닝 인코포레이티드
Publication of KR20180081630A publication Critical patent/KR20180081630A/ko
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R29/00—Arrangements for measuring or indicating electric quantities not covered by groups G01R19/00 - G01R27/00
    • G01R29/24—Arrangements for measuring quantities of charge
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R15/00—Details of measuring arrangements of the types provided for in groups G01R17/00 - G01R29/00, G01R33/00 - G01R33/26 or G01R35/00
    • G01R15/14—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks
    • G01R15/16—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using capacitive devices
    • G01R15/165—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using capacitive devices measuring electrostatic potential, e.g. with electrostatic voltmeters or electrometers, when the design of the sensor is essential
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/282—Testing of electronic circuits specially adapted for particular applications not provided for elsewhere
    • G01R31/2831—Testing of materials or semi-finished products, e.g. semiconductor wafers or substrates

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Measurement Of Resistance Or Impedance (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
KR1020187019055A 2015-12-03 2016-11-30 기판의 정전하를 측정하기 위한 장비 및 방법 Ceased KR20180081630A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201562262638P 2015-12-03 2015-12-03
US62/262,638 2015-12-03
PCT/US2016/064100 WO2017095857A1 (en) 2015-12-03 2016-11-30 Method and apparatus for measuring electrostatic charge of a substrate

Publications (1)

Publication Number Publication Date
KR20180081630A true KR20180081630A (ko) 2018-07-16

Family

ID=58798105

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020187019055A Ceased KR20180081630A (ko) 2015-12-03 2016-11-30 기판의 정전하를 측정하기 위한 장비 및 방법

Country Status (6)

Country Link
US (1) US10739394B2 (enExample)
JP (1) JP6811777B2 (enExample)
KR (1) KR20180081630A (enExample)
CN (1) CN108291931B (enExample)
TW (1) TWI712803B (enExample)
WO (1) WO2017095857A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4018190A1 (en) * 2019-08-20 2022-06-29 Ascend Performance Materials Operations LLC Method for measuring static attraction propensity
US11881424B2 (en) * 2022-03-10 2024-01-23 Intel Corporation Electrostatic charge measurement tool

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4827144B1 (enExample) * 1965-12-27 1973-08-20
JPS4910076A (enExample) * 1972-05-24 1974-01-29
US3876917A (en) * 1973-03-26 1975-04-08 Bell & Howell Co Electrostatic charging apparatus
US3935517A (en) * 1975-01-02 1976-01-27 Xerox Corporation Constant current charging device
JPH05273835A (ja) * 1992-03-26 1993-10-22 Ricoh Co Ltd 接触帯電装置
JPH05333076A (ja) * 1992-06-02 1993-12-17 Kanegafuchi Chem Ind Co Ltd 摩擦帯電量測定装置
JP2961472B2 (ja) * 1992-10-22 1999-10-12 三田工業株式会社 トナー像転写手段を備えた画像生成機
US5461324A (en) 1994-08-08 1995-10-24 International Business Machines Corporation Split-fixture configuration and method for testing circuit traces on a flexible substrate
US6391506B1 (en) * 1996-07-04 2002-05-21 Fuji Xerox Co., Ltd. Carrier, developer, and image-forming method
US5983043A (en) * 1997-12-24 1999-11-09 Canon Kabushiki Kaisha Potential measuring apparatus and potential measuring method
KR100265285B1 (ko) * 1997-12-30 2000-09-15 윤종용 정전기 센서를 이용한 표면 정전기 분포상태 측정방법과 장치 및 표면 정전기 분포상태 측정 시스템
JP2001013185A (ja) * 1999-06-29 2001-01-19 Hugle Electronics Inc 帯電分布測定装置
US20020192360A1 (en) * 2001-04-24 2002-12-19 3M Innovative Properties Company Electrostatic spray coating apparatus and method
US6806014B2 (en) * 2001-08-21 2004-10-19 Aetas Technology, Inc. Monocomponent developing arrangement for electrophotography
US7103301B2 (en) * 2003-02-18 2006-09-05 Ricoh Company, Ltd. Image forming apparatus using a contact or a proximity type of charging system including a protection substance on a moveable body to be charged
JP4439994B2 (ja) * 2003-05-14 2010-03-24 キヤノン株式会社 画像形成装置及びカートリッジ、カートリッジに搭載される記憶装置
JP2005173305A (ja) * 2003-12-12 2005-06-30 Konica Minolta Business Technologies Inc 画像形成装置及び画像形成方法
JP4434799B2 (ja) * 2004-03-23 2010-03-17 キヤノン株式会社 画像形成装置
JP2007003879A (ja) * 2005-06-24 2007-01-11 Dainippon Screen Mfg Co Ltd 画像形成装置および画像形成方法
JP2007180074A (ja) * 2005-12-27 2007-07-12 Olympus Corp 静電気検出装置および基板検査装置
US8339637B2 (en) * 2007-08-03 2012-12-25 Ricoh Company, Ltd. Management apparatus, management system, operation status determination method, and image forming apparatus
WO2009099175A1 (ja) * 2008-02-08 2009-08-13 Brother Kogyo Kabushiki Kaisha 現像剤供給装置及び画像形成装置
US20090226224A1 (en) * 2008-03-10 2009-09-10 Kabushiki Kaisha Toshiba Image forming apparatus and transfer belt turning method for image forming apparatus
JP5535670B2 (ja) * 2010-01-28 2014-07-02 富士フイルム株式会社 放射線画像検出器の製造方法
US8676071B2 (en) * 2011-01-18 2014-03-18 Xerox Corporation Interdocument photoreceptor signal sensing and feedback control of paper edge ghosting
CN103609203A (zh) * 2011-04-27 2014-02-26 道康宁法国公司 基材的等离子体处理
US9366696B2 (en) * 2011-10-19 2016-06-14 Applied Materials, Inc. Roll to roll tester and method of testing flexible substrates roll to roll
JP6106974B2 (ja) * 2011-11-14 2017-04-05 株式会社リコー 転写装置及び画像形成装置
EP2801835B1 (en) 2011-12-26 2019-07-24 The University of Tokyo Measurement method and measurement device
CN102608440B (zh) 2012-03-12 2014-05-07 南京航空航天大学 一种静电传感实验系统及颗粒摩擦带电量的测量方法
KR101923261B1 (ko) * 2012-07-02 2018-11-28 코닝 인코포레이티드 유리 기판의 가공 방법 및 유리 장치
JP2014016178A (ja) 2012-07-06 2014-01-30 Canon Inc 帯電量測定方法及び測定装置
CN102879658B (zh) 2012-09-20 2015-04-22 兰州大学 一种球盘式摩擦电测量装置
US8897675B2 (en) * 2013-03-26 2014-11-25 Xerox Corporation Semi-contact bias charge roller
CN103513119B (zh) * 2013-10-18 2016-08-17 河北大学 静电分选机转辊表面电荷密度分布的测量方法及测量装置

Also Published As

Publication number Publication date
CN108291931B (zh) 2020-08-07
TWI712803B (zh) 2020-12-11
TW201730568A (zh) 2017-09-01
US20180356452A1 (en) 2018-12-13
CN108291931A (zh) 2018-07-17
JP2019500748A (ja) 2019-01-10
US10739394B2 (en) 2020-08-11
JP6811777B2 (ja) 2021-01-13
WO2017095857A1 (en) 2017-06-08

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