KR20160071369A - 성막 마스크 및 그의 제조 방법 - Google Patents

성막 마스크 및 그의 제조 방법 Download PDF

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Publication number
KR20160071369A
KR20160071369A KR1020167006834A KR20167006834A KR20160071369A KR 20160071369 A KR20160071369 A KR 20160071369A KR 1020167006834 A KR1020167006834 A KR 1020167006834A KR 20167006834 A KR20167006834 A KR 20167006834A KR 20160071369 A KR20160071369 A KR 20160071369A
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KR
South Korea
Prior art keywords
mask
thin film
opening
metal thin
magnetic metal
Prior art date
Application number
KR1020167006834A
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English (en)
Korean (ko)
Inventor
슈지 구도
유지 사이토
미치노부 미즈무라
Original Assignee
브이 테크놀로지 씨오. 엘티디
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 브이 테크놀로지 씨오. 엘티디 filed Critical 브이 테크놀로지 씨오. 엘티디
Publication of KR20160071369A publication Critical patent/KR20160071369A/ko

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H01L51/56—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/042—Coating on selected surface areas, e.g. using masks using masks
    • H01L51/0011—
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020167006834A 2013-10-11 2014-10-07 성막 마스크 및 그의 제조 방법 KR20160071369A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013214099A JP2015074826A (ja) 2013-10-11 2013-10-11 成膜マスク及びその製造方法
JPJP-P-2013-214099 2013-10-11
PCT/JP2014/076762 WO2015053250A1 (ja) 2013-10-11 2014-10-07 成膜マスク及びその製造方法

Publications (1)

Publication Number Publication Date
KR20160071369A true KR20160071369A (ko) 2016-06-21

Family

ID=52813066

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167006834A KR20160071369A (ko) 2013-10-11 2014-10-07 성막 마스크 및 그의 제조 방법

Country Status (5)

Country Link
JP (1) JP2015074826A (zh)
KR (1) KR20160071369A (zh)
CN (1) CN105612271A (zh)
TW (1) TW201520349A (zh)
WO (1) WO2015053250A1 (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102091560B1 (ko) * 2015-06-12 2020-03-20 가부시키가이샤 아루박 기판 보지 장치, 성막 장치 및 기판 보지 방법
US11233199B2 (en) * 2016-02-10 2022-01-25 Hon Hai Precision Industry Co., Ltd. Vapor deposition mask manufacturing method, vapor deposition mask, and organic semiconductor element manufacturing method
JP6341434B2 (ja) * 2016-03-29 2018-06-13 株式会社ブイ・テクノロジー 成膜マスク、その製造方法及び成膜マスクのリペア方法
JP6465075B2 (ja) * 2016-05-26 2019-02-06 大日本印刷株式会社 蒸着マスク、フレーム付き蒸着マスク、有機半導体素子の製造方法、及びに有機ｅｌディスプレイの製造方法
CN106206990B (zh) * 2016-08-29 2018-05-08 昆山国显光电有限公司 Oled器件及制作方法、蒸镀基板制作方法
US10982316B2 (en) * 2016-09-30 2021-04-20 Dai Nippon Printing Co., Ltd. Vapor deposition mask, frame-equipped vapor deposition mask, vapor deposition mask preparation body, vapor deposition pattern forming method, method for producing organic semiconductor element, and method for producing organic EL display
CN113737128A (zh) 2017-01-31 2021-12-03 堺显示器制品株式会社 蒸镀掩模、蒸镀掩模及有机半导体元件的制造方法
CN108666420B (zh) * 2017-03-27 2021-01-22 京东方科技集团股份有限公司 掩模板及其制作方法
CN107195794B (zh) 2017-06-06 2019-07-30 京东方科技集团股份有限公司 一种柔性显示基板及其制作方法、显示面板、显示装置
CN107385391A (zh) 2017-07-14 2017-11-24 京东方科技集团股份有限公司 掩膜板、oled显示基板及其制作方法、显示装置
CN107858645B (zh) * 2017-12-15 2019-10-01 武汉华星光电半导体显示技术有限公司 金属掩膜板
CN108277454B (zh) * 2018-04-23 2021-01-26 京东方科技集团股份有限公司 精细掩模板及其制备方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004190057A (ja) 2002-12-09 2004-07-08 Nippon Filcon Co Ltd パターニングされたマスク被膜と支持体からなる積層構造の薄膜パターン形成用マスク及びその製造方法
JP2008274373A (ja) 2007-05-02 2008-11-13 Optnics Precision Co Ltd 蒸着用マスク

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006216289A (ja) * 2005-02-02 2006-08-17 Seiko Epson Corp マスク及び有機エレクトロルミネッセンス装置の製造方法
JP4867255B2 (ja) * 2005-09-28 2012-02-01 凸版印刷株式会社 有機ｅｌ用メタルマスク及び有機ｅｌ素子の製造方法
JP2013173968A (ja) * 2012-02-24 2013-09-05 V Technology Co Ltd 蒸着マスク及び蒸着マスクの製造方法
US9108216B2 (en) * 2012-01-12 2015-08-18 Dai Nippon Printing Co., Ltd. Vapor deposition mask, method for producing vapor deposition mask device and method for producing organic semiconductor element
TW201546306A (zh) * 2012-01-12 2015-12-16 大日本印刷股份有限公司 拼版蒸鍍遮罩準備體及拼版蒸鍍遮罩

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004190057A (ja) 2002-12-09 2004-07-08 Nippon Filcon Co Ltd パターニングされたマスク被膜と支持体からなる積層構造の薄膜パターン形成用マスク及びその製造方法
JP2008274373A (ja) 2007-05-02 2008-11-13 Optnics Precision Co Ltd 蒸着用マスク

Also Published As

Publication number Publication date
TW201520349A (zh) 2015-06-01
JP2015074826A (ja) 2015-04-20
WO2015053250A1 (ja) 2015-04-16
CN105612271A (zh) 2016-05-25

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