KR20160015228A - 에칭 조성물 - Google Patents

에칭 조성물 Download PDF

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Publication number
KR20160015228A
KR20160015228A KR1020157033636A KR20157033636A KR20160015228A KR 20160015228 A KR20160015228 A KR 20160015228A KR 1020157033636 A KR1020157033636 A KR 1020157033636A KR 20157033636 A KR20157033636 A KR 20157033636A KR 20160015228 A KR20160015228 A KR 20160015228A
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KR
South Korea
Prior art keywords
etching
etching composition
compound
composition according
composition
Prior art date
Application number
KR1020157033636A
Other languages
English (en)
Korean (ko)
Inventor
슌스케 고다마
?스케 고다마
도모아키 츠카하라
야스시 구마시로
Original Assignee
히타치가세이가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 히타치가세이가부시끼가이샤 filed Critical 히타치가세이가부시끼가이샤
Publication of KR20160015228A publication Critical patent/KR20160015228A/ko

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/10—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a boron compound
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/308—Chemical or electrical treatment, e.g. electrolytic etching using masks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)
  • Photovoltaic Devices (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
KR1020157033636A 2013-05-31 2014-05-22 에칭 조성물 KR20160015228A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JPJP-P-2013-116098 2013-05-31
JP2013116098 2013-05-31
JPJP-P-2013-116099 2013-05-31
JP2013116099 2013-05-31
PCT/JP2014/002702 WO2014192266A1 (ja) 2013-05-31 2014-05-22 エッチング組成物

Publications (1)

Publication Number Publication Date
KR20160015228A true KR20160015228A (ko) 2016-02-12

Family

ID=51988318

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020157033636A KR20160015228A (ko) 2013-05-31 2014-05-22 에칭 조성물

Country Status (5)

Country Link
JP (1) JP6369460B2 (zh)
KR (1) KR20160015228A (zh)
CN (1) CN105247663B (zh)
TW (1) TWI625381B (zh)
WO (1) WO2014192266A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115820256B (zh) * 2022-11-25 2024-05-24 嘉兴市小辰光伏科技有限公司 用于提升太阳能电池绒面均匀性的添加剂及其使用工艺

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005506705A (ja) 2001-10-10 2005-03-03 メルク　パテント　ゲゼルシャフト　ミット　ベシュレンクテル　ハフトング エッチングおよびドーピング複合物質
JP2008527698A (ja) 2005-01-11 2008-07-24 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフトング 二酸化ケイ素および窒化ケイ素の層のエッチングのためのプリント可能な媒体
JP2012033561A (ja) 2010-07-28 2012-02-16 Sanyo Chem Ind Ltd 窒化ケイ素用エッチング液

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2276349A (en) * 1993-03-25 1994-09-28 Ciba Geigy Ag Printing of porous substrates.
GB2373367A (en) * 2000-12-12 2002-09-18 Univ Montfort Formation and processing of porous semiconductors using etching solution of oxidant and fluorine-containing Lewis acid
JP2005162786A (ja) * 2003-11-28 2005-06-23 Mitsubishi Gas Chem Co Inc 洗浄液組成物
JP4225548B2 (ja) * 2004-01-06 2009-02-18 三菱瓦斯化学株式会社 エッチング液組成物及びエッチング方法
US9058975B2 (en) * 2006-06-09 2015-06-16 Lam Research Corporation Cleaning solution formulations for substrates
CN101639769B (zh) * 2008-07-30 2013-03-06 国际商业机器公司 在多处理器系统上对数据集进行划分及排序的方法和装置
CN102138214B (zh) * 2008-09-01 2014-06-04 默克专利股份有限公司 借助蚀刻的薄层太阳能电池组件的边缘去除
EP2438140A1 (en) * 2009-06-04 2012-04-11 Merck Patent GmbH Two component etching
CA2780291A1 (en) * 2009-11-09 2011-05-12 Carnegie Mellon University Metal ink compositions, conductive patterns, methods, and devices
JP2013533631A (ja) * 2010-07-16 2013-08-22 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド エッチング後残渣を除去するための水性洗浄剤
JP2012099550A (ja) * 2010-10-29 2012-05-24 Sanyo Chem Ind Ltd 窒化ケイ素用エッチング液

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005506705A (ja) 2001-10-10 2005-03-03 メルク　パテント　ゲゼルシャフト　ミット　ベシュレンクテル　ハフトング エッチングおよびドーピング複合物質
JP2008527698A (ja) 2005-01-11 2008-07-24 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフトング 二酸化ケイ素および窒化ケイ素の層のエッチングのためのプリント可能な媒体
JP2012033561A (ja) 2010-07-28 2012-02-16 Sanyo Chem Ind Ltd 窒化ケイ素用エッチング液

Also Published As

Publication number Publication date
CN105247663B (zh) 2018-03-23
TWI625381B (zh) 2018-06-01
CN105247663A (zh) 2016-01-13
JPWO2014192266A1 (ja) 2017-02-23
JP6369460B2 (ja) 2018-08-08
TW201504396A (zh) 2015-02-01
WO2014192266A1 (ja) 2014-12-04

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