KR20150140340A - 반도체 장치의 제조 방법 - Google Patents
반도체 장치의 제조 방법 Download PDFInfo
- Publication number
- KR20150140340A KR20150140340A KR1020157031649A KR20157031649A KR20150140340A KR 20150140340 A KR20150140340 A KR 20150140340A KR 1020157031649 A KR1020157031649 A KR 1020157031649A KR 20157031649 A KR20157031649 A KR 20157031649A KR 20150140340 A KR20150140340 A KR 20150140340A
- Authority
- KR
- South Korea
- Prior art keywords
- semiconductor substrate
- sealing sheet
- semiconductor device
- sheet
- semiconductor
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 229
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 238000007789 sealing Methods 0.000 claims abstract description 213
- 239000000758 substrate Substances 0.000 claims abstract description 157
- 238000009826 distribution Methods 0.000 claims abstract description 18
- 238000000034 method Methods 0.000 claims description 53
- 230000008569 process Effects 0.000 claims description 27
- 239000011342 resin composition Substances 0.000 claims description 6
- 238000000926 separation method Methods 0.000 claims description 4
- 230000007246 mechanism Effects 0.000 description 36
- 238000005520 cutting process Methods 0.000 description 27
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 7
- 229920001187 thermosetting polymer Polymers 0.000 description 7
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 6
- 238000003825 pressing Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 238000011084 recovery Methods 0.000 description 5
- 230000007723 transport mechanism Effects 0.000 description 5
- 238000001723 curing Methods 0.000 description 4
- 230000003028 elevating effect Effects 0.000 description 4
- 239000003566 sealing material Substances 0.000 description 4
- 238000004804 winding Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- JNDMLEXHDPKVFC-UHFFFAOYSA-N aluminum;oxygen(2-);yttrium(3+) Chemical compound [O-2].[O-2].[O-2].[Al+3].[Y+3] JNDMLEXHDPKVFC-UHFFFAOYSA-N 0.000 description 2
- 230000001174 ascending effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 230000037303 wrinkles Effects 0.000 description 2
- 229910019901 yttrium aluminum garnet Inorganic materials 0.000 description 2
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000002223 garnet Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- -1 polyethylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000011856 silicon-based particle Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013080601A JP2014204033A (ja) | 2013-04-08 | 2013-04-08 | 半導体装置の製造方法 |
JPJP-P-2013-080601 | 2013-04-08 | ||
PCT/JP2014/057175 WO2014167947A1 (ja) | 2013-04-08 | 2014-03-17 | 半導体装置の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20150140340A true KR20150140340A (ko) | 2015-12-15 |
Family
ID=51689361
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020157031649A KR20150140340A (ko) | 2013-04-08 | 2014-03-17 | 반도체 장치의 제조 방법 |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP2014204033A (ja) |
KR (1) | KR20150140340A (ja) |
CN (1) | CN105122433A (ja) |
SG (1) | SG11201508204RA (ja) |
TW (1) | TW201448062A (ja) |
WO (1) | WO2014167947A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10798814B2 (en) | 2018-06-14 | 2020-10-06 | Universal Scientific Industrial (Shanghai) Co., Ltd. | SiP module and manufacturing method of the SiP module |
KR20210003140A (ko) * | 2018-04-24 | 2021-01-11 | 디스코 하이테크 유럽 게엠베하 | 얼라인먼트 장치 및 얼라인먼트 방법 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI701097B (zh) * | 2017-09-13 | 2020-08-11 | 新加坡商誠解電子私人有限公司 | 用於以聚合物樹脂鑄模化合物為基底的基板之切割方法及其系統 |
KR102555601B1 (ko) * | 2018-04-24 | 2023-07-18 | 디스코 하이테크 유럽 게엠베하 | 반도체 웨이퍼의 보호 테이프 부착장치 및 부착방법 |
KR20230128565A (ko) * | 2021-02-01 | 2023-09-05 | 나가세케무텍쿠스가부시키가이샤 | 전자 부품 실장 기판의 봉지 방법 및 열경화성 시트 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11251347A (ja) * | 1998-03-03 | 1999-09-17 | Hitachi Cable Ltd | 半導体パッケージの製造方法 |
KR101169182B1 (ko) * | 2003-06-06 | 2012-07-30 | 히다치 가세고교 가부시끼가이샤 | 반도체 장치의 제조방법 |
JP4406300B2 (ja) * | 2004-02-13 | 2010-01-27 | 株式会社東芝 | 半導体装置及びその製造方法 |
JP5435685B2 (ja) * | 2007-02-28 | 2014-03-05 | ナミックス株式会社 | 封止用樹脂フィルム |
-
2013
- 2013-04-08 JP JP2013080601A patent/JP2014204033A/ja active Pending
-
2014
- 2014-03-17 SG SG11201508204RA patent/SG11201508204RA/en unknown
- 2014-03-17 WO PCT/JP2014/057175 patent/WO2014167947A1/ja active Application Filing
- 2014-03-17 KR KR1020157031649A patent/KR20150140340A/ko not_active Application Discontinuation
- 2014-03-17 CN CN201480020186.5A patent/CN105122433A/zh active Pending
- 2014-04-07 TW TW103112647A patent/TW201448062A/zh unknown
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20210003140A (ko) * | 2018-04-24 | 2021-01-11 | 디스코 하이테크 유럽 게엠베하 | 얼라인먼트 장치 및 얼라인먼트 방법 |
US10798814B2 (en) | 2018-06-14 | 2020-10-06 | Universal Scientific Industrial (Shanghai) Co., Ltd. | SiP module and manufacturing method of the SiP module |
Also Published As
Publication number | Publication date |
---|---|
CN105122433A (zh) | 2015-12-02 |
JP2014204033A (ja) | 2014-10-27 |
TW201448062A (zh) | 2014-12-16 |
WO2014167947A1 (ja) | 2014-10-16 |
SG11201508204RA (en) | 2015-11-27 |
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Legal Events
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WITN | Withdrawal due to no request for examination |