KR20150112984A - 질화구리 미립자 및 그 제조 방법 - Google Patents

질화구리 미립자 및 그 제조 방법 Download PDF

Info

Publication number
KR20150112984A
KR20150112984A KR1020157020804A KR20157020804A KR20150112984A KR 20150112984 A KR20150112984 A KR 20150112984A KR 1020157020804 A KR1020157020804 A KR 1020157020804A KR 20157020804 A KR20157020804 A KR 20157020804A KR 20150112984 A KR20150112984 A KR 20150112984A
Authority
KR
South Korea
Prior art keywords
copper
fine particles
copper nitride
compound
nitride fine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020157020804A
Other languages
English (en)
Korean (ko)
Inventor
다카시 나카무라
다케오 에비나
히로미치 하야시
다카아키 하나오카
Original Assignee
고쿠리츠켄큐카이하츠호진 상교기쥬츠 소고켄큐쇼
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 고쿠리츠켄큐카이하츠호진 상교기쥬츠 소고켄큐쇼 filed Critical 고쿠리츠켄큐카이하츠호진 상교기쥬츠 소고켄큐쇼
Publication of KR20150112984A publication Critical patent/KR20150112984A/ko
Ceased legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/0615—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with transition metals other than titanium, zirconium or hafnium
    • C01B21/0625—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with transition metals other than titanium, zirconium or hafnium with copper
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4417—Methods specially adapted for coating powder
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
    • C01P2002/88—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by thermal analysis data, e.g. TGA, DTA, DSC
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/30—Particle morphology extending in three dimensions
    • C01P2004/32—Spheres
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Composite Materials (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
  • Powder Metallurgy (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
KR1020157020804A 2013-01-31 2014-01-31 질화구리 미립자 및 그 제조 방법 Ceased KR20150112984A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2013017510 2013-01-31
JPJP-P-2013-017510 2013-01-31
JPJP-P-2013-225296 2013-10-30
JP2013225296A JP6057379B2 (ja) 2013-01-31 2013-10-30 窒化銅微粒子およびその製造方法
PCT/JP2014/052321 WO2014119748A1 (ja) 2013-01-31 2014-01-31 窒化銅微粒子およびその製造方法

Publications (1)

Publication Number Publication Date
KR20150112984A true KR20150112984A (ko) 2015-10-07

Family

ID=51262445

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020157020804A Ceased KR20150112984A (ko) 2013-01-31 2014-01-31 질화구리 미립자 및 그 제조 방법

Country Status (4)

Country Link
JP (1) JP6057379B2 (enExample)
KR (1) KR20150112984A (enExample)
CN (1) CN104981427A (enExample)
WO (1) WO2014119748A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190049055A (ko) * 2017-11-01 2019-05-09 전자부품연구원 전도체 패턴용 구리질화물 분말의 제조 방법

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015147561A1 (ko) * 2014-03-26 2015-10-01 전자부품연구원 전도체 패턴의 형성이 용이한 복합소재와 그 복합소재를 제조하는 방법 및 상기 복합소재에서 시드 소재인 구리질화물 및 그 구리질화물을 합성하는 방법
JP6574553B2 (ja) * 2014-06-26 2019-09-11 昭和電工株式会社 導電パターン形成用組成物および導電パターン形成方法
CN110642304B (zh) * 2019-10-09 2021-12-31 上海师范大学 一种超级电容器用三金属氮化物材料及其制备方法
CN111450867A (zh) * 2020-05-09 2020-07-28 青岛科技大学 用于电催化二氧化碳还原的Cu3N纳米催化剂的制备方法
CN115057417B (zh) * 2022-06-08 2023-09-12 安徽大学 一种氮化铜纳米片的制备及其在甲酸盐电合成中的应用
CN116516280A (zh) * 2023-04-27 2023-08-01 常州大学 一种高效节能的工件氮化方法
CN116924697B (zh) * 2023-07-31 2025-08-29 上海耀皮工程玻璃有限公司 一种Low-E镀膜玻璃调色层及其制备方法和用途
CN119282131A (zh) * 2024-11-18 2025-01-10 济源星翰新材料科技有限公司 一种微米铜粉的制备方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005122230A1 (ja) * 2004-06-07 2005-12-22 Kyushu Institute Of Technology 銅表面の処理方法及び銅パターン配線形成方法、並びに該方法を用いて作成された半導体装置
JP3870273B2 (ja) * 2004-12-28 2007-01-17 国立大学法人九州工業大学 銅パターン配線形成方法及び該方法を用いて作成された半導体装置、並びにナノ銅金属粒子
JP5778382B2 (ja) * 2008-10-22 2015-09-16 東ソー株式会社 金属膜製造用組成物、金属膜の製造方法及び金属粉末の製造方法
JP5243510B2 (ja) * 2010-10-01 2013-07-24 富士フイルム株式会社 配線材料、配線の製造方法、及びナノ粒子分散液

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190049055A (ko) * 2017-11-01 2019-05-09 전자부품연구원 전도체 패턴용 구리질화물 분말의 제조 방법

Also Published As

Publication number Publication date
CN104981427A (zh) 2015-10-14
WO2014119748A1 (ja) 2014-08-07
JP6057379B2 (ja) 2017-01-11
JP2014166939A (ja) 2014-09-11

Similar Documents

Publication Publication Date Title
KR20150112984A (ko) 질화구리 미립자 및 그 제조 방법
JP7019197B2 (ja) 導電性インク組成物
US20180168037A1 (en) Method for producing silver nanoparticles, silver nanoparticles, and silver coating composition
US9986638B2 (en) Synthetic method of suppressing metal nano-particle from having oxidized film and method of manufacturing conductive metal thin film via solution-processed
TWI665165B (zh) 銀微粒子分散體、銀微粒子及其製造方法以及接合用組成物
JP5986636B2 (ja) 銀ナノ粒子の製造方法、銀塗料組成物の製造方法および銀導電材料の製造方法
US10279393B2 (en) Method of producing copper nano particle colloidal dispersions
CN104540622B (zh) 用于生产银纳米粒子的方法、银纳米粒子、涂覆的银纳米粒子、银涂覆组合物和银导电材料
JP5858374B2 (ja) 被覆銅微粒子の製造方法
US20130334470A1 (en) Coated metal fine particle and manufacturing method thereof
JP2010064983A (ja) ニッケル粒子の製造方法及びそれに適したニッケル錯体
CN104946022A (zh) 一种高稳定性无颗粒型银基导电墨水及其制备方法
JP2009120940A (ja) 金属ナノ粒子の製造方法
TWI686447B (zh) 轉印印刷用導電性墨水
JP4168371B2 (ja) 金属コロイドオルガノゾル及びその製造方法
Chen et al. Facile synthesis of silver malonate conductive MOD ink for screen printing
JP6531456B2 (ja) 導電性インク組成物
Lee et al. Large-scale synthesis of polymer-stabilized silver nanoparticles
JP7573378B2 (ja) ニッケルナノ粒子凝集体、その製造方法及びニッケルナノ粒子複合基板
TW201500564A (zh) 銀粒子之製造方法
JP6099160B2 (ja) 複合化合物、及び懸濁液
KR20160090861A (ko) 은 나노입자의 분산물
Kim et al. Preparation of highly stabilized silver nanopowders by the thermal reduction and their properties
JP2018021246A (ja) 金属ナノ粒子の製造方法
TWI757412B (zh) 銀奈米粒子的製造方法

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20150730

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20181016

Comment text: Request for Examination of Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20200507

Patent event code: PE09021S01D

E601 Decision to refuse application
PE0601 Decision on rejection of patent

Patent event date: 20200814

Comment text: Decision to Refuse Application

Patent event code: PE06012S01D

Patent event date: 20200507

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I