KR20150064152A - 미세 도포 가능한 무기 산화물 피막 형성용 도포액 및 미세 무기 산화물 피막의 제조 방법 - Google Patents
미세 도포 가능한 무기 산화물 피막 형성용 도포액 및 미세 무기 산화물 피막의 제조 방법 Download PDFInfo
- Publication number
- KR20150064152A KR20150064152A KR1020157011217A KR20157011217A KR20150064152A KR 20150064152 A KR20150064152 A KR 20150064152A KR 1020157011217 A KR1020157011217 A KR 1020157011217A KR 20157011217 A KR20157011217 A KR 20157011217A KR 20150064152 A KR20150064152 A KR 20150064152A
- Authority
- KR
- South Korea
- Prior art keywords
- metal
- oxide film
- metal oxide
- forming
- alkoxide
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D185/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon; Coating compositions based on derivatives of such polymers
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/06—Coating on selected surface areas, e.g. using masks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
- H01B3/10—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances metallic oxides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
-
- C09D7/12—
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1245—Inorganic substrates other than metallic
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1283—Control of temperature, e.g. gradual temperature increase, modulation of temperature
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
- C23C18/143—Radiation by light, e.g. photolysis or pyrolysis
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Ceramic Engineering (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Paints Or Removers (AREA)
- Chemically Coating (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012221607 | 2012-10-03 | ||
JPJP-P-2012-221607 | 2012-10-03 | ||
PCT/JP2013/076972 WO2014054748A1 (ja) | 2012-10-03 | 2013-10-03 | 微細塗布可能な無機酸化物被膜形成用塗布液及び微細無機酸化物被膜の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20150064152A true KR20150064152A (ko) | 2015-06-10 |
Family
ID=50435067
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020157011217A KR20150064152A (ko) | 2012-10-03 | 2013-10-03 | 미세 도포 가능한 무기 산화물 피막 형성용 도포액 및 미세 무기 산화물 피막의 제조 방법 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPWO2014054748A1 (zh) |
KR (1) | KR20150064152A (zh) |
CN (1) | CN104822783B (zh) |
TW (1) | TWI599624B (zh) |
WO (1) | WO2014054748A1 (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6641217B2 (ja) * | 2016-03-30 | 2020-02-05 | 東京応化工業株式会社 | 金属酸化物膜形成用塗布剤及び金属酸化物膜を有する基体の製造方法 |
CN109680266B (zh) * | 2019-02-22 | 2020-08-25 | 吉林大学 | 一种在钛合金表面制备钽原子掺杂的生物活性陶瓷涂层及其制备方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2881847B2 (ja) * | 1988-12-15 | 1999-04-12 | 日産化学工業株式会社 | コーティング用組成物及びその製造法 |
JP3127542B2 (ja) * | 1992-01-14 | 2001-01-29 | 日産化学工業株式会社 | 液晶表示素子絶縁被膜形成用塗布液 |
JP3825813B2 (ja) * | 1992-07-17 | 2006-09-27 | 日産化学工業株式会社 | 液晶表示素子用高屈折率絶縁被膜形成用塗布液 |
JP3517890B2 (ja) * | 1993-02-18 | 2004-04-12 | 日産化学工業株式会社 | 液晶表示素子用絶縁膜形成用塗布液 |
JP3350363B2 (ja) * | 1996-08-29 | 2002-11-25 | 昭和電線電纜株式会社 | 絶縁被覆用塗料、無機絶縁電線及び電気コイル |
JP2000344894A (ja) * | 1999-06-02 | 2000-12-12 | Jsr Corp | 膜形成用組成物の製造方法、膜形成用組成物および絶縁膜形成用材料 |
JP2002146286A (ja) * | 2000-11-10 | 2002-05-22 | Toray Ind Inc | 金属酸化物薄膜形成用塗液およびこれを用いた金属酸化物薄膜の製造方法 |
US8946320B2 (en) * | 2004-03-22 | 2015-02-03 | Hewlett-Packard Development Company, L.P. | Ink system containing polymer binders |
WO2007020781A1 (ja) * | 2005-08-19 | 2007-02-22 | Nissan Chemical Industries, Ltd. | 被膜形成用塗布液の製造方法 |
JP2007201056A (ja) * | 2006-01-25 | 2007-08-09 | Toppan Printing Co Ltd | 薄膜トランジスタ及びその製造方法 |
JP5172499B2 (ja) * | 2008-06-28 | 2013-03-27 | マツモトファインケミカル株式会社 | 無機粒子バインダー組成物 |
WO2010074261A1 (ja) * | 2008-12-25 | 2010-07-01 | 日産化学工業株式会社 | インクジェット塗布用液晶配向剤、液晶配向膜及び液晶表示素子 |
JP5316701B2 (ja) * | 2010-03-24 | 2013-10-16 | コニカミノルタ株式会社 | 電気化学表示素子 |
WO2012057165A1 (ja) * | 2010-10-26 | 2012-05-03 | 日産化学工業株式会社 | タッチパネル |
JP5709540B2 (ja) * | 2011-01-14 | 2015-04-30 | 三菱重工業株式会社 | 有機el素子の製造方法 |
CN103443750B (zh) * | 2011-01-20 | 2017-02-15 | 日产化学工业株式会社 | 触摸屏用涂布组合物、涂膜及触摸屏 |
CN104011260B (zh) * | 2011-10-31 | 2018-02-13 | 日产化学工业株式会社 | 金属氧化物被膜用涂布液的制造方法、金属氧化物被膜用涂布液以及金属氧化物被膜 |
-
2013
- 2013-10-03 CN CN201380063021.1A patent/CN104822783B/zh active Active
- 2013-10-03 TW TW102135841A patent/TWI599624B/zh active
- 2013-10-03 KR KR1020157011217A patent/KR20150064152A/ko not_active IP Right Cessation
- 2013-10-03 WO PCT/JP2013/076972 patent/WO2014054748A1/ja active Application Filing
- 2013-10-03 JP JP2014539824A patent/JPWO2014054748A1/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
CN104822783A (zh) | 2015-08-05 |
JPWO2014054748A1 (ja) | 2016-08-25 |
CN104822783B (zh) | 2017-09-08 |
WO2014054748A1 (ja) | 2014-04-10 |
TW201439234A (zh) | 2014-10-16 |
TWI599624B (zh) | 2017-09-21 |
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