KR20150039690A - 도포 장치 - Google Patents
도포 장치 Download PDFInfo
- Publication number
- KR20150039690A KR20150039690A KR20140131436A KR20140131436A KR20150039690A KR 20150039690 A KR20150039690 A KR 20150039690A KR 20140131436 A KR20140131436 A KR 20140131436A KR 20140131436 A KR20140131436 A KR 20140131436A KR 20150039690 A KR20150039690 A KR 20150039690A
- Authority
- KR
- South Korea
- Prior art keywords
- slit nozzle
- coating
- substrate
- speed
- coating material
- Prior art date
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0254—Coating heads with slot-shaped outlet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1047—Apparatus or installations for supplying liquid or other fluent material comprising a buffer container or an accumulator between the supply source and the applicator
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
- B05C11/1007—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to condition of liquid or other fluent material
- B05C11/1013—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to condition of liquid or other fluent material responsive to flow or pressure of liquid or other fluent material
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Coating Apparatus (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013208526 | 2013-10-03 | ||
JPJP-P-2013-208526 | 2013-10-03 | ||
JP2014108493A JP2015091569A (ja) | 2013-10-03 | 2014-05-26 | 塗布装置 |
JPJP-P-2014-108493 | 2014-05-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20150039690A true KR20150039690A (ko) | 2015-04-13 |
Family
ID=52775922
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR20140131436A KR20150039690A (ko) | 2013-10-03 | 2014-09-30 | 도포 장치 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20150096492A1 (zh) |
JP (1) | JP2015091569A (zh) |
KR (1) | KR20150039690A (zh) |
TW (1) | TW201529182A (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190038242A (ko) * | 2017-09-29 | 2019-04-08 | 쥬가이로 고교 가부시키가이샤 | 기판의 도포 방법 및 기판의 도포 장치 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6272138B2 (ja) * | 2014-05-22 | 2018-01-31 | 東京エレクトロン株式会社 | 塗布処理装置 |
JP2018043200A (ja) * | 2016-09-15 | 2018-03-22 | 株式会社Screenホールディングス | 塗布装置および塗布方法 |
JP7500992B2 (ja) | 2020-02-25 | 2024-06-18 | 東レ株式会社 | 塗布装置及び塗布方法 |
JP2023042870A (ja) * | 2021-09-15 | 2023-03-28 | 株式会社Screenホールディングス | 基板塗布装置および基板塗布方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4005879B2 (ja) * | 2002-08-30 | 2007-11-14 | 株式会社東芝 | 現像方法、基板処理方法、及び基板処理装置 |
JP5327238B2 (ja) * | 2011-01-20 | 2013-10-30 | 東京エレクトロン株式会社 | 塗布処理装置、塗布処理方法及び記憶媒体 |
-
2014
- 2014-05-26 JP JP2014108493A patent/JP2015091569A/ja active Pending
- 2014-09-10 US US14/481,998 patent/US20150096492A1/en not_active Abandoned
- 2014-09-30 TW TW103133979A patent/TW201529182A/zh unknown
- 2014-09-30 KR KR20140131436A patent/KR20150039690A/ko not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190038242A (ko) * | 2017-09-29 | 2019-04-08 | 쥬가이로 고교 가부시키가이샤 | 기판의 도포 방법 및 기판의 도포 장치 |
Also Published As
Publication number | Publication date |
---|---|
US20150096492A1 (en) | 2015-04-09 |
TW201529182A (zh) | 2015-08-01 |
JP2015091569A (ja) | 2015-05-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |