KR20140065376A - 관찰 장치, 검사 장치, 반도체 장치의 제조 방법, 및 기판 지지 부재 - Google Patents

관찰 장치, 검사 장치, 반도체 장치의 제조 방법, 및 기판 지지 부재 Download PDF

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Publication number
KR20140065376A
KR20140065376A KR1020137023710A KR20137023710A KR20140065376A KR 20140065376 A KR20140065376 A KR 20140065376A KR 1020137023710 A KR1020137023710 A KR 1020137023710A KR 20137023710 A KR20137023710 A KR 20137023710A KR 20140065376 A KR20140065376 A KR 20140065376A
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KR
South Korea
Prior art keywords
wafer
substrate
supporting
light
illumination light
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Application number
KR1020137023710A
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English (en)
Korean (ko)
Inventor
가즈하루 미나토
다케시 이노우에
Original Assignee
가부시키가이샤 니콘
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Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20140065376A publication Critical patent/KR20140065376A/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers

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  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Analytical Chemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020137023710A 2011-02-25 2012-02-17 관찰 장치, 검사 장치, 반도체 장치의 제조 방법, 및 기판 지지 부재 KR20140065376A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2011-040921 2011-02-25
JP2011040921 2011-02-25
PCT/JP2012/053864 WO2012115012A1 (ja) 2011-02-25 2012-02-17 観察装置、検査装置、半導体装置の製造方法、および基板支持部材

Publications (1)

Publication Number Publication Date
KR20140065376A true KR20140065376A (ko) 2014-05-29

Family

ID=46720793

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020137023710A KR20140065376A (ko) 2011-02-25 2012-02-17 관찰 장치, 검사 장치, 반도체 장치의 제조 방법, 및 기판 지지 부재

Country Status (6)

Country Link
US (1) US20130330848A1 (ja)
JP (1) JPWO2012115012A1 (ja)
KR (1) KR20140065376A (ja)
CN (1) CN103403854A (ja)
TW (1) TW201241426A (ja)
WO (1) WO2012115012A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170015209A (ko) * 2015-07-30 2017-02-08 램 리써치 코포레이션 영상 기반 웨이퍼 노치 위치 측정
US10898972B2 (en) 2015-11-03 2021-01-26 Samsung Display Co., Ltd. Laser crystallizing apparatus

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9966290B2 (en) 2015-07-30 2018-05-08 Lam Research Corporation System and method for wafer alignment and centering with CCD camera and robot
JP6532800B2 (ja) 2015-10-21 2019-06-19 東芝メモリ株式会社 反射防止部材及びオリエンタ装置
JP6444909B2 (ja) * 2016-02-22 2018-12-26 東京エレクトロン株式会社 基板処理方法、基板処理装置及びコンピュータ読み取り可能な記録媒体
JP2017169480A (ja) * 2016-03-23 2017-09-28 オリンパス株式会社 観察装置、測定システム及び観察方法
JP2018041217A (ja) * 2016-09-06 2018-03-15 東京エレクトロン株式会社 異常検知方法及び半導体製造装置
JP6886379B2 (ja) * 2017-09-28 2021-06-16 Ｔｏｗａ株式会社 保持部材、保持部材の製造方法、検査装置及び切断装置
JP6979900B2 (ja) * 2018-02-13 2021-12-15 株式会社荏原製作所 基板保持部材、基板処理装置、基板処理装置の制御方法、プログラムを格納した記憶媒体
CN110411378B (zh) * 2019-08-06 2021-02-09 杭州众硅电子科技有限公司 一种晶圆检测装置及其检测方法
CN113109349B (zh) * 2021-03-23 2023-12-26 深圳中科飞测科技股份有限公司 检测方法、系统、设备及计算机可读存储介质

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5213985A (en) * 1991-05-22 1993-05-25 Bell Communications Research, Inc. Temperature measurement in a processing chamber using in-situ monitoring of photoluminescence
JPH05335405A (ja) * 1992-05-29 1993-12-17 Toshiba Corp ウエハ載置台および半導体装置製造装置
JPH11101624A (ja) * 1997-09-29 1999-04-13 Hitachi Ltd 欠陥評価装置およびその方法並びに半導体の製造方法
US6556281B1 (en) * 2000-05-23 2003-04-29 Asml Us, Inc. Flexible piezoelectric chuck and method of using the same
US7068363B2 (en) * 2003-06-06 2006-06-27 Kla-Tencor Technologies Corp. Systems for inspection of patterned or unpatterned wafers and other specimen
US7206125B2 (en) * 2003-11-10 2007-04-17 Therma-Wave, Inc. Infrared blocking filter for broadband Optical metrology
JP4511903B2 (ja) * 2004-10-20 2010-07-28 株式会社ディスコ ウエーハの分割装置
US20070031609A1 (en) * 2005-07-29 2007-02-08 Ajay Kumar Chemical vapor deposition chamber with dual frequency bias and method for manufacturing a photomask using the same
US20070249071A1 (en) * 2006-04-21 2007-10-25 Lei Lian Neural Network Methods and Apparatuses for Monitoring Substrate Processing

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170015209A (ko) * 2015-07-30 2017-02-08 램 리써치 코포레이션 영상 기반 웨이퍼 노치 위치 측정
US10898972B2 (en) 2015-11-03 2021-01-26 Samsung Display Co., Ltd. Laser crystallizing apparatus

Also Published As

Publication number Publication date
TW201241426A (en) 2012-10-16
JPWO2012115012A1 (ja) 2014-07-07
CN103403854A (zh) 2013-11-20
WO2012115012A1 (ja) 2012-08-30
US20130330848A1 (en) 2013-12-12

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