KR20140043410A - 패턴 형성 방법 및 감활성광선성 또는 감방사선성 수지 조성물 - Google Patents
패턴 형성 방법 및 감활성광선성 또는 감방사선성 수지 조성물 Download PDFInfo
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- KR20140043410A KR20140043410A KR1020137035086A KR20137035086A KR20140043410A KR 20140043410 A KR20140043410 A KR 20140043410A KR 1020137035086 A KR1020137035086 A KR 1020137035086A KR 20137035086 A KR20137035086 A KR 20137035086A KR 20140043410 A KR20140043410 A KR 20140043410A
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- 0 C*(C)CC(*(C)C)C(OC1(C)C(C2)C(C3CC4CC3)C4C2C1)=O Chemical compound C*(C)CC(*(C)C)C(OC1(C)C(C2)C(C3CC4CC3)C4C2C1)=O 0.000 description 19
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- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2011-143181 | 2011-06-28 | ||
JP2011143181A JP5775754B2 (ja) | 2011-06-28 | 2011-06-28 | パターン形成方法及び電子デバイスの製造方法 |
PCT/JP2012/066462 WO2013002295A1 (en) | 2011-06-28 | 2012-06-21 | Method of forming pattern and actinic-ray- or radiation-sensitive resin composition |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20140043410A true KR20140043410A (ko) | 2014-04-09 |
Family
ID=47424183
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020137035086A KR20140043410A (ko) | 2011-06-28 | 2012-06-21 | 패턴 형성 방법 및 감활성광선성 또는 감방사선성 수지 조성물 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5775754B2 (ja) |
KR (1) | KR20140043410A (ja) |
TW (1) | TWI548942B (ja) |
WO (1) | WO2013002295A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20220079086A (ko) | 2020-12-04 | 2022-06-13 | 이송하 | 거울 네일 |
KR20220153176A (ko) | 2021-05-11 | 2022-11-18 | 유수민 | 얇은 거울 필름을 부착한 인조 손톱 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6140487B2 (ja) * | 2013-03-14 | 2017-05-31 | 富士フイルム株式会社 | パターン形成方法、及び電子デバイスの製造方法 |
JP6186168B2 (ja) * | 2013-05-02 | 2017-08-23 | 富士フイルム株式会社 | パターン形成方法、及び電子デバイスの製造方法 |
JP6036619B2 (ja) * | 2013-09-13 | 2016-11-30 | Jsr株式会社 | 樹脂組成物及びレジストパターン形成方法 |
JP6233240B2 (ja) * | 2013-09-26 | 2017-11-22 | 信越化学工業株式会社 | パターン形成方法 |
KR102205849B1 (ko) * | 2013-12-03 | 2021-01-21 | 주식회사 동진쎄미켐 | 포토레지스트 조성물 및 이를 이용한 미세패턴 형성방법 |
CN108594605A (zh) * | 2018-01-09 | 2018-09-28 | 东莞市耀辉化工科技有限公司 | 一种线路板防焊显影用的环保清洁显影液 |
KR20230044294A (ko) | 2020-09-04 | 2023-04-03 | 후지필름 가부시키가이샤 | 유기층 패턴의 제조 방법, 및, 반도체 디바이스의 제조 방법 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4554665B2 (ja) * | 2006-12-25 | 2010-09-29 | 富士フイルム株式会社 | パターン形成方法、該パターン形成方法に用いられる多重現像用ポジ型レジスト組成物、該パターン形成方法に用いられるネガ現像用現像液及び該パターン形成方法に用いられるネガ現像用リンス液 |
TWI417274B (zh) * | 2008-12-04 | 2013-12-01 | Shinetsu Chemical Co | 鹽、酸發生劑及使用其之抗蝕劑材料、空白光罩,及圖案形成方法 |
JP5673533B2 (ja) * | 2009-07-02 | 2015-02-18 | Jsr株式会社 | 感放射線性樹脂組成物 |
JP5675125B2 (ja) * | 2009-09-30 | 2015-02-25 | 富士フイルム株式会社 | 感活性光線性または感放射線性樹脂組成物、及び該感光性組成物を用いたパターン形成方法 |
-
2011
- 2011-06-28 JP JP2011143181A patent/JP5775754B2/ja not_active Expired - Fee Related
-
2012
- 2012-06-21 KR KR1020137035086A patent/KR20140043410A/ko active Search and Examination
- 2012-06-21 WO PCT/JP2012/066462 patent/WO2013002295A1/en active Application Filing
- 2012-06-27 TW TW101122912A patent/TWI548942B/zh not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20220079086A (ko) | 2020-12-04 | 2022-06-13 | 이송하 | 거울 네일 |
KR20220153176A (ko) | 2021-05-11 | 2022-11-18 | 유수민 | 얇은 거울 필름을 부착한 인조 손톱 |
Also Published As
Publication number | Publication date |
---|---|
TWI548942B (zh) | 2016-09-11 |
TW201303506A (zh) | 2013-01-16 |
JP2013011678A (ja) | 2013-01-17 |
JP5775754B2 (ja) | 2015-09-09 |
WO2013002295A1 (en) | 2013-01-03 |
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