KR20140031230A - 컬러필터용 착색 경화성 조성물, 착색 경화막, 컬러필터의 제조 방법, 컬러필터 및 표시 장치 - Google Patents

컬러필터용 착색 경화성 조성물, 착색 경화막, 컬러필터의 제조 방법, 컬러필터 및 표시 장치 Download PDF

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Publication number
KR20140031230A
KR20140031230A KR1020137027966A KR20137027966A KR20140031230A KR 20140031230 A KR20140031230 A KR 20140031230A KR 1020137027966 A KR1020137027966 A KR 1020137027966A KR 20137027966 A KR20137027966 A KR 20137027966A KR 20140031230 A KR20140031230 A KR 20140031230A
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South Korea
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curable composition
color
colored curable
general formula
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Korean (ko)
Inventor
아키노리 후지타
카즈마사 모로즈미
요우헤이 이시지
토모히로 코다마
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후지필름 가부시키가이샤
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0033—Blends of pigments; Mixtured crystals; Solid solutions
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/02—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing an odd number of >CH- or >C[alkyl]- groups
    • C09B23/04—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing an odd number of >CH- or >C[alkyl]- groups one >CH- group, e.g. cyanines, isocyanines, pseudocyanines
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B47/00—Porphines; Azaporphines
    • C09B47/04—Phthalocyanines abbreviation: Pc
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0033—Blends of pigments; Mixtured crystals; Solid solutions
    • C09B67/0034—Mixtures of two or more pigments or dyes of the same type
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21K—NON-ELECTRIC LIGHT SOURCES USING LUMINESCENCE; LIGHT SOURCES USING ELECTROCHEMILUMINESCENCE; LIGHT SOURCES USING CHARGES OF COMBUSTIBLE MATERIAL; LIGHT SOURCES USING SEMICONDUCTOR DEVICES AS LIGHT-GENERATING ELEMENTS; LIGHT SOURCES NOT OTHERWISE PROVIDED FOR
    • F21K9/00—Light sources using semiconductor devices as light-generating elements, e.g. using light-emitting diodes [LED] or lasers
    • F21K9/60—Optical arrangements integrated in the light source, e.g. for improving the colour rendering index or the light extraction
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0041—Photosensitive materials providing an etching agent upon exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
KR1020137027966A 2011-04-28 2012-04-27 컬러필터용 착색 경화성 조성물, 착색 경화막, 컬러필터의 제조 방법, 컬러필터 및 표시 장치 Ceased KR20140031230A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2011-101862 2011-04-28
JP2011101862 2011-04-28
PCT/JP2012/061462 WO2012147954A1 (ja) 2011-04-28 2012-04-27 カラーフィルタ用着色硬化性組成物、着色硬化膜、カラーフィルタの製造方法、カラーフィルタ及び表示装置

Publications (1)

Publication Number Publication Date
KR20140031230A true KR20140031230A (ko) 2014-03-12

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KR1020137027966A Ceased KR20140031230A (ko) 2011-04-28 2012-04-27 컬러필터용 착색 경화성 조성물, 착색 경화막, 컬러필터의 제조 방법, 컬러필터 및 표시 장치

Country Status (6)

Country Link
US (1) US20140045106A1 (enExample)
JP (1) JP2012237996A (enExample)
KR (1) KR20140031230A (enExample)
CN (1) CN103492915A (enExample)
TW (1) TW201247787A (enExample)
WO (1) WO2012147954A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170083092A (ko) * 2014-12-25 2017-07-17 후지필름 가부시키가이샤 착색 조성물, 착색 조성물의 제조 방법, 컬러 필터, 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자, 및 화상 표시 장치

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TW201348346A (zh) * 2012-03-07 2013-12-01 Fujifilm Corp 著色組成物、彩色濾光片、液晶顯示裝置、有機ｅｌ顯示裝置及固體攝影元件
JP5834029B2 (ja) * 2012-03-30 2015-12-16 富士フイルム株式会社 顔料、それを用いた顔料組成物、着色組成物、およびカラーフィルタ
JP5642739B2 (ja) * 2012-07-27 2014-12-17 富士フイルム株式会社 染料化合物及びその製造方法、着色硬化性組成物、着色硬化膜、カラーフィルタ及びその製造方法、並びに表示装置
JP6028455B2 (ja) * 2012-08-24 2016-11-16 大日本印刷株式会社 体積型ホログラム記録用感光性組成物、体積型ホログラム記録用感光性基板、及び、体積型ホログラム記録体
JP5932745B2 (ja) * 2012-09-28 2016-06-08 富士フイルム株式会社 顔料、それを用いた顔料分散物、着色組成物、およびカラーフィルタ
TWI534484B (zh) 2012-12-21 2016-05-21 友達光電股份有限公司 顯示裝置
KR101768255B1 (ko) * 2013-08-21 2017-08-14 제일모직주식회사 감광성 수지 조성물 및 이로부터 제조된 컬러필터
JP6141762B2 (ja) * 2013-12-27 2017-06-07 富士フイルム株式会社 染料化合物及びその製造方法、着色硬化性組成物、カラーフィルタ及びその製造方法、画像表示装置、並びに固体撮像素子
WO2017169370A1 (ja) 2016-03-29 2017-10-05 富士フイルム株式会社 保護シート、画像表示装置、眼鏡レンズおよび眼鏡
JP7030261B2 (ja) * 2017-11-02 2022-03-07 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物及びカラーフィルタ
WO2020022247A1 (ja) * 2018-07-26 2020-01-30 富士フイルム株式会社 硬化性組成物、硬化性組成物の製造方法、膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置
JP7504787B2 (ja) * 2020-12-25 2024-06-24 富士フイルム株式会社 組成物、カラーフィルタ及び色素

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JP2005250420A (ja) * 2004-03-08 2005-09-15 Fuji Photo Film Co Ltd 着色硬化性組成物、並びに、これを用いたカラーフィルタおよびその製造方法
TW200932844A (en) * 2007-11-22 2009-08-01 Fujifilm Corp Inkjet ink, color filter and process for preparing color filter, and liquid crystal display and image display device using color filter
JP2009163014A (ja) * 2008-01-07 2009-07-23 Toppan Printing Co Ltd 液晶表示装置及び液晶表示装置用カラーフィルタ
JP2010037545A (ja) * 2008-07-08 2010-02-18 Fujifilm Corp インクジェット用インク、カラーフィルタおよびその製造方法、ならびにそれを用いる液晶ディスプレイおよび画像表示デバイス
JP2010072107A (ja) * 2008-09-16 2010-04-02 Dainippon Printing Co Ltd 白色発光ダイオード光源液晶表示装置用カラーフィルタおよび白色発光ダイオード光源液晶表示装置
JP5658461B2 (ja) * 2009-02-10 2015-01-28 富士フイルム株式会社 インクジェット用インク、カラーフィルタおよびその製造方法
JP2010191146A (ja) * 2009-02-18 2010-09-02 Fujifilm Corp カラーフィルタ及び液晶表示装置
TW201105753A (en) * 2009-06-04 2011-02-16 Fujifilm Corp Ink set, color filter and process for preparing color filter, and liquid crystal display and image display device using color filter
JP5705459B2 (ja) * 2009-09-04 2015-04-22 富士フイルム株式会社 カラーフィルタ用光硬化性組成物、該光硬化性組成物により形成されたカラーフィルタ、及びそれを備えた画像表示装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170083092A (ko) * 2014-12-25 2017-07-17 후지필름 가부시키가이샤 착색 조성물, 착색 조성물의 제조 방법, 컬러 필터, 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자, 및 화상 표시 장치

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Publication number Publication date
WO2012147954A1 (ja) 2012-11-01
CN103492915A (zh) 2014-01-01
US20140045106A1 (en) 2014-02-13
TW201247787A (en) 2012-12-01
JP2012237996A (ja) 2012-12-06

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