KR20130008024A - 증발기 챔버의 재충전을 위한 방법 및 장치 - Google Patents

증발기 챔버의 재충전을 위한 방법 및 장치 Download PDF

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Publication number
KR20130008024A
KR20130008024A KR1020127024316A KR20127024316A KR20130008024A KR 20130008024 A KR20130008024 A KR 20130008024A KR 1020127024316 A KR1020127024316 A KR 1020127024316A KR 20127024316 A KR20127024316 A KR 20127024316A KR 20130008024 A KR20130008024 A KR 20130008024A
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South Korea
Prior art keywords
vacuum chamber
vacuum
chamber
selenium
evaporator
Prior art date
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Ceased
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KR1020127024316A
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English (en)
Korean (ko)
Inventor
라이문트 보거
안드레아스 얀케
토마스 괴체
Original Assignee
쌩-고벵 글래스 프랑스
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Publication of KR20130008024A publication Critical patent/KR20130008024A/ko
Ceased legal-status Critical Current

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17D—PIPE-LINE SYSTEMS; PIPE-LINES
    • F17D1/00—Pipe-line systems
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16L—PIPES; JOINTS OR FITTINGS FOR PIPES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; MEANS FOR THERMAL INSULATION IN GENERAL
    • F16L53/00—Heating of pipes or pipe systems; Cooling of pipes or pipe systems
    • F16L53/30—Heating of pipes or pipe systems
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/6416—With heating or cooling of the system
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/85978—With pump
    • Y10T137/86083—Vacuum pump

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Physical Vapour Deposition (AREA)
  • Photovoltaic Devices (AREA)
KR1020127024316A 2010-03-26 2011-03-23 증발기 챔버의 재충전을 위한 방법 및 장치 Ceased KR20130008024A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP10157912.6 2010-03-26
EP20100157912 EP2369033A1 (de) 2010-03-26 2010-03-26 Verfahren zum Nachfüllen einer Verdampferkammer
PCT/EP2011/054433 WO2011117291A1 (de) 2010-03-26 2011-03-23 Verfahren und vorrichtung zum nachfüllen einer verdampferkammer

Publications (1)

Publication Number Publication Date
KR20130008024A true KR20130008024A (ko) 2013-01-21

Family

ID=42232778

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020127024316A Ceased KR20130008024A (ko) 2010-03-26 2011-03-23 증발기 챔버의 재충전을 위한 방법 및 장치

Country Status (7)

Country Link
US (2) US20130098453A1 (https=)
EP (2) EP2369033A1 (https=)
JP (1) JP2013524001A (https=)
KR (1) KR20130008024A (https=)
CN (1) CN102812151A (https=)
ES (1) ES2614944T3 (https=)
WO (1) WO2011117291A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017200253A1 (ko) * 2016-05-16 2017-11-23 주식회사 포스코 용융소재 공급유닛 및 이를 포함하는 건식코팅장치

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101461738B1 (ko) 2012-12-21 2014-11-14 주식회사 포스코 가열장치 및 이를 포함하는 코팅 시스템
GB2574400B (en) * 2018-06-04 2022-11-23 Dyson Technology Ltd A Device
CN113564534B (zh) * 2020-04-28 2023-05-09 宝山钢铁股份有限公司 一种真空镀机组镀液连续供给装置及其供给方法

Family Cites Families (21)

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US4366721A (en) * 1981-02-10 1983-01-04 Union Carbide Corporation Molten metal sampling device
JPS57137463A (en) * 1981-02-20 1982-08-25 Canon Inc Vapor depositing method
FR2611746B1 (fr) 1987-03-06 1989-06-30 Centre Nat Etd Spatiales Dispositif d'evaporation sous vide d'un metal en continu
JPH02118064A (ja) * 1988-10-27 1990-05-02 Mitsubishi Heavy Ind Ltd 真空蒸着装置
US5526867A (en) * 1988-11-10 1996-06-18 Lanxide Technology Company, Lp Methods of forming electronic packages
JPH0521578A (ja) * 1991-07-15 1993-01-29 Fujitsu Ltd 半導体製造装置
US5407000A (en) * 1992-02-13 1995-04-18 The Dow Chemical Company Method and apparatus for handling molten metals
DE4442824C1 (de) 1994-12-01 1996-01-25 Siemens Ag Solarzelle mit Chalkopyrit-Absorberschicht
US6251233B1 (en) * 1998-08-03 2001-06-26 The Coca-Cola Company Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation
JP3823591B2 (ja) * 1999-03-25 2006-09-20 三菱電機株式会社 Ｃｖｄ原料用気化装置およびこれを用いたｃｖｄ装置
JP2004244485A (ja) * 2003-02-13 2004-09-02 Sumitomo Electric Ind Ltd 熱媒体
US6909839B2 (en) * 2003-07-23 2005-06-21 Advanced Technology Materials, Inc. Delivery systems for efficient vaporization of precursor source material
WO2005061756A1 (en) * 2003-12-09 2005-07-07 Osemi, Inc. High temperature vacuum evaporation apparatus
LV13383B (en) * 2004-05-27 2006-02-20 Sidrabe As Method and device for vacuum vaporization metals or alloys
DE102005062977B3 (de) 2005-12-28 2007-09-13 Sulfurcell Solartechnik Gmbh Verfahren und Vorrichtung zur Umsetzung metallischer Vorläuferschichten zu Chalkopyritschichten von CIGSS-solarzellen
DE112007002897A5 (de) * 2006-09-29 2009-09-03 Von Ardenne Anlagentechnik Gmbh Vakuumbeschichtungsverfahren und Anordnung zur Durchführung des Verfahrens
JP2008248362A (ja) * 2007-03-30 2008-10-16 Fujifilm Corp セレン蒸着装置
EP2025773A1 (en) * 2007-07-19 2009-02-18 Applied Materials, Inc. Vacuum evaporation apparatus for solid materials
US20090020070A1 (en) * 2007-07-19 2009-01-22 Michael Schafer Vacuum evaporation apparatus for solid materials
AU2008297944A1 (en) 2007-09-11 2009-03-19 Centrotherm Photovoltaics Ag Method and apparatus for thermally converting metallic precursor layers into semiconducting layers, and also solar module
EP2048261A1 (fr) * 2007-10-12 2009-04-15 ArcelorMittal France Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017200253A1 (ko) * 2016-05-16 2017-11-23 주식회사 포스코 용융소재 공급유닛 및 이를 포함하는 건식코팅장치

Also Published As

Publication number Publication date
EP2553136A1 (de) 2013-02-06
US20130098453A1 (en) 2013-04-25
CN102812151A (zh) 2012-12-05
EP2553136B1 (de) 2016-11-09
US20150020896A1 (en) 2015-01-22
JP2013524001A (ja) 2013-06-17
ES2614944T3 (es) 2017-06-02
WO2011117291A1 (de) 2011-09-29
EP2369033A1 (de) 2011-09-28

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