JP2013524001A - 蒸発器チャンバを補充する方法および装置 - Google Patents

蒸発器チャンバを補充する方法および装置 Download PDF

Info

Publication number
JP2013524001A
JP2013524001A JP2013500492A JP2013500492A JP2013524001A JP 2013524001 A JP2013524001 A JP 2013524001A JP 2013500492 A JP2013500492 A JP 2013500492A JP 2013500492 A JP2013500492 A JP 2013500492A JP 2013524001 A JP2013524001 A JP 2013524001A
Authority
JP
Japan
Prior art keywords
vacuum chamber
chamber
vacuum
selenium
heated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2013500492A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013524001A5 (https=
Inventor
ボーガー，ライムント
ヤーンケ，アンドレアス
ゲツツエ，トーマス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Glass France SAS
Original Assignee
Saint Gobain Glass France SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=42232778&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP2013524001(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Saint Gobain Glass France SAS filed Critical Saint Gobain Glass France SAS
Publication of JP2013524001A publication Critical patent/JP2013524001A/ja
Publication of JP2013524001A5 publication Critical patent/JP2013524001A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17D—PIPE-LINE SYSTEMS; PIPE-LINES
    • F17D1/00—Pipe-line systems
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16L—PIPES; JOINTS OR FITTINGS FOR PIPES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; MEANS FOR THERMAL INSULATION IN GENERAL
    • F16L53/00—Heating of pipes or pipe systems; Cooling of pipes or pipe systems
    • F16L53/30—Heating of pipes or pipe systems
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/6416—With heating or cooling of the system
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/85978—With pump
    • Y10T137/86083—Vacuum pump

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Physical Vapour Deposition (AREA)
  • Photovoltaic Devices (AREA)
JP2013500492A 2010-03-26 2011-03-23 蒸発器チャンバを補充する方法および装置 Pending JP2013524001A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP10157912.6 2010-03-26
EP20100157912 EP2369033A1 (de) 2010-03-26 2010-03-26 Verfahren zum Nachfüllen einer Verdampferkammer
PCT/EP2011/054433 WO2011117291A1 (de) 2010-03-26 2011-03-23 Verfahren und vorrichtung zum nachfüllen einer verdampferkammer

Publications (2)

Publication Number Publication Date
JP2013524001A true JP2013524001A (ja) 2013-06-17
JP2013524001A5 JP2013524001A5 (https=) 2014-11-27

Family

ID=42232778

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013500492A Pending JP2013524001A (ja) 2010-03-26 2011-03-23 蒸発器チャンバを補充する方法および装置

Country Status (7)

Country Link
US (2) US20130098453A1 (https=)
EP (2) EP2369033A1 (https=)
JP (1) JP2013524001A (https=)
KR (1) KR20130008024A (https=)
CN (1) CN102812151A (https=)
ES (1) ES2614944T3 (https=)
WO (1) WO2011117291A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101461738B1 (ko) 2012-12-21 2014-11-14 주식회사 포스코 가열장치 및 이를 포함하는 코팅 시스템
KR101778441B1 (ko) * 2016-05-16 2017-09-14 주식회사 포스코 건식코팅장치
GB2574400B (en) * 2018-06-04 2022-11-23 Dyson Technology Ltd A Device
CN113564534B (zh) * 2020-04-28 2023-05-09 宝山钢铁股份有限公司 一种真空镀机组镀液连续供给装置及其供给方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57137463A (en) * 1981-02-20 1982-08-25 Canon Inc Vapor depositing method
JPH0521578A (ja) * 1991-07-15 1993-01-29 Fujitsu Ltd 半導体製造装置
JP2002522637A (ja) * 1998-08-03 2002-07-23 ザ・コカ−コーラ・カンパニー 固体の蒸発、アーク放電、及びイオン化と蒸発の測定のための諸システムを含んだプラズマ強化真空蒸着システム
JP2004244485A (ja) * 2003-02-13 2004-09-02 Sumitomo Electric Ind Ltd 熱媒体
JP2008500454A (ja) * 2004-05-27 2008-01-10 ズィードラーベ インコーポレイテッド 金属及び合金の蒸発による真空蒸着方法及び真空蒸着装置
JP2008248362A (ja) * 2007-03-30 2008-10-16 Fujifilm Corp セレン蒸着装置
WO2009010468A1 (en) * 2007-07-19 2009-01-22 Applied Materials, Inc. Vacuum evaporation apparatus for solid materials

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4366721A (en) * 1981-02-10 1983-01-04 Union Carbide Corporation Molten metal sampling device
FR2611746B1 (fr) 1987-03-06 1989-06-30 Centre Nat Etd Spatiales Dispositif d'evaporation sous vide d'un metal en continu
JPH02118064A (ja) * 1988-10-27 1990-05-02 Mitsubishi Heavy Ind Ltd 真空蒸着装置
US5526867A (en) * 1988-11-10 1996-06-18 Lanxide Technology Company, Lp Methods of forming electronic packages
US5407000A (en) * 1992-02-13 1995-04-18 The Dow Chemical Company Method and apparatus for handling molten metals
DE4442824C1 (de) 1994-12-01 1996-01-25 Siemens Ag Solarzelle mit Chalkopyrit-Absorberschicht
JP3823591B2 (ja) * 1999-03-25 2006-09-20 三菱電機株式会社 Ｃｖｄ原料用気化装置およびこれを用いたｃｖｄ装置
US6909839B2 (en) * 2003-07-23 2005-06-21 Advanced Technology Materials, Inc. Delivery systems for efficient vaporization of precursor source material
WO2005061756A1 (en) * 2003-12-09 2005-07-07 Osemi, Inc. High temperature vacuum evaporation apparatus
DE102005062977B3 (de) 2005-12-28 2007-09-13 Sulfurcell Solartechnik Gmbh Verfahren und Vorrichtung zur Umsetzung metallischer Vorläuferschichten zu Chalkopyritschichten von CIGSS-solarzellen
DE112007002897A5 (de) * 2006-09-29 2009-09-03 Von Ardenne Anlagentechnik Gmbh Vakuumbeschichtungsverfahren und Anordnung zur Durchführung des Verfahrens
US20090020070A1 (en) * 2007-07-19 2009-01-22 Michael Schafer Vacuum evaporation apparatus for solid materials
AU2008297944A1 (en) 2007-09-11 2009-03-19 Centrotherm Photovoltaics Ag Method and apparatus for thermally converting metallic precursor layers into semiconducting layers, and also solar module
EP2048261A1 (fr) * 2007-10-12 2009-04-15 ArcelorMittal France Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57137463A (en) * 1981-02-20 1982-08-25 Canon Inc Vapor depositing method
JPH0521578A (ja) * 1991-07-15 1993-01-29 Fujitsu Ltd 半導体製造装置
JP2002522637A (ja) * 1998-08-03 2002-07-23 ザ・コカ−コーラ・カンパニー 固体の蒸発、アーク放電、及びイオン化と蒸発の測定のための諸システムを含んだプラズマ強化真空蒸着システム
JP2004244485A (ja) * 2003-02-13 2004-09-02 Sumitomo Electric Ind Ltd 熱媒体
JP2008500454A (ja) * 2004-05-27 2008-01-10 ズィードラーベ インコーポレイテッド 金属及び合金の蒸発による真空蒸着方法及び真空蒸着装置
JP2008248362A (ja) * 2007-03-30 2008-10-16 Fujifilm Corp セレン蒸着装置
WO2009010468A1 (en) * 2007-07-19 2009-01-22 Applied Materials, Inc. Vacuum evaporation apparatus for solid materials

Also Published As

Publication number Publication date
EP2553136A1 (de) 2013-02-06
US20130098453A1 (en) 2013-04-25
CN102812151A (zh) 2012-12-05
EP2553136B1 (de) 2016-11-09
US20150020896A1 (en) 2015-01-22
KR20130008024A (ko) 2013-01-21
ES2614944T3 (es) 2017-06-02
WO2011117291A1 (de) 2011-09-29
EP2369033A1 (de) 2011-09-28

Similar Documents

Publication Publication Date Title
US8323408B2 (en) Methods and apparatus to provide group VIA materials to reactors for group IBIIIAVIA film formation
US9614118B2 (en) Method and apparatus for depositing copper-indium-gallium selenide (CuInGaSe2-cigs) thin films and other materials on a substrate
KR101645950B1 (ko) 특정 적층 가공품을 처리하기 위한 처리 장치
US20150044814A1 (en) Apparatus and method for forming chalcogenide semiconductor absorber materials with sodium impurities
US20100226629A1 (en) Roll-to-roll processing and tools for thin film solar cell manufacturing
CN103460405B (zh) 一种在卷对卷过程中制备薄膜型太阳能电池吸收层的组合式反应器
CN101578386A (zh) 将前体层转换成光伏吸收体的方法和装置
CN104051628B (zh) 有机/无机杂化钙钛矿薄膜的制备方法及其薄膜的用途
TW200945475A (en) Reel-to-reel reaction of a precursor film to form solar cell absorber
JP2013524001A (ja) 蒸発器チャンバを補充する方法および装置
EP3479931A1 (en) Multi-element alloy compound, ink and film absorption layer thereof, and methods for preparing the same
US9343305B2 (en) Method and device for continuously coating substrates
CN106219502B (zh) 一种硫族元素化合物的量产装置及量产方法
US20140302634A1 (en) Apparatus and method for producing solar cells
AU2018101483A4 (en) Device for preparing multi-element alloy compound
KR20170036645A (ko) 박막 태양전지 제조 장치 및 이를 이용한 열처리 공정 방법
US10092854B2 (en) Device and method for applying a material to a substrate
EP2371991B1 (de) Verfahren zum diskontinuierlichen Nachfüllen einer Selenverdampferkammer
RU2212080C2 (ru) СПОСОБ ПОЛУЧЕНИЯ ХАЛЬКОПИРИТНЫХ CuInSe2, Cu (In, Ga)Se2, CuGaSe2 ТОНКИХ ПЛЕНОК
ES3036183T3 (en) Process and device for producing a chalcogen-containing compound semiconductor
JP2013105910A (ja) 処理炉
WO2011135420A1 (en) Process for the production of a compound semiconductor layer
JP2025122762A (ja) 蒸発源装置
JPS58196027A (ja) 液相エピタキシヤル成長装置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20131017

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20140311

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140401

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20140625

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20140702

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140930

A524 Written submission of copy of amendment under article 19 pct

Free format text: JAPANESE INTERMEDIATE CODE: A524

Effective date: 20140930

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20150331