KR20110068157A - 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막 및 이의 제조방법 - Google Patents
태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막 및 이의 제조방법 Download PDFInfo
- Publication number
- KR20110068157A KR20110068157A KR1020090125004A KR20090125004A KR20110068157A KR 20110068157 A KR20110068157 A KR 20110068157A KR 1020090125004 A KR1020090125004 A KR 1020090125004A KR 20090125004 A KR20090125004 A KR 20090125004A KR 20110068157 A KR20110068157 A KR 20110068157A
- Authority
- KR
- South Korea
- Prior art keywords
- thin film
- solar cells
- solar cell
- manufacturing
- depositing
- Prior art date
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 140
- 238000002360 preparation method Methods 0.000 title claims abstract 4
- 238000004519 manufacturing process Methods 0.000 claims abstract description 33
- 230000031700 light absorption Effects 0.000 claims abstract description 8
- 229910052711 selenium Inorganic materials 0.000 claims description 81
- 238000000034 method Methods 0.000 claims description 36
- 239000000758 substrate Substances 0.000 claims description 29
- 238000000151 deposition Methods 0.000 claims description 24
- 229910052738 indium Inorganic materials 0.000 claims description 18
- 229910052718 tin Inorganic materials 0.000 claims description 17
- 229910052725 zinc Inorganic materials 0.000 claims description 17
- 238000010549 co-Evaporation Methods 0.000 claims description 9
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 7
- 229910052750 molybdenum Inorganic materials 0.000 claims description 7
- 239000011733 molybdenum Substances 0.000 claims description 7
- 239000005361 soda-lime glass Substances 0.000 claims description 7
- 238000004070 electrodeposition Methods 0.000 claims description 5
- 229910007610 Zn—Sn Inorganic materials 0.000 claims description 3
- 230000008021 deposition Effects 0.000 claims description 3
- 238000001771 vacuum deposition Methods 0.000 claims description 3
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 claims 2
- 239000010949 copper Substances 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 10
- 239000000203 mixture Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000004927 fusion Effects 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 229910008772 Sn—Se Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 229910004613 CdTe Inorganic materials 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/0445—PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
- C22C9/02—Alloys based on copper with tin as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
- C22C9/04—Alloys based on copper with zinc as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0623—Sulfides, selenides or tellurides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
- H01L31/0324—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising only AIVBVI or AIIBIVCVI chalcogenide compounds, e.g. Pb Sn Te
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
- H01L31/03923—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate including AIBIIICVI compound materials, e.g. CIS, CIGS
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type
- H01L31/0749—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type including a AIBIIICVI compound, e.g. CdS/CulnSe2 [CIS] heterojunction solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
Abstract
Description
Claims (17)
- 태양전지에서 광흡수층으로 사용되는 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막.
- 청구항 1에 있어서,상기 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막은 CuInZnSnS4 박막, CuInZnSnSe2 박막 또는 CuInZnSnS4Se2 박막인 것을 특징으로 하는 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막.
- 청구항 1에 있어서,상기 Cu-In-Zn-Sn-(Se,S)계 박막에서 (Zn+Sn)/(In+Zn+Sn)은 O 초과 0.5 이하인 것을 특징으로 하는 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막.
- 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막을 광흡수층으로 사용하는 태양전지.
- 청구항 4에 있어서,상기 Cu-In-Zn-Sn-(Se,S)계 박막에서 (Zn+Sn)/(In+Zn+Sn)은 O 초과 0.5 이하 인 것을 특징으로 하는 태양전지.
- 기판 상에 Cu2ZnSnS4 박막을 형성하는 단계(단계 1); 및상기 단계 1에서 형성된 Cu2ZnSnS4 박막 상에 In 및 Se을 증착시키는 단계(단계 2)를 포함하는 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막의 제조방법.
- 청구항 6에 있어서,상기 단계 2에서 Cu2ZnSnS4 박막 상에 In 및 Se을 증착시키는 단계 2는 동시진공증발법, MOCVD 방법 또는 전착 방법을 사용하여 수행되는 것을 특징으로 하는 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막의 제조방법.
- 청구항 6에 있어서,상기 단계 2에서 Cu2ZnSnS4 박막 상에 In 및 Se을 증착시키는 단계는 동시진 공증발법을 사용하여 수행되는 것을 특징으로 하는 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막의 제조방법.
- 청구항 6에 있어서,상기 단계 2에서 Cu2ZnSnS4 박막 상에 In 및 Se을 증착시키는 과정에서 기판 온도는 400~600℃인 것을 특징으로 하는 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막의 제조방법.
- 청구항 6에 있어서,상기 기판은 몰리브덴이 후면전극으로 형성된 소다라임 유리기판인 것을 특징으로 하는 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막의 제조방법.
- 청구항 6에 있어서,상기 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막에서 (Zn+Sn)/(In+Zn+Sn)은 0 초과 0.5 이하인 것을 특징으로 하는 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막의 제조방법.
- 기판 상에 CuInSe2 박막을 형성하는 단계(단계 A); 및상기 CuInSe2 박막 상에 Zn, Sn 및 Se를 증착하여 CuInZnSnSe2 박막을 형성하는 단계(단계 B)를 포함하는 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막의 제조방법.
- 청구항 12에 있어서,상기 CuInSe2 박막 상에 Zn, Sn 및 Se를 증착시키는 과정에서 기판 온도는 300~400 ℃인 것을 특징으로 하는 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막의 제조방법.
- 청구항 12에 있어서,상기 CuInSe2 박막 상에 Zn, Sn 및 Se를 증착시키는 단계는 동시진공증발법, MOCVD 방법 또는 전착 방법을 사용하여 수행되는 것을 특징으로 하는 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막의 제조방법.
- 청구항 12에 있어서,상기 CuInSe2 박막 상에 Zn, Sn 및 Se를 증착시키는 단계 B는 동시진공증발법을 사용하여 수행되는 것을 특징으로 하는 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막의 제조방법.
- 청구항 12에 있어서,상기 기판은 몰리브덴이 후면전극으로 형성된 소다라임 유리기판인 것을 특징으로 하는 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막의 제조방법.
- 청구항 12에 있어서,상기 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막에서 (Zn+Sn)/(In+Zn+Sn)은 O 초과 0.5 이하인 것을 특징으로 하는 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막의 제조방법.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090125004A KR101094326B1 (ko) | 2009-12-15 | 2009-12-15 | 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막 및 이의 제조방법 |
US13/379,814 US8747706B2 (en) | 2009-12-15 | 2010-11-08 | Cu—In—Zn—Sn-(Se,S)-based thin film for solar cell and preparation method thereof |
PCT/KR2010/007836 WO2011074784A2 (en) | 2009-12-15 | 2010-11-08 | Cu-in-zn-sn-(se,s)-based thin film for solar cell and preparation method thereof |
CN201080056028.7A CN102652368B (zh) | 2009-12-15 | 2010-11-08 | 太阳能电池中使用的Cu-In-Zn-Sn-(Se,S)基薄膜及其制造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090125004A KR101094326B1 (ko) | 2009-12-15 | 2009-12-15 | 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막 및 이의 제조방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20110068157A true KR20110068157A (ko) | 2011-06-22 |
KR101094326B1 KR101094326B1 (ko) | 2011-12-19 |
Family
ID=44167806
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020090125004A KR101094326B1 (ko) | 2009-12-15 | 2009-12-15 | 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막 및 이의 제조방법 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8747706B2 (ko) |
KR (1) | KR101094326B1 (ko) |
CN (1) | CN102652368B (ko) |
WO (1) | WO2011074784A2 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013022234A2 (en) * | 2011-08-08 | 2013-02-14 | Korea Institute Of Energy Research | Method of manufacturing czt(s,se)-based thin film for solar cell and czt(s,se)-based thin film manufactured thereby |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2949773B1 (fr) * | 2009-09-10 | 2016-01-01 | Univ Toulouse 3 Paul Sabatier | Materiau solide a l'etat divise, procede de fabrication d'un tel materiau et utilisation d'un tel materiau dans une cellule photovoltaique. |
CN102306685B (zh) * | 2011-09-20 | 2013-03-06 | 湛江师范学院 | 一种铜锌锡硫薄膜太阳能电池吸收层的低成本制备方法 |
KR101279370B1 (ko) | 2011-12-22 | 2013-07-04 | 한국에너지기술연구원 | 동시진공증발공정을 이용한 태양전지용 CZTSe계 박막의 제조방법 및 그 방법에 의해 제조된 CZTSe계 박막 |
US20130217211A1 (en) * | 2012-02-21 | 2013-08-22 | Aqt Solar, Inc. | Controlled-Pressure Process for Production of CZTS Thin-Films |
FR2995452B1 (fr) * | 2012-09-12 | 2014-10-10 | Inst Nat Sciences Appliq | Ensemble pour cellule photovoltaique, procede de fabrication d'un tel ensemble et cellule photovoltaique le contenant |
TWI463685B (zh) * | 2012-12-17 | 2014-12-01 | Ind Tech Res Inst | 多層堆疊的光吸收薄膜與其製造方法及太陽能電池 |
CN103343318B (zh) * | 2013-07-03 | 2015-11-18 | 深圳先进技术研究院 | 太阳能电池的光吸收层的制备方法 |
CN104716229B (zh) * | 2013-12-16 | 2017-06-27 | 中国电子科技集团公司第十八研究所 | 铜锌锡硒薄膜太阳电池的制备方法 |
CN104716227A (zh) * | 2013-12-16 | 2015-06-17 | 中国电子科技集团公司第十八研究所 | Czts薄膜太阳电池吸收层的制备方法 |
KR101691134B1 (ko) | 2014-09-23 | 2016-12-29 | 인천대학교 산학협력단 | 공간적 에너지 밴드갭 변조방법에 의한 태양전지의 케스트라이트 광흡수층 구조 |
CN104876195B (zh) * | 2015-06-17 | 2017-01-25 | 许昌学院 | 一种常温原位控制合成硒硫铜三元化合物的化学方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100347106B1 (ko) * | 2000-07-19 | 2002-07-31 | 한국에너지기술연구원 | 이원화합물의 진공증발 증착에 의한 CuInSe2박막의 제조방법 |
JP4131965B2 (ja) * | 2004-12-28 | 2008-08-13 | 昭和シェル石油株式会社 | Cis系薄膜太陽電池の光吸収層の作製方法 |
KR100495925B1 (ko) | 2005-01-12 | 2005-06-17 | (주)인솔라텍 | 태양전지용 광흡수층 및 그 제조 방법 |
JP2007269589A (ja) * | 2006-03-31 | 2007-10-18 | Nagaoka Univ Of Technology | 硫化物薄膜の作製方法 |
US9748422B2 (en) * | 2008-01-23 | 2017-08-29 | Massachusetts Institute Of Technology | Semiconductor nanocrystals |
CN101452969B (zh) * | 2008-12-29 | 2010-06-02 | 上海太阳能电池研究与发展中心 | 铜锌锡硫化合物半导体薄膜太阳能电池及制备方法 |
WO2010138636A2 (en) * | 2009-05-26 | 2010-12-02 | Purdue Research Foundation | Synthesis of multinary chalcogenide nanoparticles comprising cu, zn, sn, s, and se |
US9105796B2 (en) * | 2009-11-25 | 2015-08-11 | E I Du Pont De Nemours And Company | CZTS/Se precursor inks and methods for preparing CZTS/Se thin films and CZTS/Se-based photovoltaic cells |
-
2009
- 2009-12-15 KR KR1020090125004A patent/KR101094326B1/ko active IP Right Grant
-
2010
- 2010-11-08 WO PCT/KR2010/007836 patent/WO2011074784A2/en active Application Filing
- 2010-11-08 CN CN201080056028.7A patent/CN102652368B/zh active Active
- 2010-11-08 US US13/379,814 patent/US8747706B2/en active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013022234A2 (en) * | 2011-08-08 | 2013-02-14 | Korea Institute Of Energy Research | Method of manufacturing czt(s,se)-based thin film for solar cell and czt(s,se)-based thin film manufactured thereby |
WO2013022234A3 (en) * | 2011-08-08 | 2013-05-02 | Korea Institute Of Energy Research | Method of manufacturing czt(s,se)-based thin film for solar cell and czt(s,se)-based thin film manufactured thereby |
Also Published As
Publication number | Publication date |
---|---|
CN102652368B (zh) | 2014-12-17 |
US20120103420A1 (en) | 2012-05-03 |
KR101094326B1 (ko) | 2011-12-19 |
US8747706B2 (en) | 2014-06-10 |
CN102652368A (zh) | 2012-08-29 |
WO2011074784A3 (en) | 2011-10-20 |
WO2011074784A2 (en) | 2011-06-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101094326B1 (ko) | 태양전지용 Cu-In-Zn-Sn-(Se,S)계 박막 및 이의 제조방법 | |
US9780246B2 (en) | Method for manufacturing CZTS based thin film having dual band gap slope, method for manufacturing CZTS based solar cell having dual band gap slope and CZTS based solar cell thereof | |
KR20100136790A (ko) | 태양전지 및 그 제조방법 | |
TW201123465A (en) | Photoelectric conversion device, method for producing the same, and solar battery | |
KR20130016528A (ko) | 태양전지용 CZT(S,Se)계 박막의 제조방법 및 그 방법에 의해 제조된 CZT(S,Se)계 박막 | |
WO2013162781A2 (en) | Back contact structure for photovoltaic devices such as copper-indium-diselenide solar cells | |
US20140326296A1 (en) | Solar cell and method of fabricating the same | |
JP2015233139A (ja) | 原子層蒸着法で形成されたバッファ層を含む太陽電池、及び、その製造方法 | |
US20140318610A1 (en) | Solar cell and method of fabricating the same | |
CN108401469B (zh) | 太阳能电池及其制造方法 | |
Ikeda et al. | A superstrate solar cell based on In2 (Se, S) 3 and CuIn (Se, S) 2 thin films fabricated by electrodeposition combined with annealing | |
WO2012165860A2 (en) | METHOD OF MANUFACTURING CIGS THIN FILM WITH UNIFORM Ga DISTRIBUTION | |
US8258003B2 (en) | Manufacturing method of compound semiconductor solar cell | |
KR102057234B1 (ko) | Cigs 박막 태양전지의 제조방법 및 이의 방법으로 제조된 cigs 박막 태양전지 | |
KR102594725B1 (ko) | 흡수체층의 후처리 방법 | |
US20150249171A1 (en) | Method of making photovoltaic device comprising i-iii-vi2 compound absorber having tailored atomic distribution | |
KR102212042B1 (ko) | 원자층 증착법으로 형성된 버퍼층을 포함하는 태양전지 및 이의 제조방법 | |
KR101358055B1 (ko) | 태양전지용 CZTSe계 박막의 제조방법 및 그 방법에 의해 제조된 CZTSe계 박막 | |
KR101924538B1 (ko) | 투명 전도성 산화물 후면전극을 가지는 칼코게나이드계 태양전지 및 그 제조방법 | |
KR101761565B1 (ko) | 태양 전지 및 이의 제조 방법 | |
JP6861480B2 (ja) | 光電変換モジュールの製造方法 | |
US20120125426A1 (en) | Compound semiconductor solar cell | |
TW201311923A (zh) | 利用氧化鋁鋅靶材製備多層薄膜之方法 | |
JP2017199872A (ja) | 光電変換層の製造方法及び光電変換素子の製造方法 | |
JP2017199873A (ja) | 光電変換層の製造方法及び光電変換素子の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20141208 Year of fee payment: 4 |
|
FPAY | Annual fee payment |
Payment date: 20151207 Year of fee payment: 5 |
|
FPAY | Annual fee payment |
Payment date: 20161107 Year of fee payment: 6 |
|
FPAY | Annual fee payment |
Payment date: 20171204 Year of fee payment: 7 |
|
FPAY | Annual fee payment |
Payment date: 20180918 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20190909 Year of fee payment: 9 |