KR20100121678A - 가요성 하우징을 구비한 확산 냉각 이산화탄소 레이저 - Google Patents

가요성 하우징을 구비한 확산 냉각 이산화탄소 레이저 Download PDF

Info

Publication number
KR20100121678A
KR20100121678A KR1020107021068A KR20107021068A KR20100121678A KR 20100121678 A KR20100121678 A KR 20100121678A KR 1020107021068 A KR1020107021068 A KR 1020107021068A KR 20107021068 A KR20107021068 A KR 20107021068A KR 20100121678 A KR20100121678 A KR 20100121678A
Authority
KR
South Korea
Prior art keywords
wall
walls
laser
longitudinal
housing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020107021068A
Other languages
English (en)
Korean (ko)
Inventor
앤서니 제이. 드마리아
Original Assignee
코히어런트, 인크.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 코히어런트, 인크. filed Critical 코히어런트, 인크.
Publication of KR20100121678A publication Critical patent/KR20100121678A/ko
Ceased legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H01S3/041—Arrangements for thermal management for gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/0315—Waveguide lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0385—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H01S3/0404—Air- or gas cooling, e.g. by dry nitrogen
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • H01S3/0813—Configuration of resonator
    • H01S3/0816—Configuration of resonator having 4 reflectors, e.g. Z-shaped resonators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09702—Details of the driver electronics and electric discharge circuits

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Lasers (AREA)
KR1020107021068A 2008-02-22 2009-02-12 가요성 하우징을 구비한 확산 냉각 이산화탄소 레이저 Ceased KR20100121678A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/035,630 US8942270B2 (en) 2008-02-22 2008-02-22 Diffusion-cooled CO2 laser with flexible housing
US12/035,630 2008-02-22

Publications (1)

Publication Number Publication Date
KR20100121678A true KR20100121678A (ko) 2010-11-18

Family

ID=40853845

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020107021068A Ceased KR20100121678A (ko) 2008-02-22 2009-02-12 가요성 하우징을 구비한 확산 냉각 이산화탄소 레이저

Country Status (7)

Country Link
US (1) US8942270B2 (https=)
JP (1) JP2011513948A (https=)
KR (1) KR20100121678A (https=)
CN (1) CN102007654B (https=)
DE (1) DE112009000417T5 (https=)
GB (1) GB2470530B (https=)
WO (1) WO2009105174A2 (https=)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8422528B2 (en) * 2011-02-24 2013-04-16 Iradion Laser, Inc. Ceramic slab, free-space and waveguide lasers
US8611391B2 (en) 2011-05-03 2013-12-17 Coherent, Inc. Waveguide CO2 laser with mutiply folded resonator
US10404030B2 (en) 2015-02-09 2019-09-03 Iradion Laser, Inc. Flat-folded ceramic slab lasers
US9614342B2 (en) * 2015-04-16 2017-04-04 Coherent, Inc. Air-cooled carbon-dioxide laser
US9419404B1 (en) * 2015-04-22 2016-08-16 Coherent, Inc. Water-cooled carbon-dioxide laser
CN105048256B (zh) * 2015-09-23 2017-10-20 江苏卓远激光科技有限公司 一种激光器电极板活动安装式结构
CN105098594B (zh) * 2015-09-23 2018-05-08 江苏卓远激光科技有限公司 一种激光器电极板卡接式结构
WO2017075731A1 (zh) * 2015-11-03 2017-05-11 徐海军 四腔室结构的射频激光器
CN105576482B (zh) * 2016-03-09 2018-07-03 中国工程物理研究院应用电子学研究所 一种用于激光器晶体的纵向式冷却器系统
CN106451039A (zh) * 2016-10-17 2017-02-22 吉林省永利激光科技有限公司 无水冷的风冷型封离式二氧化碳激光器
US10644474B2 (en) * 2018-03-07 2020-05-05 Coherent, Inc. Conductively-cooled slab laser
KR102894577B1 (ko) * 2019-07-03 2025-12-02 에스이씨 테크놀로지스 에스.알.오. 온도 변화 동안 레이저 헤드의 편향을 제한하기 위한 방법 및 레이저 헤드
ES2966706T3 (es) 2020-02-05 2024-04-24 Coherent Inc Láser de gas excitado por radiofrecuencia
CN116014537A (zh) * 2023-01-31 2023-04-25 安徽光智科技有限公司 二氧化碳激光器腔体模块

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3553603A (en) * 1966-03-21 1971-01-05 Avco Corp Laser device utilizing an electric field across a nonresonant optical cavity
US3781709A (en) * 1972-08-02 1973-12-25 Siemens Ag Laser arrangement
US4493087A (en) * 1979-12-13 1985-01-08 Walwel, Inc. RF Excited waveguide gas laser
US4959840A (en) * 1988-01-15 1990-09-25 Cymer Laser Technologies Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser
US4787090A (en) * 1988-03-28 1988-11-22 United Technologies Corporation Compact distributed inductance RF-excited waveguide gas laser arrangement
JPH07307506A (ja) * 1994-05-16 1995-11-21 Mitsubishi Electric Corp レーザ発振器
US5661746A (en) * 1995-10-17 1997-08-26 Universal Laser Syatems, Inc. Free-space gas slab laser
DE69840287D1 (de) * 1997-03-14 2009-01-15 Demaria Electrooptics Inc Hochfrequenz-angeregter wellenleiterlaser
US5901167A (en) * 1997-04-30 1999-05-04 Universal Laser Systems, Inc. Air cooled gas laser
US5881087A (en) * 1997-04-30 1999-03-09 Universal Laser Systems, Inc. Gas laser tube design
US6198759B1 (en) * 1999-12-27 2001-03-06 Synrad, Inc. Laser system and method for beam enhancement
US6198758B1 (en) * 1999-12-27 2001-03-06 Synrad, Inc. Laser with heat transfer system and method
CN2469589Y (zh) * 2001-02-28 2002-01-02 陈清明 一种用于高功率co2激光输出窗口的冷却装置
US6983001B2 (en) * 2002-12-16 2006-01-03 Universal Laser Systems, Inc. Laser with heat transfer system
US7145926B2 (en) * 2003-01-24 2006-12-05 Peter Vitruk RF excited gas laser

Also Published As

Publication number Publication date
GB2470530B (en) 2012-03-07
DE112009000417T5 (de) 2010-12-30
CN102007654B (zh) 2013-05-01
WO2009105174A2 (en) 2009-08-27
GB201015431D0 (en) 2010-10-27
CN102007654A (zh) 2011-04-06
WO2009105174A3 (en) 2010-03-18
US8942270B2 (en) 2015-01-27
GB2470530A (en) 2010-11-24
JP2011513948A (ja) 2011-04-28
US20090213885A1 (en) 2009-08-27

Similar Documents

Publication Publication Date Title
KR20100121678A (ko) 가요성 하우징을 구비한 확산 냉각 이산화탄소 레이저
US7145926B2 (en) RF excited gas laser
US5982803A (en) Free-space gas slab laser
US3753144A (en) Gas laser structure
US6198758B1 (en) Laser with heat transfer system and method
JP2011513948A5 (https=)
US20020061045A1 (en) Portable low-power gas discharge laser
US3437950A (en) Ion laser having a metal tube shrink-fitted onto the ceramic discharge tube
US6983001B2 (en) Laser with heat transfer system
US6195379B1 (en) Laser assembly system and method
US3427564A (en) High-power ionized gas laser structure
TWI345348B (en) Chamber for a high energy excimer laser source
US9614342B2 (en) Air-cooled carbon-dioxide laser
EP3763003B1 (en) Conductively-cooled slab laser
US7885310B2 (en) Gas slab laser
JP2009099902A (ja) 放電励起ガスレーザ装置の冷却機構
JPH03208383A (ja) ガスレーザ装置
JP4450980B2 (ja) 交流放電ガスレーザ発振器
JP2702202B2 (ja) Ｒｆ励起式全金属型気体レーザ
JP2002261356A (ja) ガスレーザ発振器
JPH08148736A (ja) ガスレーザ装置
JPH02278777A (ja) 内部ミラー型Ｈｅ―Ｎｅレーザ管
JPH04256387A (ja) ガスレーザ装置
JPH0716056B2 (ja) パルスレーザ発振装置
JPH05235437A (ja) 金属蒸気レーザ装置

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20100920

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20130904

Comment text: Request for Examination of Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20140430

Patent event code: PE09021S01D

E601 Decision to refuse application
PE0601 Decision on rejection of patent

Patent event date: 20140930

Comment text: Decision to Refuse Application

Patent event code: PE06012S01D

Patent event date: 20140430

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I