DE112009000417T5 - Diffusionsgekühlter CO2-Laser mit flexiblem Gehäuse - Google Patents
Diffusionsgekühlter CO2-Laser mit flexiblem Gehäuse Download PDFInfo
- Publication number
- DE112009000417T5 DE112009000417T5 DE112009000417T DE112009000417T DE112009000417T5 DE 112009000417 T5 DE112009000417 T5 DE 112009000417T5 DE 112009000417 T DE112009000417 T DE 112009000417T DE 112009000417 T DE112009000417 T DE 112009000417T DE 112009000417 T5 DE112009000417 T5 DE 112009000417T5
- Authority
- DE
- Germany
- Prior art keywords
- wall
- laser
- housing
- longitudinal wall
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000001816 cooling Methods 0.000 claims abstract description 54
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 239000012777 electrically insulating material Substances 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 6
- 238000001125 extrusion Methods 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 claims description 3
- 229910000838 Al alloy Inorganic materials 0.000 claims description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 2
- 238000010276 construction Methods 0.000 claims 1
- 239000011810 insulating material Substances 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 15
- 239000012528 membrane Substances 0.000 description 11
- 238000005452 bending Methods 0.000 description 4
- 239000012212 insulator Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- QGDKRLQRLFUJPP-UHFFFAOYSA-N 1,2,3,5-tetrachloro-4-(2-chlorophenyl)benzene Chemical compound ClC1=CC=CC=C1C1=C(Cl)C=C(Cl)C(Cl)=C1Cl QGDKRLQRLFUJPP-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- GQWNECFJGBQMBO-UHFFFAOYSA-N Molindone hydrochloride Chemical compound Cl.O=C1C=2C(CC)=C(C)NC=2CCC1CN1CCOCC1 GQWNECFJGBQMBO-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000005283 ground state Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/041—Arrangements for thermal management for gas lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/0315—Waveguide lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0385—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/0404—Air- or gas cooling, e.g. by dry nitrogen
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/0813—Configuration of resonator
- H01S3/0816—Configuration of resonator having 4 reflectors, e.g. Z-shaped resonators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/09702—Details of the driver electronics and electric discharge circuits
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Lasers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/035,630 US8942270B2 (en) | 2008-02-22 | 2008-02-22 | Diffusion-cooled CO2 laser with flexible housing |
| US12/035,630 | 2008-02-22 | ||
| PCT/US2009/000917 WO2009105174A2 (en) | 2008-02-22 | 2009-02-12 | Diffusion-cooled co2 laser with flexible housing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE112009000417T5 true DE112009000417T5 (de) | 2010-12-30 |
Family
ID=40853845
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE112009000417T Withdrawn DE112009000417T5 (de) | 2008-02-22 | 2009-02-12 | Diffusionsgekühlter CO2-Laser mit flexiblem Gehäuse |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8942270B2 (https=) |
| JP (1) | JP2011513948A (https=) |
| KR (1) | KR20100121678A (https=) |
| CN (1) | CN102007654B (https=) |
| DE (1) | DE112009000417T5 (https=) |
| GB (1) | GB2470530B (https=) |
| WO (1) | WO2009105174A2 (https=) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8422528B2 (en) * | 2011-02-24 | 2013-04-16 | Iradion Laser, Inc. | Ceramic slab, free-space and waveguide lasers |
| US8611391B2 (en) | 2011-05-03 | 2013-12-17 | Coherent, Inc. | Waveguide CO2 laser with mutiply folded resonator |
| US10404030B2 (en) | 2015-02-09 | 2019-09-03 | Iradion Laser, Inc. | Flat-folded ceramic slab lasers |
| US9614342B2 (en) * | 2015-04-16 | 2017-04-04 | Coherent, Inc. | Air-cooled carbon-dioxide laser |
| US9419404B1 (en) * | 2015-04-22 | 2016-08-16 | Coherent, Inc. | Water-cooled carbon-dioxide laser |
| CN105048256B (zh) * | 2015-09-23 | 2017-10-20 | 江苏卓远激光科技有限公司 | 一种激光器电极板活动安装式结构 |
| CN105098594B (zh) * | 2015-09-23 | 2018-05-08 | 江苏卓远激光科技有限公司 | 一种激光器电极板卡接式结构 |
| WO2017075731A1 (zh) * | 2015-11-03 | 2017-05-11 | 徐海军 | 四腔室结构的射频激光器 |
| CN105576482B (zh) * | 2016-03-09 | 2018-07-03 | 中国工程物理研究院应用电子学研究所 | 一种用于激光器晶体的纵向式冷却器系统 |
| CN106451039A (zh) * | 2016-10-17 | 2017-02-22 | 吉林省永利激光科技有限公司 | 无水冷的风冷型封离式二氧化碳激光器 |
| US10644474B2 (en) * | 2018-03-07 | 2020-05-05 | Coherent, Inc. | Conductively-cooled slab laser |
| KR102894577B1 (ko) * | 2019-07-03 | 2025-12-02 | 에스이씨 테크놀로지스 에스.알.오. | 온도 변화 동안 레이저 헤드의 편향을 제한하기 위한 방법 및 레이저 헤드 |
| ES2966706T3 (es) | 2020-02-05 | 2024-04-24 | Coherent Inc | Láser de gas excitado por radiofrecuencia |
| CN116014537A (zh) * | 2023-01-31 | 2023-04-25 | 安徽光智科技有限公司 | 二氧化碳激光器腔体模块 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4787090A (en) | 1988-03-28 | 1988-11-22 | United Technologies Corporation | Compact distributed inductance RF-excited waveguide gas laser arrangement |
| US6192061B1 (en) | 1997-03-14 | 2001-02-20 | Demaria Electrooptics Systems, Inc. | RF excited waveguide laser |
| US6198758B1 (en) | 1999-12-27 | 2001-03-06 | Synrad, Inc. | Laser with heat transfer system and method |
| US6983001B2 (en) | 2002-12-16 | 2006-01-03 | Universal Laser Systems, Inc. | Laser with heat transfer system |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3553603A (en) * | 1966-03-21 | 1971-01-05 | Avco Corp | Laser device utilizing an electric field across a nonresonant optical cavity |
| US3781709A (en) * | 1972-08-02 | 1973-12-25 | Siemens Ag | Laser arrangement |
| US4493087A (en) * | 1979-12-13 | 1985-01-08 | Walwel, Inc. | RF Excited waveguide gas laser |
| US4959840A (en) * | 1988-01-15 | 1990-09-25 | Cymer Laser Technologies | Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser |
| JPH07307506A (ja) * | 1994-05-16 | 1995-11-21 | Mitsubishi Electric Corp | レーザ発振器 |
| US5661746A (en) * | 1995-10-17 | 1997-08-26 | Universal Laser Syatems, Inc. | Free-space gas slab laser |
| US5901167A (en) * | 1997-04-30 | 1999-05-04 | Universal Laser Systems, Inc. | Air cooled gas laser |
| US5881087A (en) * | 1997-04-30 | 1999-03-09 | Universal Laser Systems, Inc. | Gas laser tube design |
| US6198759B1 (en) * | 1999-12-27 | 2001-03-06 | Synrad, Inc. | Laser system and method for beam enhancement |
| CN2469589Y (zh) * | 2001-02-28 | 2002-01-02 | 陈清明 | 一种用于高功率co2激光输出窗口的冷却装置 |
| US7145926B2 (en) * | 2003-01-24 | 2006-12-05 | Peter Vitruk | RF excited gas laser |
-
2008
- 2008-02-22 US US12/035,630 patent/US8942270B2/en active Active
-
2009
- 2009-02-12 DE DE112009000417T patent/DE112009000417T5/de not_active Withdrawn
- 2009-02-12 JP JP2010547618A patent/JP2011513948A/ja active Pending
- 2009-02-12 KR KR1020107021068A patent/KR20100121678A/ko not_active Ceased
- 2009-02-12 WO PCT/US2009/000917 patent/WO2009105174A2/en not_active Ceased
- 2009-02-12 GB GB1015431.8A patent/GB2470530B/en not_active Expired - Fee Related
- 2009-02-12 CN CN200980106563.6A patent/CN102007654B/zh not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4787090A (en) | 1988-03-28 | 1988-11-22 | United Technologies Corporation | Compact distributed inductance RF-excited waveguide gas laser arrangement |
| US6192061B1 (en) | 1997-03-14 | 2001-02-20 | Demaria Electrooptics Systems, Inc. | RF excited waveguide laser |
| US6198758B1 (en) | 1999-12-27 | 2001-03-06 | Synrad, Inc. | Laser with heat transfer system and method |
| US6983001B2 (en) | 2002-12-16 | 2006-01-03 | Universal Laser Systems, Inc. | Laser with heat transfer system |
Also Published As
| Publication number | Publication date |
|---|---|
| GB2470530B (en) | 2012-03-07 |
| CN102007654B (zh) | 2013-05-01 |
| WO2009105174A2 (en) | 2009-08-27 |
| GB201015431D0 (en) | 2010-10-27 |
| CN102007654A (zh) | 2011-04-06 |
| WO2009105174A3 (en) | 2010-03-18 |
| US8942270B2 (en) | 2015-01-27 |
| KR20100121678A (ko) | 2010-11-18 |
| GB2470530A (en) | 2010-11-24 |
| JP2011513948A (ja) | 2011-04-28 |
| US20090213885A1 (en) | 2009-08-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee |