CN102007654B - 具有挠性外壳的扩散冷却的co2激光器 - Google Patents

具有挠性外壳的扩散冷却的co2激光器 Download PDF

Info

Publication number
CN102007654B
CN102007654B CN200980106563.6A CN200980106563A CN102007654B CN 102007654 B CN102007654 B CN 102007654B CN 200980106563 A CN200980106563 A CN 200980106563A CN 102007654 B CN102007654 B CN 102007654B
Authority
CN
China
Prior art keywords
laser
walls
housing
wall
longitudinal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN200980106563.6A
Other languages
English (en)
Chinese (zh)
Other versions
CN102007654A (zh
Inventor
A·J·德马利亚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coherent Inc
Original Assignee
Coherent Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coherent Inc filed Critical Coherent Inc
Publication of CN102007654A publication Critical patent/CN102007654A/zh
Application granted granted Critical
Publication of CN102007654B publication Critical patent/CN102007654B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H01S3/041—Arrangements for thermal management for gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/0315—Waveguide lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0385—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H01S3/0404—Air- or gas cooling, e.g. by dry nitrogen
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • H01S3/0813—Configuration of resonator
    • H01S3/0816—Configuration of resonator having 4 reflectors, e.g. Z-shaped resonators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09702—Details of the driver electronics and electric discharge circuits

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Lasers (AREA)
CN200980106563.6A 2008-02-22 2009-02-12 具有挠性外壳的扩散冷却的co2激光器 Expired - Fee Related CN102007654B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/035,630 US8942270B2 (en) 2008-02-22 2008-02-22 Diffusion-cooled CO2 laser with flexible housing
US12/035,630 2008-02-22
PCT/US2009/000917 WO2009105174A2 (en) 2008-02-22 2009-02-12 Diffusion-cooled co2 laser with flexible housing

Publications (2)

Publication Number Publication Date
CN102007654A CN102007654A (zh) 2011-04-06
CN102007654B true CN102007654B (zh) 2013-05-01

Family

ID=40853845

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200980106563.6A Expired - Fee Related CN102007654B (zh) 2008-02-22 2009-02-12 具有挠性外壳的扩散冷却的co2激光器

Country Status (7)

Country Link
US (1) US8942270B2 (https=)
JP (1) JP2011513948A (https=)
KR (1) KR20100121678A (https=)
CN (1) CN102007654B (https=)
DE (1) DE112009000417T5 (https=)
GB (1) GB2470530B (https=)
WO (1) WO2009105174A2 (https=)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8422528B2 (en) * 2011-02-24 2013-04-16 Iradion Laser, Inc. Ceramic slab, free-space and waveguide lasers
US8611391B2 (en) 2011-05-03 2013-12-17 Coherent, Inc. Waveguide CO2 laser with mutiply folded resonator
US10404030B2 (en) 2015-02-09 2019-09-03 Iradion Laser, Inc. Flat-folded ceramic slab lasers
US9614342B2 (en) * 2015-04-16 2017-04-04 Coherent, Inc. Air-cooled carbon-dioxide laser
US9419404B1 (en) * 2015-04-22 2016-08-16 Coherent, Inc. Water-cooled carbon-dioxide laser
CN105048256B (zh) * 2015-09-23 2017-10-20 江苏卓远激光科技有限公司 一种激光器电极板活动安装式结构
CN105098594B (zh) * 2015-09-23 2018-05-08 江苏卓远激光科技有限公司 一种激光器电极板卡接式结构
WO2017075731A1 (zh) * 2015-11-03 2017-05-11 徐海军 四腔室结构的射频激光器
CN105576482B (zh) * 2016-03-09 2018-07-03 中国工程物理研究院应用电子学研究所 一种用于激光器晶体的纵向式冷却器系统
CN106451039A (zh) * 2016-10-17 2017-02-22 吉林省永利激光科技有限公司 无水冷的风冷型封离式二氧化碳激光器
US10644474B2 (en) * 2018-03-07 2020-05-05 Coherent, Inc. Conductively-cooled slab laser
KR102894577B1 (ko) * 2019-07-03 2025-12-02 에스이씨 테크놀로지스 에스.알.오. 온도 변화 동안 레이저 헤드의 편향을 제한하기 위한 방법 및 레이저 헤드
ES2966706T3 (es) 2020-02-05 2024-04-24 Coherent Inc Láser de gas excitado por radiofrecuencia
CN116014537A (zh) * 2023-01-31 2023-04-25 安徽光智科技有限公司 二氧化碳激光器腔体模块

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4959840A (en) * 1988-01-15 1990-09-25 Cymer Laser Technologies Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser
US6198758B1 (en) * 1999-12-27 2001-03-06 Synrad, Inc. Laser with heat transfer system and method
CN2469589Y (zh) * 2001-02-28 2002-01-02 陈清明 一种用于高功率co2激光输出窗口的冷却装置
US6983001B2 (en) * 2002-12-16 2006-01-03 Universal Laser Systems, Inc. Laser with heat transfer system
US7145926B2 (en) * 2003-01-24 2006-12-05 Peter Vitruk RF excited gas laser

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3553603A (en) * 1966-03-21 1971-01-05 Avco Corp Laser device utilizing an electric field across a nonresonant optical cavity
US3781709A (en) * 1972-08-02 1973-12-25 Siemens Ag Laser arrangement
US4493087A (en) * 1979-12-13 1985-01-08 Walwel, Inc. RF Excited waveguide gas laser
US4787090A (en) * 1988-03-28 1988-11-22 United Technologies Corporation Compact distributed inductance RF-excited waveguide gas laser arrangement
JPH07307506A (ja) * 1994-05-16 1995-11-21 Mitsubishi Electric Corp レーザ発振器
US5661746A (en) * 1995-10-17 1997-08-26 Universal Laser Syatems, Inc. Free-space gas slab laser
DE69840287D1 (de) * 1997-03-14 2009-01-15 Demaria Electrooptics Inc Hochfrequenz-angeregter wellenleiterlaser
US5901167A (en) * 1997-04-30 1999-05-04 Universal Laser Systems, Inc. Air cooled gas laser
US5881087A (en) * 1997-04-30 1999-03-09 Universal Laser Systems, Inc. Gas laser tube design
US6198759B1 (en) * 1999-12-27 2001-03-06 Synrad, Inc. Laser system and method for beam enhancement

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4959840A (en) * 1988-01-15 1990-09-25 Cymer Laser Technologies Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser
US6198758B1 (en) * 1999-12-27 2001-03-06 Synrad, Inc. Laser with heat transfer system and method
CN2469589Y (zh) * 2001-02-28 2002-01-02 陈清明 一种用于高功率co2激光输出窗口的冷却装置
US6983001B2 (en) * 2002-12-16 2006-01-03 Universal Laser Systems, Inc. Laser with heat transfer system
US7145926B2 (en) * 2003-01-24 2006-12-05 Peter Vitruk RF excited gas laser

Also Published As

Publication number Publication date
GB2470530B (en) 2012-03-07
DE112009000417T5 (de) 2010-12-30
WO2009105174A2 (en) 2009-08-27
GB201015431D0 (en) 2010-10-27
CN102007654A (zh) 2011-04-06
WO2009105174A3 (en) 2010-03-18
US8942270B2 (en) 2015-01-27
KR20100121678A (ko) 2010-11-18
GB2470530A (en) 2010-11-24
JP2011513948A (ja) 2011-04-28
US20090213885A1 (en) 2009-08-27

Similar Documents

Publication Publication Date Title
CN102007654B (zh) 具有挠性外壳的扩散冷却的co2激光器
US7145926B2 (en) RF excited gas laser
US6198758B1 (en) Laser with heat transfer system and method
US4805182A (en) RF-excited, all-metal gas laser
JP2011513948A5 (https=)
CN103518295B (zh) 陶瓷板条、自由空间和波导激光器
JP2001053360A (ja) ガラススラブレーザ
US3437950A (en) Ion laser having a metal tube shrink-fitted onto the ceramic discharge tube
US6195379B1 (en) Laser assembly system and method
US3427564A (en) High-power ionized gas laser structure
US6983001B2 (en) Laser with heat transfer system
WO2003073489A1 (en) Plasma processing device and feeding unit
CN101689743B (zh) 射频激励气体激光源
TWI345348B (en) Chamber for a high energy excimer laser source
US9614342B2 (en) Air-cooled carbon-dioxide laser
JPH04259274A (ja) 高入力に適した電気的ポンピングガスレーザ
US7885310B2 (en) Gas slab laser
JP3979863B2 (ja) 放電励起ガスレーザ装置
RU2108647C1 (ru) Блок генерации излучения многоканального лазера
JP2702202B2 (ja) Ｒｆ励起式全金属型気体レーザ
JP2013187444A (ja) レーザ発振器
JP2009099902A (ja) 放電励起ガスレーザ装置の冷却機構
JPH03208383A (ja) ガスレーザ装置
JPH0645359U (ja) レーザ発振器用放電電極
JPH08148736A (ja) ガスレーザ装置

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20130501

Termination date: 20150212

EXPY Termination of patent right or utility model