KR20100080788A - 표면 개질된 고굴절률 나노입자를 포함하는 자기-조립 반사방지 코팅 - Google Patents

표면 개질된 고굴절률 나노입자를 포함하는 자기-조립 반사방지 코팅 Download PDF

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KR20100080788A
KR20100080788A KR1020107007453A KR20107007453A KR20100080788A KR 20100080788 A KR20100080788 A KR 20100080788A KR 1020107007453 A KR1020107007453 A KR 1020107007453A KR 20107007453 A KR20107007453 A KR 20107007453A KR 20100080788 A KR20100080788 A KR 20100080788A
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refractive index
index layer
meth
antireflective film
low refractive
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Ceased
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KR1020107007453A
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English (en)
Korean (ko)
Inventor
리차드 제이 포코르니
토마스 피 클룬
마크 디 래드클리프
로버트 에프 캄라트
크리스토퍼 비 주니어 워커
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쓰리엠 이노베이티브 프로퍼티즈 컴파니
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Publication of KR20100080788A publication Critical patent/KR20100080788A/ko
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
    • C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
    • C09D127/12—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/006—Anti-reflective coatings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/61—Additives non-macromolecular inorganic
    • C09D7/62—Additives non-macromolecular inorganic modified by treatment with other compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00—Use of pretreated ingredients
    • C08K9/04—Ingredients treated with organic substances
    • C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
    • G02B2207/101—Nanooptics
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Biophysics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Paints Or Removers (AREA)
KR1020107007453A 2007-09-07 2008-09-02 표면 개질된 고굴절률 나노입자를 포함하는 자기-조립 반사방지 코팅 Ceased KR20100080788A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US97054107P 2007-09-07 2007-09-07
US60/970,541 2007-09-07

Publications (1)

Publication Number Publication Date
KR20100080788A true KR20100080788A (ko) 2010-07-12

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KR1020107007453A Ceased KR20100080788A (ko) 2007-09-07 2008-09-02 표면 개질된 고굴절률 나노입자를 포함하는 자기-조립 반사방지 코팅

Country Status (6)

Country Link
US (1) US8202573B2 (https=)
EP (1) EP2193174A1 (https=)
JP (1) JP2010538147A (https=)
KR (1) KR20100080788A (https=)
CN (1) CN101796146B (https=)
WO (1) WO2009035874A1 (https=)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5558363B2 (ja) * 2007-11-29 2014-07-23 エルジー・ケム・リミテッド 耐摩耗性および指紋除去性に優れたコーティング組成物およびコーティングフィルム
WO2011011167A2 (en) 2009-07-21 2011-01-27 3M Innovative Properties Company Curable composition, method of coating a phototool, and coated phototool
WO2011034845A1 (en) * 2009-09-16 2011-03-24 3M Innovative Properties Company Fluorinated coating and phototools made therewith
KR101256552B1 (ko) * 2010-07-08 2013-04-19 주식회사 엘지화학 반사 방지 필름 및 이의 제조 방법
EP2657729A4 (en) * 2010-12-22 2014-07-30 Mitsubishi Rayon Co TRANSFER FILM, MANUFACTURING METHOD, LAMINATE AND MANUFACTURING METHOD THEREFOR
CN103518148B (zh) * 2011-03-09 2016-01-20 3M创新有限公司 包含大粒度热解法二氧化硅的抗反射膜
US9272947B2 (en) * 2011-05-02 2016-03-01 Corning Incorporated Glass article having antireflective layer and method of making
US8568958B2 (en) * 2011-06-21 2013-10-29 Az Electronic Materials Usa Corp. Underlayer composition and process thereof
CN103764567A (zh) * 2011-08-31 2014-04-30 住友大阪水泥股份有限公司 无机氧化物透明分散液、透明复合体形成用树脂组合物及透明复合体以及光学构件
BR112014018980A8 (pt) * 2012-02-01 2017-07-11 3M Innovative Properties Company Materiais nanoestruturados e métodos para a produção dos mesmos
CN102759761B (zh) * 2012-07-17 2014-10-08 宁波激智科技股份有限公司 一种高遮盖高辉度的光学薄膜及包括该光学薄膜的显示器件
FR3009302B1 (fr) * 2013-08-05 2018-01-12 Saint-Gobain Glass France Substrat portant un revetement fonctionnel et une couche de protection temporaire
JP2017507803A (ja) 2013-12-19 2017-03-23 スリーエム イノベイティブ プロパティズ カンパニー 多層複合材料物品
US9994676B2 (en) 2014-06-23 2018-06-12 3M Innovative Properties Company Silicon-containing polymer and method of making a silicon-containing polymer
JP2016097594A (ja) * 2014-11-21 2016-05-30 マツダ株式会社 積層塗膜及び塗装物
US9499698B2 (en) 2015-02-11 2016-11-22 Az Electronic Materials (Luxembourg)S.A.R.L. Metal hardmask composition and processes for forming fine patterns on semiconductor substrates
EP3271418A1 (en) * 2015-03-18 2018-01-24 CoeLux S.r.l. Composite system comprising a matrix and scattering elements, process for preparing it and use thereof
CN104845484B (zh) * 2015-04-29 2017-03-08 广德嘉宝莉化工有限公司 一种高机械性能防水工程机械涂料
JP6688875B2 (ja) * 2016-03-14 2020-04-28 富士フイルム株式会社 組成物、膜、硬化膜、光学センサおよび膜の製造方法
HUP1600384A1 (hu) 2016-06-15 2018-01-29 Hungaro Lux Light Kft Antireflexiós bevonat
TWI755564B (zh) 2017-09-06 2022-02-21 德商馬克專利公司 含有旋轉塗佈無機氧化物的組合物、製造電子裝置之方法以及在矽基板上塗佈硬遮罩組合物之方法
KR102731347B1 (ko) * 2017-12-08 2024-11-15 쓰리엠 이노베이티브 프로퍼티즈 컴파니 가요성 하드코트
WO2019189880A1 (ja) * 2018-03-30 2019-10-03 日揮触媒化成株式会社 膜形成用の塗布液および膜付基材の製造方法
KR102522013B1 (ko) 2018-04-04 2023-04-14 삼성전자주식회사 고분자 및 무기입자를 포함하는 조성물, 폴리이미드-무기입자 복합체, 상기 복합체를 포함하는 성형품, 및 상기 성형품을 포함하는 광학 장치
KR102032316B1 (ko) * 2018-07-09 2019-10-15 에스케이씨 주식회사 광학 다층 필름, 이를 포함하는 광학 부품 및 표시장치
CN113272136B (zh) * 2019-01-10 2023-07-14 大日本印刷株式会社 防反射构件、以及具备该防反射构件的偏振片、图像显示装置和防反射性物品
WO2021111297A1 (en) 2019-12-06 2021-06-10 3M Innovative Properties Company Optical layer and optical system
CN111440382B (zh) * 2020-04-14 2022-11-25 江苏源源山富数码喷绘科技有限公司 一种冷裱膜用柔性pp颗粒及其制备方法
EP4139405A1 (en) * 2020-04-21 2023-03-01 PPG Industries Ohio Inc. Retroreflective coating compositions, coatings formed therefrom, and methods of forming such coatings
CN120740764B (zh) * 2025-08-26 2025-12-09 秦皇岛微晶科技有限公司 一种防爆窗口结构及其制备方法和应用

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06211945A (ja) 1993-01-20 1994-08-02 Nissin High Voltage Co Ltd ハードコートシートとその製造方法
US6589650B1 (en) 2000-08-07 2003-07-08 3M Innovative Properties Company Microscope cover slip materials
DE19829172A1 (de) 1998-06-30 2000-01-05 Univ Konstanz Verfahren zur Herstellung von Antireflexschichten
JP3897938B2 (ja) 1998-10-22 2007-03-28 宇部日東化成株式会社 有機−無機複合傾斜材料、その製造方法及びその用途
JP3760669B2 (ja) 1999-04-22 2006-03-29 株式会社Ｎｈｖコーポレーション ハードコートシートとその製造方法
US7125926B2 (en) 2001-03-21 2006-10-24 Daikin Industries, Ltd. Surface treatment agent comprising inorganic-organic hybrid material
WO2002079328A2 (en) * 2001-03-30 2002-10-10 Dsm Ip Assets B.V. Curable composition, cured product thereof, and laminated material
WO2003102500A1 (en) 2002-06-04 2003-12-11 Olympus Corporation Method of obtaining 3-d coordinates
EP1539378A2 (en) 2002-09-19 2005-06-15 Optimax Technology Corp. Antiglare and antireflection coatings of surface active nanoparticles
EP1418448A1 (en) 2002-11-06 2004-05-12 Koninklijke DSM N.V. Preparation of a mechanically durable single layer coating with anti-reflective properties
JP3960307B2 (ja) * 2003-05-15 2007-08-15 Ｊｓｒ株式会社 液状樹脂組成物、硬化膜及び積層体
JP2005148376A (ja) * 2003-11-14 2005-06-09 Sumitomo Osaka Cement Co Ltd 膜及び反射防止膜
WO2005090473A1 (ja) * 2004-03-18 2005-09-29 Jsr Corporation 積層体の製造方法
WO2006030721A1 (en) * 2004-09-13 2006-03-23 Fujifilm Corporation Anti-reflection film, polarizing plate, and liquid crystal display device
JP5075333B2 (ja) * 2005-11-11 2012-11-21 富士フイルム株式会社 光学フィルム、偏光板、及び画像表示装置
US7615283B2 (en) 2006-06-13 2009-11-10 3M Innovative Properties Company Fluoro(meth)acrylate polymer composition suitable for low index layer of antireflective film
US20070286994A1 (en) * 2006-06-13 2007-12-13 Walker Christopher B Durable antireflective film
US20100291364A1 (en) 2007-12-19 2010-11-18 E.I. Dupont Nemours And Company Bilayer anti-reflective films containing nanoparticles in both layers

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Publication number Publication date
US8202573B2 (en) 2012-06-19
EP2193174A1 (en) 2010-06-09
WO2009035874A1 (en) 2009-03-19
JP2010538147A (ja) 2010-12-09
CN101796146B (zh) 2013-09-04
US20100189970A1 (en) 2010-07-29
CN101796146A (zh) 2010-08-04

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