KR20100056444A - 정전 방전 보호 디바이스 및 정전 방전 보호 디바이스를 포함하는 반도체 디바이스 제조 방법 - Google Patents
정전 방전 보호 디바이스 및 정전 방전 보호 디바이스를 포함하는 반도체 디바이스 제조 방법 Download PDFInfo
- Publication number
- KR20100056444A KR20100056444A KR1020107002262A KR20107002262A KR20100056444A KR 20100056444 A KR20100056444 A KR 20100056444A KR 1020107002262 A KR1020107002262 A KR 1020107002262A KR 20107002262 A KR20107002262 A KR 20107002262A KR 20100056444 A KR20100056444 A KR 20100056444A
- Authority
- KR
- South Korea
- Prior art keywords
- region
- well device
- conductivity type
- silicon substrate
- device region
- Prior art date
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0255—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using diodes as protective elements
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/771,565 US8013393B2 (en) | 2007-06-29 | 2007-06-29 | Electrostatic discharge protection devices |
US11/771,565 | 2007-06-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20100056444A true KR20100056444A (ko) | 2010-05-27 |
Family
ID=39689213
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020107002262A KR20100056444A (ko) | 2007-06-29 | 2008-06-26 | 정전 방전 보호 디바이스 및 정전 방전 보호 디바이스를 포함하는 반도체 디바이스 제조 방법 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8013393B2 (de) |
EP (1) | EP2160763A1 (de) |
JP (1) | JP5389022B2 (de) |
KR (1) | KR20100056444A (de) |
CN (1) | CN101720505A (de) |
TW (1) | TW200915537A (de) |
WO (1) | WO2009005695A1 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8405123B2 (en) * | 2008-10-27 | 2013-03-26 | National Semiconductor Corporation | Split-gate ESD diodes with elevated voltage tolerance |
US8686508B2 (en) | 2009-09-03 | 2014-04-01 | International Business Machines Corporation | Structures, methods and applications for electrical pulse anneal processes |
US8692290B2 (en) | 2011-09-07 | 2014-04-08 | International Business Machines Corporation | Silicon controlled rectifier structure with improved junction breakdown and leakage control |
FR2980039B1 (fr) | 2011-09-12 | 2013-09-27 | Commissariat Energie Atomique | Transistor a effet de champ z2fet a pente sous le seuil verticale et sans ionisation par impact |
FR2981796B1 (fr) | 2011-10-21 | 2017-02-03 | Commissariat Energie Atomique | Cellule memoire dynamique munie d'un transistor a effet de champ a pente sous le seuil vertical |
CN105097798A (zh) * | 2014-05-22 | 2015-11-25 | 上海北京大学微电子研究院 | Esd保护器件结构与系统 |
JP2016031943A (ja) * | 2014-07-25 | 2016-03-07 | ソニー株式会社 | 静電保護素子および静電保護回路 |
CN108878541B (zh) * | 2017-05-08 | 2021-07-02 | 中芯国际集成电路制造(上海)有限公司 | 鳍片式二极管及其制造方法 |
US20210098987A1 (en) * | 2019-09-26 | 2021-04-01 | Priya Walimbe | Electrostatic discharge protection for stacked-die system |
TWI792295B (zh) | 2021-05-04 | 2023-02-11 | 合晶科技股份有限公司 | 半導體基板及其製造方法 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5637900A (en) * | 1995-04-06 | 1997-06-10 | Industrial Technology Research Institute | Latchup-free fully-protected CMOS on-chip ESD protection circuit |
JP3363038B2 (ja) * | 1996-09-18 | 2003-01-07 | 株式会社東芝 | 半導体記憶装置 |
US6015992A (en) * | 1997-01-03 | 2000-01-18 | Texas Instruments Incorporated | Bistable SCR-like switch for ESD protection of silicon-on-insulator integrated circuits |
JPH1154743A (ja) * | 1997-07-29 | 1999-02-26 | Toshiba Corp | 半導体装置及びその製造方法 |
TW423156B (en) | 1999-09-06 | 2001-02-21 | Winbond Electronics Corp | Electrostatic discharge protection circuit for SOI technique |
US6594132B1 (en) | 2000-05-17 | 2003-07-15 | Sarnoff Corporation | Stacked silicon controlled rectifiers for ESD protection |
US6864536B2 (en) * | 2000-12-20 | 2005-03-08 | Winbond Electronics Corporation | Electrostatic discharge protection circuit |
TW511269B (en) | 2001-03-05 | 2002-11-21 | Taiwan Semiconductor Mfg | Silicon-controlled rectifier device having deep well region structure and its application on electrostatic discharge protection circuit |
JP5172056B2 (ja) * | 2001-06-04 | 2013-03-27 | ラピスセミコンダクタ株式会社 | 半導体装置 |
US6573566B2 (en) | 2001-07-09 | 2003-06-03 | United Microelectronics Corp. | Low-voltage-triggered SOI-SCR device and associated ESD protection circuit |
JP2003209185A (ja) * | 2002-01-11 | 2003-07-25 | Seiko Epson Corp | 半導体装置 |
US6737682B1 (en) * | 2002-07-30 | 2004-05-18 | Taiwan Semiconductor Manufacturing Company | High voltage tolerant and low voltage triggering floating-well silicon controlled rectifier on silicon-on-insulator for input or output |
US6900970B2 (en) * | 2003-01-22 | 2005-05-31 | Freescale Semiconductor, Inc. | Electrostatic discharge circuit and method therefor |
JP4800605B2 (ja) * | 2004-11-15 | 2011-10-26 | Okiセミコンダクタ株式会社 | 静電破壊保護回路 |
JP4696964B2 (ja) | 2005-07-15 | 2011-06-08 | ソニー株式会社 | メモリ用の半導体装置 |
DE102005039365B4 (de) | 2005-08-19 | 2022-02-10 | Infineon Technologies Ag | Gate-gesteuertes Fin-Widerstandselement, welches als pinch - resistor arbeitet, zur Verwendung als ESD-Schutzelement in einem elektrischen Schaltkreis und Einrichtung zum Schutz vor elektrostatischen Entladungen in einem elektrischen Schaltkreis |
US7298008B2 (en) * | 2006-01-20 | 2007-11-20 | International Business Machines Corporation | Electrostatic discharge protection device and method of fabricating same |
DE102006022105B4 (de) | 2006-05-11 | 2012-03-08 | Infineon Technologies Ag | ESD-Schutz-Element und ESD-Schutz-Einrichtung zur Verwendung in einem elektrischen Schaltkreis |
DE102006023429B4 (de) * | 2006-05-18 | 2011-03-10 | Infineon Technologies Ag | ESD-Schutz-Element zur Verwendung in einem elektrischen Schaltkreis |
-
2007
- 2007-06-29 US US11/771,565 patent/US8013393B2/en not_active Expired - Fee Related
-
2008
- 2008-06-26 EP EP20080768801 patent/EP2160763A1/de not_active Withdrawn
- 2008-06-26 JP JP2010514820A patent/JP5389022B2/ja not_active Expired - Fee Related
- 2008-06-26 CN CN200880022756A patent/CN101720505A/zh active Pending
- 2008-06-26 WO PCT/US2008/007975 patent/WO2009005695A1/en active Application Filing
- 2008-06-26 KR KR1020107002262A patent/KR20100056444A/ko not_active Application Discontinuation
- 2008-06-27 TW TW097124047A patent/TW200915537A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
WO2009005695A1 (en) | 2009-01-08 |
US20090001472A1 (en) | 2009-01-01 |
JP5389022B2 (ja) | 2014-01-15 |
TW200915537A (en) | 2009-04-01 |
US8013393B2 (en) | 2011-09-06 |
JP2010532566A (ja) | 2010-10-07 |
EP2160763A1 (de) | 2010-03-10 |
CN101720505A (zh) | 2010-06-02 |
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A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |