KR20090129476A - 염산 기체 유동으로부터 무기 성분을 제거하기 위한 흡착 방법 - Google Patents

염산 기체 유동으로부터 무기 성분을 제거하기 위한 흡착 방법 Download PDF

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Publication number
KR20090129476A
KR20090129476A KR1020097021616A KR20097021616A KR20090129476A KR 20090129476 A KR20090129476 A KR 20090129476A KR 1020097021616 A KR1020097021616 A KR 1020097021616A KR 20097021616 A KR20097021616 A KR 20097021616A KR 20090129476 A KR20090129476 A KR 20090129476A
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KR
South Korea
Prior art keywords
gas
adsorbent
hydrogen chloride
process according
hydrochloric acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
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KR1020097021616A
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English (en)
Korean (ko)
Inventor
볼프 아우렐
올리페르 펠릭스-칼 슈뤼테르
Original Assignee
바이엘 머티리얼사이언스 아게
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 바이엘 머티리얼사이언스 아게 filed Critical 바이엘 머티리얼사이언스 아게
Publication of KR20090129476A publication Critical patent/KR20090129476A/ko
Withdrawn legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00Halogens; Halogen acids
    • C01B7/01Chlorine; Hydrogen chloride
    • C01B7/07Purification ; Separation
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00Halogens; Halogen acids
    • C01B7/01Chlorine; Hydrogen chloride
    • C01B7/07Purification ; Separation
    • C01B7/0706Purification ; Separation of hydrogen chloride
    • C01B7/0718Purification ; Separation of hydrogen chloride by adsorption
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2253/00Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/10Inorganic adsorbents
    • B01D2253/104Alumina
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2253/00Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/10Inorganic adsorbents
    • B01D2253/106Silica or silicates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2253/00Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/10Inorganic adsorbents
    • B01D2253/106Silica or silicates
    • B01D2253/108Zeolites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2253/00Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/30Physical properties of adsorbents
    • B01D2253/302Dimensions
    • B01D2253/306Surface area, e.g. BET-specific surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2256/00Main component in the product gas stream after treatment
    • B01D2256/26Halogens or halogen compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/60Heavy metals or heavy metal compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Catalysts (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
KR1020097021616A 2007-04-17 2008-04-04 염산 기체 유동으로부터 무기 성분을 제거하기 위한 흡착 방법 Withdrawn KR20090129476A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007018016A DE102007018016A1 (de) 2007-04-17 2007-04-17 Absorptionsprozess zur Entfernung anorganischer Komponenten aus einem Chlorwasserstoff enthaltenden Gasstrom
DE102007018016.2 2007-04-17

Publications (1)

Publication Number Publication Date
KR20090129476A true KR20090129476A (ko) 2009-12-16

Family

ID=39684160

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020097021616A Withdrawn KR20090129476A (ko) 2007-04-17 2008-04-04 염산 기체 유동으로부터 무기 성분을 제거하기 위한 흡착 방법

Country Status (7)

Country Link
US (1) US20080257150A1 (enExample)
EP (1) EP2139809A1 (enExample)
JP (1) JP2010524814A (enExample)
KR (1) KR20090129476A (enExample)
CN (1) CN101657380A (enExample)
DE (1) DE102007018016A1 (enExample)
WO (1) WO2008125235A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101935020B (zh) * 2010-09-15 2012-01-25 重庆天原化工有限公司 甲烷氯化物副产氯化氢的提纯方法
US9352270B2 (en) 2011-04-11 2016-05-31 ADA-ES, Inc. Fluidized bed and method and system for gas component capture
CN102602892B (zh) * 2012-04-11 2015-04-01 万华化学集团股份有限公司 通过氯化氢的催化氧化制备氯气的方法
CN104812467B (zh) 2012-09-20 2017-05-17 Ada-Es股份有限公司 用于恢复被热稳定盐污染的吸附剂上的功能位置的方法和系统
CN105377751A (zh) * 2013-05-15 2016-03-02 旭硝子株式会社 氯化氢的纯化方法
IN2013MU02038A (enExample) * 2013-06-17 2015-06-05 Reliance Ind Ltd
CN104689782A (zh) * 2013-12-05 2015-06-10 无锡钻石地毯制造有限公司 一种生态地毯氯化氢吸附剂
CN106145039B (zh) * 2015-04-01 2020-09-11 上海氯碱化工股份有限公司 氯化氢制氯工艺中原料预处理的方法
CN106422656A (zh) * 2016-11-30 2017-02-22 广东广山新材料有限公司 一种氯化氢气体的纯化方法
CN109678114B (zh) * 2019-02-19 2021-04-02 苏州晶瑞化学股份有限公司 一种电子级盐酸中杂质砷的去除方法
CN112678775B (zh) * 2019-10-17 2022-12-06 新疆晶硕新材料有限公司 一种白炭黑尾气净化回收的方法及装置
CN114212757B (zh) * 2021-12-24 2023-03-17 昆山市年沙助剂有限公司 一种试剂级化工助剂的生产工艺

Family Cites Families (24)

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US1936078A (en) 1926-12-09 1933-11-21 Gen Chemical Corp Process of purifying hydrochloric acid gas
DE730177C (de) * 1939-09-16 1943-01-07 Metallgesellschaft Ag Verfahren zur laufenden Herstellung von selenfreier Salzsaeure
US3029575A (en) * 1958-11-03 1962-04-17 Exxon Research Engineering Co Chlorine separation process
GB1090521A (en) 1965-11-04 1967-11-08 Ici Ltd Purification of hydrogen chloride
GB1186941A (en) * 1966-04-02 1970-04-08 Sir Soc Italiana Resine Spa Method of Manufacturing Useful Intermediates in the Synthesis of Biologically Degradable Detergents
CA991822A (en) * 1971-06-16 1976-06-29 Dhirendra R. Merchant Purification of gaseous hydrogen chloride
DE2413043A1 (de) 1974-03-19 1975-09-25 Bayer Ag Verfahren zur reinigung von salzsaeure
US4009214A (en) * 1975-04-25 1977-02-22 The Lummus Company Separation of hydrogen fluoride from hydrogen chloride gas
US4053558A (en) * 1975-07-14 1977-10-11 Stauffer Chemical Company Purification of gas streams containing ferric chloride
US4639259A (en) * 1985-10-09 1987-01-27 Kaiser Aluminum & Chemical Corporation Promoted scavenger for purifying HCl-contaminated gases
US4663052A (en) * 1985-12-12 1987-05-05 Union Carbide Corporation Drying process using chabazite-type adsorbents
US5316998A (en) * 1992-05-05 1994-05-31 Discovery Chemicals, Inc. HCl adsorbent and method for making and using same
US5284638A (en) * 1992-08-05 1994-02-08 Corning Incorporated System and method for removing hydrocarbons from gaseous mixtures using multiple adsorbing agents
US5958356A (en) * 1997-11-05 1999-09-28 Air Products And Chemicals, Inc. Method for removal of moisture from gaseous HCl
US6395070B1 (en) * 1998-10-06 2002-05-28 Matheson Tri-Gas, Inc. Methods for removal of impurity metals from gases using low metal zeolites
US6110258A (en) * 1998-10-06 2000-08-29 Matheson Tri-Gas, Inc. Methods for removal of water from gases using superheated zeolites
US6221132B1 (en) * 1999-10-14 2001-04-24 Air Products And Chemicals, Inc. Vacuum preparation of hydrogen halide drier
US6547861B2 (en) * 2000-12-26 2003-04-15 Matheson Tri-Gas,, Inc. Method and materials for purifying reactive gases using preconditioned ultra-low emission carbon material
GB0103762D0 (en) * 2001-02-15 2001-04-04 Air Prod & Chem A gas purification unit
US7175696B2 (en) * 2002-02-19 2007-02-13 American Air Liquide, Inc. Method and apparatus for corrosive gas purification
US7101415B2 (en) * 2002-08-30 2006-09-05 Matheson Tri-Gas, Inc. Methods for regenerating process gas purifier materials
US6709487B1 (en) * 2002-10-22 2004-03-23 Air Products And Chemicals, Inc. Adsorbent for moisture removal from fluorine-containing fluids
CN1988948A (zh) * 2004-07-20 2007-06-27 安格斯公司 从超高纯度气体中除去金属污染物
US7314506B2 (en) * 2004-10-25 2008-01-01 Matheson Tri-Gas, Inc. Fluid purification system with low temperature purifier

Also Published As

Publication number Publication date
WO2008125235A1 (de) 2008-10-23
US20080257150A1 (en) 2008-10-23
CN101657380A (zh) 2010-02-24
DE102007018016A1 (de) 2008-10-30
EP2139809A1 (de) 2010-01-06
JP2010524814A (ja) 2010-07-22

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Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20091016

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid